Patents Examined by Shrive Beck
  • Patent number: 6224833
    Abstract: A gas-solid fluidized bed is formed within a contacting element having pairs of planar portions arranged in intersecting planes, each planar portion being formed by one or more webs and one or more open slots adjacent each web, the webs and slots being arranged such that a web in one of the planar portions intersects a slot in the paired planar portion. The fluidized bed can be catalyst particles fluidized by a gas stream, such as in a catalyst stripper and/or regenerator in an FCC system.
    Type: Grant
    Filed: December 10, 1999
    Date of Patent: May 1, 2001
    Assignee: Koch-Glitsch, Inc.
    Inventor: Richard R. Rall
  • Patent number: 6224950
    Abstract: A method is disclosed which forms a thin film by setting a substrate in place in a vacuum vessel provided with a gas inlet and introducing reaction gases through the gas inlet into the vacuum vessel and meanwhile applying a high-frequency electric power to the reaction gases thereby inducing generation of plasma and deposition of the thin film of the reaction product of the reaction gases on the substrate, which method is characterized in that prior to the introduction of the reaction gas, a discharge gas formed of a component gas of the reaction gases which by itself assumes the state of plasma and possesses substantially no ability to form the thin film or a plurality of reaction gases which in itself possesses substantially no ability to form the thin film is introduced into the vacuum vessel and the high-frequency electric power is meanwhile applied to the discharging gas thereby inducing the generation of plasma and effecting a pretreatment, and thereafter the reaction gases are introduced into the vacuu
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: May 1, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Noriyuki Hirata
  • Patent number: 6224952
    Abstract: An abrasion-proof and static-erasing coating is formed on the contact surface of a contact image sensor. The coating comprises a first film having a high hardness and a low conductivity, a second film formed on the first film and having a low hardness and a high conductivity, and a third film having a high hardness and a high resistivity providing an abrasion-proof insulating external surface.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: May 1, 2001
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Kenji Itoh
  • Patent number: 6224939
    Abstract: A method and apparatus provides for the formation of an encapsulated feedstock product matrix. A solid product matrix additive is spray ejected in a free-flow condition. The matrix additive is encapsulated in its free-flow condition with a matrix encapsulant. The encapsulant additive substantially solidifies in its free-flow condition to form the feedstock product matrix.
    Type: Grant
    Filed: May 10, 1999
    Date of Patent: May 1, 2001
    Assignee: Fuisz International Ltd.
    Inventors: Subraman R. Cherukuri, Supapong Siris
  • Patent number: 6221436
    Abstract: There is disclosed a method for depositing layered material onto a substrate including a layer formed from a coating solution, wherein the method comprises: (a) cleaning the substrate by dipping the substrate into and raising the substrate from a cleaning solvent selected from the group consisting of (i) a mixture comprising an alcohol and an alkane; and (ii) a liquid compatible with the coating solution; and (b) dipping the substrate subsequent to (a) into and raising the substrate from the coating solution, thereby depositing the layer on the substrate, wherein when the cleaning solvent is the liquid compatible with the coating solution, any cleaning solvent present on the substrate upon the dipping of the substrate into the coating solution fails to detrimentally affect the layer.
    Type: Grant
    Filed: August 21, 1995
    Date of Patent: April 24, 2001
    Assignee: Xerox Corporation
    Inventors: Philip G. Perry, Gene W. O'Dell, William G. Herbert
  • Patent number: 6221435
    Abstract: Processes are disclosed for the use of subcritical compressed fluids, such as carbon dioxide or ethane, to reduce viscosity and to enhance atomization when spray applying coating compositions containing low molecular weight polymers to substrates, by using spray conditions that produce choked flow in the liquid mixture being sprayed, wherein the subcritical compressed fluid is a gas at standard conditions of 0° C. temperature and one atmosphere pressure and is miscible with the coating composition.
    Type: Grant
    Filed: November 18, 1998
    Date of Patent: April 24, 2001
    Assignee: Union Carbide Chemicals & Plastics Technology Corporation
    Inventor: Kenneth Andrew Nielsen
  • Patent number: 6221438
    Abstract: A display structure is formed using patterned deposition of display materials. A substrate includes a plurality of distinct electrodes. A plurality of droplets including a material are formed and charged to a second polarity. First selected ones of the plurality of electrodes are charged to a first polarity opposite the second polarity to selectively attract the droplets including the material to the oppositely charged first selected ones of the plurality of electrodes.
