Patents Examined by Rosemary E. Ashton
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Patent number: 6280911Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of non-ionic and ionic PAGS. Preferred resists of the invention preferably are imaged with 248 nm and/or 193 nm exposure wavelengths to provide highly resolved small dimension features.Type: GrantFiled: September 10, 1998Date of Patent: August 28, 2001Assignee: Shipley Company, L.L.C.Inventor: Peter Trefonas, III
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Patent number: 6277538Abstract: A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,000 and represented by the following formula: wherein R1 is tert-butyl, tetrahydropyranyl, 1-alkoxyethyl or 1-alkoxymethyl, R2 is hydrogen, cyano, hydroxy, hydroxymethyl, carboxylic acid, 2-hydroxyethyloxycarbonyl or tert-butoxycarbonyl, or alicyclic compound, R3 is hydrogen or methyl, R4 is hydrogen, 2-hydroxyethyl, isobornyl, tert-butyl, adamantyl, norbornyl or menthyl, 1/(l+m+n+p) is between about 0.1-0.5, m/(l+m+n+p) is between about 0.3-0.5, n/(l+m+n+p) is between about 0.0-0.3, and p/(l+m+n+p) is between about 0.0-0.3.Type: GrantFiled: March 30, 2000Date of Patent: August 21, 2001Assignee: Samsung Electronics Co., LTDInventors: Sang-jun Choi, Dong-won Jung
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Patent number: 6274289Abstract: In one embodiment, the present invention relates to a method of treating a resist layer involving the steps of providing the resist layer having a first thickness, the resist layer comprising a polymer having a labile group; contacting a coating containing at least one cleaving compound with the resist layer to form a deprotected resist layer at an interface between the resist layer and the coating; and removing the coating and the deprotected resist layer leaving a resist having a second thickness, wherein the second thickness is smaller than the first thickness.Type: GrantFiled: November 6, 2000Date of Patent: August 14, 2001Assignee: Advanced Micro Devices, Inc.Inventors: Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan, Ursula Q. Quinto
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Patent number: 6270942Abstract: A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,000 and represented by the following formula: wherein R1, R2 and R5 are independently hydrogen or methyl, R3 is methyl, ethyl, C3 to C20 aliphatic hydrocarbon or alicyclic compound, R4 is hydrogen, hydroxy, hydroxymethyl, carboxylic acid, 2-hydroxyethyloxycarbonyl, tert-butoxycarbonyl or alicyclic compound, R6 is hydrogen atom, 2-hydroxyethyl, tert-butyl, isobornyl, adamantyl, norbornyl or menthyl, l/(l+m+n+p) is between about 0.1-0.5, m/(l+m+n+p) is between about 0.3-0.5, n/(l+m+n+p) is between about 0.0-0.3, and p/(l+m+n+p) is between about 0.0-0.3.Type: GrantFiled: March 30, 2000Date of Patent: August 7, 2001Assignee: Samsung Electronics Co., LTDInventor: Sang-jun Choi
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Patent number: 6270941Abstract: Disclosed is a positive silicone-containing photosensitive composition comprising a water-insoluble and alkali-soluble silicon-containing polymer having a specific siloxane structure, a compound which generates an acid upon irradiation with actinic rays or radiation, and a polymer having a repeating unit of a specific structure and showing the enhanced solubility in an alkaline developing solution by the action of an acid.Type: GrantFiled: January 28, 2000Date of Patent: August 7, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Shoichiro Yasunami
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Composition for forming antireflective coating film and method for forming resist pattern using same
Patent number: 6268108Abstract: The present invention provides a composition for forming an antireflective coating film which is not liable to intermixing between the resist composition layer and the antireflective coating layer and a method for forming a resist pattern having an excellent dimensional accuracy and section shape. The composition consists of (A) a compound which produces an acid upon irradiation with actinic rays, (B) a compound which undergoes crosslinking reaction in the presence of an acid, (C) a dye and (D) an organic solvent.Type: GrantFiled: July 16, 1998Date of Patent: July 31, 2001Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Etsuko Iguchi, Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama -
Patent number: 6265131Abstract: A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): wherein R1 and R2 each independently is a hydroxyl group, a C1-8 hydroxyalkyl group, or a C3-8 hydroxycycloalkyl group; R3, R4 and R5 each independently is a hydrogen, a C1-8 hydroxyalkyl group, a C1-6 carboxylic acid or a C3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The photoresist composition has high transparency to deep UV light and is capable of forming good fine patterns, roughness and high sensitivity, thus being useful as a chemically amplified type resist when exposed to deep UV light from an KrF and ArF excimer laser.Type: GrantFiled: April 3, 2000Date of Patent: July 24, 2001Assignee: Everlight USA. Inc.Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang
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Patent number: 6261738Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.Type: GrantFiled: March 23, 2000Date of Patent: July 17, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
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Patent number: 6258508Abstract: The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer.Type: GrantFiled: February 25, 2000Date of Patent: July 10, 2001Assignee: Korea Advanced Institute of Science and TechnologyInventors: Jin Baek Kim, Bum Wook Lee
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Patent number: 6255032Abstract: An active matrix liquid crystal display (AMLCD) with improved pixel aperture and long term stability. It contains: (a) a substantially transparent substrate; (b) an array of thin film transistors (TFT) on the substrate; (c) a photo imageable color filter formed on the each of the TFTs. The photo imageable color filter contains: (i) a substantially transparent acrylic copolymer containing 1-15 mol % of carboxyl groups, 1-15 mol % of hydroxyl groups, 30-50 mol % tertiary butyl ester groups, and 5-20 mol % phenyl groups; (ii) an organic pigment; and (iii) a photo acid generator and a photo sensitizer. The acrylic copolymer allows the polymer molecules to fully extend and provides improved affinity with the color pigments, so as to allow improved long term stability of the color filters to be obtained by preventing the coagulation and/or precipitation of the pigment particles, which will cause the properties of the color filter, such as light transmissibility, color saturation, and color hue, to degrade.Type: GrantFiled: November 22, 1999Date of Patent: July 3, 2001Assignee: Industrial Technology Research InstituteInventors: Wu Jung Lung, Chien Shien Wen, Fan Jr Cheng, Lee Rong Jer
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Patent number: 6251560Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.Type: GrantFiled: May 5, 2000Date of Patent: June 26, 2001Assignee: International Business Machines CorporationInventors: Thomas I. Wallow, Robert D. Allen, Phillip Joe Brock, Richard Anthony DiPietro, Hiroshi Ito, Hoa Dao Truong, Pushkara Rao Varanasi
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Patent number: 6225020Abstract: The present invention relates to a polymer represented by following Formula 1 and a method of forming a micro pattern using the same: wherein R1 is a C1-C10 straight- or branched-chain substituted alkyl group, or a benzyl group; R2 is C1-C10 primary, secondary or tertiary alcohol group; m and n independently represent a number from 1 to 3; and X, Y and Z are the respective polymerization ratios of the co-monomers. The photoresist polymer according to the present invention is suitable for forming an ultra-micro pattern such as used in 4 G or 16 G DRAM semiconductor devices using a light source such as ArF, an e-beam, EUV, or an ion-beam.Type: GrantFiled: April 29, 1999Date of Patent: May 1, 2001Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik