Abstract: An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
Abstract: Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to "payback" the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography.A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics.An array of lenses can be fabricated with binary optical device and other techniques.
August 30, 1993
Date of Patent:
May 14, 1996
William B. Hugle, Rene Dandliker, Hans P. Herzig
Abstract: A rear screen television cabinet, comprising a cabinet having front portions including a top, two sides and a front face, viewing surface on the front face, a mirror system comprising a plurality of mirrors for reflecting and successively enlarging and reflecting an incident beam onto the rear screen and a rear assembly which substantially closes said cabinet and is foldable or collapsible to render said cabinet portable, is disclosed. The cabinet's mirror system receives and successively enlarges and reflect an incident beam from a projector, to project a large image onto the viewing surface.
Abstract: A projection exposure apparatus including a mask stage for supporting a mask, a wafer stage for supporting a wafer, and a projection optical system for projecting, on the wafer, an image of a circuit pattern of the mask, is disclosed. There are provided a surface position detecting system for detecting position of a surface of the wafer with respect to a direction of an optical axis of the projection optical system, an adjusting device for adjusting an interval between the wafer and the projection optical system, to position the wafer surface at a focus position of the projection optical system, and an outputting portion operable to direct a light beam to a reflection surface, provided at a predetermined site on the wafer stage, and to receive reflection light coming from the reflection surface through the projection optical system, the outputting portion producing a signal corresponding to a positional relationship between the reflection surface and the focus position of the projection optical system.
Abstract: Multidimensional lithographs which impart the illusions of depth and/or motion to a viewer are prepared by constructing and sequencing a plurality of electronic pages, preferably four or more; rasterizing, compressing and converting each page; interlacing the pages in a desired sequence; outputting the interlaced frames to an imaging device; and producing a lithographic separation from the imaging device. In the rasterization of each frame, nonbinary pixels are created that correspond to the resolution of the line count of the lenticular lens that will ultimately be applied to a print of the lithograph times the number of frames in the lithographic separation. The frames are compressed to an amount equal to the reciprocal of the number of frames from which the lithographic separation is prepared. In the converting step, the nonbinary pixels of the compressed frames are converted to individual color plates of binary pixels.
Abstract: Fine, sub-micron line features and patterns are created in a sensitized layer on a semiconductor wafer by a beam of low wavelength radiation, such as X-rays or Gamma-rays. A stream of such radiation is concentrated and collimated by a concentrator, the output of which is disposed in close proximity to the sensitized surface of the wafer. In this manner, the sensitized surface can be converted from one chemical state to another chemical state, essentially point-by-point. By moving one or the other of the beam or the wafer, line features can be converted in the sensitized surface. Typically, non-converted areas of the sensitized surface are removed, for further processing a layer underlying the sensitized surface.
April 30, 1993
Date of Patent:
January 16, 1996
LSI Logic Corporation
Michael D. Rostoker, Nicholas F. Pasch, Joe Zelayeta
Abstract: On the pupil plane of the projection optical system, a light shield member, having apertures separated from the optical axis, is provided. Light beams from the apertures illuminate a photomask from oblique directions, and are projected on a photosensitive substrate through a projection optical system. When the photomask bears a periodic pattern and a non-periodic pattern, the oblique illumination provides a larger depth of focus in the projected image of the periodic pattern than in the projected image of the non-periodic pattern. A partial area, in which the non-periodic pattern is projected, of the photosensitive substrate is matched with the best focal plane of the projection optical system, whereby satisfactory image transfer is realized over the entire area of the photomask.
Abstract: A projection screen comprises a horizontal refracting linear Fresnel lens sheet, a vertical refracting linear Fresnel lens sheet and a light diffusing lenticular lens sheet, which are arranged from the beam-projection side starting with the horizontal refracting linear Fresnel lens sheet followed by the vertical refracting linear Fresnel lens sheet and ending with the light diffusing lenticular lens sheet.
Abstract: A camera of the prewind or normal wind type that writes data on a roll of film to indicate where specific frames on the roll of film have been exposed and unexposed and detects the presence of that data on the film to determine where additional exposures may be made on the roll of film. The camera writes data on the magnetically sensitive layer of the roll of film in bursts, wherein each burst is separated from each other burst with nonwritten portions of film. BY using one pattern of data and spaces for the marking of exposed frames and another pattern for unexposed frames, prewind and normal wind cameras can interchange partially exposed rolls of film without explicitly decoding magnetic data.
Abstract: A vehicular exhaust system muffler including a mechanical lock joint for joining the end tubes to the flow tubes. One end of each end tube has an outer diameter selected such that the one end may be loosely, telescopically and overlappingly fitted within the adjacent end of the adjacent flow tube. The overlapped ends of the end tubes and the flow tubes are mechanically locked together by a circumferential skewed bead formed in the overlapped ends, where the plane of the skewed bead is at an angle less than ninety degrees with respect to the central longitudinal axis of the overlapped ends. This mechanical locking maintains the relative axial positions of the overlapped ends and resists relative movement between the overlapped ends and between the internal panels and the wrapper due to the application of torsional and axial forces that the tubes experience during the assembly of the muffler.
October 4, 1993
Date of Patent:
December 19, 1995
A. J. Preslicka, Robert J. Paterick, Paul Smeltzer
Abstract: Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.
