Patents Examined by Rebecca C. Slomski
  • Patent number: 7724380
    Abstract: A three-dimensional measurement method is provided for measuring an object shape in a non-contact manner by using a non-contact sensor and a sensor moving mechanism that changes a position and a posture of the sensor and can operate by numerical control, moving the non-contact sensor in accordance with measurement path information indicating plural positions and postures of the sensor at the respective positions. The measurement path information is set in advance by teaching.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: May 25, 2010
    Assignee: Konica Minolta Sensing, Inc.
    Inventors: Shinichi Horita, Yoshihisa Abe
  • Patent number: 7715017
    Abstract: An apparatus and a method for measuring very small separations between a transparent or semi-transparent first body and a second body, wherein one or more light sources produce light that is split into two distinct paths. One path is directed through the first body at two locations, one where it reflects from the interface at the separation to be measured, and another where the second body does not affect the reflection. The second path is directed at a frequency shifter, which shifts the frequency of the light. The two paths are recombined and interfereometric variations of intensity, substantially at the frequency of the shifter, are detected. The difference in phase between the measurement and reference areas with the second body not present is subtracted from the difference in phase between the measurement and reference areas with the second body present. The difference in differences yields the phase change that occurs when the second body is introduced.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: May 11, 2010
    Assignee: MicroPhysics Inc
    Inventor: Christopher Allen Lacey
  • Patent number: 7701567
    Abstract: An optoelectronic distance sensor with slant component 200 having a spacer 202 bonded on a mother substrate 201 is disclosed. The spacer 202 has slant surface for receiving one or more optoelectronic components 204, such as an optical sensor, that are mounted at an angle to the mother substrate 201. Such electronic components 204 are bonded on a daughter substrate 203 which attaches to the spacer 202 at the slant surface. The optoelectronic assembly 200 can be manufactured at chip-level, including by one ore more of exemplary methods disclosed herein.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: April 20, 2010
    Assignee: Hong Kong Applied Science & Technology Research Institute Co., Ltd.
    Inventor: Yeung Ming Chow
  • Patent number: 7701563
    Abstract: A lens decenter error measuring apparatus including a testing device, a lens supporter, and a lens carrier is disclosed. The testing device is configured for measuring a decenter error of a lens. The lens supporter is configured for receiving the lens. The lens carrier is installed within the lens supporter and includes at least three spheres and an elastic member. The spheres associated with the elastic member constrain the lens when the lens is placed in the lens supporter.
    Type: Grant
    Filed: February 28, 2008
    Date of Patent: April 20, 2010
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventors: Sheng-An Wang, Ming-Shan Chan
  • Patent number: 7692790
    Abstract: The present invention is directed to a grating spectrometer system for polychromator spectrometer arrangements and monochromator spectrometer arrangements. The grating spectrometer system, according to the invention, comprises a light source for illuminating the sample to be analyzed, a diffraction grating, imaging optical elements, a detector arranged in the image plane, and a controlling and regulating unit. Individual light sources, preferably LEDs having different spectral characteristics, whose spectral range covers a plurality of diffraction orders in the image plane are used as light source. Only those LEDs which do not illuminate the same location of the individual detectors arranged in the image plane in any diffraction order are switched on individually or in groups by the controlling and regulating unit. The proposed solution is suitable for polychromator spectrometer arrangements and for monochromator spectrometer arrangements.
    Type: Grant
    Filed: May 10, 2006
    Date of Patent: April 6, 2010
    Assignee: Carl Zeiss Microimaging GmbH
    Inventors: Felix Kerstan, Nico Correns
  • Patent number: 7684054
    Abstract: A system and method are disclosed for inspecting a component having a length, a width, and an axis. The system includes a fixture for holding the component, a light source disposed on one side of the component, and an optical detector disposed on the other side of the component. In the preferred embodiment, the detector has a field of view wider than the width of the component, thereby enabling the detector to image a portion of the outer edges of the component. A translation stage is operative to move the light source and detector in unison along the length of the component and a processor, in communication with the detector and the translation stage, is operative to: a) receive electrical signals representative of the outer profile imaged by the detector; b) move the translation stage incrementally along the length of the component; and c) record the outer profile imaged by the detector at each increment and form a composite profile of the component.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: March 23, 2010
    Assignee: GII Acquisition, LLC
    Inventor: David Crowther
  • Patent number: 7684032
    Abstract: The disclosed system provides a method and apparatus for automated detection of a variety of defects within an epitaxial layer by way of an optical surface analysis device containing at least two wavelengths of incident light. A unique defect detection algorithm is provided for generating defect maps for each wavelength of incident light and merging each defect map into one overall defect map in order to detect all defects within an epitaxial layer. The present system is enabled for detecting defects within an epitaxial layer independent of the thickness of the epitaxial layer. Topography, scatter, and phase measurements can also be made in order to increase the accuracy of defect detection.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: March 23, 2010
    Assignee: KLA-Tencor Corporation
    Inventor: Steven W. Meeks
  • Patent number: 7671987
    Abstract: An optical detection system for flow cytometry that uses light sources positioned laterally at different distances from the central axis of the flow stream for providing light through different parts of the flow stream. By using two or more light sources, the particle position can be detected, and the alignment and width of the core stream can be monitored and controlled.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: March 2, 2010
    Assignee: Honeywell International Inc
    Inventors: Aravind Padmanabhan, Bernard S. Fritz
  • Patent number: 7671998
    Abstract: A measuring method, comprising a step of drawing a line on a surface such as ground surface, a step of performing measurement along the line on a predetermined measurement range including the line, a step of acquiring an image of a range including the predetermined measurement range as an image data, a step of superimposing the image data on a measurement data, and a step of calculating a measurement data of the line from line position in the image data and from the measurement data near the line.
