Patents Examined by Saeed Chaudhry
  • Patent number: 9023155
    Abstract: An engine wash system for delivering wash liquid to an engine with a lift fan and a main engine, the lift fan including a plurality of inlet guide vanes and a nose cone, and the main engine connected to the lift fan by a shaft, the engine wash system includes a lift fan manifold to deliver wash liquid to the lift fan; and a main engine manifold to deliver wash liquid to the main engine, wherein the lift fan manifold and the main engine manifold can deliver the wash liquid simultaneously.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: May 5, 2015
    Assignee: EcoServices, LLC
    Inventors: Kurt Dorshimer, Robert M. Rice, Sebastian Nordlund, Wayne Zadrick
  • Patent number: 7402212
    Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: July 22, 2008
    Assignee: Au Optronics Corp.
    Inventors: Wei-Ting Chen, Man-Hung Wu, Hung-Yi Cheng
  • Patent number: 7371288
    Abstract: A dishwasher and a method for controlling the same, performing a main washing cycle depending upon an amount of food residue on used dishes or a pollution level thereof, are disclosed. The method includes supplying washing water to the dishwasher, detecting for an N number of times a pollution level of the supplied washing water during a preliminary washing cycle, and comparing the detected pollution levels with a reference pollution level, and carrying out a main washing cycle depending upon a comparison result between the detected pollution levels and the reference pollution level.
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: May 13, 2008
    Assignee: LG Electronics Inc.
    Inventors: In Haeng Cho, Joung Hun Kim
  • Patent number: 7360749
    Abstract: Semi-circular cover members 17 and 17 having a spring function for opening and closing the openings of pores 15S are provided on the cavity inner wall side of a porous air vent 15 in order to close the openings of the above pores 15S while a small space remains between the above cover members 17 and 17 and the openings of the pores 15S of the porous air vent during vulcanization, whereby the occurrence of the occlusion of the above pores 15S is reduced and stains adhered to the cavity inner wall side of the mold 10 are removed by physical means such as a blast treatment while the above cover members 17 and 17 are closed at the time of cleaning to remove the stains of the above mold 10. Further, the above openings are opened as required to allow a cleaning liquid 24 go into the above pores 15S to clean the above mold 10 and remove stains in the pores 15S.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: April 22, 2008
    Assignee: Kabushiki Kaisha Bridgestone
    Inventor: Kouji Hirose
  • Patent number: 7354483
    Abstract: A device for transporting and delivering chemical to interior walls of pipelines employs a pig having a tank which contains pressurized chemical therein. Operably connected to the tank is a nozzle which is equipped to deliver the chemical from the tank onto the inner pipeline walls as the pig is transported through the pipeline. The pig is equipped with a device to deliver the chemical at a predetermined point within the pipeline and includes a position tracking device to enable location thereof. A method of cleaning and treating a pipeline is also provided.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: April 8, 2008
    Inventor: Sam Farris
  • Patent number: 7350529
    Abstract: A device for cleaning an ostomy pouch is provided. The device comprises a waste collector having a wide mouth and a circular aperture in its base, a waste tube, a pedestal and, first and second water sprayers connected to a high pressure water source. An ostomy pouch is hung from the mouth of the waste collector so that its contents are drained out into the waste collector from its closable drain end, while the other distant end of the pouch is attached to a user's stoma. One end of the waste tube is coupled to the aperture in the base of the waste collector while the other end is coupled to the pedestal. The pedestal is fitted onto a waste dispenser. The first water sprayer cleans the waste collector by washing away the contents of the waste collector into the waste dispenser, through the waste tube.
    Type: Grant
    Filed: April 22, 2005
    Date of Patent: April 1, 2008
    Inventor: Edward J. Sarvis
  • Patent number: 7343922
    Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.
    Type: Grant
    Filed: April 12, 2005
    Date of Patent: March 18, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Hyung Jung, Young-Min Kwon, Jong-Jae Lee, Dong-Hoon Jung
  • Patent number: 7337789
    Abstract: The present invention provides for a cleaning apparatus for a vertical exhaust pipe in an exhaust system, the cleaning apparatus comprising a cleaning liquid source, an enclosure receiving a cleaning liquid from the cleaning liquid source, and a fluid communication between the enclosure and an inner surface of the exhaust pipe so that the cleaning liquid supplied to the enclosure by the cleaning liquid source is gravity fed into the exhaust pipe through the fluid communication, thereby creating a cleaning liquid film flowing down along at least part of the inner surface of the exhaust pipe, whereby the cleaning liquid film washes the at least part of the inner surface of the exhaust pipe. The cleaning apparatus is thus efficient, has a low risk of failure and is easily accessible for maintenance. A method for cleaning a vertical exhaust pipe in an exhaust system is also provided.
