Patents Examined by Peter L. Vajda
  • Patent number: 11392052
    Abstract: An electrostatic image developing toner includes a toner particle, an external additive A, and an external additive B. At least the external additive A is present on the surface of the toner particles. At least the external additive B is present on the external additive A. The number of peaks of the external additive B on the external additive A is 5 or more and 100 or less per 30 ?m peripheral length of the toner particle, the peaks having a height from the surface of the toner particle of 80 nm or more and 250 nm or less.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: July 19, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Yasuko Torii, Yosuke Tsurumi, Atsushi Sugawara, Yoshimasa Fujihara, Moegi Iguchi
  • Patent number: 11392034
    Abstract: A resist composition comprising a carbonyloxyimide compound having an iodized or brominated aromatic ring has a high sensitivity and forms a pattern having improved LWR or CDU.
    Type: Grant
    Filed: August 2, 2019
    Date of Patent: July 19, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 11392053
    Abstract: The present disclosure relates to an electrophotographic printing method comprising electrophotographically printing a liquid electrophotographic composition onto a substrate. The liquid electrophotographic composition comprises a charge adjuvant and a copolymer of a) ethylene and b) methacrylic acid and/or acrylic acid, wherein 80 to 95 weight % of the units of said copolymer are derived from ethylene. The printed substrate is then subjected to electron beam (EB) radiation.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: July 19, 2022
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Boris Kaziev, Dani Tulchinski, Liora Braun, Einat Glick, Yair Gellis, Debby Margoy
  • Patent number: 11385558
    Abstract: A toner has a toner particle containing a resin having an acid group, an aluminum pigment, and a fatty acid metal salt, wherein an acid value of the resin having an acid group is in a range of from 5 mg KOH/g to 25 mg KOH/g, and an amount of the resin having the acid group is 50% by mass or more; an amount of the aluminum pigment is in a range of from 10% by mass to 40% by mass; the fatty acid metal salt is represented by formula (R—COO)pM(OH)q; and an amount thereof is in a range of from 1 part by mass to 10 parts by mass based on 100 parts by mass of the aluminum pigment.
    Type: Grant
    Filed: June 16, 2020
    Date of Patent: July 12, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yuya Chimoto, Kouichirou Ochi, Tomoyo Miyakai, Takashi Hirasa
  • Patent number: 11385545
    Abstract: A resist underlayer composition and a method of forming patterns, the composition including a polymer including at least one of a first moiety represented by Chemical Formula 1-1 and a second moiety represented by Chemical Formula 1-2; a thermal acid generator including a salt composed of an anion of an acid and a cation of a base, the base having pKa of greater than or equal to about 7; and a solvent,
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: July 12, 2022
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Jaeyeol Baek, Shinhyo Bae, Yoojeong Choi, Soonhyung Kwon, Hyeon Park
  • Patent number: 11366402
    Abstract: There is provided a process cartridge detachably attachable to a main body of an electrophotographic apparatus, the process cartridge including an electrophotographic photosensitive member and a charging member, wherein an outer surface of the charging member is composed of at least a matrix and at least a part of domains, a volume resistivity of the matrix is 1.0×105 times or more of a volume resistivity of the domain, an average value Sd of circle equivalent diameters of the domains observed on the outer surface of the charging member is in a predetermined range, the electrophotographic photosensitive member contains a support, a photosensitive layer, and a protective layer in this order and when a surface roughness of the protective layer is measured, each of a protruding valley portion Rvk, a load length ratio Mr2, and Sd/Rvk is in a predetermined range.
