Patents Examined by Yewebdar T Tadesse
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Patent number: 12048940Abstract: Disclosed is an electrostatic coating apparatus including: an atomizing head cleaning flow path which is disposed at a coating machine and through which a cleaning fluid for cleaning a rotary atomizing head and a front end of a feed tube of a cartridge flows; a cleaning fluid flow path connecting a cleaning fluid supply source with the atomizing head cleaning flow path; a cleaning fluid valve disposed in the cleaning fluid flow path and configured to open and close the cleaning fluid flow path; a discharge air flow path connected to the atomizing head cleaning flow path and through which the discharge air flows; a cleaning fluid discharge flow path connected to the cleaning fluid flow path at a connection point located between the atomizing head cleaning flow path and the cleaning fluid valve; a discharge air switching valve disposed in the atomizing head cleaning flow path and configured to open and close the atomizing head cleaning flow path; and a cleaning fluid discharge valve disposed in the cleaning fluType: GrantFiled: April 5, 2021Date of Patent: July 30, 2024Assignee: ABB SCHWEIZ AGInventor: Kuniharu Yamauchi
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Patent number: 12051629Abstract: A semiconductor device manufacturing system includes a spin coater and a coating layer inspector. The spin coater includes: a chuck, a rotation driver configured to rotate the chuck; and a solution dispenser configured to spray a solution onto a portion of the coating layer formed on an edge portion of the wafer, wherein the coating layer inspector includes an edge inspection camera and an inspection controller configured to determine a radius, eccentricity, and a top-view shape of the coating layer, based on images of the edge portion of the wafer.Type: GrantFiled: March 20, 2020Date of Patent: July 30, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Seunghwa Hyun, Younghwan Kim, Hwayoung Park, Youngsu Ryu, Yusang Cheon
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Patent number: 12037673Abstract: A metal mask material for OLED use reduced in amount warpage due to etching, a method for manufacturing the same, and a metal mask are provided. The metal mask material and metal mask of the present invention contain, by mass %, Ni: 35.0 to 37.0% and Co: 0.00 to 0.50%, have a balance of Fe and impurities, have thicknesses of 5.00 ?m or more and 50.00 ?m or less, and have amounts of warpage defined as maximum values in amounts of rise of four corners of a square shaped sample of the metal mask material of 100 mm sides when etching the sample from one surface until the thickness of the sample becomes ? and placing the etched sample on a surface plate of 5.0 mm or less.Type: GrantFiled: September 27, 2019Date of Patent: July 16, 2024Assignee: NIPPON STEEL CHEMICAL & MATERIAL CO., LTD.Inventors: Mitsuharu Yonemura, Naoki Fujimoto, Keita Kimura, Hiroto Unno
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Patent number: 12031211Abstract: A device of executing vacuum processing is provided with: a chamber including a single main chamber executing the vacuum processing and being capable of keeping the chamber as a whole in a depressurized state; a plurality of feeding rollers so arranged as to hang down a plurality of threads in the main chamber with keeping the threads from each other; a plurality of winding bobbins respectively winding the plurality of threads independently, the winding bobbins arranged in the chamber horizontally apart from the plurality of threads vertically hung down; and a plurality of movable arms being respectively movable in the chamber from a first position horizontally apart from the plurality of threads vertically hung down, via a second position in contact with any of the plurality of threads, to a third position to make the threads in contact be in contact with corresponding winding bobbins.Type: GrantFiled: September 15, 2021Date of Patent: July 9, 2024Assignee: IHI CorporationInventors: Akihiko Yoshimura, Hirotsugu Chishina, Naoya Yamamoto, Yukihiro Nakada, Wataru Ueda
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Patent number: 12030327Abstract: A digital printer machine for ceramic products, including at least one conveyor, suitable for transporting the products to be printed along a feed direction, and at least one printing module, positioned along said conveyor and comprising an operating unit with respective print heads provided with nozzles for dispensing at least one printing fluid to be deposited on the surface of the products. The printing module includes a basement provided with a recess (R), underlying the operating unit, wherein the conveyor is inserted to make the products pass under the heads; the basement further comprises two completely flat and free lateral opposite flanks, so that the printing module can be matched to other modules along the conveyor until a complete mutual matching is obtained.Type: GrantFiled: August 12, 2019Date of Patent: July 9, 2024Assignee: Projecta Engineering S.r.L.Inventors: Fabio Tarozzi, Francesco Casoni
