Abstract: The present invention provides a one-component dental adhesive composition which can exhibit excellent adhesion to both materials of a dental ceramics and an organic composite containing an inorganic compound, and is excellent in can-stability. More particularly, the present invention provides a one-component dental adhesive composition comprising 1 to 60 parts by weight of (a) a silane coupling agent, 1.0 to 20.0 parts by weight based on 100 parts by weight of the (a) component of (b) an acidic group-containing polymerizable monomer, and 28 to 99 parts by weight of (c) a volatile organic solvent.
Abstract: An ink set for inkjet recording is provided that includes at least a colored liquid comprising at least a radically polymerizable compound, a photopolymerization initiator, and a colorant and an undercoat liquid comprising at least a radically polymerizable compound and a photopolymerization initiator, the undercoat liquid comprising a sensitizer represented by Formula (I) below. In Formula (I) above, X denotes O, S, or NR, n denotes 0 or 1, R denotes a hydrogen atom, an alkyl group, or an acyl group, and R1, R2, R3, R4, R5, R6, R7, and R8 independently denote a hydrogen atom or a monovalent substituent. There is also provided an inkjet recording method employing the ink set for inkjet recording, the method including a step of applying the undercoat liquid on top of a recording medium, a step of semi-curing the undercoat liquid, and a step of carrying out image formation by discharging the colored liquid on top of the semi-cured undercoat liquid.
Abstract: A carboxyl resin according to the present invention is obtained by a process including following steps: epoxy groups on a resin (a) having two or more epoxy groups in one molecule is made to react with 0.3-0.85 mol of a monocarboxylic acid (b) per one epoxy-group equivalent weight to obtain a reaction product (c); the epoxy group or groups on the reaction product (c) are made to react with 0.15-0.95 mol of a polybasic acid (d) per one epoxy-group equivalent weight to obtain a reaction product (e); and the epoxy group or groups on the reaction product (e) are further made to react with 1.0-5.0 mol of a monocarboxylic acid (f) per one epoxy-group equivalent weight. The carboxyl resin thus obtained has an acid value within a range from 20 to 200 mgKOH/g and is soluble in an organic solvent.
Abstract: The present invention relates to oxonium salts having [(Ro)3O]+ cations and sulfonium salts having [(Ro)3S]+ cations, where Ro denotes straight-chain or branched alkyl groups having 1-8 C atoms or phenyl which is unsubstituted or substituted by Ro, ORo, N(Ro)2, CN or halogen, and anions selected from the group of [PFx(CyF2y+1?xHz)6?x]? anions, where 2?x?5, 1?y?8 and 0?z?2y+1, or anions selected from the group of [BFn(CN)4?n]? anions, where n=0, 1, 2 or 3, or anions selected from the group of [(Rf1SO2)2N]? anions or anions selected from the group of [BFWRf24?w]? anions, to processes for the preparation thereof, and to the use thereof, in particular for the preparation of ionic liquids.
Type:
Grant
Filed:
October 20, 2010
Date of Patent:
April 3, 2012
Assignee:
Merck Patent Gesellschaft Mit Beschrankter Haftung
Inventors:
Nikolai (Mykola) Ignatyev, German Bissky, Helge Willner
Abstract: To provide a composition useful for forming a heat conductive sheet that satisfies both high heat conductivity and sufficient softness, has sufficient cohesive strength at a surface portion of a heat conductive sheet and does not cause remaining paste and breakage of an electronic appliance when the sheet is peeled. The composition comprises (A) a photo polymerizable component consisting of a (meth)acryl type monomer or its partial polymer; (B) a heat conductive filler; (C) a photo reaction initiator for initiating the polymerization of the photo polymerizable component; and (D) a photo absorber for absorbing and removing a predetermined wavelength band from electromagnetic rays used for the polymerization of the photo polymerizable component.