    Type: Grant
    Filed: April 1, 2005
    Date of Patent: March 2, 2010
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Fumio Ohtomo, Hitoshi Otani
  • Patent number: 7667827
    Abstract: A system and method for monitoring the vibrations of a machine that includes a reflective patch affixed to the machine and a vibration detection unit including an optics module. The optics module may be positioned remotely from the machine such that the optics module transmits an electromagnetic beam to the reflective patch and reflected from the reflective patch to the optics module. The optics module demodulates the electromagnetic beam to determine the vibration of the machine.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: February 23, 2010
    Assignee: General Electric Company
    Inventors: Matthew Allen Nelson, Naresh Sundaram Iyer, John Erik Hershey, Charles Erklin Seeley, Piero Patrone Bonissone, Kai Frank Goebel
  • Patent number: 7663740
    Abstract: The present invention provides an optical power measuring apparatus capable of monitoring the status, such as cleanness, of an optical fiber contact end face. The disclosed optical power measuring apparatus includes a microscope camera module, an illuminating module, an optical element, an optical power detection unit, a display unit and a central processing unit. The present invention may switch between optical fiber contact end status monitoring and optical power measurement. The apparatus can simplify the complicated steps for an optical fiber to insert to and pull from an optical microscope and then insert to an optical power meter. It can help a user to measure the correct optical power rapidly.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: February 16, 2010
    Assignee: Inventec Multimedia & Telecom Corporation
    Inventor: Tien-Hsiang Lu
  • Patent number: 7659973
    Abstract: An inspection system may be configured to inspect objects, such as semiconductor wafers, using narrow-pulse broadband illumination. The illumination may be obtained in some embodiments using a laser configured to emit light into a material having a spectral broadening effect. The inspection system can include various filters which may be selectively placed in the illumination and/or imaging path in order to tune the spectrum of light impinging on the wafer and the light that is detected. The filters may include selectable filters, fixed filters, and filters whose characteristics can be adjusted in-place. In some embodiments, filters may be used to match the illumination/detection spectra of different tools. Additionally, the broadband illumination may be tuned between inspections and/or during inspections for best results. The system may support Fourier filtering whereby light, related to repetitive features of the object and in one or more wavelength sub-bands of the illumination, may be filtered.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: February 9, 2010
    Assignee: Applied Materials Southeast Asia, Pte Ltd.
