Abstract: A method of applying a coating to a stent supported by a mandrel is disclosed.

Abstract: Various embodiments of methods and devices for coating stents are described herein. Among these embodiments are methods of manufacturing an implantable medical device by purifying a polymer with a fluid capable of swelling the polymer, and subsequently coating a device with the purified polymer or fabricating a device from the purified polymer. A preferred polymer is poly(vinylidene fluoride-co-hexafluoropropylene).

Abstract: A method for the vapor deposition of aluminum films is provided. Such method employs a dialkyl amido dihydroaluminum compound of the formula [H2AlNR1R2]n wherein R1 and R2 are the same or different alkyl groups having 1 to 3 carbons, and n is an integer of 2 or 3. The aluminum films may be thick or thin and may be aluminum films or may be mixed metal films with aluminum metal. Both CVD and ALD methods may be employed.

Abstract: A process for producing a thin film and an optical member which are free from discoloration of a lens and exhibit a good antistatic property and a good water repellency. The thin film is formed by a vacuum deposition of a water repellent solution which contains (a) a water repellent having a perfluoroalkyl group, (b) a mixture of a silane coupling agent, a modified silicone oil introduced with an organic group into its side chain and/or both terminal ends, and a perfluoroether compound, and (c) at least one conductive substance selected from the group consisting of fullerenes, carbon nanotubes and graphite compounds.

Abstract: An implantable device composed of a biocompatible material having an enhanced surface topography that has an implanted calcium ion concentration and method of making the same.

Abstract: The invention relates to a method for applying paints or varnishes with the aid of an application device in order to apply a color design on surfaces of buildings or public or civil engineering works in accordance with a previously executed implementation of a digital image model in a previously recorded digital surface object that represents the surface of the object. According to the invention, the application device moves on the surface of the object while contacting the surface thereof, the position of the application device is continuously measured or calculated using motion sensors and paint is applied in accordance with said implementation depending on the position thus determined.

Abstract: One embodiment thermal chemical vapor deposition method includes exposing a substrate within a chamber to first and second deposition precursors effective to thermally chemical vapor deposit a material on the substrate, and exhausting unreacted first and second deposition precursors from the chamber through a vacuum pump via a first exhaust line comprising a filter. A reactive gas is flowed to the material on the substrate, with the reactive gas being reactive with the material. After flowing the reactive gas, an inert purge gas is flowed through the chamber and through the vacuum pump. The flowing of the inert purge gas to the vacuum pump is through a second exhaust line not comprising the filter. The exposing, the flowing of the reactive gas, and the flowing of the inert purge gas are repeated effective to deposit material of desired thickness on the substrate.

Abstract: This invention relates to a process for the functionalization of a transparent or translucent substrate by formation of a layer, characterized in that it comprises the stages consisting in evaporating over the substrate at least one type of organic or organometallic functionalization molecule, simultaneously with the formation, by plasma-enhanced chemical vapour deposition, of an inorganic glass matrix forming part of the layer; a substrate made according to this process; a device for the implementation of this process; and the applications of this substrate.

Abstract: The apparatus and method use an optical feedback system to align a transducer with a stent strut. Once alignment is achieved, the transducer causes a coating to be ejected onto the stent strut and the transducer is moved along the stent strut to coat the stent strut.

Abstract: Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precursor and/or a metal halide of said metal oxide, the deposition being enhanced by a plasma source.

Abstract: A coating film removal method for a coated member having a coating film formed over the surface of a substrate is disclosed, which can easily achieve a coating film removal, even for a carbon-based coating film containing carbon as a main component, besides a carbon-based coating film containing a metal element etc. A coated member regeneration method is also disclosed, which removes a coating film from a coated member, and then forms a new coating film over the member, to regenerate the coated member. The coating film removal method is adapted to remove a carbon-based coating film from a coated member (10) including a substrate, and the carbon-based coating film coated on at least a portion of a surface of the substrate while containing carbon as a main component.

Abstract: A thin film formation method is used for forming a thin film by providing a conductance valve on an exhaust path connecting a depressurizable processing chamber and a vacuum pump, arranging a processing object substrate inside the processing chamber, performing once or plural times a cycle including a first step of supplying a first reactive gas and a second step of supplying a second reactive gas into the processing chamber during a film formation processing period to cause a chemical reaction between the first reactive gas and the second reactive gas, and using the chemical reaction to form the thin film on the substrate.

Abstract: A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises forming a nanoscale roughened surface on the microscale roughened surface. The method further comprises the act of depositing discrete nanoparticles on the nanoscale roughened surface though a one-step process of exposing the roughened surface to a solution including the nanoparticles. The nanoparticles comprise a material having a property that promotes osseointegration.

Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.

Abstract: The invention relates to a method and apparatus for applying and forming a coating on a substrate surface by the application of at least one atomized coating forming material onto the substrate to form the coating. The atomized coating forming material, upon leaving a suitable atomizer which can be an ultrasonic nozzle or nebulizer for example, passes through an exciting medium and, upon leaving the exciting medium, passes to the substrate. The substrate is positioned remotely from the exciting medium.

Abstract: A method for forming a coating over a surface is disclosed. The method comprises depositing over a surface, a hybrid layer comprising a mixture of a polymeric material and a non-polymeric material. The hybrid layer may have a single phase or comprise multiple phases. The hybrid layer is formed by chemical vapor deposition using a single source of precursor material. The chemical vapor deposition process may be plasma-enhanced and may be performed using a reactant gas. The precursor material may be an organo-silicon compound, such as a siloxane. The hybrid layer may comprise various types of polymeric materials, such as silicone polymers, and various types of non-polymeric materials, such as silicon oxides. By varying the reaction conditions, the wt % ratio of polymeric material to non-polymeric material may be adjusted. The hybrid layer may have various characteristics suitable for use with organic light-emitting devices, such as optical transparency, impermeability, and/or flexibility.

Abstract: A manufacturing method for a flat panel display device includes forming a barrier layer on a flexible plastic substrate by RF sputtering, forming an amorphous silicon layer on the plastic substrate, and subjecting the amorphous silicon layer to a rapid heat treatment so as to thereby improve electrical characteristics and/or homogeneity of the amorphous silicon layer.

Abstract: An insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas containing a silane family gas, a second process gas containing a nitriding gas or oxynitriding gas, a third process gas containing a boron-containing gas, and a fourth process gas containing a carbon hydride gas. A first step performs supply of the first process gas and a preceding gas, which is one of the third and fourth process gases, while stopping supply of the second process gas and a succeeding gas, which is the other of the third and fourth process gases. A second step performs supply of the succeeding gas, while stopping supply of the second process gas and the preceding gas. A third step performs supply of the second process gas while stopping supply of the first process gas.

Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.

Abstract: A method for forming a modified TaC or TaCN film that may be utilized as a barrier film for Cu metallization. The method includes disposing a substrate in a process chamber of a plasma enhanced atomic layer deposition (PEALD) system configured to perform a PEALD process, depositing a TaC or TaCN film on the substrate using the PEALD process, and modifying the deposited TaC or TaCN film by exposing the deposited TaC or TaCN film to plasma excited hydrogen or atomic hydrogen or a combination thereof in order to remove carbon from at least the plasma exposed portion of the deposited TaCN film. The method further includes forming a metal film on the modified TaCN film, where the modified TaCN film provides stronger adhesion to the metal film than the deposited TaCN film. According to one embodiment, a TaCN film is deposited from alternating exposures of TAIMATA and plasma excited hydrogen.