Abstract: The present invention provides a laser cladding nozzle apparatus, where the laser cladding nozzle apparatus is mounted on a laser head, and the laser cladding nozzle apparatus includes a conical nozzle head, where the conical nozzle head is connected to an inner side of the laser head; the conical nozzle head includes a plurality of first powder channels, a plurality of first inlets is evenly distributed on an upper end circumference of the conical nozzle head, a plurality of first outlets is evenly distributed on a lower end circumference of the conical nozzle head, the first inlet is in communication with the first outlet through the first powder channel, and a size and a quantity of the first inlet are the same as those of the first outlet. The present invention further provides a puncturing method for a laser cladding nozzle apparatus.

Abstract: This document relates to adhesive application devices and methods for applying an adhesive on a shoe during manufacturing.

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.

Abstract: The present disclosure discloses a fixing apparatus for fixing a substrate to be processed below a bearing base during an evaporation process, the substrate to be processed includes a base substrate, a ferromagnetic material is formed on a front surface or a back surface of the base substrate, and a magnetic field generator is disposed on a back surface of the bearing base at a location corresponding to the ferromagnetic material; the magnetic field generator is configured to generate a magnetic field so that the ferromagnetic material and the magnetic field generator are approaching to each other under an effect of the magnetic field generated by the magnetic field generator to fix a front surface of the bearing base with the back surface of the base substrate. An evaporation method is further disclosed.

Abstract: The present disclosure relates to a semiconductor processing apparatus. The processing chamber includes a chamber body and lid defining an interior volume, a substrate support disposed in the interior volume and a showerhead assembly disposed between the lid and the substrate support. The showerhead assembly includes a faceplate configured to deliver a process gas to a processing region defined between the showerhead assembly and the substrate support and an underplate positioned above the faceplate, defining a first plenum between the lid and the underplate, the having multiple zones, wherein each zone has a plurality of openings that are configured to pass an amount of inert gas from the first plenum into a second plenum defined between the faceplate and the underplate, in fluid communication with the plurality of openings of each zone such that the inert gas mixes with the process gas before exiting the showerhead assembly.

Abstract: An applicator for applying adhesive to a moving web has a housing with an interior chamber, an inlet and a discharge port. The inlet and discharge port are in fluid communication with the interior chamber. A rotor is disposed within the interior chamber of the housing. The rotor has a body and a nonlinear channel extending about at least a portion of the body. The nonlinear channel is selectively positionable for fluid communication with the inlet and the discharge port of the housing such that adhesive flowing into the housing through the inlet flows through and is directed by the nonlinear channel to the discharge port in the housing. The rotor is rotatable relative to the housing to change the position of the nonlinear channel relative to the discharge port and thereby change the location from which adhesive flows from the discharge port.

Abstract: According to various embodiments, a wafer chuck may include at least one support region configured to support a wafer in a receiving area; a central cavity surrounded by the at least one support region configured to support the wafer only along an outer perimeter; and a boundary structure surrounding the receiving area configured to retain the wafer in the receiving area.

Abstract: A rubber fixing apparatus and a coater are provided. The rubber fixing apparatus includes: a storing device, in which a cavity configured to receive at least one rubber and an outlet communicated with the cavity are provided; and a fixing structure provided on the storing device and outside the cavity. The rubber is moved from the cavity through the outlet in a first direction and is fixed to the fixing structure.

Abstract: A system for delivering and applying a flowable mixture to an article (311-313) is disclosed. The system includes a mixture delivery system (200) and a skinning system (300). The mixture delivery system (200) includes a mixer (220) configured to mix a dry material and a fluid to produce the flowable mixture, and a pump (235) configured to pump the flowable mixture to a delivery line. The skinning system (300) receives the flowable mixture from the mixture delivery system (200) through the delivery line. The skinning system (300) includes a skinning pipe (310) configured to apply the flowable mixture to the article (311-313) and a manifold (305) that supports the skinning pipe (310). The skinning system (300) also includes an article feeding mechanism (315) configured to push the article (311-313) into the skinning pipe (310). The skinning system (300) includes a transfer system (320) configured to hold the article (311-313) and move the article (311-313) out of the skinning pipe (310).

Abstract: Embodiments described herein relate to a thermal chamber utilized in the processing of display substrates. The thermal chamber may be part of a larger processing system configured to manufacture OLED devices. The thermal chamber may be configured to heat and cool masks and/or substrates utilized in deposition processes in the processing system. The thermal chamber may include a chamber body defining a volume sized to receive one or more cassettes containing a plurality of masks and/or substrates. Heaters coupled to the chamber body within the volume may be configured to controllably heat masks and/or substrates prior to deposition processes and cool the masks and/or substrates after deposition processes.

Abstract: Disclosed is a substrate processing system that includes a substrate processing apparatus configured to perform a predetermined processing on a substrate accommodated in a processing container. The substrate processing system includes: a processing execution unit configured to execute a film deposition processing on the substrate; a characteristic acquiring unit configured to acquire the characteristic of the film deposited on the substrate by the film deposition processing; and an abnormality determination unit configured to determine whether the characteristic of the film includes an abnormal value based on the characteristic of the film acquired by the characteristic acquiring unit.

