Abstract: In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about ?40° C. to fracture the process deposits on the surface. The surface can be cooled by immersing the surface in a low temperature fluid, such as liquid nitrogen. In another version, the component surface is heated to fracture and delaminate the deposits, and optionally, subsequently rapidly cooled to form more fractures. The component surface cleaning can also be performed by bead blasting followed by a chemical cleaning step.

Abstract: Apparatus for remotely operated fluid pumping in work spaces, particularly suitable for the cleaning of enclosed space tanks such as those on marine vessels. The apparatus comprises one or more arm assemblies, each made up of two or more arm sections each, with the arm assembly mounted within of the tank. Hydraulic rotary actuators disposed between the arm sections provide up to 360 degree rotation of one arm section with respect to the next. A nozzle is mounted on a pair of hydraulic rotary actuators near the end of the arm assembly distal from the mount, with a hose supplying fluid from a supply pump to the nozzle. Fluids and solids from the cleaning operation can be pumped from the area being cleaned via a discharge pump to a holding vessel, such as a disposal barge. A video camera is mounted so as to permit an operator to remotely view the cleaning process and area.

Abstract: A wash fluid containment system includes an elevated, fluid impervious surface upon which items to be washed are placed for washing. The surface is configured to cause wash fluid to flow to an edge of the surface and off of the surface to prevent buildup of wash fluid on the surface. A collecting trough is positioned in fluid flow communication with the edges of the surface to which the fluid flows to catch and collect the fluid as it flows from the surface. Used wash fluid is taken from the collecting trough for disposal or recycling and solids and debris can be easily removed from the trough.

Abstract: The present invention comprises a system and method for removing contaminates from the surface of a shopping cart such as a grocery cart. The system includes subjecting the cart to multiple stages of disinfection, including washing, sanitizing, and drying stages. A shopping cart is subjected to these stages by conveying the cart on a conveyor system past a plurality of nozzles, which are configured to provide a disinfecting fluid such as water, sanitizer or air. The invention uses sensors to detect the location of a shopping cart during the sanitizing process. The sensors provide indications of the cart's location which may be used to control the operation of the disinfecting stages on the conveyor belt.

Abstract: A method of cleaning a lubrication system of a machine includes removing existing lubricant and circulating a cleaning fluid through the lubrication system. After the cleaning fluid has been removed, a neutralising fluid is circulated through the lubrication system, whereby the neutralising fluid combines or reacts with the cleaning fluid to produce a fluid that does not adversely affect the lubricating qualities of fresh lubricating fluid. An apparatus (1) for carrying out the method includes first (3) and second (15) reservoirs to receive the cleaning fluid and neutralising fluid respectively, one or more connectors to connect the apparatus to the machine, one or more pumps adapted to circulate cleaning fluid and neutralising fluid and a controller to control the transfer of the cleaning fluid and neutralising fluid from the reservoirs to the machine.

Abstract: A method for treating CIP equipment is provided according to the present invention. The CIP equipment includes process equipment. The method includes steps of treating the CIP equipment with a multiple phase treating composition comprising a treating liquid phase and a treating gaseous phase and rinsing the CIP equipment with a multiple phase rinsing composition comprising a rinsing liquid phase and a rinsing gaseous phase.

Abstract: A dishwasher operates to sense the need for a drain or purge operation based on dynamic characteristics of a respective washing operation such that an adaptive system is defined. In accordance with the invention, washing fluid used to spray clean kitchenware being washed is filtered and soil from the kitchenware is collected. When the filtering system becomes clogged, a flow signal is established to indicate the need for at least a partial drain operation. Most preferably, this arrangement is used in combination with signals from a turbidity sensor, as well as pump motor current signals, to provide an comprehensive, dynamically adaptive control system.

Abstract: An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer, a cover for covering an upper part of the chamber, and a light source. The cleaning solution, preferably one of ozone water, hydrogen water, or electrolytic-ionized water, may be heated for a short time and used to clean the wafer.

Abstract: The present invention relates to a mobile or stationary waste container cleaning system used for residential, commercial and industrial waste, garbage, trash, storage or operations containers or receptacles. Other applications include, but are not limited to cleaning of chemical drums, grease dumpsters (e.g. behind restaurants), rain barrels and non-uniform residential, commercial or industrial dumpsters or waste containers. The container cleaning system can alternatively be used for rural areas, farms or ranches.

Abstract: A cleaning method preventing foreign matter attached to a brush from being transferred back to a magnetic transfer carrier by removing foreign matter attached to a cleaning tool such as the brush with a dummy carrier having a recess equivalent to that on a surface of the magnetic transfer carrier.

Abstract: Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized water, nonaqueous, e.g., formed of a dense fluid, such as supercritical carbon dioxide, liquid carbon dioxide, supercritical nitrogen or combinations the dense fluids or the feed phase can be a mixture of aqueous and nonaqueous phases.

Abstract: A method for plasma cleaning a CVD reactor chamber including providing a plasma enhanced CVD reactor chamber comprising residual deposited material; performing a first plasma process comprising an oxygen containing plasma; performing a second plasma process comprising an argon containing plasma; and, performing a third plasma process comprising a fluorine containing plasma.

Abstract: Disclosed are a method for cleaning a deposition chamber by removing attached metal oxides, and a deposition apparatus for performing in situ cleaning. A first gas and a second gas are provided into the deposition chamber. The first gas is reacted with metal included in the metal oxide to generate reacting residues. The second gas then decomposes the reacting residues, and the decomposed residues are exhausted out of the chamber. Thus, this cleaning process can be rapidly accomplished while the deposition chamber is not opened or separated from a deposition apparatus.

Abstract: An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a center of a wafer to be off-center from an axis of rotation of the single wafer holding bracket.

Abstract: In a chamber (11), a SiOF film is formed on a wafer W using a plasma CVD method. A film remaining inside the chamber (11) is cleaned up using a gas containing NF3. A manometer (28) is prepared for the chamber (11). An end point of cleaning of the chamber (11) is detected by monitoring the pressure inside the chamber (11).

Abstract: A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

Abstract: A cleaning preparation method, comprising: providing a part with an internal cavity, an opening, and foreign material within the cavity; and creating an additional opening in the part adjacent the foreign material. A cleaning method, comprising: providing a part with an internal cavity and an opening; creating an additional opening in the part; and flushing the cavity with a fluid. The additional opening acts as an exit or entrance for the fluid. A repair method, comprising: providing a part with an internal cavity, an opening and foreign material within the cavity; creating an additional opening in the part; and removing the foreign material through the additional opening. A part, comprising: an exterior surface; an internal cavity; an opening through the surface to the cavity; and a repaired section of the surface, which was an additional opening that provided a temporary exit or entrance to the cavity for foreign material removal.

Abstract: Apparatus (20) for cleaning a window (24) of a vehicle (22), including a vessel (28) having an inlet (32) through which a washing fluid is received from a reservoir and an outlet (34) through which the fluid is discharged for cleaning the window. There is a heating (50) for heating the fluid in the vessel, which element preheats the vessel before the washing fluid is received therein, whereby at least an initial quantity of the fluid is rapidly heated and discharged from the vessel.

Abstract: A device having at least one cleaning unit for cleaning installations, especially for the production and/or processing of food stuffs or pharmaceuticals is provided. The device may include a cleaning unit that is configured to move within the installation to be cleaned. The cleaning unit may also be provided with one or more nozzles with rotatable nozzle tips configured to rotate as cleaning agent flows through the nozzle tip.

Abstract: In a first aspect, a first apparatus is provided. The first apparatus includes (1) a tank adapted to contain fluid; (2) at least one support component mounted in the tank and adapted to support a substrate in a supported position at least partially submerged in the fluid; (3) a transducer adapted to output sonic energy into the fluid; and (4) a reflector positioned at a side of the substrate and adapted to reflect the sonic energy toward an edge of the substrate so as to provide a 100% duty cycle. The reflector is positioned such that the reflector does not obstruct a path employed to load the substrate into the supported position and to unload the substrate from the supported position. Numerous other aspects are provided.