    Type: Grant
    Filed: July 27, 2004
    Date of Patent: March 4, 2008
    Inventor: Minel Kupferberg
  • Patent number: 7329322
    Abstract: In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the exhaust pipe and is provided with an introduction hole and branch holes in such a manner that the introduction hole and the branch holes are communicated with each other to form through holes extending from the outside to the inside of the exhaust pipe. Into a gap between the rotating shaft takeoff connection and the rotating shaft, purge gas is introduced via the introduction hole and the branch holes. Furthermore, pure water is introduced into the gap via the introduction hole and the branch holes. By utilizing the purge gas, exhaust gas within the exhaust pipe is prevented from leaking outside the pipe and by utilizing the pure water, accumulated solid substance are prevented from adhering to the related parts of the pipe.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: February 12, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kou Sugano
  • Patent number: 7325422
    Abstract: In a washing method of a drum type washing machine, a large amount of the laundry can be more effectively washed by effectively transmitting a mechanical force to the laundry by repeatedly and forcedly rotating a drum forward (or clockwise) or backward (or counterclockwise) for a short predetermined time. Through continuous rotation of the drum of the drum type washing machine, a falling washing is performed such that the laundry in the drum is washed by falling by a gravity, or a reversing washing is performed such that the laundry is washed by repeatedly rotating the drum forward (or clockwise) or backward (or counterclockwise) for a short predetermined time, thereby improving energy efficiency through economizing a washing time and washing water according to the amount of the laundry, and also preventing a waste of power by driving a heater at a proper time.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: February 5, 2008
    Assignee: LG Electronics Inc.
    Inventors: Hyun-Seok Seo, Byung-Keol Choi, Tae-Hee Lee, Sang-Wook Hong, Si-Moon Jeon
  • Patent number: 7323064
    Abstract: The invention includes a method of cleaning a processing chamber by introducing supercritical fluid into the processing chamber. A residue over an internal chamber surface is contacted with the supercritical fluid to remove the residue from the surface. The invention also includes a method of removing deposited material from internal surfaces of a processing system. A cleaning agent comprising at least one of C3H8, C2H6 and CH4 is provided in supercritical phase into at least a portion of the processing system. A material deposited on an internal surface of the processing system is contacted with the cleaning agent to remove at least a portion of the deposited material.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: January 29, 2008
    Assignee: Micron Technology, Inc.
    Inventors: Cem Basceri, Gurtej S. Sandhu
  • Patent number: 7320330
    Abstract: A dish washing machine includes a washing tub with a spraying device in the tub fitted with spraying openings supplied with washing liquid from a pump coupled thereto for spraying the washing liquid into the tub. The dishwashing machine includes a control element actuatable for switching on the pump and supplying the washing liquid when the tub is open and accessible. The dishwashing machine also includes a sensor for detecting the tub open position and for triggering throttling of the flow rate of the washing liquid through the spraying openings to reduce the flow rate when the tub is accessible.
    Type: Grant
    Filed: October 26, 2005
    Date of Patent: January 22, 2008
    Assignee: BSH Bosch und Siemens Hausgeraete GmbH
    Inventors: Michael Rosenbauer, Bernd Schessl, Helmut Jerg
  • Patent number: 7320329
    Abstract: Apparatus for remotely operated fluid pumping in work spaces, particularly suitable for the cleaning of enclosed space tanks such as those on marine vessels. The apparatus comprises one or more arm assemblies, each made up of two or more arm sections each, with the arm assembly mounted within of the tank. Hydraulic rotary actuators disposed between the arm sections provide up to 360 degree rotation of one arm section with respect to the next. A nozzle is mounted on a pair of hydraulic rotary actuators near the end of the arm assembly distal from the mount, with a hose supplying fluid from a supply pump to the nozzle. Fluids and solids from the cleaning operation can be pumped from the area being cleaned via a discharge pump to a holding vessel, such as a disposal barge. A video camera is mounted on the arm assembly, preferably at the nozzle, to permit an operator to remotely view the cleaning process and area.