    Inventors: Dov Furman, Shai Silberstein
  • Patent number: 7652757
    Abstract: A method and apparatus for inspection of a security article (10) is provided in which a substantially collimated light beam (15) from a point light source (14) is directed onto a diffractive optical projection element (DOE) (11). The light beam is transformed by the DOE (11) into a patterned beam (17) which is reconstructed to form a projected image at a particular position in space remote from the surface of the security article 910). An optical detection device 916) is located at which the patterned beam (17) is reconstructed to detect the projected image. The inspection method and apparatus may be used in equipment for handling, sorting, counting or otherwise processing security articles, in particular security documents such as banknotes. The apparatus may include a processor for generating a signal when the absence or poor quality of a DOE is detected and which is used to isolate or mark the security article.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: January 26, 2010
    Assignee: Securency International Pty Ltd
    Inventors: Gary Fairless Power, Patrick Swift, James Hock Hai Chua, Anthony Nardella, Paul Henson
  • Patent number: 7646478
    Abstract: An apparatus for examining spectral characteristics of an object may include a chuck configured to support and releasably fix the object, wherein the chuck is larger than the object, a first light source assembly integral with the chuck and configured to illuminate a bottom surface of the object with light having a predetermined spectrum and intensity, and a transmission analysis unit for collecting and analyzing light transmitted through the object. The first light source assembly may include multiple and/or adjustable light sources. A second light source assembly may illuminate a top surface of the object, and a reflection analysis unit may collect resultant reflected light.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: January 12, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Koung-Su Shin, Dong-Su Ha, Chung-Sam Jun
  • Patent number: 7639372
    Abstract: A scanning system includes one or more stereo camera sets (10) for detecting qualitative and quantitative anomalies of an object (40). Each stereo camera set (10) includes two cameras (12, 14) and a projector (16). Each camera (12, 14) is calibrated to correct any distortion due to misalignment of the CCD matrix array (18) and deficiencies of the optical system. The projector (16) projects an absolute encoded pattern (32, 34, 36) onto the object (40) to be measured and is capable of varying the intensity of the emitted electromagnetic energy in the infrared, visible and ultraviolet spectrums. A plurality of camera sets (10) can be combined in a scanning system matrix (42, 44) capable of detecting anomalies of the object (40) in a three-dimensional room (26). The three-dimensional room (26) can be of any desirable size, depending on the number of stereo camera sets (10).
    Type: Grant
    Filed: March 8, 2004
    Date of Patent: December 29, 2009
    Inventors: Dieter Gerlach, Helmut Kellner
  • Patent number: 7639351
    Abstract: A fabrication cluster can be controlled using optical metrology. A fabrication process is performed on a wafer using a fabrication cluster. A photonic nanojet, an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere, is generated. An inspection area on the wafer is scanned with the photonic nanojet. A measurement is obtained of the retroreflected light from the dielectric microsphere as the photonic nanojet scans the inspection area. The existence of a structure in the inspection area is determined with the obtained measurement of the retroreflected light. One or more process parameters of the fabrication cluster is adjusted based on the determination of the existence of the structure in the inspection area.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: December 29, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Zhigang Chen, Hanyou Chu, Shifang Li, Manuel Madriaga
  • Patent number: 7633635
    Abstract: A method and system are provided for automatically identifying non-labeled, manufactured parts. The system includes an electronic storage device to store templates of a plurality of known good, manufactured parts. Each of the templates includes a part profile and a set of features. Each of the features includes a range of acceptable values. Each of the templates has a part identification code associated therewith. A first subsystem optically measures a profile and features of a part to be purchased. The system further includes a processor operable to compare the profile and the features of the part to be purchased with the profile and corresponding features of each of the stored templates to identify a template which most closely matches the profile and features of the part to be purchased and to generate and transmit an identification signal representing the part identification code for the part associated with the most closely matched template.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: December 15, 2009
    Assignee: GII Acquisitions, LLC
    Inventors: Gregory M. Nygaard, John V. McKowen
  • Patent number: 7630086
    Abstract: A method comprises generating a data set comprising first surface roughness data from a first orientation and second surface roughness data from a second orientation and determining a roughness bias parameter from the first surface roughness data and the second surface roughness data.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: December 8, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Dave S. Oak, Tri Do, Ronny Soetarman, Steven W. Meeks, Vamsi Velidandla
  • Patent number: 7626705
    Abstract: A chromatically dispersive lens configuration may be utilized in optical pens for chromatic range sensing. The lens configuration may include a negative power doublet lens and a positive power lens portion. The Abbe numbers of lenses included in the positive power lens portion may be between the Abbe numbers of the two portions of the doublet lens. The relationship between the Abbe numbers of the materials used in two portions of the doublet lens is generally opposite to their relationship as used in standard doublet lenses of similar geometry. The doublet lens may have a negative spherical aberration which effectively cancels a positive spherical aberration that arises in the positive lens portion. In one embodiment all of the lens elements in the lens configuration are spherical lenses. The lens configuration can be implemented with dimensions which fit a standard commercial optical pen, while providing improved range sensing performance.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: December 1, 2009
    Assignee: Mitutoyo Corporation
    Inventor: Eric Altendorf
  • Patent number: 7623252
    Abstract: A method of controlling dispensing of a liquid can include detecting a predetermined shape of a surface of a liquid in a container by reflecting optical radiation from the surface to control a volume of the liquid dispensed into the container. Related apparatus and computer program products are also disclosed.
    Type: Grant
    Filed: August 1, 2005
    Date of Patent: November 24, 2009
    Assignee: Cree, Inc.
    Inventors: Peter Andrews, Gerald H. Negley