Abstract: Disclosed is a quadrupole mass spectrometer, which is capable of, during an SIM measurement, maximally reducing a settling time-period necessary for an operation of changing an input voltage to a quadrupole mass filter in a staircase pattern, and preventing unwanted ions from excessively entering a detector during a course of changing between a plurality of mass values. Under a condition that a response speed of a DC voltage U to be applied to quadrupole electrodes is less than that of an amplitude of a high-frequency voltage V, a control section 10 is operable to rearrange the mass values in descending order of mass value, and an optimal settling-time calculation sub-section 101 is operable to determine a settling time-period for each of the mass values, based on a mass-value difference and a post-change mass value.

Abstract: A charged particle beam apparatus which is able to adjust charged particle optics easily in a short time with a high degree of accuracy and a method of adjusting charged particle optics are provided.

Abstract: A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

Abstract: An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.

Abstract: A workpiece scanning system is provided having a scan arm that rotates about a first axis and a chilled end effector rotatably coupled to the scan arm about a second axis for selectively securing a workpiece. The chilled end effector has a clamping plate and one or more cooling mechanisms for cooling the clamping plate. A bearing is positioned along the second axis and rotatably couples the end effector to the scan arm, and a seal is positioned along the second axis to provide a pressure barrier between an external environment and an internal environment. One or more of the bearing and seal can have a ferrofluid associated therewith. A heater assembly is positioned proximate to the bearing and seal, wherein the heater assembly selectively provides a predetermined amount of heat to the bearing and seal, therein increasing a propensity of the end effector to rotate about the second axis.

Abstract: Closed containers which are filled with a consumer product are tested on leakiness by means of mass spectrometry (10) in that an impact (AN(P)) by the consumer product (P) upon the surrounding atmosphere (A(P)) of the container to be leak tested is monitored by the mass spectrometry (10).

Abstract: An imaging method and apparatus for forming images of substantially the same area on a sample for defect inspection within the area are disclosed. The disclosed method includes line-scanning the charged particle beam over the area to form a plurality of n*Y scan lines by repeatedly forming a group of n scan lines for Y times. During the formation of each group of n scan lines, an optical beam is, from one line scan to another, selectively illuminated on the area prior to or simultaneously with scanning of the charged particle beam. In addition, during the formation of each group of n scan lines, a condition of illumination of the optical beam selectively changes from one line scan to another. The conditions at which individual n scan lines are formed are repeated for the formation of all Y groups of scan lines.

Abstract: Method for producing a probe for atomic force microscopy with a silicon nitride cantilever and an integrated single crystal silicon tetrahedral tip with high resonant frequencies and low spring constants intended for high speed AFM imaging.

Abstract: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10?8 to 10?9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system.

Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.

Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.

Abstract: An ion entrance opening (15) for introducing ions into an orbit (C) along a sector-shaped electric field entrance optical axis (A) from outside is provided in an outer electrode (11a) of a main electrode (11) for producing a sector-shaped electric field for forming the orbit (C). In order to correct the disturbance in the sector-shaped electric field due to the provision the ion entrance opening (15), three electrode correction electrodes (20) are aligned in the direction of the sector-shaped electric field entrance optical axis (A). By appropriately adjusting each of the direct-current voltages applied to the electrode correction electrodes (20), the equipotential lines in the sector-shaped electric field can be substantially the same as in the case where the ion entrance opening (15) is not provided. This configuration can alleviate the shift of the orbit of ions flying along the orbit (C).

Abstract: A patient platform for making the position and posture of a diseased site coincide with those established by a treatment plan. Translation units translate a top board in the X, Y and Z directions respectively, in a fixed coordinate system. Rotation units rotate the top board in the ?, ?, and ? directions respectively. A controller controls the translation units and rotation units, based on desired rotation center point and desired rotation angle. The controller has a rotation drive signal generation unit that generates a signal for moving the top board in a rotating manner from the reference state “a” of the translation units and the rotation units to a desired rotation angle; and a translation drive signal generation unit that generates a signal for translating the translation units so the amount of translation movement, of the desired rotation center point, caused by the rotation movement is a predetermined value.

Abstract: A method and system for detecting ratios and amounts of isotopes of noble gases. The method and system is constructed to be able to measure noble gas isotopes in water and ice, which helps reveal the geological age of the samples and understand their movements. The method and system uses a combination of a cooled discharge source, a beam collimator, a beam slower and magneto-optic trap with a laser to apply resonance frequency energy to the noble gas to be quenched and detected.

Abstract: A quadrupole mass spectrometer for use in analyzing gas components in a test piece is made in a constitution in which resistance heating of a grid is materialized, and in which a high-accuracy analysis of the gas components is possible at a low cost while preventing the sensitivity from lowering. A quadrupole mass spectrometer is provided with a sensor section which can be detachably fitted to the test piece.

Abstract: A method and apparatus is provided for reducing unwanted isotopes of an ion implantation species from an ion beamline. The apparatus herein disclosed is a mass analysis variable exit aperture that selectively reduces the size of an exit aperture as seen by an ion beam. In one embodiment, the variable mass analysis exit aperture is located within a mass analyzer at a position upstream of a resolving aperture and effectively limits the size of an exit aperture so as to allow passage of desired implantation isotope(s) while blocking the passage of unwanted implantation isotopes. In one particular embodiment, the mass analysis variable exit aperture has a mechanical drive mechanism that enables a blocking structure to be moved into the path of an ion beam in a graduated fashion as guided by a control unit that operates based upon one or more characteristics of the ion beam.

Abstract: An ion trap comprises a ring electrode and opposite first and second endcap electrodes situated at opposite ends of the ring electrode. A waveform generator is configured to vary both frequency and amplitude of an AC waveform applied across the first and second endcap electrodes as a function of time, thereby exciting ions with a band of resonant secular frequencies substantially without exciting ions with adjacent secular frequencies.

Abstract: An electron microscope is offered which facilitates aberration correction even during high-magnification imaging. The microscope has a spherical aberration corrector, a transfer lens system mounted between the corrector and an objective lens, an aperture stop mounted in a stage preceding the corrector so as to be movable relative to the optical axis, and an angular aperture stop mounted at or near the principal plane of the transfer lens system movably relative to the optical axis to adjust the angular aperture of the electron beam.

Abstract: There are provided with a respiration induction apparatus that induces respiration, based on a desired respiration waveform; a switching device that switches the orbit of a particle beam; and an irradiation apparatus that controls irradiation, in synchronization with the desired respiration waveform. A controller, which performs synchronization control of the switching device and the respiration induction apparatuses in a plurality of treatment rooms, adjusts the periods and the phases of the desired respiration waveforms of the respiration induction apparatuses in the treatment rooms so that the irradiation times synchronized with the desired respiration waveforms in the treatment rooms do not overlap with one another, and controls the switching device so as to switch the orbits of the particle beam, in accordance with the respective irradiation times of the treatment rooms.

Abstract: A microwave probe having a metal tip on the free end of a microcantilever. In one embodiment, a pyramidal pit is isotropically etched in a device wafer of monocrystalline silicon. Oxidation may sharpen the pit. Deposited metal forms the metal tip in the pit and a bottom shield. Other metal sandwiched between equally thick dielectric layers contact the tip and form a conduction path along the cantilever for the probe and detected signals. Further metal forms a top shield overlying the conduction path and the dielectrically isolated tip and having equal thickness to the bottom shield, thus producing together with the symmetric dielectric layers a balanced structure with reduced thermal bending. The device wafer is bonded to a handle wafer. The handle is formed and remaining silicon of the device wafer is removed to release the cantilever.