Abstract: A milking plant for milking animals, such as cows, wherein milk collecting means, prefeably in the form of teat cups, are attached to the teat of the animal whereafter milk is taken from the animal by use of vacuum. The milk is transported by a milk line system (31) to milks storage means comprising a cooling tank (30). For cleaning purposes the milk line system from each milk collecting means can be shut off from the milk tank by valve means (32) in order for separate cleaning of the milk line system. The invention is characterized by preventing any possible leakage of detergent from a cleaning fluid to the milk that has been collected in the milk tank, by providing a pressure difference between the two fluids. The pressure difference between the fluids is preferably achieved by connecting the cleaning fluid to the vacuum supply (4) of the milking plant.

Abstract: The method of using the mouse pad cleaning apparatus is disclosed and claimed. The method comprises the steps of uncovering the mouse cleaning surface, applying the mouse and ball of the mouse to the cleaning surface, moving the mouse in a rotational pattern on the mouse cleaning surface, removing the mouse form the mouse cleaning surface, washing the cleaning surface, and covering the mouse cleaning surface. A mouse pad cleaning apparatus comprising a plurality of substrates, each said substrate having adhesive thereon, said plurality of substrates residing in and affixed to a receptacle. A single substrate having adhesive, which may be washable or non-washable, thereon may be employed. The washable adhesive may be an organopolysiloxane or gelatinous elastomer.

Abstract: To improve on a vent plug system for a cell opening of a storage battery containing a plug element with an inner cartridge and a valve element, to where it is possible without the need for maintaining excessive physical tolerances to assemble it with a minimal number of components m simple fashion while still assuring reliable operation without any major effort, the plug element is provided as a cup-shaped unit with an outer contour shaped to fit into, and seal, the cell opening, with an internal cavity and with a gas port between the cavity and an outside surface. The inner cartridge is essentially cylindrical, has an outer contour shaped to permit insertion in the cavity of the plug element and is provided with a gas passage that opens into the cavity, while the valve element is a separate element retainable in the cavity by the inner cartridge and, as a function of the gas pressure, establishes a gas-flow connection between the gas passage of the inner cartridge and the gas port of the plug element.

Abstract: A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interaction, sufficient solvent for the solvent purge operation, without residual solvent, requiring disposal. This eliminates customer handling of the solvent, and eliminates the customer's need to find a solvent waste facility, as residual solvent can be returned in the same package in one piece/one step.

Abstract: A method of using PFCs recovered from the effluent of a CVD chamber cleaning process as an influent for the cleaning process is provided which includes the steps of selecting a first PFC gas mixture having a first ratio of C2F6 to CF4, providing the first PFC gas mixture as the influent gas to the CVD chamber to create a CVD chamber effluent gas of a second PFC gas mixture having a second ratio of C2F6 to CF4, adding virgin C2F6 or CF4 to the CVD chamber effluent gas in sufficient quantity to create a third PFC gas mixture having the first ratio of C2F6 to CF4, and using the third PFC gas mixture as the influent gas to the CVD chamber.

Abstract: A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interaction, sufficient solvent for the solvent purge operation, without residual solvent, requiring disposal. This eliminates customer handling of the solvent, and eliminates the customer's need to find a solvent waste facility, as residual solvent can be returned in the same package in one piece/one step.

Abstract: A method for cleaning a wafer with a drip nozzle being configured for use in a drip manifold that is oriented over a brush of a wafer cleaning system is provided. The drip nozzle has a first end and a second end with a passage defined there between where the passage includes a wall that extends longitudinally between the first end and the second end. An orifice is defined within the passage and located at the first end of the drip nozzle. The method includes inputting a fluid into the drip nozzle at an acute angle relative to a longitudinal extension of the wall and reflecting the fluid stream off an internal wall of the drip nozzle at least twice in a direction that is toward the second end. The method further includes outputting at least one substantially uniform drop from the second end of the passage.

Abstract: A method and an apparatus for removing a liquid, i.e. a wet processing liquid, from at least one surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter the liquid or the substrate is locally heated to thereby reduce the surface tension of said liquid. By doing so, at least locally a sharply defined liquid-ambient boundary is created. According to the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-ambient boundary over the surface of the substrate thereby removing said liquid from said surface.