Abstract: A method and a dense phase powder pump for conveying coating powder from a first powder reservoir to a second downstream powder reservoir or to a downstream powder spray-coating gun or the like installation for spraying coating powder are disclosed. In order to reduce the number of components of the dense phase powder pump that require maintenance, the dense phase powder pump is designed as a single-chamber dense phase powder pump and has only a single powder conveyor chamber for conveying coating powder.

Abstract: An embodiment includes a support unit, substrate treating apparatus and substrate treating method. The substrate treating apparatus comprises: a process chamber having a treatment space inside thereof; a support unit for supporting a substrate inside of the process chamber; and a gas supply unit for supplying the treatment gas into the treatment space, wherein the support unit comprises: an electrode layer of a metal material to which a high frequency electric power can be applied; a ground line having one end connected to the electrode layer and the other end grounded; and a switch provided on the ground line.

Abstract: A single axis application unit for processing a glass workpiece includes a workpiece supporting table, an applicator movable on a traveler shiftable along a first linear axis and a central suction unit that is activateable to grip the glass workpiece that travels along a second linear axis oriented generally perpendicular to the first linear axis. A central suction unit brake selectively secures the central suction unit both rotationally and translationally. The central suction unit is freely moveable both translationally and rotationally when the central suction unit brake is released. A mid-peripheral suction unit is located at a fixed location remote from the central suction unit and selectively activateable to grip the glass workpiece to hold the glass workpiece in a fixed orientation. A corner suction gripper is movable with the applicator parallel to the first linear axis, and is selectively activateable to grip the glass workpiece.

Abstract: The invention relates to the technical field of display, particularly a pressurized spray deposition device and method for an organic material steam. The pressurized spray deposition device comprises an uniform-pressure mixing chamber, an organic material steam source, a high-pressure carrier gas feeding device, a piezoelectric pressurizing device and a nozzle, wherein the organic material steam source and the high-pressure carrier gas feeding device are respectively connected with the uniform-pressure mixing chamber, and an outlet of the uniform-pressure mixing chamber is connected with the nozzle through the piezoelectric pressurizing device. The organic material steam in the organic material steam source enters the uniform-pressure mixing chamber and is mixed with the introduced carrier gas to form a carried gas mixture.

Abstract: An apparatus for coating a donor surface that is movable relative to the apparatus with a layer of metallic particles or particles having a metal-like appearance and reflectivity, the particles adhering more strongly to the surface than to one another. The apparatus comprises an application device to apply to the donor surface a fluid stream within which the particles are suspended, a housing surrounds the application device forming an interior plenum for confining the fluid stream, the housing prevents egress of particles from a sealing gap defined between the rim of the housing and the surface to be coated, and a suction source connected to the housing to extract from the plenum excess fluid and particles. In operation, the suction source extracts substantially all particles that are not in direct contact with the donor surface, leaving substantially a single particle layer adhering to the donor surface upon exiting the apparatus.

Abstract: Multiple processes for preparing porous articles are described. The porous articles can be in a wide array of shapes and configurations. The methods include providing a soluble material in particulate form and forming a packed region from the material. The methods also include contacting a flowable polymeric material with the packed region such that the polymeric material is disposed in voids in the packed region. The polymeric material is then at least partially solidified. The soluble material is then removed such as by solvent washing to thereby produce desired porous articles. Also described are systems for performing the various processes.

Abstract: A nozzle unit 22 is attached to a mounting portion 15 of a coating apparatus 10 through a support portion 21. The nozzle unit 22 can move along an arc-shaped guide portion 29 provided on the support portion 21. The guide portion 29 maintains a tip of a nozzle 31 at a center position of the arc shape and supports the nozzle unit 22 such that the nozzle unit 22 can move along the arc shape.

Abstract: The present invention discloses a heat-resistant glue roll structure with discharge through holes, which comprises a shaft sleeved with a high-temperature resistance insulation layer on the surface thereof. Multiple discharge through holes are formed on the high-temperature resistance insulation layer and communicate the outer and inner surface of the high-temperature resistant insulation layer. A heat-resistant soft glue outer layer is also sleeved on the surface of the high-temperature resistant insulation layer. Since the high-temperature resistant insulation layer is provided with the discharge through holes in the present invention, air bubbles generated both between the high-temperature resistant insulation layer and the heat-resistant soft glue outer layer and between the high-temperature resistant insulation layer and the shaft would be squeezed to move towards the discharge through holes and discharged therefrom.

Abstract: A device and a method for accurately discharging a fixed amount of a liquid, the liquid containing solid particles, in a state that the solid particles are dispersed in the liquid material. The device includes a first reservoir, a first air pressure supply pipe, a metering portion having a metering hole, a plunger moving back and forth in the metering hole, a nozzle, a switching valve having a first position and a second position, a plunger driver, and a switching valve driver. The discharge device further includes a second reservoir, a second air pressure supply pipe, a branch portion provided in an upper portion of the metering hole and having a branch flow path, and an opening/closing mechanism that establishes or cuts off communication between the second reservoir and the metering hole. A discharge method is carried out using the discharge device.