Abstract: An optical device includes a light modulation device disposed on an optical axis of incident light, and a holding section configured to hold the light modulation device. The holding section includes an inflow part to which a liquid supplied from an outside of the holding section inflows, a flow channel forming part disposed along a circumferential edge of the light modulation device so as to have an annular shape, and having a flow channel through which the liquid flowed from the inflow part circulates, and an outflow part from which the liquid having flowed through the flow channel outflows to the outside of the holding section.

Abstract: A technique which, in forming a resist pattern on a wafer, can achieve high resolution and high in-plane uniformity of pattern line width. After forming a resist film on a wafer W and subsequently performing pattern exposure by means of a pattern exposure apparatus, the entire pattern exposure area is exposed by using a flood exposure apparatus. During the flood exposure, the exposure amount is adjusted depending on the exposure position on the wafer based on information on the in-plane distribution of the line width of a resist pattern, previously obtained from an inspection apparatus. Methods for adjusting the exposure amount include a method which adjusts the exposure amount while moving a strip-shaped irradiation area corresponding to the diameter of the wafer, a method which involves intermittently moving an irradiation area, corresponding to a shot area in the preceding pattern exposure, to adjust the exposure amount for each chip.

Abstract: A device for treating a disc-shaped substrate is disclosed, comprising a support which has a support face for the disc-shaped substrate and a support adapter which can be coupled to the support and can support a mask used for treating the disc-shaped substrate, wherein an interface is provided which detects the coupling of the support adapter to the support and wherein a control system is provided which cooperates with the interface and detects whether the support adapter is coupled to the support, in particular whether the interface is occupied. A support adapter for use in a device of this type is further disclosed.

Abstract: Disclosed embodiments provide a heat dissipation controlling method and an apparatus thereof for a laser projection equipment. The method includes: obtaining an ambient temperature and a compensating value of a rotating speed of a fan when a laser projection equipment is currently powered on; determining a first rotating speed value of the fan of the laser projection equipment according to the ambient temperature and first preset rotating speed information; and determining an initial rotating speed value of the fan for the current power on according to the first rotating speed value and the compensating value; taking the initial rotating speed value as a current rotating speed value; and controlling operation of the fan using the current rotating speed value to dissipate heat from the laser projection equipment. The embodiments of the present disclosure can enable promptly satisfying the demand for heat dissipation when the laser projection equipment is powered on.

Abstract: A board 2 for a projector includes a movable arm 5 for moving a projector 1 to a use position in front of a projection board 3 and to a storage position above the projection board and a cam mechanism 6 for elevating the movable arm 5 while swinging it. By elevation of the movable arm 5 by the cam mechanism 6, when the projector is positioned at the storage position, a body portion of the projector is positioned above an upper edge portion of the projection board, while when the projector is positioned at the use position, the body portion is positioned below the upper edge portion of the projection board. Even a projector with a short focal distance can be moved to the storage position and to the use position.

Abstract: The present invention provides a detection apparatus which detects a position of a mark on a substrate, the apparatus comprising an image capturing unit having an image sensor configured to capture an image of the mark, and a processor configured to control the image capturing unit such that second image capturing is performed after first image capturing is performed, and determine the position of the mark based on an image obtained by the second image capturing, wherein the processor controls the first image capturing such that an accumulation period of charges in the image sensor becomes shorter than that in the second image capturing, and determines an image capturing condition of the second image capturing based on an output of the image sensor in the first image capturing.

Abstract: Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for facilitating alignment of replacement optical elements so that the amount of time in a system including the optical elements can be reduced. Also disclosed are methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system and/or misalignment of the optical elements. Information pertaining to an extent of damage to optical elements in the optical system can be used to optimally schedule maintenance events for the optical system.

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Abstract: A lithographic apparatus including a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus has a first sensor apparatus including a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.

Abstract: The invention discloses an oscillating lens module and a projector. The oscillating lens module includes a frame, a first coil, a lens, and a second coil. The first coil and the second coil are connected to the frame and located in a magnetic field, wherein the first coil and the second coil are adapted to be electrified and to oscillate about a first axis and a second axis respectively via the magnetic field. The lens is connected to the first coil, wherein the lens is adapted to oscillate along with the first coil. An oscillation phase of the second coil is opposite to an oscillation phase of the first coil, such that forces applied on the frame by the first coil and the second coil are counterbalanced, so as to prevent the oscillating lens module from over vibrating which makes projection images shake and makes noise.