    Type: Grant
    Filed: February 16, 1999
    Date of Patent: April 24, 2001
    Assignee: Sarnoff Corporation
    Inventor: Dennis Lee Matthies
  • Patent number: 6221437
    Abstract: A heated platen or chuck is employed in connection with a wet chemistry process cell, such as a plating cell for plating a flat substrate. A flow of electrolyte or other wet process solution is introduced into the cell across the surface of the substrate which is mounted on a the chuck or holder. A cathode ring may be disposed to make electrical contact with the substrate. The cathode ring can include a thin metal thieving ring. A fluid-powered rotary blade or wiper may be employed to draw bubbles or other impurities from the substrate, and a megasonic transducer can apply megasonic acoustic energy to the solution. The cell can be used for electroless or galvanic plating. A heater in the chuck heats the substrate to a temperature significantly above that of the electrolyte. Heating the substrate during plating improves the grain structure of the plated metal.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: April 24, 2001
    Assignee: Reynolds Tech Fabricators, Inc.
    Inventor: H. Vincent Reynolds
  • Patent number: 6221431
    Abstract: In a method of hot-galvanizing ferrous materials, in order to improve results, there is provision, during the course of the galvanizing, for a step for the introduction of various suitable metals, preferably selected from aluminum, potassium, nickel, magnesium and manganese, which are introduced in the form of their salts.
    Type: Grant
    Filed: December 18, 1998
    Date of Patent: April 24, 2001
    Assignee: Soprin S.R.L.
    Inventors: Francesco Bisol, Inigo Quesada, Hans Harald Schmidt
  • Patent number: 6221425
    Abstract: A method of providing a lubricious hydrophilic coating on an intracorporeal medical device and the coated device produced thereby, wherein the coating is durable and highly lubricious when in contact with body fluids. In one embodiment, the coating comprises a polymerized base coat and a hydrophilic top coat, where the base coat has a binding component which binds to the hydrophilic compound of the top coat, and a grafting component which binds to the binding component and to the device. In another embodiment, the coating comprises a blend of a hydrophilic compound, a grafting component, and salt, wherein the polymerized grafting component contains uncrosslinked domains. The hydrophilic coating of the invention can be applied to a medical device with a polymeric surface such as a polymeric catheter, or a metal device coated with a polymeric primer.
    Type: Grant
    Filed: January 30, 1998
    Date of Patent: April 24, 2001
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventors: Eugene T. Michal, Stephen James Bigus
  • Patent number: 6222228
    Abstract: A method of processing wafers containing a gate oxide assembly (10) is disclosed that reduces gate oxide damage during wafer production due to damage caused by charging. The method comprises creating an oxide gate assembly (10) on a silicon layer (11) in a production line chamber followed by the deposition of a polysilicon layer (22). Following the creation of the gate oxide assembly (10) a pressure of at least 1.2 Torr is maintained while lowering the power within the production line chamber. The invention can be used with a gate oxide layer (16) of less than 1000 angstroms.
    Type: Grant
    Filed: February 16, 1999
    Date of Patent: April 24, 2001
    Assignee: Texas Instruments Incorporated
    Inventors: Farris D. Malone, Sima Salamati-Saradh, Ingrid G. Jenkins, David R. Wyke, Mary C. Adams
  • Patent number: 6221430
    Abstract: There is provided a process for applying a coating to a base particle comprising a hygroscopic material, particularly sodium silicate, comprising the steps of (i) spraying an aqueous mixture comprising organic binder and optionally a dyestuff onto the base particle; and (ii) drying the particle to obtain a finished particle wherein the weight ratio of hygroscopic material to organic binder in the finished particle is from 1000:1 to 10:1, expressed on a dry weight basis. Detergent compositions containing the resulting particles are also provided.
    Type: Grant
    Filed: March 28, 1996
    Date of Patent: April 24, 2001
    Assignee: The Procter & Gamble Company
    Inventor: Michael Frederick Tompsett
  • Patent number: 6217933
    Abstract: The invention relates to a method for treating a denture, comprising passing the denture through the air interface of an aqueous composition comprising a polymeric coating agent, especially a silicone polymer, having a weight average molecular weight of 1,000 or greater.