Abstract: A dishwasher tub is provided with containment structure which prevents liquid from leaking around a door seal. The containment structure includes a bead that extends along side portions of a front flange of the dishwasher tub. At each lower portion of the front flange, the bead includes an inward and downward extending portion which leads to a substantially vertical portion, and finally to another inward and downward extending portion. The final two portions of the bead are arranged along a reduced dimension section of the front flange and define a trough which guides the liquid back into the tub.

Abstract: A new apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface.

Abstract: A process and system for conditioning a bulk container for ultra-high purity liquefied gas. Vapor is generated in the container from a conditioning quantity of the ultra-high purity liquefied gas by imposing a temperature difference on the container so that the vapor condenses when a temperature difference is achieved. The resulting liquid reflux, e.g., the condensed liquid drips or flows back to the conditioning quantity of the liquified gas, washes or removes contaminants, e.g., particles, metal and moisture, from the interior surface of the container. A portion of the vapor is vented from the container for reclamation. The used conditioning liquid may also be reclaimed.

Abstract: An apparatus and method for cleaning debris and residue from a multitude of electrical contacts of a test probe card of an integrated circuit test probe apparatus preferably comprises a silicon wafer having a grooved surface into which the test probe card is moved into pressurized contact. The grooved surface provides a grating structure that when combined with the pressurized electrical contacts will crush any intervening or attached residue particles, which will then break into smaller particles and fall away from the probe card. Pressure and relative movement of the probe card may be controlled by a variety of measurement sensors.

Abstract: In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.

Abstract: A terminal unit (TU) includes a battery terminal (2) mounted at the leading end of a wiring harness (4), and a holder (8) mounted on the wiring harness (4) at a position distanced from the battery terminal (2). A current sensor (12) is transported separately from the terminal unit (TU) to a connection site to a battery (B). The battery terminal (2) is introduced through the current sensor (12) and the current sensor (12) then is coupled with the holder (8) at the connection site. This operation is performed at a position distanced from the battery (B), and hence can be performed smoothly without being hindered.

Abstract: Apparatus for cleaning a surface, comprising brush means including a body (16) which carries bristles (17) engageable with the surface; means for effecting movement of the bristles relative to the surface, to provide an agitating cleaning action thereon; said bristle-carrying body further being provided with steam delivery means (20, 21) for applying steam to said surface in a region thereof engaged by said bristles. The apparatus may be for cleaning a conveyor belt (10), with the brush in the form of a drum (16) rotatable about an axis (18) parallel to the conveyor belt with the steam passing through the drum and emerging through peripheral apertures (21), the brush being disposed within a hood (15) with an extraction system for loosened dirt and water.

Abstract: The present invention relates to a method and a device for cleaning internal passageways within a component, such as a component to be used in an engine. The device for cleaning the internal passageway includes a first probe having a longitudinal axis and at least one nozzle oriented at an angle, preferably perpendicular, to the longitudinal axis. In a preferred embodiment, the first probe has two nozzles, both oriented perpendicular to the longitudinal axis, and offset 180 degrees from each other. The device further includes a second probe having a longitudinal axis and a nozzle in a tip end, which nozzle is oriented along the longitudinal axis. Preferably, the first and second probes are connected to a common manifold.

Abstract: Process for removing microwave energy absorbing material disposed on a substrate without thermally and/or mechanically damaging the substrate and with reduced production of volatile matter comprising the steps of directing microwave energy at the coating of sufficient power to damage the coating and removing the damaged coating from the substrate.

Abstract: Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving contact therewith. Drying of the substrate is carried out, using a water solution of carbon dioxide in a pressurizable vessel. By releasing the pressure in the vessel, a layer of foam is established on the surface of the solution. The solution is discharged from the vessel, causing the foam layer to pass over the substrate in moving contact therewith. The carbon dioxide reduces the surface tension of the water, thereby enabling the foam layer to be produced and also assisting in the elimination of water from the surface of the substrate. In both cases, the use of foam reduces materials requirements and also reduces the quantity of particles deposited onto the substrate in the treatment process.

Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.

Abstract: A method and machine for on-line treating and/or processing containers (2), whereby a container (2) is fed along a production line (45), a portion of which is defined by an endless conveyor (3) extending through a loading station (43; 55) and an unloading station (41; 55) for containers (2); the container (2), as it is fed along by the conveyor (3), being subjected to a treatment and/or processing operation inside a respective cell (17), which is movable with the conveyor (3) to receive the container (2) at the loading station (43; 55) and to release the container (2) at the unloading station (41; 55).