Abstract: A method and apparatus for manipulating ions using a two-dimensional substantially quadrupole field, and a method of manufacturing and operating an apparatus for manipulating ions using a two-dimensional substantially quadrupole field are described. The field has a quadrupole harmonic with amplitude A2 and a hexapole harmonic with amplitude A3. The amplitude A3 of the hexapole component of the field is selected to improve the performance of the field with respect to ion selection and ion fragmentation.

Abstract: A reciprocating drive system and apparatus for scanning a workpiece through an ion beam are provided, wherein a motor comprising a rotor and stator operable to individually rotate about a first axis is operable to reciprocally translate the workpiece with respect to the ion beam. A shaft rotatably driven by the rotor extends along the first axis, and a scan arm is operably coupled to the shaft, wherein the scan arm is operable to support the workpiece thereon. Cyclical counter rotations of the shaft by the motor are operable to rotate the scan arm, therein scanning the workpiece through the ion beam along a first scan path, wherein the stator acts as a reaction mass to the rotation of the rotor. A controller is further operable to control an electromagnetic force between the rotor and the stator, therein generally determining a rotational position of the rotor and the stator.

Abstract: A Faraday dose and uniformity monitor can include a magnetically suppressed annular Faraday cup surrounding a target wafer. A narrow aperture can reduce discharges within Faraday cup opening. The annular Faraday cup can have a continuous cross section to eliminate discharges due to breaks. A plurality of annular Faraday cups at different radii can independently measure current density to monitor changes in plasma uniformity. The magnetic suppression field can be configured to have a very rapid decrease in field strength with distance to minimize plasma and implant perturbations and can include both radial and azimuthal components, or primarily azimuthal components. The azimuthal field component can be generated by multiple vertically oriented magnets of alternating polarity, or by the use of a magnetic field coil. In addition, dose electronics can provide integration of pulsed current at high voltage, and can convert the integrated charge to a series of light pulses coupled optically to a dose controller.

Abstract: High throughput analytical systems and methods employing multiple liquid phase separation process regions coupled to a common mass spectrometer are provided. Disclosed systems and methods permits parallel separation and parallel storage of discrete eluate fractions, followed by sequential discharge and ionization of previously stored eluate portions to yield a composite ion stream containing the sequential series of eluate portions, followed by mass analysis of the ion stream. A common manifold may receive ions and utilize pressurized gas or ion gating to direct ions within the manifold toward the mass spectrometer inlet.

Abstract: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

Abstract: An electron flood apparatus 1 of the present invention comprises a chamber 22 having a first part 22a made of conductive material and a second part 22b made of insulating material, and extending along a predefined closed curve Ax. A coil 18 is provided outside the first part 22a to generate a magnetic field in a direction intersecting with the surface formed by the predefined closed curve Ax. The coil 18 and the chamber 22 are inductively coupled by the magnetic field. Since the inert gas plasma is generated in the chamber 22 mainly by inductive coupling, electrons contained in the plasma have a low energy. Here, by applying voltage to an electrode 21, electrons having a low energy in the chamber 22 are emitted from an opening 14.

Abstract: In an electron microscope, focus correction is carried out automatically, an astigmatic difference amount is displayed and astigmatism correction is executed quantitatively. Enlarged specimen images obtained by irradiating an electron beam on a specimen while changing excitation currents of an objective lens and of a stigmator coil are picked up by a capturing unit comprised of an optical lens and a capturing device and image sharpness coefficients are calculated by means of an arithmetic logic unit. A suitable astigmatism correction direction is chosen on the basis of an angular component value of the obtained image sharpness coefficients and then, a correction excitation current is supplied to a stigmator coil to correct astigmatism and a correction excitation current is supplied to an objective lens coil to perform focus correction.

Abstract: An inspection method and apparatus includes control of an acceleration voltage of an electron beam, irradiation of the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, and detection of at least one of secondary electrons and reflected electrons emanated from the object in response to the irradiation. An image of the object is obtained from the detected electron by using positional information of the stage and inspection or measurement of the object is conducted using and obtained image. In the detection, an electric field in the vicinity of the object mounted on the stage is controlled so that at least one secondary electrons and the reflected electrons emanated from the object in response to the irradiation of the electron beam are decelerated.