    Type: Grant
    Filed: July 15, 1999
    Date of Patent: April 17, 2001
    Assignee: The Procter & Gamble Company
    Inventors: Mark Ieuan Edwards, Iain Allan Hughes
  • Patent number: 6217663
    Abstract: A substrate processing apparatus comprises a hot-wall type processing chamber for processing a substrate, a heater capable of heating an interior of the processing chamber, a substrate holder capable of holding the substrate and processing the substrate in the processing chamber in a state where the substrate holder holds the substrate, and a mechanism, which is capable of allowing the substrate holder to hold the substrate and then transferring the substrate holder holding the substrate into the processing chamber, and/or which is capable of carrying out the substrate holder from the processing chamber in a state where the substrate holder holds the substrate, and then separating the substrate from the substrate holder.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: April 17, 2001
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Yasuhiro Inokuchi, Fumihide Ikeda, Michiko Nishiwaki, Masatoshi Takada, Mamoru Sueyoshi
  • Patent number: 6217934
    Abstract: The present invention relates to a paint color testing kit and method. More particularly, a test kit that duplicates and eliminates the spray process utilized for both color and strength control of paint products in a quality setting. Also provided is the ability to substantially duplicate the surface in which the paint is to be applied to a testing member of the kit and the painted surface to be evaluated or repaired.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: April 17, 2001
    Assignee: BASF Corporation
    Inventor: Darlene Eilenberger
  • Patent number: 6217832
    Abstract: An improved catalytic reactor for high temperature reactions having a reaction chamber and a monolithic catalyst structure disposed in the reaction chamber is disclosed wherein the catalyst structure has a multiplicity of longitudinally disposed channels formed by thin metal substrate walls which expand on exposure to the heat generated in high temperature reactions and reactor also includes a monolithic open cellular support structure disposed in the reaction chamber having a multiplicity of longitudinally disposed passageways formed by strips of high temperature resistant metal or ceramic material with the support structure being secured on its outer periphery to the wall of the reaction chamber to limit movement along the longitudinal axis, and being positioned at and abutting against the outlet end of the catalyst structure.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: April 17, 2001
    Assignee: Catalytica, Inc.
    Inventors: Ralph Dalla Betta, James Cameron Schlatter, Sarento George Nickolas, Walter Wiley
  • Patent number: 6217947
    Abstract: Generally, the method of the present invention has the steps of (a) flash evaporating a liquid monomer forming an evaporate; (b) passing the evaporate to a glow discharge electrode creating a glow discharge monomer plasma from the evaporate; and (c) cryocondensing the glow discharge monomer plasma on a fixture and crosslinking the glow discharge plasma thereon, wherein the crosslinking results from radicals created in the glow discharge plasma and achieves self curing.
    Type: Grant
    Filed: December 16, 1998
    Date of Patent: April 17, 2001
    Assignee: Battelle Memorial Institute
    Inventor: John D. Affinito
  • Patent number: 6217945
    Abstract: In a process for overcoating a substrate having a cured primer coating with a curable topcoat which when cured is swellable by a stripping solvent, a non-volatile polar material is applied to the primed substrate from an aqueous liquid vehicle before coating with the topcoat. The polar material facilitates the removal of the topcoat from the primer by the stripping solvent, as is required for example when repainting aircraft. The polar material has sufficiently high affinity for the primer surface that it is not washed off the primer surface by water rinsing or by application of the topcoat paint.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: April 17, 2001
    Assignee: PRC-DeSoto International, Inc.
    Inventor: Michael Fowler
  • Patent number: 6217626
    Abstract: For storage of natural gas at pressures over 1,000 psia, it is advantageous to add to natural gas an additive which is a C2 or C3 hydrocarbon compound, or a mixture of such hydrocarbon compounds. Above a lower limit (which varies with the additive being added and the pressure), there is a decrease in the amount of power needed to compress the mixture. For storage or pipeline transportation of natural gas at pressures over 800 psia, it is advantageous to add ammonia to the natural gas, in an amount such that the ammonia does not create a liquid phase at the temperature and pressure used. The ammonia-natural gas mixture can be compressed or pumped with a lower energy expenditure than would be needed for an equivalent volume of natural gas alone. When more than 4% by volume of ammonia is present, the pumping through pipelines is also aided by the refrigerant effect of the ammonia, which reduces the temperature of the gas being transported.
    Type: Grant
    Filed: July 16, 1997
    Date of Patent: April 17, 2001
    Assignee: JL Energy Transportation Inc.
    Inventors: Ian Morris, Glen Perry
  • Patent number: 6218218
    Abstract: A method of processing wafers containing a gate oxide assembly (10) is disclosed that reduces gate oxide damage during wafer production due to damage caused by charging. The method comprises creating an oxide gate assembly (10) on a silicon layer (11) in a production line chamber followed by the deposition of a polysilicon layer (22). Following the creation of the gate oxide assembly (10) a pressure of at least 1.2 Torr is maintained while lowering the power within the production line chamber. The invention can be used with a gate oxide layer (16) of less than 1000 angstroms.
    Type: Grant
    Filed: June 19, 1997
    Date of Patent: April 17, 2001
    Assignee: Texas Instruments Incorporated
    Inventors: Farris D. Malone, Sima Salamati-Saradh, Ingrid G. Jenkins, David R. Wyke, Mary C. Adams