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Patent number: 12031660Abstract: A system for use in maintaining a pipe includes a motorized apparatus including a body assembly and at least one maintenance device. The at least one maintenance device includes a sprayer, a heater, and an infrared sensor. The system includes at least one controller configured to apply the at least one coating material to the interior surface of the pipe at a work location using the sprayer, heat the interior surface of the pipe at the work location using the heater to begin a cure of the at least one coating material, generate one or more infrared images of the work location using the infrared sensor while using the heater to cure the at least one coating material, and perform a non-destructive evaluation (NDE) of the work location based on the one or more infrared images.Type: GrantFiled: January 31, 2022Date of Patent: July 9, 2024Assignee: General Electric CompanyInventors: Alexander Kyle Duncan, Todd William Danko, Venkata Vijayaraghava Nalladega
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Patent number: 12025533Abstract: A system for detecting leakage of a liquid supply pipe includes a pipe casing for enclosing an end portion of the liquid supply pipe adjoined to a nozzle and a sensor system configured to detect presence of a liquid leaked from the liquid supply pipe at the end portion. The sensor system is in alignment with the end portion of the liquid supply pipe.Type: GrantFiled: November 23, 2021Date of Patent: July 2, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu Kai Chen, Li-Jen Wu, Chin-Kun Fang, Ko-Bin Kao
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Patent number: 12017248Abstract: A film manufacturing equipment includes a transporting device, a filtering device, a coating device, a baking device and a blowing device. Transporting device is configured to transport a substrate. The filtering device is configured to filter a solution. The coating device is configured to squeeze and coat the filtered solution on the substrate. The baking device is configured to bake the solution coated on the substrate. The blowing device is configured to blow an air to the baked solution.Type: GrantFiled: December 30, 2022Date of Patent: June 25, 2024Assignee: BEYOND MANUFACTURE INC.Inventors: Chun-Hao Luo, Ren-Yu Liao
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Patent number: 12018376Abstract: Process chambers and methods for leveling a motor shaft and substrate support plane are described. The process chamber includes a motor shaft connected to the process chamber with a plurality of motor bolts. A first plurality of sensors is arranged at about the same radial distance from the rotational axis and at different angular positions relative to the rotational axis and a second plurality of sensors are arranged to measure the support plane. An angle-dependent motor leveling profile is determined and shim values for the motor bolts are determined to level the motor shaft. The support plane is measured using the second plurality of sensors to level the support plane perpendicular to the motor shaft.Type: GrantFiled: September 18, 2020Date of Patent: June 25, 2024Assignee: Applied Materials, Inc.Inventors: Ashutosh Agarwal, Tejas Ulavi, Sanjeev Baluja
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Patent number: 12014940Abstract: Disclosed is a substrate treating system and a substrate transporting method. For instance, it is assumed that an indexer block, a first treating block, and a second treating block are arranged in this order. In this case, for transporting a substrate treated in the second treating block to an indexer block, the substrate is necessarily sent through the first treating block without any treatment in the first treating block. However, the first treating block and the second treating block are both connected to the indexer block. Therefore, transportation of the substrate is performable directly from the second treating block to the indexer block without through the first treating block. Therefore, reduction in throughput is suppressible.Type: GrantFiled: July 17, 2020Date of Patent: June 18, 2024Assignee: SCREEN Holdings Co., Ltd.Inventor: Joji Kuwahara
