Abstract: The frontloading dishwasher has a dishwashing compartment and a door mounted on the machine body such that it can be pivoted about a horizontal axis for closing a loading opening of the dishwashing compartment. The bottom border of an inner wall of the door, forming a door lip, engages behind a compartment skirt that rises from the dishwashing-compartment base. A seal is arranged between the door and the dishwashing compartment. The seal includes a sealing strip that extends across the entire door width. Satisfactory sealing of the dishwasher is ensured over a long period of use, dirt deposits in the sealing region are avoided, and only a low level of force for moving the door is required in that a guide and securing device for the seal is provided, for securing the seal in the rest position and for guiding the seal during movement of the door.

Abstract: A long-lived cleaning vessel for ultrasonic cleaning is provided which is easily manufactured and is also easy to handle due to a simple structure thereof, and has excellent durability, mechanical strength, and corrosion resistance. A cleaning vessel 1 of the present invention includes a layer of silicon carbide sintered body 3 which propagates ultrasonic waves. Further, a silicon carbide sintered body is provided which can be applied to components for semiconductor production apparatuses, components for electronic information equipment, and various structural components for vacuum devices and the like, and which can particularly suitably be used as an ultrasonic resonance plate or an ultrasonic diaphragm, and can be easily processed, and further which can be made thinner while maintaining sufficient mechanical strength. The silicon carbide sintered body can propagate ultrasonic waves and an acoustic velocity of ultrasonic waves propagated therethrough is 4000 to 20000 m/s.

Abstract: A wash water recirculation unit and system for use in cleaning ventilation system equipment, and components of the system, are described.

Abstract: A clothes washing machine is automatically responsive to indications of high suds level conditions during washing operations to, not only counteract the high level of suds, but effectively educate the user on avoiding the reoccurrence of the conditions. A display, such as an LCD touch screen which is also preferably used to input desired cycle parameters, is integrated into the washing machine for both alerting the user to the occurrence of a high suds level condition and conveying information on how to avoid the development of the situation in the future. In order to avoid prematurely alarming the user, it is preferable to instruct the user only after a predetermined number of high level suds cycles are detected.

Abstract: A dispensing device for the machine washing of laundry comprises a receptacle for receiving an amount of detergent product having filling opening means and a body wall which includes a plurality of apertures for dispensing detergent product. The device includes a rigids spacing means which is formed around the body wall for spacing laundry from the dispensing apertures.

Abstract: A laundry device for use with a washing machine is provided. The laundry device includes a bag storing a water-insoluble DTI compound. The bag includes a plurality of apertures allowing wash water to flow through the bag but which substantially prevent the water-insoluble DTI compound from exiting the bag during use. The laundry device can further include a container having a compartment for receiving and dispensing a dosed amount of detergent during use.

Abstract: A carrier for receiving and holding a plurality of semiconductor wafers and permitting surfaces of the wafers to receive maximum exposure to ultrasonic waves during a wafer cleaning process in which the carrier and the wafers are immersed in a liquid medium and ultrasonic waves are generated in the liquid medium. The carrier includes two vertical sidewalls and at least three horizontal supporting rods that interconnect the sidewalls and that are collectively positioned for supporting wafers in generally upright, face to face position generally parallel to each other. At least one stabilizing rod extends horizontally between the sidewalls for limiting wafer motion relative to the carrier to steady the wafers. A series of spaced apart teeth on the stabilizing rod define troughs for receiving wafers loosely therein to prevent substantial vibratory deflections of the wafers.

Abstract: The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.

Abstract: A washing machine having a variable speed motor. The washing machine has a basket for holding articles to be washed and has a first axis of rotation. A basket drive shaft connected to the basket drives the basket. An agitator disposed in the basket along the first axis of rotation agitates the article in the basket. An agitator drive shaft connected to the agitator drives the agitator. A variable speed motor, having a second axis of rotation which is not coincident with the first axis of rotation, drives the basket drive shaft and the agitator drive shaft. A coupler couples motion of the variable speed motor to the agitator drive shaft and basket drive shaft.

Abstract: A washing machine including an metal-containing bleach activation system and method of operation are disclosed herein. A peroxide generator, in the form of an electrochemical cell, is connected to a water inlet pipe to produce and deliver peroxide molecules into the washing machine. The activation system includes a catalyst which is preferably compounded into structure of the machine, such that when soiled articles contact the peroxide and the catalyst, the bleaching activity of the peroxide is greatly increased.

Abstract: Structure of a driving unit in a drum type washing machine including a tub for storing washing water, a drum of a metal rotatably mounted inside of the tub disposed horizontal to the ground, or with an angle to the ground for accommodating laundry therein, a shaft connected to the drum mounted inside of the tub through the tub for transmission of a driving force of the motor to the drum, bearings fitted onto outer circumferences of both end portions of the shaft for supporting the shaft, a bearing housing having stator fastening bosses at fixed intervals along a circumference of a central portion thereof for supporting the bearings, a stator having a plurality of magnetic cores each formed by stacking magnetic laminations each having a salient pole projected outward in a radial direction and a rib projected inward in a radial direction, both of which are formed as one unit, frames of insulating material for covering top and bottom surfaces of a magnetic core assembly of the magnetic cores, and coils each woun

Abstract: This invention is related to a smart balancing system, where it determines the steady or varying imbalance force vectors acting on rotational drum or rotors, while rotating at high speeds and counterbalances the said imbalance force vectors by using one or more “balancing drums” fitted onto the same drum or rotor along the same rotational axis and one of the areas where such a balancing system used, being high speed spinning washing machines, where the imbalance force vectors acting on the system while spinning at high speeds are eliminated by the use of said intelligent balancing system.

