Patents Examined by Susan W. Berman
  • Patent number: 8463099
    Abstract: The present invention relates to a resin composition for an optical material comprising (A) a carboxylic acid-modified phenoxy resin, (B) a polymerizable compound and (C) a polymerization initiator, a resin film for an optical material comprising the above resin composition and an optical waveguide having a core part and/or a cladding layer formed by using the same. Provided are a resin composition for an optical material which is excellent in a heat resistance and a transparency and which is soluble in an alkaline aqueous solution, a resin film for an optical material comprising the above resin composition and an optical waveguide produced by using the same.
    Type: Grant
    Filed: February 8, 2008
    Date of Patent: June 11, 2013
    Assignee: Hitachi Chemical Company
    Inventors: Tatsuya Makino, Atsushi Takahashi, Masatoshi Yamaguchi, Toshihiko Takasaki, Tomoaki Shibata, Masami Ochiai
  • Patent number: 8399535
    Abstract: Certain embodiments described herein are directed to polymer compositions including a protected antioxidant. In some examples, the compositions can also include a deprotected antioxidant, an unprotected antioxidant or both. Methods of producing compositions including a protected antioxidant and articles including a protected antioxidant are also described.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: March 19, 2013
    Assignee: Zimmer, Inc.
    Inventor: Dirk Pletcher
  • Patent number: 8389591
    Abstract: A coating composition includes a UV curable film forming resin; a thixotropic and/or pseudoplastic anti-settling agent selected from at least one of an amine salt of a synthetic wax, a microcrystalline cellulose compound (MCC), a urea urethane, or a urethane enzymatically modified starch; a mar/scratch resistant additive selected from at least one of a mineral abrasive, glass particles, and ceramic particles; and water.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: March 5, 2013
    Assignee: Valspar Sourcing, Inc.
    Inventor: James Madison Bohannon
  • Patent number: 8377516
    Abstract: This invention relates to a radiation-curable ink-jet ink having a viscosity of 30 mPas or less at 25° C., the ink comprising: at least two monofunctional (meth)acrylate monomers which comprise a cyclic monofunctional (meth)acrylate monomer and 2-(2-ethoxyethoxy)ethyl acrylate; a monofunctional monomer selected from an N-vinyl amide, an N-acryloyl amine or a mixture thereof; a multifunctional (meth)acrylate monomer; a polymerisable (meth)acrylate oligomer; a radical photoinitiator; and a colouring agent. The ink is preferably used in reel-to-reel printing and in printing where the substrates are stacked.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: February 19, 2013
    Assignee: Sericol Limited
    Inventors: Gareth Pratt, Nigel Gould
  • Patent number: 8367045
    Abstract: A method of preparing colored UV-curable artificial nail gel compositions comprising dispersing a pigment in an organic liquid to form a pigment concentrate and mixing the pigment concentrate with a polyfunctional acrylic monomer and/or a polyfunctional acrylic oligomer, and the resultant highly colored artificial nail gel are disclosed.
    Type: Grant
    Filed: September 14, 2011
    Date of Patent: February 5, 2013
    Assignee: Mycone Dental Supply Co., Inc.
    Inventors: Robert R. Raney, Kevin M. Sheran, Larry W. Steffier, Gary Iannece
  • Patent number: 8361605
    Abstract: A photosensitive resin composition which is effective in avoiding troubles in the step of plating with various metals in printed wiring board production, such as under-film metal deposition and film peeling, and which forms a wiring-protecting film excellent in adhesion, flexibility, insulation reliability, and heat resistance. The photosensitive resin composition comprises (A) a carboxylated polymer, (B) a compound having at least two photopolymerizable unsaturated double bonds, (C) a photopolymerization initiator, and (D) a nitrogen compound represented by a specific feature.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: January 29, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
  • Patent number: 8357731
    Abstract: A one-package type tooth surface coating material that is capable of forming, on the surface of a tooth, a cured film having not only a very high strength of adhesion to the tooth surface but also excellent properties such as long-term adhesion, long-term durability, dentinal tubule occlusion and aesthetic appearance, and that has excellent storage stability and can be stored in the form of one package. The one-package type tooth surface coating material includes (A) a polymerizable monomer component containing not less than 5% by mass of an acidic group-containing polymerizable monomer; (B) polyvalent metal ions; (C) a volatile water-soluble organic solvent; (D) water; and (E) an effective amount of a photopolymerization initiator; the amount of the polyvalent metal ions (B) and the amount of the volatile water-soluble organic solvent (C) satisfying a specific relationship.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: January 22, 2013
    Assignee: Tokuyama Dental Corporation
    Inventors: Koji Matsushige, Qian Cui, Mikio Kimura
  • Patent number: 8354049
    Abstract: An antibacterial measure using titanium oxide includes mixing titanium oxide in a resin to form a coating resin, and then coating a key surface with the coating resin. This method requires formation of a coating layer on a resin molding and thus increases the number of the production steps and cost. Furthermore, in the method, a coating film containing an antibacterial agent is scraped off light by little at each time of keying, and thus the film is finally completely removed to lose its antibacterial function. A conceivable measure against this includes directly mixing a resin and an antibacterial agent. However, titanium oxide used as an antibacterial agent degrades a raw material resin. It has recently be thought that photocatalytic apatite as a substitute for titanium oxide also causes chalking, and an antibacterial coating layer has been formed on a surface of a resin molding.
