Abstract: The present invention is directed to a method of and apparatus for forming a coating having at least one fade zone over a substrate. The method and apparatus include positioning a coating composition dispenser above a surface of a substrate with the coating composition dispenser oriented to dispense a coating composition spray generally normal to the surface of the substrate. A gas dispenser is also positioned above the surface of the substrate and adjacent the coating composition dispenser with the gas dispenser oriented to dispense a gas stream generally normal to the surface of the substrate. The coating composition spray and the gas stream are spaced from each other so as to develop an interference effect therebetween adjacent the surface of the substrate. Preferably the substrate is maintained at a temperature which pyrolyzes the coating composition. The interference effect directs the coating composition to deposit over the substrate as a coating having a fade zone.

Abstract: This invention provides an improved process for coating medical and surgical devices and the like using super-critical fluids.

Abstract: The invention aims to provide a phosphor thin film eliminating a need for filters, having a satisfactory color purity, suited for RGB in full-color EL displays, enabling to simplify the manufacture process of full-color EL panels, and offering the advantages of minimized variation of luminance, increased yields, and reduced manufacture cost, a method for preparing the same and an EL panel. Such objects are achieved by a phosphor thin film formed of a matrix material comprising an oxysulfide consisting of at least one compound selected from alkaline earth thiogallates and alkaline earth thioindates, in which oxygen is incorporated, the matrix material further containing an element serving as a luminescent center, a method for preparing the same, and an EL panel using the same.

Abstract: A process for coating the flow channels in a monolithic, cylindrically shaped catalyst carrier with a coating dispersion, wherein the carrier has two end faces which are connected to each other by flow channels arranged parallel to the axis of the cylinder, by vertically aligning the axis of the cylindrical carrier, placing a predetermined amount of coating dispersion from a storage container on the upper end face of the carrier and drawing the dispersion through the flow channels under suction, removing excess coating dispersion from the flow channels by emptying the flow channels under suction, returning the excess dispersion to the storage container and fixing the dispersion coating by calcination. The coating dispersion is drawn through the flow channels under suction at a rate of flow of 0.

Abstract: A method for marking a product for detecting unauthorized imitations of the product, in particular of electrical switchgear equipment and the like. A color imprint is applied to an outer or inner surface of a housing of the switchgear or the like. The color imprint contains pigments that can be detected only by special methods, for example infrared examination and the like.

Abstract: Slag coating is accomplished by blowing a gas from a top-blown lance such that slag is splashed uniformly onto the barrel and throat near the trunnion of the converter; the lance height is adjusted to 0.7-3.0 m and the gas flow rate is adjusted to 250-600 Nm3/min and, after gas blowing, the remaining molten slag is incorporated with a slag solidifier containing MgO or CaO and the molten slag is splashed toward the desired part of the converter wall that needs repair.

Abstract: A method of chemically depositing a copper film in which a bromine or iodine-containing catalyst component is employed to enhance the deposition rate. The present invention is characterized in that the catalyst component floats on the film surface during the film formation. Accordingly, a film deposition having superior step coverage and high deposition rate is obtained.

Abstract: The present invention is related to systems and methods for modifying various non-equidimensional substrates with modifying agents. The system comprises a processing chamber configured for passing the non-equidimensional substrate therethrough, wherein the processing chamber is further configured to accept a treatment mixture into the chamber during movement of the non-equidimensional substrate through the processing chamber. The treatment mixture can comprise of the modifying agent in a carrier medium, wherein the carrier medium is selected from the group consisting of a supercritical fluid, a near-critical fluid, a superheated fluid, a superheated liquid, and a liquefied gas. Thus, the modifying agent can be applied to the non-equidimensional substrate upon contact between the treatment mixture and the non-equidimensional substrate.

Abstract: A protective material comprising a pre-polymer and a curative is applied to a finished surface. Near equal amounts of the pre-polymer and curative are mixed, pre-heated, and applied to the finished surface by a portable spray mixer apparatus having a disposable mixing spray nozzle. For temporary protection, a releasing agent is applied to the finished surface prior to application of the protective material. The short cure period of the present invention facilitates repeated, fast applications in construction sites to provide impenetrable protection for finished surfaces.

Abstract: A method of modifying the surface characteristics of a polymeric hydrogel, and a polymer article formed therefrom, without causing substantial swelling or distortion or the hydrogel. A preferred method includes photoinitating of the surface of the article with a benzophenone and grafting a macromer having a number-average molecular weight greater than 1000 in the presence of UV irradiation. The preferred article is a siloxane-containing hydrogel, especially a soft contact lens.

