Abstract: An illumination system for EUV projection lithography has a beam shaping optical unit for generating an EUV collective output beam from an EUV raw beam of a synchrotron-radiation-based light source. An output coupling optical unit serves for generating a plurality of EUV individual output beams from the EUV collective output beam. In each case a beam guiding optical unit serves for guiding the respective EUV individual output beam toward an object field in which a lithography mask is arrangable. The result is an illumination system with which EUV light of a synchrotron-radiation-based light source is guided to the greatest possible extent without losses and at the same time flexibly.

Abstract: According to the present invention there is provided a light assembly, comprising, at least one laser source which is operable to emit a laser beam, and a component for reducing speckle, wherein the component for reducing speckle comprises a block, comprising at least first, second and third surface, and a means for beam splitting, and wherein the first and second reflective means and means for beam splitting are arranged to define an optical path for the second portion of the laser beam whose length is equal to, or greater than, a coherence length of the laser beam which is emitted from the at least one laser source.

Abstract: A wafer-level liquid-crystal-on-silicon (LCOS) projection assembly includes a LCOS display for spatially modulating light incident on the LCOS display and a polarizing beam-separating (PBS) layer for directing light to and from the LCOS display. A method for fabricating a LCOS projection system includes disposing a PBS wafer above an active-matrix wafer. The active-matrix wafer includes a plurality of active matrices for addressing liquid crystal display pixels. The method, further includes disposing a lens wafer above the PBS wafer. The lens wafer includes a plurality of lenses. Additionally, a method for fabricating a wafer-level polarizing beam includes bonding a PBS wafer and at least one other wafer to form a stacked wafer. The PBS wafer includes a PBS layer that contains a plurality of PBS film bands.

Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

Abstract: A projector that projects an image based on image data, includes alight source, a modulation unit that modulates light which is emitted from the light source, a light attenuation rate setting unit that sets a light attenuation rate based on the image data, and a light adjustment unit that adjusts intensity of incident light of the modulation unit, according to the light attenuation rate which is set by the light attenuation rate setting unit. The light attenuation rate setting unit sets a minimum value of an adjustment range of the light adjustment unit in a case where the image data is stereoscopic image data to a higher value than a minimum value of an adjustment range of the light adjustment unit in a case where the image data is not stereoscopic image data.

Abstract: According to one embodiment, a value of a film thickness of a processing object disposed above a substrate is obtained. Then, a wavelength that provides a highest degree of intensity of signal light reflected when the signal light is incident onto the processing object having the value of the film thickness, based on wavelength selection reference information is selected. Then, a first instruction performing an alignment process to the substrate by use of signal light having a wavelength thus selected is generated. The wavelength selection reference information is information that includes a correlation between values of the film thickness of the processing object and degrees of intensity of the signal light, with respect to a plurality of wavelengths.

Abstract: Provided is an image projection apparatus including: one or more light sources; one or more illumination optical systems; a first reflection-type light valve group including three light valves and being configured to modulate incident light based on first image information; a second reflection-type light valve group including three light valves and being configured to modulate incident light based on second image information; a first prism-type photosynthesizing member having a function of synthesizing, on one optical axis, light that is reflected by the first reflection-type light valve group; a second prism-type photosynthesizing member having a function of synthesizing, on one optical axis, light that is reflected by the second reflection-type light valve group; and a prism-type beam splitter configured to synthesize, on one optical axis, light that has been reflected by the first reflection-type light valve group and light that has been reflected by the second reflection-type light valve group.

Abstract: A mask data generation method includes obtaining data of a pattern including a plurality of pattern elements, dividing a region of the pattern into a plurality of sections so that each pattern element is arranged in each section by using the obtained data of the pattern and generating map data including information indicative of presence or absence of the pattern element in each section, setting one piece of mask individual information out of a plurality pieces of mask individual information for each section including the pattern element by using a constraint condition, which inhibits setting of same mask individual information in a constraint region including one section and surrounding sections thereof, and the map data, and generating the data of the plurality of masks corresponding to the plurality pieces of mask individual information by using the set mask individual information.