Abstract: A plasma source mass spectrometer (20) having an ion beam extraction electrode (45) associated with a skimmer cone (40) to restrict the pumping of gas from a region (60) immediately behind the skimmer cone orifice (42) to provide a higher pressure (e.g. 1–10?2 Torr) in the region (60) compared to the pressure downstream of the electrode (45) (e.g. 10?3–10?4 Torr). This provides a collisional gas volume (60) for plasma (28) for attenuating polyatomic and multicharged interfering ions prior to extraction of an ion beam (49). In one embodiment a substance (e.g. hydrogen) can be supplied into the region (60) to assist attenuation of polyatomic and multicharged interfering ions by reactive or collisional interactions.

Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

Abstract: An apparatus for separating ions includes providing a FAIMS analyzer region defined by a space between a first electrode surface and a second electrode surface and extending between an ion inlet end and an ion outlet end. An asymmetric waveform is applied to the first electrode surface and a compensation voltage difference is applied between the first and second electrode surfaces. An output signal is provided from a temperature sensor, the output signal relating to a temperature within the FAIMS analyzer region. In dependence upon the output signal, the temperature within the FAIMS analyzer region is controllably affected. The apparatus supports operation of FAIMS at temperatures different from the temperature of other components in a tandem multi-stage system, and supports the stable operation of FAIMS at different temperatures which increases the separation capability of FAIMS.

Abstract: A protective screen includes a front wall (1), connected to a lateral wall (2) running perpendicular or essentially perpendicular to the front wall (1), the walls (1, 2) including transparent panels (8, 10) over at least a part of the height thereof. The upper part (8) of the front wall (1) is inclined forwards, forming an overhang which permits the operator to approach the working region and with two holes (11, 12) to permit the passage of the operator's arms.

Abstract: In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 ?m or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.

Abstract: An electron beam column package comprises a plurality of layers having components, such as lenses, coupled thereto. The layers may be made of LTCC, HTCC or other layer technology.

Abstract: A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV radiation by deceleration of electrons accelerated into an n-type region of the pn-junction. The radiation source can have a low operating voltage, a high switching speed, and provides great design freedom. High intensity can be provided, e.g., by the use of large or multiple sources. The pn-junction can be doped with impurities to increase emission of radiation at a desired frequency and increase the efficiency of the device. For protection, the pn-junction may be covered by a layer of transparent oxide. By reverse biasing the pn-junction with a potential difference at least 4V, radiation of wavelength 300 nm or less can be obtained.

Abstract: A particle beam device, in particular an electron microscope, having at least two particle beam columns and one object slide having a receiving surface for receiving an object. The particle beam device makes it possible to align the surface of the object perpendicular to the beam axes of the particle beam columns, using simple means, in an accurate and error-free manner. The object slide assumes a basic position from which it may be tilted into the position in which the first or the second beam axis is perpendicular or at least almost perpendicular to the receiving surface of the object slide. In the basic position, a normal to the receiving surface of the object slide is spatially oriented such that an angle formed between the first beam axis and the normal is greater than or equal to an angle formed between the second beam axis and the normal.

Abstract: According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

Abstract: The source of electrons is a nanotip in a vacuum as used in near field microscopy. The source of ions is a similar nanotip in vacuum supplied with liquid metal (gallium) as in a liquid-metal ion source. Electrons or ions from this nanometre-sized tip are extracted by centralising the tip over an aperture plate and applying a suitable voltage to the tip. The electrons (ions) pass through this plate and are accelerated up to several keV using a nanoscale/microscale accelerating column before being focussed using further microscale (or nanoscale) cylindrical lenses. The final element is an aberration corrected miniature (or sub-miniature) einzel lens which can focus the beam at several millimetres from the end of the instrument.

Abstract: A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

Abstract: An imaging device having many detector elements is used to construct multiple images of the surface of a specimen in a scanning electron microscope (SEM) using signals from different elements of the imaging device as the specimen is scanned a single time in the SEM.