Abstract: A method and a copying frame for copying of negative and positive original films, in combination with or without so called masking films, onto a material which is covered with a light sensitive layer, and having a frame rim of a non-transparent material and a glass plate inserted in a recess of said frame rim, and suction channels (9, 14, 17, 18) provided in said frame rim, and in which the copying frame, for making it possible to handle original films both of a "small" size format and of a "large" size format is formed with two sets of suction grooves, namely a) two cooperating, separate, parallel grooves (14) for suction connecting a "small" size original film (23), which grooves have a length matching the the width of said "small" size film format and are arranged along a part of the long sides of the frame rim, and b) two separate and cooperating, mainly C-shaped grooves (17) having the openings thereof facing each other and being arranged for suction connecting an original film of the "large" size film f
Abstract: A kaleidoscope housing is in the form of an irregular polyhedron having four of its sides providing irregular polygonal reflecting mirrors joined along respective edges of the polyhedron at specified dihedral angles and its remaining sides formed as triangular viewing windows. The windows produce three-dimensional geometric images in the interior space of the housing when viewed through any window, the images having triaxial symmetry and repeating to infinity.
Abstract: The average number N of coarse exposure pulses is obtained by dividing a proper exposure amount to a wafer by the average pulse energy. Under a condition that the average number N of coarse exposure pulses is equal to or more than the minimum number of pulses N.sub.min, the achievement accuracy R is calculated by dividing the actual accumulated exposure amount to the wafer by the proper exposure amount and the coarse exposure is performed until the achievement accuracy R reaches the coarse exposure finish judgment level Rc. Thereafter, the attenuating rate for pulse lights is set to be a predetermined value and the correcting exposure is performed by the cutoff control method until the achievement accuracy R reaches the correction exposure finish judgment level Rcc.
Abstract: An exposure device in which a reticle having a circuit pattern of a semiconductor device formed on it is irradiated with light beam emanated from a light source, such as a laser light source, for exposing the circuit pattern formed on the reticle on a semiconductor wafer. The exposure device includes a light beam generator for illuminating the reticle having a semiconductor circuit pattern formed on it, an image-forming optical system for forming an image on a wafer of a light image produced on radiating a light beam on the reticle from the light beam generator. The exposure device also includes a movement unit for moving the wafer relative to the image-forming optical system, and an alignment unit for detecting the position on the wafer of the image formed on the wafer by the image-forming optical system for position matching the image by the image-forming optical system relative to the wafer. The light beam generator includes a light source for excitation, a first resonator and a second resonator.
Abstract: An original or a photosensitive film is held by a sheet holder and the sheet holder is fixed to the drum of an image reading scanner or an image recording scanner by a row of hooks planted on the drum. A row of holes corresponding to the row of hooks are formed at each of the opposing ends of the sheet holder. A hook is composed of: a stem, a lever rotatably attached with a pin to the stem, and a plate urged upward by a spring against the bottom of the lever. A plane is formed at a side of the bottom of the lever. First the levers of the hooks are raised upright and the holes of an end of the sheet holder are engaged with the hooks. After surrounding the drum with the sheet holder, the holes at the other end of the sheet holder are engaged with the hooks and the levers are turned to a lying position, where the levers are stable because the plate is urged upward against the side plane of the lever.
Abstract: A front projection screen is made up of a front portion and a rear portion, the front portion having a front surface lenticular lens array and light scattering particles forming a diffusion region between the front and rear surfaces, and the rear portion having a reflective surface spaced apart from the diffusion region. In use, an incoming ray of projected light traverses the diffusion region and the space between the diffusion region and the reflective surface, before being reflected back through these regions again. Thus, the ray traverses different portions of the diffusion region in different directions, increasing the likelihood that the ray will encounter at least one scattering particle, thus reducing the incidence of speckle.
September 21, 1994
Date of Patent:
December 5, 1995
Philips Electronics North America Corporation
Abstract: The lens moving mechanism of a printing/developing apparatus has a pulse motor for moving the holding member of the exchangeable lens in the directions X and Y to finely adjust the position of the lens. The lens moving mechanism is controlled by a computer. The movement and position of the lens are specified by inputting numeric values, thus adjusting the position freely. The specified position of the lens is stored as channel data corresponding to each print channel.
Abstract: In order to effect projection exposure at a great depth of focus without spoiling transfer fidelity even for a plurality of isolated patterns relatively close to one another, provision is made of a coherence reducing member CCM for reducing the coherency between imaging light in a central circular transmitting portion FA on or near the pupil plane (Fourier transform plane) of a projection optical system and imaging light in a marginal zonal transmitting portion FB, and a double focalizing member DFM for making the in-focus position of light passing through the circular transmitting portion FA and the in-focus position of light passing through the zonal transmitting portion FB differ in the direction of the optical axis of the projection optical system.
Abstract: A multi-screen projector having unit module projectors stacked at two higher and lower stages, each unit module projector having a screen with a Fresnel sheet unit, a prism sheet unit, and a lenticular sheet unit. By the functions of the Fresnel sheet unit and the prism sheet unit, main output light from higher and lower screens is converged to substantially the same target point. Only one type of metal molds is required for the Fresnel sheet unit as well as the prism sheet unit, thereby reducing the manufacturing cost of the multi-screen projector.