Abstract: A small-sized cleaning and drying apparatus is provided. Without generating particles, hydrogen gas, etc., the apparatus easily generates an ozone water to form an oxidation film on an object to be processed. The apparatus includes a cleaning part 1 for washing semiconductor wafers W and a drying part 2 for drying the wafers W. The cleaning part 1 is formed by a processing bath 10 storing a chemical liquid or a rinsing liquid. The processing bath 10 is communicated with a chemical source 17 and a pure water source 15 through a rinsing liquid pipeline 14 interposing an ozone water generating unit 21. After completing both chemical treatment and rinsing, it is possible to form the oxidation Elms on respective surfaces of the wafers W and dry them.

Abstract: A cleaning plug (P) adaptable to be placed within an interior passageway (10) of a tubular system (14) includes a generally conically shaped element (16) having a first end (18) and an opposite second end (20). The width (22) of the first end (18) fits within the tube (12). The width (24) of the second end (20) may be less than the first end (18). Rigging (26) is connected to the first end (18) to secure the conical element (16). A valve assembly (28) mounted with the second end (20) has a normally closed position (30) preventing appreciable fluid flow and an open position (32) permitting fluid flow (F) through the valve (28) if the flow pressure therethrough is greater than a minimum selected pressure.

Abstract: The present invention teaches a washing machine having improved cleaning efficiency by adding a generator of functional waster such as ozone water or electroylzed water to a full-automatic washing machine. The washing machine includes a water supplier for supplying washing water, a washing tub containing the washing water and a laundry, a functional water generator inside the washing tub, and an agitator for agitating the washing water and the laundry. When the washing water supplied to the washing tub reaches a predetermined level, the functional water generator generates ozone water or electrolyzed water, which is then mixed by the agitator. Thus, partial decolorization or damage of laundry can be prevented. Also, since ozone water or electrolyzed is maintained in the washing tub in a constant concentration, the laundry can be sterilized, disinfected, bleached and deodorized without being heated, which avoids damage to the laundry.

Abstract: A control device for a laundry appliance includes a member which need only be manually shifted through a limited range of travel, from a neutral position to which the control member is biased, in either of first and second opposing directions, to establish a desired cycle and to adjust an operational time for the cycle. The control member is provided with numerous movable contacts which are interposed between fixed contacts. Shifting of the control member a limited amount in either direction will function to engage a single pair of the contacts, while shifting the control member a further amount in the same direction causes another pair of the contacts to become engaged. In this manner, the contacts are paired to slowly increase or decrease the operational time and to also select either the next or previous operational cycle. User feedback of the selected setting is preferably provided through the use of a illuminated indicator that shifts around a track adjacent operational indicia.

Abstract: An automotive vehicle washing system includes a frame comprising a bridge member end opposed and support sections mounted for linear reciprocating movement on spaced apart support rails. Pivoting washing nozzle support arms are mounted on the bridge section and are interconnected by a drive motor and drive pulleys to move in opposite directions to wash the sides and opposite ends of a vehicle. Each arm includes movable arm sections supporting spaced apart nozzle assemblies which may move toward each other or away from each other to size a vehicle according to its width. Each arm includes opposed elongated beam members which also provide fluid conducting passages for conducting washing fluids to the nozzle assemblies. Certain ones of the nozzle assemblies are drivenly connected to an oscillating servomotor. The servomotor is also used to position the pivoting arm sections through a lost motion coupling and a gear drive unit.

Abstract: A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper end, within which a spool is disposed to slide vertically. In its lowest position the spool is spaced from the closed bottom of the cylinder, and purified water is supplied under pressure to the space. A passage extends vertically through the spool, and the water is discharged at the upper end of the spool from the passage. As a wafer is lowered toward the upper end of the spool, the wafer partially impedes the discharge, increasing the pressure in the space below the spool. The increased pressure drives the spool and the wafer upward, but the wafer never comes into contact with the wafer because the discharge of water creates a protective cushion between them.

Abstract: A load adaptive brake system is provided for an appliance which includes a motor, a drive wheel driven by the motor and a rotatable vessel. A brake surface is fixed relative to a non-movable portion of the appliance and at least one brake shoe carried by the vessel to rotate with the vessel. A biasing mechanism is engageable with the brake shoe to press the brake shoe into engagement with the brake surface. A cam is carried on the vessel, but is rotatable with respect thereto, and engageable with a portion of the brake shoe to overcome a bias of the biasing mechanism when the cam is rotated relative to the vessel in a first direction to disengage the brake shoe from the brake surface.

Abstract: The object of this invention is to provide a semiconductor wafer cleaning apparatus designed to clean several wafers at the same time while rotating the wafers held in a horizontal, laid-down position. In an operation of this apparatus, a wafer feeding robot arm 20 feeds wafers 60 from a wafer cassette 10 to a wafer boat 50 and seats the wafers in the wafer boat while maintaining a horizontal, laid-down position of the wafers. The wafer boat 50, with the horizontally laid-down wafers 60, is vertically moved downward by a boat drive unit 40 to be immersed in a wafer cleaning liquid flowing in a wafer cleaning bath 30. Thereafter, the boat 50 is rotated within the wafer cleaning liquid, and so the wafers 60 are washed and cleaned by the wafer cleaning liquid while being maintained in the horizontal, laid-down position and being rotated horizontally.