Abstract: A projector and an illumination system thereof are provided. The illumination system includes an excitation light source group, a phosphor wheel, a light combiner element and a first lens group. The excitation light source group provides a first beam and has a first optical axis. The phosphor wheel has a reflection region and a wavelength conversion region. The light combiner element is disposed between the excitation light source group and the phosphor wheel and has a dichroic portion and a reflection portion. The first lens group is disposed between the light combiner element and the phosphor wheel. The first lens group has a second optical axis. The illumination system is provided in the projector to reduce the number of optical elements, thereby reducing the cost and volume.

Abstract: The disclosed systems and methods emphasize driving LEDs in series and in parallel with the same LED driver chip and a single inductor. For creating overlap, the systems and methods of LED color overlap disclosed herein take advantage of the fact that green and blue LEDs have the same voltage. Thus, green and blue LEDs can be driven in parallel as needed. LED suppliers can screen parts for sufficiently close voltage matching between green and blue LEDs. This is especially true when using green LED die based on a blue die with a green phosphor. Cyan may be produced by driving a green LED and a blue LED in parallel. White may produced by driving a green LED and a blue LED in parallel and a red LED in series with this green and blue parallel pair.

Abstract: A radiation source, e.g. for EUV for use in a lithographic apparatus, generates radiation by illuminating droplets of fuel with first radiation to form a plasma and collects second radiation omitted by the plasma using a collector (CO). The collector has an aperture and the fuel passes along a vertical trajectory through that aperture before being irradiated by the first radiation. In an embodiment the first radiation is directed along a beam, the final part of which is coincident with the final part of the trajectory of the fuel droplets. In an embodiment a gas flow is arranged coincident with the fuel trajectory and/or the beam of first radiation.

Abstract: A projector that projects an image includes a communication section that sends a projection request command that requests another projector connected to the projector to project a test image, an imaging section that captures an image of the test image projected in response to the projection request command by the another projector, and a layout recognition section that recognizes a relative layout relationship between the projector and the another projector based on the image captured by the imaging section.

Abstract: An illuminator includes a light source that emits light containing a predetermined polarized light component, an optical element that transmits the light emitted from the light source, a polarization separation element on which the light having passed through the optical element is incident and which performs polarization separation on the incident light, and a temperature adjuster that adjusts the temperature of the optical element.

Abstract: A sample analysis system includes a scanning electron microscope, an optical and/or eBeam inspection system, and an optical metrology system. The system further includes at least one controller. The controller is configured to receive a first plurality of selected regions of interest of the sample; generate a first critical dimension uniformity map based on a first inspection performed by the scanning electron microscope at the first selected regions of interest; determine a second plurality of selected regions of interest based on the first critical dimension uniformity map; generate a second critical dimension uniformity map based on a second inspection performed by the optical and/or eBeam inspection system at the second selected regions of interest; and determine one or more process tool control parameters based on inspection results and on overlay measurements performed on the sample by the optical metrology system.

Abstract: A position measurement system configured to measure a position of an object. The system includes an optical system to obtain a first measurement wave and a second measurement wave from a radiation source, and to allow the first and second measurement wave to at least partially interfere with each other after interaction of at least one of the first and second measurement wave with the object to form a first detection beam. The system further includes a first detector to receive the first detection beam. The system also has a processing unit configured to receive an output from the first detector and to determine a signal representative for the position of the object from the output, wherein the optical system includes a phase modulator configured to modulate a phase difference between the first measurement wave and the second measurement wave.

Abstract: An illumination device includes: a plurality of light-emitting elements; a collimating optical system; a first multi-lens array including a plurality of first lenses; a second multi-lens array including a plurality of second lenses; and a superimposing lens. The plurality of second lenses are arranged respectively corresponding to the plurality of first lenses. The plurality of first lenses form a plurality of first lens columns. A width, in a first direction, of one second lens of the plurality of second lenses has a distribution in a second direction, where the first direction is a direction in which the plurality of first lens columns are arranged and the second direction is a direction orthogonal to the first direction.

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure.

Abstract: A pattern projector has a housing and a projection device disposed in the housing. The housing has a base and a cover. The cover is disposed on the base and has a connecting portion connected to the base, a convex portion, and a datum plane. The convex portion protrudes out of a front surface of the connecting portion, and has an outer lens disposed on the convex portion. The datum plane is defined between the connecting portion and the convex portion. A maximum height is defined from an inner surface of the convex portion to the datum plane. A maximum inner diameter of the convex portion is defined on the datum plane. The maximum inner diameter is three times to eleven times as long as the maximum height. A pattern projected by the projection device will not be distorted.

Abstract: A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

Abstract: Provided is a video-image-projecting-function-equipping lighting device having favorable usability for a user. The lighting device has: a lighting unit for emitting illumination light; a projection type video image display unit for projecting a video image; and also a structure of suspending the lighting device from a ceiling surface so as to make its horizontality adjustable, and the projection type video image display unit displays an image for guiding the adjustment of the horizontality.

Abstract: Polarizing beam splitters and systems incorporating such beam splitters are described. More specifically, polarizing beam splitters and systems with such beam splitters that incorporate multilayer optical films and reflect imaged light towards a viewer or viewing screen with high effective resolution are described.

Abstract: An electronic device casing can be used in a projector and includes a first casing member and a second casing member. The first casing member includes a first side wall. The first casing member and the second casing member are engaged with each other to form an internal accommodating space. The second casing member includes a second side wall. The first side wall and the second side wall are oppositely disposed to form a narrow passage therebetween. The internal accommodating space is connected to an external space of the electronic device casing through the narrow passage. The narrow passage has a non-straight traveling path. Furthermore, the electronic device can includes an air flow bypass passage near the narrow passage.

Abstract: A lithography apparatus is provided. The lithography apparatus a reticle having a first surface and a second surface facing each other, and a pattern region formed on the first surface, a reticle stage facing the second surface of the reticle, the reticle stage to chuck the reticle, a protection conductor within a chamber housing the reticle and the reticle stage; and a power source to supply a voltage to the protection conductor.

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

Abstract: A scanning image display device is provided that can display high-quality images even with variation in environmental conditions at a place where the device is installed. The scanning image display device includes: a laser light source that emits laser light based on image information; a scanning mirror that scans the laser light emitted from the laser light source to project an image on a projection plane; a housing that holds the laser light source and the scanning mirror; and a container formed of a base and an outer cover that accommodates the housing and is internally sealed, wherein the outer cover has a thin-wall portion that is elastically deformed with variation in pressure within the container.

Abstract: A multi-projection screening system may include a projection apparatus projecting an image, a plurality of projection surfaces onto which the image is projected, a polymer dispersed liquid crystal (PDLC) panel disposed in some of the plurality of projection surfaces, and a server controlling the PDLC panel. A method of controlling a PDLC panel may include the steps of checking whether an image is projected onto the PDLC panel and controlling a color displayed on the PDLC panel. A multi-projection screening method may include the steps of projecting an image onto a projection surface disposed in the front of a theater, checking whether an image is projected onto a PDLC panel, and controlling a color displayed on the PDLC panel. In accordance with embodiments of the present invention, a totally uniform image can be provided, and a sense of difference between front and side projection images can be prevented from occurring.

Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.