    Type: Grant
    Filed: October 14, 2020
    Date of Patent: June 21, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yuka Ishiduka, Tsutomu Nishida, Hideharu Shimozawa, Nobuhiro Nakamura, Hiroyuki Watanabe, Kenichi Kaku, Kazuhiro Yamauchi, Yuichi Kikuchi, Kazuhisa Shida, Atsushi Okuda
  • Patent number: 11360404
    Abstract: A toner comprising a toner particle that contains a binder resin and fine particles A at the surface of the toner particle, wherein the fine particles A are organosilicon polymer fine particles, the organosilicon polymer fine particles have a number-average primary particle diameter of 30 nm to 500 nm, the organosilicon polymer fine particles have an attachment index for a polycarbonate film of not more than 3.5, the organosilicon polymer fine particles penetrate into the toner particle in a penetration depth b (nm), and protrude from the toner particle in a protrusion height c (nm), and b and c satisfy 0.05?b/(b+c)?0.40.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: June 14, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takaaki Furui, Yojiro Hotta, Yasuhiro Hashimoto, Koji Nishikawa, Shotaro Nomura, Yuujirou Nagashima
  • Patent number: 11360387
    Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from ?5 to 13 and having pendently-bound siloxane moieties are provided.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: June 14, 2022
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Paul J. LaBeaume, James F. Cameron, Charlotte A. Cutler, Shintaro Yamada, Suzanne M. Coley, Iou-Sheng Ke
  • Patent number: 11353803
    Abstract: A toner for electrostatic image development includes toner particles containing an amorphous resin and a crystalline resin. The toner particles include first toner particles. When a cross section of each of the first toner particles is observed, at least two domains of the crystalline resin satisfy conditions (A), (B1), (C), and (D) below: condition (A): an aspect ratio of each of the at least two domains of the crystalline resin is from 5 to 40 inclusive; condition (B1): a length of a major axis of each of the at least two domains of the crystalline resin is from 0.5 ?m to 1.
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: June 7, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Atsushi Sugawara, Shintaro Anno, Yoshimasa Fujihara, Daisuke Noguchi, Satoshi Miura
  • Patent number: 11347157
    Abstract: A toner comprising a toner particle, wherein the toner has G1 of from 5.0×10?13 to 1.0×10?10, and a ratio G2/G1 of G2 to G1 is from 0.10 to 0.60, when a conductivity of the toner measured at a frequency of 0.01 Hz under a pressure of 1,000 kPa is designated by G1 in S/m, and a conductivity of the toner measured at a frequency of 0.01 Hz under a pressure of 100 kPa is designated by G2 in S/m.
    Type: Grant
    Filed: July 22, 2020
    Date of Patent: May 31, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kenta Kamikura, Takashi Kenmoku, Yuzo Seino
  • Patent number: 11347145
    Abstract: High etch contrast materials provide the basis for using pre-patterned template structure with a template hardmask having periodic holes and filler within the holes that provides the basis for rapidly obtaining high resolution patterns guided by the template and high etch contrast resist. Methods are described for performing the radiation lithography, e.g., EUV radiation lithography, using the pre-patterned templates. Also, methods are described for forming the templates. The materials for forming the templates are described.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: May 31, 2022
    Assignee: Inpria Corporation
    Inventors: Jason K. Stowers, Andrew Grenville
  • Patent number: 11333989
    Abstract: A toner containing a toner particle that contains a binder resin and a crystalline material, wherein, in measurement of powder dynamic viscoelasticity of the toner, when T(A)° C. is taken as an onset temperature for a storage elastic modulus E? obtained at a ramp rate of 20° C./min, EA?(100) Pa is taken as a storage elastic modulus at 100° C. obtained at a ramp rate of 20° C./min, and T(B)° C. is taken as an onset temperature for a storage elastic modulus E? obtained at a ramp rate of 5° C./min, T(A)?T(B) is 3.0° C. or less, T(A) is from 45.0° C. to 70.0° C., and EA?(100) is from 4.0×109 Pa to 6.5×109 Pa.
    Type: Grant
    Filed: June 23, 2020
    Date of Patent: May 17, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomohiro Unno, Kosuke Fukudome, Ryo Nagata, Tetsuya Kinumatsu, Mariko Yamashita
  • Patent number: 11333964
    Abstract: An organic compound represented by general formula (1) is a novel organic compound having an absorption band in the near infrared region, and is useful for infrared absorbing dyes, optical films, and organic electronic devices such as photoelectric conversion elements, wherein R1 to R18 each independently represent a hydrogen atom, an aryl group, a heteroaryl group, an alkyl group, a cycloalkyl group, a halogen atom, a hydroxy group, an alkoxy group, a mercapto group, an alkylthio group, a nitro group, a substituted amino group, an amide group, an acyl group, a carboxyl group, an acyloxy group, a cyano group, a sulfo group, a sulfamoyl group, an alkylsulfamoyl group, a carbamoyl group, or an alkylcarbamoyl group; and X represents a substituted or unsubstituted methine group, a silylidyne group, a germylidyne group, a stannylidyne group, a nitrogen atom, a phosphorus atom, an arsenic atom, or an antimony atom.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: May 17, 2022
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Tatsuya Aotake, Toshifumi Inouchi, Hidenori Yakushiji, Tatsuya Yamamoto
  • Patent number: 11332788
    Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
    Type: Grant
    Filed: January 20, 2021
    Date of Patent: May 17, 2022
    Assignee: Illumina, Inc.