Abstract: A lithographic apparatus applies a pattern onto a substrate using an optical projection system. The apparatus includes an optical level sensor and an associated processor for obtaining a height map of the substrate surface prior to applying the pattern. A controller uses the height map to control focusing with respect to the projection system when applying the pattern. The processor is further arranged to use information relating to processing previously applied to the substrate to define at least first and second regions of the substrate and to vary the manner in which the measurement signals are used to control the focusing, between the first and second regions. For example, an algorithm to calculate height values from optical measurement signals can be varied according to differences in known structure and/or materials. Measurements from certain regions can be selectively excluded from calculation of the height map and/or from use in the focusing.

Abstract: A projector includes: a first processor that controls the projector; a second processor that controls the light source; and a storage unit that stores parameters for the second processor to control the light source. The second processor starts to control the light source based on the parameters stored in the storage unit when activated. When the parameters are changed, the first processor stores the changed parameters in the storage unit.

Abstract: The inventive subject matter provides an apparatus for reproducibly fabricating hydrogel-based organ and tumor models inside multi-well plates. For example, tumor models made using the inventive apparatus can be used for studying the progression of cancer, cancer diagnostics, and therapeutic screening. A mold controls the thickness of each hydrogel layer. A photomask controls the size and shape of each hydrogel layer, allowing the hydrogel diameter to be smaller than the diameter of each well so that liquid media can be exchanged around both the sides and top of the hydrogels. A holder aligns the photomask with the multi-well plate, and polymerization is initiated by a light source.

Abstract: A display device for a motor vehicle includes: a projection module for generating an image for a projection in a direction of gaze of a user of the display device along an optical path; a reflection and/or display element; a support element for the reflection and/or display element; and a holding element, comprising a protruding part relative to the reflection and/or display element. The reflection and/or display element is held between the support element and the holding element and in a fixed position relative to the support element.

Abstract: A projection display device includes a plurality of reflective liquid crystal panels, a plurality of polarizers, and a combining optical system. The combining optical system includes a first incident surface to which first color light emitted from a first reflective liquid crystal panel and reflected by a combining surface of the combining optical system is incident and a second incident surface to which second color light emitted from a second reflective liquid crystal panel and passing through the combining surface is incident. The polarizes include a first polarizer, which reflects the first color light to the first incident surface, and a second polarizer which reflects the second color light to the second incident surface. An alignment direction of the liquid crystal of the first reflective liquid crystal panel is orthogonal to an alignment direction of the liquid crystal of the second reflective liquid crystal panel.

Abstract: Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.

Abstract: A vehicle puddle lamp assembly is provided that includes a plurality of light projectors located on a vehicle and configured to illuminate different lighted image patterns on a ground surface adjacent to the vehicle. The vehicle puddle lamp assembly includes a controller for sequentially activating the plurality of light projectors to generate an animated lighted image on the ground surface. The animated image moves in a location based on a door position.

Abstract: A reflective sample, such as a mask, is imaged in an optics system. A radiation source emits a light beam with relatively low coherence. A first focusing element focuses the beam before a mirror reflects the focused beam towards the sample at an incidence angle of between 2 and 25° A pinhole aperture plate upstream of the sample has a first aperture to focus and cut-off the beam diameter to form a more monochromatic beam. The sample is displaced by a mechanism in a direction perpendicular to the normal vector of the sample surface while it reflects the light beam. The reflected beam passes a second aperture in the pinhole aperture plate next to the first aperture on its way to a pixel detector. The second aperture limits the diameter of the reflected beam, thereby adjusting the diameter of the light beam before it reaches the pixel detector.

Abstract: Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.

Abstract: The image projection apparatus includes a light modulator configured to perform modulation of light based on an image signal, a projection optical system configured to project the light modulated by the light modulator, an illumination optical system configured to illuminate multiple divided illumination areas of the light modulator, multiple light source units provided corresponding to the divided illumination areas, a light source controller configured to control light quantities of the respective light source units so as to change illuminances of the divided illumination areas independently, and a light detector configured to detect a non-projection light component that is not projected through the projection optical system. The light source controller is configured to control the light quantities of the respective light source units depending on the image signal and a detection result of the non-projection light component by the light detector.