    Type: Grant
    Filed: May 19, 2010
    Date of Patent: January 15, 2013
    Assignee: Fujitsu Limited
    Inventors: Masato Wakamura, Noriyasu Aso
  • Patent number: 8353582
    Abstract: An ultraviolet curable inkjet recording ink of the present invention includes at least a colorant, a light-curable compound, a photopolymerization initiator, and at least one fluorine surfactant represented by the following formulae (1) or (2) as a surface tension regulator: where Rf is selected from CH2CF3 and CH2CF2CF3; n represents a value of 5 to 20; and each R1 represents a functional group capable of initiating an ultraviolet curing reaction and one of the two R1s in (1) may be hydrogen; where Rf is selected from CH2CF3 and CH2CF2CF3; l represents a value of 1 to 20; k and m each represent a value of 1 to 8; each R2 represents a functional group capable of initiating an ultraviolet curing reaction and one of the two R2s in (2) may be hydrogen; and R3 is selected from hydrogen and methyl.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: January 15, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Hisashi Habashi, Michihiko Namba, Kiyofumi Nagal
  • Patent number: 8349538
    Abstract: The present invention relates to a photo-curable and thermo-curable resin composition and a dry film solder resist making it possible to provide the dry film solder resist having superior heat-resistance and dimensional stability while exhibiting improved alkali developing properties. The resin composition may comprise an acid-modified oligomer having carboxyl group (—COOH) and photo-curable functional group; a photo-polymerizable monomer comprising a compound having a structure that three or more functional epoxy-acrylate groups are bonded to a heterocyclic structure containing nitrogen, and a functional group having carboxyl group is bonded to at least one epoxy-acrylate group; a thermo-curable binder having thermo-curable functional group; and a photo-initiator.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: January 8, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Woo-Jae Jeong, Byung-Ju Choi, Bo-Yun Choi, Kwang-Joo Lee, Min-Su Jeong
  • Patent number: 8343597
    Abstract: The present invention relates to a photoreactive norbornene polymer comprising a photoreactive norbornene monomer, a process for preparing the same, and an alignment layer using the same. The photoreactive norbornene polymer includes a photoreactive functional group having a halogen, in particular, a fluorine substituent group so that it gives a compositional gradient in the alignment layer to improve an orientation rate, an orientation, and an adhesion property.
    Type: Grant
    Filed: January 12, 2010
    Date of Patent: January 1, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Woo Yoo, Sung-Ho Chun, Dai-Seung Choi, Young-Chul Won
  • Patent number: 8344039
    Abstract: There is provided a photo-curable composition that shows the suppression of a residual film formation and a high adhesion thereof to a substrate in a process for forming a three-dimensional pattern by a photo-imprinting method. A photo-curable composition for forming a three-dimensional pattern by a photo-imprinting method, comprises a monomer having a photopolymerizable group; an inorganic fine particle to which a dispersant is added; and a photopolymerization initiator. It is preferred that the inorganic fine particle (e.g., silica) has an average particle diameter of 1 to 1,000 nm, and the dispersant is a silane coupling agent, particularly a silane coupling agent containing an organic group having a carbon-carbon unsaturated bond or an organic group having an epoxy group.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: January 1, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Makoto Hanabata
  • Patent number: 8343710
    Abstract: Provided is a method that provides both spatial and temporal control of a polymer degradation process using mono- and multifunctional macromolecular monomers (“macromers”) that degrade via single- and multi-photon photolysis mechanisms over a broad range of wavelengths. The macromers can form or be incorporated into networks via covalent, non-covalent and/or ionic interactions. The spatial and temporal degradation of these networks can be controlled. More specifically, provided is a photodegradable macromer, comprising: (a) a photodegradable group; (b) a backbone structure comprising one or more repeating units that may be the same or different, which backbone structure is attached to the photodegradable group directly or through a linker; (c) one or more reactive end groups at one or more ends of the macromer; and optionally, (d) one or more therapeutic agents; and optionally (e) one or more caged groups.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: January 1, 2013
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventors: Kristi S. Anseth, Andrea M. Kasko
  • Patent number: 8337965
    Abstract: A sealant for a one drop fill process of the invention contains the following components (1), (2), (3), and (4): (1) a curing agent composed of a reaction product produced by reacting an acid compound and a polyamine containing, within its molecule, at least one active hydrogen and at least two nitrogen atoms; (2) a heat-curable resin; (3) an acylphosphine-based photoinitiator; and (4) a photo-curable resin. A heat-curable resin containing a bisphenol A propylene oxide-modified epoxy resin is preferably used as the heat-curable resin (2), and a photo-curable resin containing a bisphenol A acrylate-modified resin is preferably used as the photo-curable resin (4).