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Patent number: 12005469Abstract: According to the present disclosure, there is provided a coating determining device of a coating head that can prevent coating defect caused by clogging in multiple successive coatings. The coating determining device according to the present disclosure can determine a coating state of the coating head, wherein the coating head having a plurality of nozzles for ejecting paint, the plurality of nozzles being configured to eject the paint out of the nozzles so as to coat a workpiece with the ejected paint while moving in a direction, the coating determining device of the coating head being characterized by comprising: an image acquiring unit for acquiring an image of the coated workpiece; and a determination unit for determining, based on the image acquired by the image acquiring unit, whether coating the workpiece is implemented normally.Type: GrantFiled: June 19, 2022Date of Patent: June 11, 2024Assignee: ABB SCHWEIZ AGInventor: Kisumi Iida
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Patent number: 12006573Abstract: A film layer curing apparatus includes: a support platform, configured to carry a substrate having a film layer on the substrate surface; and a light source component located above the support platform, the light source component including a light source array being arranged toward the support platform and covering the light outgoing surface of the entire film layer by projection of the light source array, the light source array including multiple point light sources evenly distributed on the light outgoing surface, light emitted by the light source array being able to uniformly irradiate the entire film layer so as to improve the thickness distribution uniformity of the film layer after curing.Type: GrantFiled: May 8, 2021Date of Patent: June 11, 2024Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.Inventor: Tiancheng Wu
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Patent number: 12005463Abstract: A material applicator for controlling application of at least one material on a substrate includes a housing and an array plate with an applicator array positioned within the housing. The applicator array has a plurality of micro-applicators and each of the plurality of micro-applicators has an ultrasonic transducer, a material inlet, a reservoir, and a micro-applicator plate with a plurality of apertures. The applicator plate is in mechanical communication with the ultrasonic transducer such that at least one material is ejected through the plurality of apertures as atomized droplets when the ultrasonic transducer vibrates the micro-applicator plate.Type: GrantFiled: January 22, 2021Date of Patent: June 11, 2024Assignee: Ford Motor CompanyInventors: Kevin Ellwood, Mark Nichols, Wanjiao Liu, Christopher Seubert
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Patent number: 11994801Abstract: A semiconductor manufacturing device has an outer cup and inner cup with a wafer suction mount disposed within the outer cup. A photoresist material is applied to a first surface of a semiconductor wafer disposed on the wafer suction mount while rotating at a first speed. A gas port is disposed on the inner cup for dispensing a gas oriented toward a bottom side of the semiconductor wafer. The gas port purges a second surface of the semiconductor wafer with a gas to remove contamination. The second surface of the semiconductor wafer is rinsed while purging with the gas. The gas can be a stable or inert gas, such as nitrogen. The contamination is removed from the second surface of the semiconductor wafer through an outlet between the inner cup and outer cup. The semiconductor wafer rotates at a second greater speed after discontinuing purge with the gas.Type: GrantFiled: May 13, 2021Date of Patent: May 28, 2024Assignee: STATS ChipPAC Pte. Ltd.Inventors: Giwoong Nam, Junghwan Jang, Inhee Hwang, Taekyu Choi, Sanghyun Park
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Patent number: 11992856Abstract: An intermittent valve device includes: an intermittent valve capable of switching between a first state in which a coating material is supplied to a die that applies the coating material onto a material to be coated and a second state in which the supply of the coating material is stopped; and a drive unit that switches the first state and the second state of the intermittent valve. The drive unit includes a cam that rotates in one direction with a circumferential surface of the cam connected to the intermittent valve. The cam includes, on the circumferential surface, a first shape part that places the intermittent valve in the first state, and a second shape part that places the intermittent valve in the second state.Type: GrantFiled: November 29, 2019Date of Patent: May 28, 2024Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Daisuke Tokieda, Yuta Fukutomi, Naoyuki Koide, Yoshinori Sakai