Abstract: A process for forming a retroreflective layer on a powder coated substrate is provided. The substrate is powder coated and the powder coating is subsequently partially cured. Reflective elements are then partially embedded in the semi-cured powder. The powder is then fully cured to permanently bond the reflective elements with the powder coating. The resultant retroreflective assembly can be used in any application requiring high detectability in poor visibility conditions, such as road signs and the like.

Abstract: This invention provides a method for producing a CD-R optical recording medium. A first stack at a first stage is created by forming on a substrate a recording layer containing an organic dyestuff and a metal layer. At least after a formation of the metal layer; the first stack is transported from the first stage along a transport path towards a second stage through an atmosphere having a relative humidity. The relative humidity is maintained at 40% or less. To control the relative humidity, a shielding plate may be provided around the transport path. An air conditioner may locally control the relative humidity of an area encircled by this shielding plate.

Abstract: A system and method for two-sided etch of a semiconductor substrate. Reactive species are generated and flowed toward a substrate for processing. A diverter is positioned between the generation chamber and the substrate. A portion of the reactive species flows through the diverter for processing the front of the substrate. Another portion is diverted around the substrate to the backside for processing. A flow restricter is placed between the substrate and the exhaust system to increase the residence time of reactive species adjacent to the backside.

Abstract: An apparatus for processing a semiconductor wafer has a circular chuck and a focus ring. The chuck is located in a process chamber and holds the semiconductor wafer. The focus ring surrounds the semiconductor wafer held by the chuck and focuses processing gases or plasma on a surface of the semiconductor wafer. The focus ring has a stepped inner periphery formed by a cylindrical lower surface surrounding the wafer and having a first diameter, a cylindrical upper surface having a second diameter greater than the first diameter, and a collector interposed between the lower surface and the upper surface for collecting contaminants created at the upper surface due to a reaction between the processing media and the material of the focus ring. The collector collects particulate contaminants falling from the upper surface of the focus ring so that the contaminants do not reach the wafer.

Abstract: A plasma etch reactor 20 includes a upper electrode 24, a lower electrode 24, a peripheral ring electrode 26 disposed therebetween. The upper electrode 24 is grounded, the peripheral electrode 26 is powered by a high frequency AC power supply, while the lower electrode 28 is powered by a low frequency AC power supply, as well as a DC power supply. The reactor chamber 22 is configured with a solid source 50 of gaseous species and a protruding baffle 40. A nozzle 36 provides a jet stream of process gases in order to ensure uniformity of the process gases at the surface of a semiconductor wafer 48. The configuration of the plasma etch reactor 20 enhances the range of densities for the plasma in the reactor 20, which range can be selected by adjusting more of the power supplies 30, 32.

Abstract: An electrostatic fluidized bed powder coating apparatus including powder coating structure, such as a coating enclosure, hood or booth, and a powder fluidizing bed operatively associated with an electrostatic charging device. An enclosed powder accumulator is provided for collecting excess powder from the powder coating structure. A vacuum pump communicates between the powder coating structure and the powder accumulator and is operable by a source of compressed air for forming and controlling a cloud of powder emanating from the fluidizing bed and for transferring excess powder from the powder coating structure to the powder accumulator. In the preferred embodiment, the accumulator includes a cyclone housing. A powder reclaim feeder is disposed below and in communication with the cyclone housing and further communicates with a new powder feeder.

Abstract: A method and apparatus for shielding a device, such as a pump, from a process chamber of a semiconductor wafer processing system. The apparatus comprises a shield connected to a mounting portion. The mounting portion has a fluid passage wherein the temperature of the apparatus is regulated by flowing fluid through the passage.

Abstract: An improved method for applying a ceramic material, such as a thermal barrier coating to an article. A method for applying a ceramic material as a coating to a substrate article in which the thermal conductivity of the ceramic material is reduced or lowered is provided. The thermal conductivity of a coating applied by a physical vapor deposition (PVD) method is dependent upon its distance from the source(s) of material used for the coating. The thermal conductivity of the applied coating is altered by adjusting the position of the article undergoing the PVD process by increasing the distances of the article or workpiece from the ingot or source of ceramic material to provide a coating of lower thermal conductivity. In accordance with the present invention, the article to be coated is positioned at a distance required to achieve at least a 10% reduction in the thermal conductivity of the applied coating.

Abstract: Method and preparation for the photochromic labeling and/or for protecting the authenticity of objects, in which bacteriorhodopsin materials and preparations therefrom are used for application to the objects; preference is given to using a combination of low-level and high-level security features in said bacteriorhodopsin materials and preparations therefrom.

Abstract: An improved decorated metal slot machine token produced by coating a metal base with a sublimative dye receptive coating, then infusing sublimative decorative dye into the coating under heat and pressure.