    Inventors: Yir-Shyuan Wu, Yan-You Lin, M. Shane Bowen, Cyril Delattre, Fabien Abeille, Tarun Khurana, Arnaud Rival, Poorya Sabounchi, Dajun Yuan, Maria Candelaria Rogert Bacigalupo
  • Patent number: 11319410
    Abstract: The present invention provides an amic acid ester oligomer having a structure of Formula (1) or (1?): wherein G, P, R, Rx, D, E and m are those as defined in the specification. The present invention also provides a polyimide precursor composition or a photosensitive polyimide precursor composition comprising the amic acid ester oligomer, as well as a polyimide prepared from the composition.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: May 3, 2022
    Assignee: ETERNAL MATERIALS CO., LTD.
    Inventors: Po-Yu Huang, Chung-Jen Wu, Meng-Yen Chou, Chang-Hong Ho, Shun-Jen Chiang, Chung-Kai Cheng
  • Patent number: 11320755
    Abstract: A brilliant developer contains a metallic pigment containing pigment particles, a binder resin, and an external additive. A percentage of the pigment particles not less than 2 ?m and not more than 4 ?m in a volume particle size distribution of a residue separated from a mixture obtained by dissolving the brilliant developer in tetrahydrofuran after removing the external additive from the brilliant developer is not less than 21.5% and not more than 25.3%.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: May 3, 2022
    Assignee: Oki Electric Industry Co., Ltd.
    Inventor: Karin Nakahara
  • Patent number: 11307498
    Abstract: A film patterning method, an array substrate, and a manufacturing method of an array substrate are disclosed. The film patterning method includes: applying photoresist on a film to be patterned; performing exposure and development on the photoresist, a region corresponding to a completely removed portion of the photoresist after the exposure and the development being a first region; post-baking the photoresist, so that the photoresist is melted and collapsed to change the region corresponding to the completely removed portion into a second region, the photoresist after post-baking forms into a mask pattern; and patterning the film by using the mask pattern as a mask.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: April 19, 2022
    Assignees: BOE Technology Group Co., Ltd., Hefei Xinsheng Optoelectronics Technology Co., Ltd.
    Inventors: Jun Wang, Guangcai Yuan, Dongfang Wang, Chong Fang, Guangyao Li
  • Patent number: 11307508
    Abstract: An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer on the conductive substrate. The electrophotographic photoreceptor has an outermost surface layer that contains fluorine-containing resin particles and an antioxidant. The fluorine-containing resin particles contain 0 or more and 30 or less carboxy groups per 106 carbon atoms. A decrease in weight of the antioxidant when heated at 150° C. for 10 minutes in an air atmosphere is 40 mass % or less.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: April 19, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Keisuke Kusano, Wataru Yamada, Masahiro Iwasaki, Yuto Okazaki
  • Patent number: 11300879
    Abstract: A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein R1 is an organic group having at least two amines and at least three C6-40 aromatic rings, R2 and R3 are each a hydrogen atom, a C1-10 alkyl group, a C6-40 aryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or R2 and R3 optionally form a ring together). The above mentioned composition t, wherein R1 is a divalent organic group derived from N,N?-diphenyl-1,4-phenylenediamine.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: April 12, 2022
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Daigo Saito, Keisuke Hashimoto, Rikimaru Sakamoto
  • Patent number: 11294296
    Abstract: A toner comprising: a toner particle including a binder resin; and an external additive, wherein the external additive includes an external additive A which is silica fine particles and an external additive B which is a fatty acid metal salt, the external additive A has a specific particle diameter, a coverage ratio of a surface of the toner particle with the external additive A is from 60% to 80%, and where an average theoretical surface area obtained from a number average particle diameter, a particle size distribution and a true density of the toner particle is denoted by C (m2/g), an amount of the external additive B is denoted by D (parts by mass) and a coverage ratio of the surface of the toner particle with the external additive B is denoted by E (%), following formulas are satisfied: 0.05?D/C?2.00 E/(D/C)?50.0.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: April 5, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hidekazu Fumita, Noriyoshi Umeda, Tomonori Matsunaga, Satoshi Otsuji