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Patent number: 11986878Abstract: When molding surfaces (50A) of a pair of dies (50) are to be cleaned by air-blowing, air is blown towards the molding surfaces (50A) from blowing nozzles (22A) of a cleaning blowing function portion (22) while a moving body (16) is reciprocatingly moved by driving force of a driving mechanism (18). When a parting agent is to be applied to the molding surfaces (50A) of the pair of dies (50), the mold release agent is jetted out towards the molding surfaces (50A) from spraying nozzles (24A) of a parting agent application function portion (24) while the moving body (16) is reciprocatingly moved by the driving force of the driving mechanism (18). In both of these situations, at the same time as the treatment of the molding surfaces (50A), a cleaning brush (32) reciprocatingly moves together with the moving body (16) and sweeps a device floor surface (12).Type: GrantFiled: April 24, 2019Date of Patent: May 21, 2024Assignees: Sintokogio, Ltd., Toyota Jidosha Kabushiki KaishaInventors: Youhei Noguchi, Koji Sakou, Hirotaka Kurita, Takashi Nagaya, Hirotsune Watanabe, Katsutoshi Okumura
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Patent number: 11982632Abstract: A system and method for coating marine pipeline weld joints and wet inspection of the applied coating is provided. The coating system includes an anti-corrosion coating including a fluorescent pigment to enhance inspection of the applied coating. The system also includes a robotic crawler for traversing inside the pipe and carrying a coating apparatus and inspection apparatus respectively configured to apply the coating on the weld joints and facilitate inspection of the wet coating. The coating apparatus comprises a spraying nozzle provided on a forward end of the robotic crawler and configured to spray coating onto on the surrounding circumferential pipe surface. The inspection apparatus includes an ultraviolet radiation emitter for activating the fluorescent pigment in the coating and a camera for providing a live image feed of the coated weld joint area to an operator computing station for inspection of the applied coating.Type: GrantFiled: May 7, 2021Date of Patent: May 14, 2024Assignee: SAUDI ARABIAN OIL COMPANYInventor: Mana H. Al-Mansour
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Patent number: 11984299Abstract: A deposition device includes a chamber, a support member, a ground member, and a first fixing member. The chamber includes a lower portion and a side wall. The support member is located in a space defined by the lower portion and the side wall of the chamber, and includes a side surface. The ground member is disposed between the support member and the lower portion of the chamber. The first fixing member includes a first body and a first blocking part. The first body is located under a first end portion of the ground member, and includes a side surface. The first blocking part is located on the side surface of the first body and the side surface of the support member, and extends along the side surface of the support member. The first blocking part shields the first end portion of the ground member from view.Type: GrantFiled: May 17, 2021Date of Patent: May 14, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventor: Youngsik Cha
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Patent number: 11978892Abstract: An electrode active material coating device according includes a transfer unit for continuously transferring a substrate in a first direction; a coating die for forming a coated portion by ejecting an electrode active material slurry on the substrate; and a guide unit including a guide portion that moves along the first direction between the coating die and the substrate.Type: GrantFiled: October 22, 2020Date of Patent: May 7, 2024Assignee: LG ENERGY SOLUTION, LTD.Inventors: Dana Kim, Joo Hwan Sung, Sanggu Ji, Younjoong Kim, Huigyun Nam
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Patent number: 11963852Abstract: In a method and device for manufacturing an absorbent material, the degree of freedom in design can be increased by expanding a modifiable distribution pattern of an SAP and broadening the range in which the performance of the absorbent material can be modified. Pulverized pulp is suctioned in a predetermined pattern to form a pulp layer in which the pulp is fiber-laminated. A first distribution opening through which a first distribution device discharges a first SAP and a second distribution opening through which a second distribution opening discharges a second SAP are provided facing the pulp layer, and the first and second SAPs are distributed onto the pulp layer through the first and second distribution openings while moving the pulp layer relative to the first and second distribution openings. The first and second distribution devices can control the discharge amounts of the first SAP and the second SAP, respectively.Type: GrantFiled: October 26, 2018Date of Patent: April 23, 2024Assignee: ZUIKO CORPORATIONInventor: Hitoshi Satou