Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device is disposed between the radiation-sensitive material and the at least one radiation source. The smart glass device includes at least one switchable layer selectively operable from an active state to an inactive state. The smart glass device is configured to expose the radiation-sensitive material to a desired exposure pattern when in one of the active state and the inactive state. A method for fabricating the radiation-cured structure is also provided.

Abstract: A method of obtaining an elemental concentration profile of a sample using x-ray photon spectroscopy measurements is described. Each measurement relates to a different depth in the sample. The sample is shaped to provide access to different depths thereof. Measurements are obtained at respective positions on a bevelled surface exposing material at each of the depths. The method involves fitting the measurements to a mathematical function, dividing the function into a plurality of equal depth wise slices, determining the elemental concentration for the slice corresponding to the thinnest part of the bevel, and then iteratively determining the contribution of each successive slice to the intensity value as being the intensity value measured for that slice minus the intensity value determined to have been contributed by each preceding slice. According to preferred embodiments, a surface correction factor compensating surface effect phenomena is applied to the concentration value calculated for each slice.

Abstract: A crystal material lattice strain evaluation method includes illuminating a sample having a crystal structure with an electron beam in a zone axis direction, and selectively detecting a certain diffracted wave diffracted in a certain direction among a plurality of diffracted waves diffracted by the sample. The method further includes repeating the illuminating step and the selectively detecting step while scanning the sample, and obtaining a strain distribution image in a direction corresponding to the certain diffracted wave from diffraction intensity at each point of the sample.

Abstract: An apparatus and method for using high beam currents in FIB circuit edit operations, without the generation of electrostatic discharge events. An internal partial chamber is disposed over the circuit to be worked on by the FIB. The partial chamber has top and bottom apertures for allowing the ion beam to pass through, and receives a gas through a gas delivery nozzle. A non-reactive gas, or a combination of a non-reactive gas and a reactive gas, is added to the FIB chamber via the partial chamber, until the chamber reaches a predetermined pressure. At the predetermined pressure, the gas pressure in the partial chamber will be much greater than that of the chamber, and will be sufficiently high such that the gas molecules will neutralize charging induced by the beam passing through the partial chamber.

Abstract: Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.

Abstract: A micro-reflectron for a time-of-flight mass spectrometer including a substrate and integrated with the volume of the substrate, means for application of a potential gradient in a volume suitable for constituting a flight zone of the ions. The means of application includes at least two polarization electrodes and a wall of at least one resistive material that can be polarized between these electrodes so as to generate a continuous potential gradient, itself providing the function of reflectron, this flight zone, these electrodes and this wall being obtained by the technology of microelectromechanical systems (MEMS) and this micro-reflectron having a thickness of less than 5 millimeters while its other dimensions are less than 10 times this thickness.

Abstract: A method for correcting Positron Emission Tomography (PET) data includes adjusting a tube current generated by the CT imaging system to a second tube current value that is less than a first tube current value used to generate diagnostic quality CT images, and imaging the patient with the CT imaging system set at the second tube current value. The method also includes generating a plurality of computed tomography (CT) projection data from the CT imaging system and preprocessing the CT projection data to generate preprocessed CT projection data. The method further includes filtering the preprocessed CT projection data to reduce electronic noise to generate filtered CT projection data, and performing a minus logarithmic operation on the filtered CT projection data to generate the corrected PET data.

Abstract: Methods for proteomic analysis are provided. For example, in one aspect a method for identifying and sequencing a peptide may include fractionating a biological sample containing a peptide of interest to at least partially isolate the peptide, obtaining mass spectra of the peptide, and accelerating the peptide into a collision chamber at a plurality of discrete collision energies for a discrete period of time to form a plurality of peptide fragments for each of the plurality of discrete collision energies.

Abstract: The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit (7), a second beam aligning unit (4), and a beam focusing unit (5) are arranged in the vaporization beam (3) and are connected to first to third measuring devices (8, 9, 10) and can be adjusted in order to acquire and compensate for direction deviations and divergence deviations of the vaporization beam (3) with respect to reference values.

Abstract: An electron microscope is offered which can correct chromatic and spherical aberrations without producing residual aberrations. In this microscope, a chromatic aberration-correcting optical system and a spherical aberration-correcting optical system are connected in series (in tandem) via a connection system. That is, the chromatic aberration-correcting optical system and the spherical aberration-correcting optical system are configured independently. Chromatic and spherical aberrations are corrected separately.