    Type: Grant
    Filed: January 5, 2010
    Date of Patent: December 25, 2012
    Assignee: Adeka Corporation
    Inventors: Kazuyuki Itano, Hiroya Fukunga, Hirokatsu Shinano, Rieko Hamada, Takahiro Otsuka
  • Patent number: 8338499
    Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator characterized in that said co-initiator is represented by Formula I, wherein MA is the residue of a mono- or oligofunctional Michael acceptor; L is a divalent linking group positioning the two tertiary amines in a 1-3 to 1-10 position, with the proviso that both amines are aliphatic; R1, R2 and R3 independently represent an optionally substituted alkyl group, an optionally substituted alkenyl group , an optionally substituted alkynyl group or an optionally substituted (hetero) alkaryl group; any two of R1, R2 and R3 may represent the necessary atoms to form a ring; any two of R1, R2 and R3 may represent the necessary atoms to form a ring with any of the atoms of the linking group L; n is an integer ranging from 1 to 6.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: December 25, 2012
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Roland Claes, Jaymes Van Luppen
  • Patent number: 8334025
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: December 18, 2012
    Assignee: 3D Systems, Inc.
    Inventors: John Wai Fong, Richard N. Leyden, Laurence Messe, Ranjana C. Patel, Carole Chapelat
  • Patent number: 8334092
    Abstract: The present invention relates to a photo-sensitive resin composition having superior heat-resistant and mechanical property, and a protective film for printed circuit board, and particularly provides a photo-sensitive resin composition including an acid-modified oligomer, a photo-polymerizable monomer, a photo-initiator, an epoxy resin, and a butadiene-modified epoxy resin including epoxy group and at least one double bond in the main chain, and a protective film for printed circuit board prepared by using the composition.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: December 18, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Bo-Yun Choi, Byung-Ju Choi, Woo-Jae Jeong, Kwang-Joo Lee, Min-Su Jeong
  • Patent number: 8333831
    Abstract: The invention relates to a dispersion of antimony or indium doped tinoxide nanoparticles in an organic solvent, comprising a) 5-75 wt % of nanoparticles having a mean average size between 1 and 100 nm. b) a solvent comprising a hydroxyl group and an ether group. c) a water content of less then 15 wt %. d) a dispersant content of less then 0.1 wt %. The invention also relates to a method of making such a dispersion, by I. Making a mixture of an aqueous dispersion of antimony or indium doped tinoxide particles having an average size between 1 and 100 nm, a solvent comprising a hydroxyl group and an ether group, which forms an azeotrope with water, and a grafting compound. II. Heating the mixture under stirring at a temperature between 20 and 150° C. III. At least partially removing the solvent/water mixture. IV. Optionally adding more solvent. V. Repeating steps III and IV till the water content of the obtained dispersion is less then a desired value and the concentration solid is between 5 and 70 wt %.
    Type: Grant
    Filed: October 9, 2008
    Date of Patent: December 18, 2012
    Assignee: Chemip B.V.
    Inventors: Roelof van de Belt, Edwin Currie
  • Patent number: 8329771
    Abstract: The object of the present invention is to provide a photobase generator capable of efficiently generating amines (tertiary amines and amidine) high in catalytic activity by sensing light with a wavelength of from 350 to 500 nm (especially, from 400 to 500 nm). The present invention is a photobase generator characterized in being represented by general formula (1) or (2). Y+ is a quaternary ammonio group of general formula (3) to (5), and X? is a counter anion selected from among a borate anion, a phenolate anion, and a carboxylate anion.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: December 11, 2012
    Assignee: San-Apro Limited
    Inventors: Atsushi Shiraishi, Hideki Kimura
  • Patent number: 8318830
    Abstract: The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: November 27, 2012
    Assignee: BASF SE
    Inventors: Rachel Kohli Steck, Caroline Lordelot, Thomas Vogel, Gisele Baudin, Paul Brown, Kurt Dietliker, Rinaldo Huesler, Tunja Jung, Peter Simmendinger, Katia Studer, Antoine Carroy