    Type: Grant
    Filed: September 14, 2004
    Date of Patent: January 22, 2008
    Assignee: Baker Hughes Incorporated
    Inventors: Stephen A. Luke, Robert P. Luke, Ben T. Deslatte
  • Patent number: 7311109
    Abstract: A method for cleaning a processing chamber and manufacturing a semiconductor device by removing impurities from a substrate in the processing chamber with a plasma of a first gas including hydrogen gas. After the substrate is removed from the processing chamber, the processing chamber is etched with the plasma of a non-hydrogenous second gas. Thus, the etching selectivity can be improved and the particles are prevented from depositing and/or forming on the substrate.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: December 25, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-wook Kim, Hyeon-Deok Lee, Jin-Gi Hong, Ji-Soon Park, Eung-Joon Lee
  • Patent number: 7306001
    Abstract: A method for cleaning tubes and heat exchangers provides a cavitation enhancement unit between a source of pressurized fluid an a lance. The pressurized fluid flows through jets, which impart a high speed rotation to a set of propellers, preferably square in profile canted at a 15° angle. Generation of cavitation develops a cleaning vibration in the fluid discharged from the lance.
    Type: Grant
    Filed: August 17, 2004
    Date of Patent: December 11, 2007
    Assignee: AIMM Technologies, Inc.
    Inventor: Ralph Garcia, Jr.
  • Patent number: 7300524
    Abstract: A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for detecting a distribution of particles adhering to the substrate, a reversing unit for reversing the substrate, and a transport section having a pair of transport units. Cleaning conditions of the front surface cleaning unit or back surface cleaning unit are varied based on the distribution of particles on the substrate after the substrate is cleaned by the front surface cleaning unit or back surface cleaning unit and inspected by the particle inspecting unit.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: November 27, 2007
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Toru Asano
  • Patent number: 7288156
    Abstract: The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing process, a cleaning process and a working process of a subject, is provided with a water vapor body supplying means for supplying a water vapor body, and a water mist body supplying means for supplying a water mist body containing liquid water fine particles, and the structure is made such that said water vapor body and said water mist body are supplied to the subject by independently controlling said two means.
    Type: Grant
    Filed: January 10, 2006
    Date of Patent: October 30, 2007
    Assignee: Lam Research Corporation
    Inventors: Yoichi Isago, Kazuo Nojiri, Naoaki Kobayashi, Teruo Saito, Shu Nakajima
  • Patent number: 7275551
    Abstract: A food washing apparatus of the invention includes an ozonized water generator (10), a cylindrical washing tank (1) in which the food materials are put and which can rotate to wash the food materials, a drainage part (4) formed at a part of the washing tank (1) and including openings to such a degree that water passes through and the food materials do not pass through, and wash water pipings (2, 9) which are inserted and disposed in the washing tank (1) in an axial direction and in which water spray holes (2a, 2a) for spraying wash water including at least ozonized water are formed, and while at least one part of the wash water sprayed from the wash water pipings (2, 9) is draind from the washing tank (1) every rotation of the washing tank (1), washing of the food materials is performed.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: October 2, 2007
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Takafumi Kanaya, Kazuhisa Okada, Koichi Yoshida
  • Patent number: 7275550
    Abstract: An apparatus and method for cleaning and pressure testing tube structures comprising a cleaning fluid supply pump and a pressurization pump alternately in fluid communication with a feed header having a feed header interface engageable to an end of at least one tube structure and a drain header having a drain header interface engageable to an opposing end of the at least one tube structure and an outlet valved so as to be selectively closed or opened depending on mode of operation of the apparatus. The apparatus and associated method cleans and pressure tests a tube by engaging a tube between the feed header interface and the drain header interface and maintaining said engagement while sequentially flowing a cleaning fluid through the inner diameter of the hollow tube, pressurizing a static fluid within the hollow tube, and releasing fluid from the tube.
    Type: Grant
    Filed: May 3, 2004
    Date of Patent: October 2, 2007
    Assignee: The Boeing Company
    Inventor: Joseph M. Nealon
  • Patent number: 7267134
    Abstract: A shockwave cleaning apparatus cleans one or more surfaces within a vessel. A sensor senses one or more thermodynamic properties associated with the vessel. A control system is coupled to an initiator and a fuel/oxidizer source to control the firing of the apparatus responsive to input from the sensor.
    Type: Grant
    Filed: March 15, 2004
    Date of Patent: September 11, 2007
    Assignee: United Technologies Corporation
    Inventors: James R. Hochstein, Jr., Michael J. Aarnio, Donald W. Kendrick, Thomas R. A. Bussing, Robert R. Niblock