Abstract: The present invention is further directed to a method of producing a particulate composite of silica and elastomer comprising the steps of dispersing a diene based elastomer in a hydrophobic liquid to form an elastomer dispersion; mixing the elastomer dispersion with an aqueous solution of an alkali metal silicate to form a mixture; adding a precipitating agent to the mixture to precipitate a porous silica onto the dispersed elastomer to form a particulate composite of silica and elastomer comprising a porous silica shell at least partially surrounding a core of diene based elastomer; and optionally adding a separating agent to remove the hydrophobic liquid from the particulate composite.
Abstract: A radiation crosslinked (50 kGy), pressure-treated UHMWPE material has been developed by applying compressive force on a crosslinked polymer in a direction orthogonal to an axial direction. The deformed material is then cooled while held in a deformed state. The resulting material is anisotropic, with enhanced strength oriented along the axial direction. The directionally engineered material is oxidatively stable even after four weeks of accelerated aging in a pressure vessel containing five atmospheres of oxygen (ASTM F2003). Because of its oxidative stability, the deformation processed material is a suitable candidate for air-permeable packaging and gas sterilization, which has thus far been reserved for remelted highly crosslinked UHMWPEs.
Type:
Grant
Filed:
August 3, 2010
Date of Patent:
March 20, 2012
Assignee:
Biomet Manufacturing Corp.
Inventors:
David W. Schroeder, Jordan H. Freedman, James E. Gunter, Brian D. Salyer, H. Gene Hawkins
Abstract: The present invention relates to the use of a R—N2+ diazonium salt carrying an aromatic group R, for grafting of the aromatic group onto insulating, semiconductor, binary or ternary compound or composite material surfaces, the diazonium salt being present at a concentration close to its solubility limit, notably at a concentration higher than 0.05 M, and preferably varying between approximately 0.5 M to approximately 4 M.
Abstract: To provide a photocurable composition with which a fine pattern molded product on which a fine pattern of a mold is highly precisely transferred can efficiently be produced. A photocurable composition comprising 100 parts by mass of a photocurable monomer (A), from 5 to 60 parts by mass of a colloidal silica (B) (solid content) having an average particle size of at most 200 nm, and from 0.1 to 10 parts by mass of a photopolymerization initiator (C), wherein the photocurable monomer (A) comprises a multifunctional monomer (A1) having at least 3(meth)acryloyloxy groups in one molecule and a bifunctional monomer (A2) having two (meth)acryloyloxy groups in one molecule, at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%.
Abstract: A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification.
Abstract: Adamantane derivatives are provided including a phenolic hydroxyl group-containing adamantane derivative, a glycidyloxy group-containing adamantane derivative, and an adamantyl group-containing epoxy modified acrylate, which exhibit excellent transparency, light resistance, and heat resistance properties. Also provided are resin compositions containing the adamantane derivatives. Further provided are corresponding methods for producing the adamantane derivatives, as well as the resin compositions containing the same.
Type:
Grant
Filed:
November 21, 2007
Date of Patent:
February 7, 2012
Assignee:
Idemitsu Kosan Co., Ltd.
Inventors:
Katsuki Ito, Yasunari Okada, Hideki Yamane, Akio Kojima
Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator, characterized in that said co-initiator is a oligomer or polymer having a repeating unit, said repeating unit comprising at least two tertiary amines, and said polymer being prepared by the polycondensation of di- or oligofunctional Michael acceptors with mono- or oligofunctional aliphatic primary amines or with di- or oligofunctional aliphatic secondary amines or with a mixture thereof.
Abstract: An antireflective coating composition includes a photopolymerizable acrylate monomer (C1); a particle-type metal fluoride (C2) with a refractive index of 1.40 or less; a photopolymerization initiator (C3); and at least one liquid dispersion-enhancing chelating agent (C4) selected from the group consisting of Mg(CF3COO)2, Na(CF3COO), K(CF3COO), Ca(CF3COO)2, Mg(CF2COCHCOCF3)2 and Na(CF2COCHCOCF3). This composition ensures good mechanical strength, excellent adhesion to a substrate, short curing time by UV curing, prevention of dust attachment, good erasure of stain, good dust removal and good scratch resistance, so it is usefully for making an antireflective coating film of a display.
Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a filler that comprises particles having an average diameter of less than 100 nm. The functional groups of the components may include meth(acrylic) and the composition has a viscosity of about 50-500 cps at ambient temperature. Further, the concentration of the mono-functional monomer may be at least 30% by weight elative to the total weight of the composition and the concentration of the di-functional oligomer may be at least 20% by weight elative to the total weight of the composition.
Abstract: Various apparatuses, arrangements, and methods are provided for creating various structures including microstructures. In one embodiment, a method for creating a microstructure is provided comprising packing a plurality of particles into a micromold, and then applying energy to the particles in the micromold. As a result of the application of energy, a microstructure is formed in the micromold out of the particles. Thereafter, the microstructure is removed from the micromold.
Type:
Grant
Filed:
April 30, 2007
Date of Patent:
January 24, 2012
Assignee:
Georgia Tech Research Corporation
Inventors:
Jung-hwan Park, Mark G. Allen, Mark R. Prausnitz
Abstract: Crosslinkable polymers and crosslinked fluoropolymers are prepared from selected fluorinated dienes and monomers containing Br and I. Also disclosed are proton conductive membranes of these crosslinked fluoropolymers.
Abstract: The invention provides a coating composition comprising a thermal plastic resin selected from the group consisting of a polycycloolefin resin, polyester resin, polyacrylate resin, and a mixture thereof; and a radiation curable resin comprising a radiation polymer containing at least one mono- or multi-functional acrylic acid based monomer as a polymerization unit, an oligomer containing an ethylenically unsaturated functional group, and a photoinitiator, wherein the radiation curable resin is used in an amount of 220-1000% by weight on the basis of the weight of the thermal plastic resin. The invention improves the hardness of the coating composition, prevent the coated substrate from being scratched or impaired, and impart the substrate with high transparency without causing warping problem.
Abstract: A polyolefin-based resin composition of the invention has an addition polymerization-based block copolymer (I) and a polyolefin-based resin (II). The addition polymerization-based block copolymer (I) is selected from block copolymers comprising at least one polymer block A and at least one polymer block B, and the hydrogenated products thereof. The polymer block A comprises an aromatic vinyl compound unit comprising at least 1% by mass of an alkylstyrene-derived structural unit (a), in which at least one alkyl group having 1 to 8 carbon atoms is bound to a benzene ring. The polymer block B comprises a conjugated diene compound unit. A moiety of polymer block A can undergo crosslinking upon exposure to an active energy ray. After being molded into a desired shape, the composition is exposed to an active energy ray to carry out the crosslinking reaction. The composition exhibits flexibility, heat resistance, mechanical properties and solvent resistance in a well-balanced manner.
Abstract: Provided is an electrode patterning layer used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. The electrode patterning layer is prepared by irradiating a layer comprising a polyamic acid having repeating units at the formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape: wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.
Abstract: The subject of the invention is a process for producing polyamide, copolyamide, polyolefin, copolyester amide or fluorocarbon resin powder particles on to the surface of which has been grafted at least one functionalized grafting monomer, characterized in that it comprises: a) a step of blending the polyamide or copolyamide powder particles with the functionalized grafting monomer; followed by b) a step of irradiating the powder impregnated with functionalized grafting monomer resulting from a) with photons (?-radiation) or electrons (?-radiation), with a dose ranging from 0.5 to 15 Mrad. The invention also relates to the particles grafted in this way and to the compositions containing such particles.
Type:
Grant
Filed:
April 30, 2010
Date of Patent:
October 18, 2011
Assignee:
Arkema France
Inventors:
Karine Loyen, Herve Ster, Holger Senff, Thomas Fine