Abstract: A high pressure gas cleaning purge cleans silicon oxide dust deposits from inside a dry vacuum pump while installed on a crystal grower. The high pressure gas cleaning purge is performed before or after each crystal is grown. The high pressure gas flow is injected into the inlet of the dry vacuum pump and repeatedly turned on and off to create differing turbulent flow patterns within the pump. The differing turbulent flow patterns effectively remove substantial quantities of the silicon oxide dust deposited in the pump during crystal growing.

Abstract: A process for the removal of poly(arylene sulfide) based deposits from an article by contacting said poly(arylene sulfide) based deposits with a polar aprotic compound, a base, an organosulfur compound having the formula:R.sub.1 --S--S--R.sub.2,wherein R.sub.1 and R.sub.2 are hydrocarbon radicals having from 1 to 50 carbon atoms per radical, and optionally, a halogenated aromatic compound.

Abstract: A method for operating an upright wet extractor having a base and a handle. The base includes a floor cleaning tool and has a hand held cleaning tool permanently attached thereto. A motor fan unit is operated to generate a suction force and this suction force is selectively communicated to a suction inlet of one of the hand held cleaning tool and the floor cleaning tool. When the suction force is communicated to the hand held cleaning tool suction inlet, pressurized cleaning fluid is also supplied to that tool, and when the suction force is supplied to the suction inlet of the floor cleaning tool, a brush unit is rotated in the floor cleaning tool.

Abstract: In order to determine a concentration of a gas mixture, especially a hydrogen concentration of a containment atmosphere of a nuclear power station, a temperature change resulting from a catalytic reaction is measured. The gas mixture is diluted with a motive gas of known composition. The dilution is carried out by a jet pump.

Abstract: A polymeric sensing membrane having a Stern-Volmer constant within a pre-determined range of Stern-Volmer constants. The membrane includes a polymeric material having a fluorescent dye molecule dispersed therein. The dye molecule is capable of having its fluorescence collisionally quenched by a gas to be detected by the membrane. In one embodiment, the membrane includes a fluorescent dye molecule which has a relaxation time and a polymeric material having a permeability within a range of permeabilities defined by a mathematical function of the pre-determined range of Stern-Volmer constants. In another embodiment, the membrane includes a polymeric having a permeability and a fluorescent dye molecule having a relaxation time within a range of relaxation times defined by a mathematical function of the pre-determined range of Stern-Volmer constants.

Abstract: An elongated fluid applicator is used to manually apply a fluid such as a lubricant or a cleaning fluid to the belt and/or belt supporting surface of an exercise treadmill. The applicator is optionally included in a kit containing one or more desired fluids, and at least one treadmill belt tension adjusting device.

Abstract: A method for producing sliders without alumina overcoat protrusion on the air bearing surface. The method involves removing the alumina protrusion on the air bearing surface of a slider by contacting the air bearing surface of the slider with an aqueous ozone bases solution having a pH of about 9 to about 11.

Abstract: A method of cleaning a deposition tool to control and minimize emission of environmentally deleterious materials includes the steps of: a) establishing a predetermined temperature in a processing chamber; b) providing a mixture of between 15 and 25 percent nitrogen trifluoride in helium at a mixture flow rate of more than 550 standard cubic centimeters per minute (sccm); c) establishing a high pressure of 1.5 to 9.5 torr in the processing chamber; d) establishing a plasma in the processing chamber, e) establishing a low pressure in the processing chamber of 2 torr or less; and f) establishing a plasma in the processing chamber. Instead of a two-step cleaning method, the method may alternatively be executed as a one-step cleaning method. Either method may be optimized by, among other things, providing 19% nitrogen trifluoride. The two-step method may also be optimized by providing a high pressure of about 7 to 9.5 torr and a low pressure of about 1.5 torr.

Abstract: Compositions and methods are provided for cleaning and de-oiling metal parts and then degrading the removed oils or other organic compounds in an environmentally-friendly manner. The compositions generally contain surfactants to remove the oils and enzymes to degrade the oils. Generally, both aliphatic and aromatic compounds normally present in standard oils, lubricants, cutting oils, and greases are removed from the metal parts (i.e., "solubilized") by surfactants (although the enzymes may also assist in this process) and then ultimately broken down into relatively short-chain fatty acids by enzymes, both processes being carried out in an aqueous medium. The surfactants include (a) one or more alkylphenol ethoxylates; (b) one or more alkaline metal salts of an alkane sulfonic acid; and (c) one or more alkanolamines in aqueous solution. Suitable enzymes include monomethanoxigenase, alcoholdehydrogenase, and aldehydehydrogenase.

Abstract: A method for cleaning an object. The method (400) includes immersing (420) an object in a liquid comprising water, which can be ultra-clean. The object has a front face, a back face, and an edge. The method includes providing (450) a cleaning enhancement substance (e.g., trace amount of polar organic compound, surfactant, ammonia bearing compound) into the liquid. In one embodiment, the cleaning enhancement substance can form a liquid film, such as a monolayer overlying an upper surface or level of the liquid. The method also includes providing a substantially particle free environment (e.g., ultra-clean gas, ultra-clean non-reactive gas) adjacent to the front face and the back face of the object as the liquid including the cleaning enhancement substance is being removed.