Abstract: A device for disinfecting publicly-used equipment includes a plurality of reflective units disposed along the interior of each wall of the device. Each of the reflective units can include a reflective back section and at least three reflective sections disposed about the reflective back section. UV lamps can be disposed to extend along the walls, and at partially disposed adjacent to a one or more reflective back sections of the reflective units. The UV lamps together with the reflective units collectively direct sufficient UV light on the equipment such that the equipment can be disinfected. The walls and ceiling of the device define a tunnel into which the equipment to be disinfected is inserted. Optionally, the device can include a door to prevent children and others from entering the tunnel while the UV lamps are illuminated.

Abstract: Systems, methods, and related computer program products for image-guided radiation treatment (IGRT) are described. For one preferred embodiment, an IGRT apparatus is provided comprising a ring gantry having a central opening sufficiently large to accommodate a body of a patient positioned along a longitudinal axis and extending therethrough, and a gantry tilting mechanism configured to tilt the ring gantry to a plurality of different tilt angles relative to the longitudinal axis. A radiation treatment head is coupled to the ring gantry and is rotatable around said central opening in at least a 180 degree arc. The radiation treatment head is mechanically coupled to the ring gantry such that a distance by which the radiation treatment head extends inwardly toward the central opening relative to the ring gantry is dynamically controllable.

Abstract: Techniques, apparatus and systems for obtaining tomographic images of a volume of interest by using charged particle tomography detection systems.

Abstract: One embodiment relates to a focused electron beam imaging apparatus. The apparatus includes an electron beam column, an electron source, a gun lens, a pre-scanning deflector, a main scanning deflector, an objective lens, and a detector. The pre-scanning deflector comprises a 12-pole electrostatic deflector which is configured to controllably deflect the electron beam away from the optical axis of the electron beam column. Another embodiment relates to a method of scanning an electron beam over a target substrate in a focused electron beam imaging instrument. The electron beam is controllably deflected, without third-order deflection aberrations, away from an optical axis of an electron beam column using a pre-scanning deflector. The electron beam is then controllably deflected back towards the optical axis using a main scanning deflector so that the electron beam passes through a center of an objective electron lens. Other embodiments, aspects and features are also disclosed.

Abstract: Methods and systems for sterilization of objects by gas-cluster ion-beam (GCIB) irradiation are disclosed. The sterilization may be in conjunction with other beneficial GCIB surface processing of the objects. The objects may be medical devices or surgically implantable medical prostheses.

Abstract: The pattern observation method for observing a pattern which is formed on an insulating film, includes: irradiating an entirety of the pattern with a charged particle beam, to obtain a temporary image of the pattern which has region information of a convex pattern and a concave pattern; irradiating the convex and concave patterns with the charged particle beam having a first and second voltages based on the region information, to thereby form an electric field between a top surface of the convex pattern and a bottom surface of the concave pattern so that charged particles emitted from the bottom surface of the concave pattern may be drawn out to an outside of the pattern; and irradiating the entirety of the pattern with the charged particle beam to obtain an image of the pattern having the information of the bottom surface of the concave pattern.

Abstract: An electron-beam dimension measuring apparatus includes: electron-beam irradiating means for irradiating a surface of a sample with an electron beam; a stage on which the sample is placed; a photoelectron generating electrode disposed so as to face the sample; ultraviolet light irradiating means for emitting ultraviolet light; and control means for causing the ultraviolet light irradiating means to irradiate the sample and the photoelectron generating electrode with the ultraviolet light for a predetermined length of time, to cause the sample and the photoelectron generating electrode to emit photoelectrons, for applying a voltage to the photoelectron generating electrode, the voltage applied to supply energy corresponding to a difference between energy of photoelectrons emitted by the sample and energy of photoelectrons emitted by the photoelectron generating electrode, and thereby for controlling an electric potential of the surface of the sample to set the electric potential at 0 V.

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.

Abstract: A particle beam irradiation system comprising a first deflector having the maximum deflection amount which enables to move a particle beam in one direction to the maximum width of a target and a second deflector having the maximum deflection amount is less than the maximum deflection amount of the first deflector performs a control in which the particle beam is moved by increasing at least a deflection amount of the second deflector when the particle beam is moved, and performs a deflection substitution control in which a deflection of the second deflector is substituted to a deflection of the first deflector by decreasing the deflection amount of the second deflector and changing a deflection amount of the first deflector so as to make a position of the particle beam in the target dwell when the particle beam dwells.

Abstract: A method and apparatus for transmitting ions in a mass spectrometer from an ion source to a mass analyzer extracts analyte ions from the ion source in such a manner that the number of extracted analyte ions is maximized. The ions are then transmitted through an ion guide to the mass analyzer. The ion guide is filled with an interaction gas and its operating parameters are adjusted so that, as the ions pass through the ion guide, the analyte ion energy distribution width is narrowed and the analyte ions are collimated within the ion guide to improve the resolution and sensitivity of the mass analyzer.