Abstract: The invention provides a projection apparatus and an illumination system. The projection apparatus includes an illumination system, a light valve, and a projection lens. The illumination system includes at least one laser light source, at least one light separating element, a wavelength conversion element, and a reflective element. The at least one laser light source is adapted to generate at least one laser beam, and the at least one laser beam is adapted to penetrate at least one first coating region of the light separating element. The wavelength conversion element is adapted to convert the laser beam from the light separating element into a converted beam. A second coating region of a reflective surface of the reflective element is adapted to reflect a portion of the laser beam from the wavelength conversion element, and the second coating region and the first coating region are adapted to reflect the converted beam. The portion of the laser beam and the converted beam constitute an illumination beam.

Abstract: An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units configured to emit light independently of each other, so as to form a strip-like irradiation area; a rotation mechanism configured to rotate the substrate relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to make the exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.

Abstract: An image projection apparatus includes a light source, an image generation unit configured to receive light from the light source and generate an image based on the received light, a projection optical system unit configured to project the image generated by the image generation unit, a heat dissipation unit configured to dissipate heat of the image generation unit, and a movable member configured such that a position of the movable member is movable relative to the projection optical system unit, wherein the image generation unit and the heat dissipation unit are mounted on the movable member.

Abstract: An exposure apparatus exposes a substrate with illumination light via an optical system. A detection system supported in a measurement station detects a mark of the substrate. A stage disposed below the optical system and the detection system holds the substrate with a holder. A carrier system has a first support member supporting the substrate in a noncontact manner and carries the substrate to a loading position in the measurement station. A second support member supports the substrate supported by the first support member, from a rear surface side of the substrate and is vertically movable independently from the first support member. A drive device relatively moves the first support member, the second support member and the holder at least in a vertical direction, at the loading position where the stage is placed. The substrate is carried from the carrier system to the holder via the first support member.

Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.

Abstract: The present application discloses an ultraviolet (UV) mask device and a method for using the UV mask device. The UV mask device includes: a platform, configured for carrying a substrate thereon; a mask substrate, configured above the platform for fixing a mask corresponding to the substrate on the platform; and a light source array, configured above the mask substrate by a first distance and including a plurality of UV light-emitting diodes (UV LEDs) emitting light having a first single central wavelength.

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Abstract: A virtual reality support device includes a hanging main body, a circuit board module and a battery module. The hanging main body has an internal space. A receiving space is defined by an outline of the hanging main body, and the receiving space allows the hanging main body to be hung onto a human body. The circuit board module is received within the internal space, and the circuit board module is provided with an electric connecting port for electrically connecting to a display device. The battery module is received within the internal space, and electrically connected to the circuit board module.

Abstract: An exposure apparatus includes a carrying device and a UV light generation device that irradiate a transparent substrate positioned on the carrying device. The carrying device includes a base, a linear electric machine, an exposure table, and a pneumatic lift device that is arranged between the exposure table and the base and supports the exposure table on the base. A stator of the linear electric machine is fixed to the base, and a rotor of the linear electric machine is fixedly coupled to the exposure table. The linear electric machine drives the exposure table to move relative to the base. A method for exposure of a transparent substrate is also provided. The linear electric machine only needs to drive the movement of the exposure table thereby helping increase exposure speed and exposure accuracy. The pneumatic lift device provides an additional function of cushioning.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.

Abstract: An initialization method including estimating a characteristic of a property of an object based on a plurality of measurements by the sensor of the property using a respective plurality of different measurement parameters, different ones of the measurements using different measurement parameters, the characteristic including a combination of respective outcomes of respective ones of the measurements weighted by a respective weighting coefficient; performing, for each of a plurality of models of the object, each model configured to enable respective simulation of the performing of the measurements, a respective simulation, the respective simulation including simulating the measurements under control of a respective plurality of different simulation parameters to obtain a respective plurality of simulated characteristics of the property, the different simulation parameters being indicative of the different measurement parameters; determining, for each of the models, a respective bias representative of a respect