Abstract: A method of evaluating a separation and exhalation performance of volatile matters present in a wort boiling apparatus used in the production of beer or malt liquors. The evaluation is conducted using a volatilization rate coefficient of dimethyl sulfide converted into a gaseous phase in boiling a wort in the boiling apparatus.

Abstract: A sensor housing (10) for directing the flow of a gas over two sensitive regions (53, 54) of sensing device (52) includes an inner shroud (12) surrounding the sensing device (52). The inner shroud (12) is inserted into an outer shroud (14), such that a plurality of gas channels (44) are formed between the inner shroud (12) and the outer shroud (14). In operation, a gas enters through inlet orifices (28) in the outer shroud (14) and travels through the gas channels (44) to the proximal end (26) of the inner shroud (12). The flow direction of the gas is then reversed and the gas passes through an inner chamber (50) and over sensitive regions (53), (54) located on the surface of the sensing device (52). Vacuum pressure created at an outlet hole (46) located at a distal end (35) of the outer shroud (14) draws the gas out of the inner chamber (50) and return the gas to the exterior of the sensor housing (10).

Abstract: An apparatus and method for performing activated clotting time tests, including their use for evaluating platelet functionality of a blood sample. The apparatus includes a plurality of test cells. Each of the cells comprises a heparin-inactivating agent, an anticoagulant agent, and a clotting reagent. At least one of the test cells further comprises a platelet activating agent. The clotting time is determined for each of the aliquot portions, and the relative clotting times of the aliquot portions in the cells are determinative of the platelet functionality of the sample. The method comprises the steps of combining a heparin-inactivating agent, an anticoagulant agent, a clotting reagent, a platelet activating agent, and the sample of blood to be tested to form a test mixture. The platelets of the sample are activated by agitating the test mixture, and the activated clotting time test is terminated upon detecting a predetermined change in a property of the test mixture.

Abstract: Cleaning of a textile machine or part of such a machine is effected by directing a laser beam at the part to be cleaned for an appropriate length of time. This may be done with the part in situ in its normal operating position in the machine, and the machine may be run in its normal operating condition, possibly with the yarn running to avoid machine down time. Alternatively, the operation may include moving the yarn to a substitute part whilst the original part is cleaned, or moving a substitute part into the normal operating position whilst the part to be cleaned is moved to a cleaning position. A lens system may direct a parallel beam to the part to be cleaned from a remote location, or a fiber optic cable may extend near to that part to guide the laser beam to it.

Abstract: A method for cleaning a plasma etch chamber is described which can be carried out by first terminating an etch process by stopping a process gas flow into the chamber, then maintaining a RF power in the etch chamber, and flowing a cleaning gas consists of at least one inert gas and oxygen through the chamber at a flow rate higher than the flow rate for the process gas for a length of time sufficient to evacuate substantially all the contaminating byproducts formed by the process gas. A suitable cleaning gas contains at least one inert gas of Ar, He, or N.sub.2 mixed with O.sub.2. A sufficient length of time for the cleaning process is at least 5 seconds, and preferably at least 10 seconds.

Abstract: A method of cleaning a silicon material using a polyvinyl acetal sponge material. The sponge material is purified by an extracting process which includes alternating exposure of the sponge material to acid and oxidizing solutions. The extracting process permits residual amounts of calcium, zinc, sulfate, arsenic, barium, cadmium, chloride, chromium, copper, iron, lead, manganese, magnesium, mercury, nitrate, potassium, selenium, silica, silver and sodium to be 2 ppm or less. Following the extracting process, the silicon material is contacted with the sponge material to thereby clean the silicon material.

Abstract: A method for washing and drying a substrate includes the steps of (a) disposing a substrate on a spin chuck such that a surface to be treated faces upward, (b) applying a washing solution from a first nozzle to the surface of the substrate while rotating the substrate disposed on the spin chuck so as to cleanse the surface, and (c) blowing a gas from a second nozzle against the surface while rotating the substrate and moving the second nozzle above the substrate in a radial direction from a central portion toward a peripheral portion of the substrate, thereby drying the surface of the substrate.

Abstract: Methods for diagnosing and screening for ovarian carcinomas in a subject are provided The methods employ the steps of preparing a plasma sample from a blood specimen from the subject, and assaying for the presence of lysophosphatidic acid in the plasma sample. The presence of lysophosphatidic acid in the plasma sample is indicative of ovarian carcinoma in the subject. In a preferred embodiment the plasma sample is prepared under conditions which minimize the release of lysophosphatidic acid from platelets in the blood specimen into the plasma.

Abstract: Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and rear access doors for providing access to the inner processing chamber. A blower is disposed in the enclosure for circulating purified gas therethrough. A prefilter disposed prior to an inlet of the blower, and a high purity filter and laminar flow screen are disposed in the inner processing chamber. A heater is provided for heating the purified gas and a temperature controller is coupled to the heater for controlling the temperature of the purified gas. A table is disposed in the inner processing chamber upon which contamination sensitive hardware and testing and assembly apparatus may be placed.

Abstract: A method for rinsing and drying semiconductor wafers. The method includes placing a semiconductor wafer into a rinse/dry apparatus, directing rinse liquid over the semiconductor wafer, and lowering at least a portion of a side wall of the rinse/dry apparatus to remove rinse liquid therefrom.