Abstract: A silicate-based glass composition includes 15-65 wt. % SiO2, 2.5-25 wt. % MgO, 1-30 wt. % P2O5, and 15-50 wt. % CaO, such that the composition has a hydrolytic resistance of glass grains (HGB) of at most 3, when measured by International Organization for Standardization section 719 (ISO 719) and forms a bioactive crystalline phase in a simulated body fluid.

Abstract: A glass substrate comprises: a first surface with surface features having an average width, an average height, a ratio of the average height to the average width of from about 0.04 to about 0.24, and the first surface has a haze value of 3% to 40%. The glass substrate can be transparent to electromagnetic radiation in the visible spectrum. The glass substrate can have a composition of: 61-75 mol. % SiO2; 7-15 mol. % Al2O3; 0-12 mol. % B2O3; 9-21 mol. % Na2O; 0-4 mol. % K2O; 0-7 mol. % MgO; and 0-3 mol. % CaO. The first surface can have an average surface roughness Ra of from 10 nm to 1,000 nm. The first surface can have an average characteristic largest feature size of from 200 nm to 50 ?m. The ratio of the average height to the average width can be from 0.06 to about 0.08.

Abstract: In some embodiments, a method comprises forming a pilot hole or damage track through a laminate glass structure using a laser. The laminate glass structure comprising a first layer and a second layer adjacent to the first layer. The first layer is formed from a first glass composition. The second layer is formed from a second glass composition different from the first glass composition. After forming the pilot hole, the laminate glass structure is exposed to etching conditions that etch the first glass composition at a first etching rate and the second glass composition at a second etching rate, wherein the first etch rate is different from the second etch rate, to form an etched hole.

Abstract: A method for manufacturing a microfluidic device includes depositing a bonding layer on a surface of a second glass layer of a glass substrate having a first glass layer and the second glass layer fused to the first glass layer, such that a masked region of the surface is covered by the bonding layer, and an exposed region of the surface is uncovered by the bonding layer; removing a portion of the second glass layer corresponding to the exposed region of the surface to form a flow channel in the glass substrate; and bonding a cover to the glass substrate with the bonding layer.

Abstract: A method for manufacturing a microfluidic device (100) includes depositing a bonding layer (106) on a surface of a second glass layer (104a) of a glass substrate having a first glass layer (102) and the second glass layer (104a) fused to the first glass layer (102), such that a masked region of the surface is covered by the bonding layer, and an exposed region of the surface is uncovered by the bonding layer; removing a portion of the second glass layer corresponding to the exposed region of the surface to form a flow channel (112) in the glass substrate; and bonding a cover (108) to the glass substrate with the bonding layer (106).

Abstract: A method of forming a glass laminate includes providing a substrate having a core layer and at least one cladding layer; heat treating the substrate at a temperature such that the at least one cladding layer is phase-separated after the heat treating; and etch treating the substrate for at least 10 sec. A phase-separated glass laminate includes a substrate having a core layer and at least one phase-separated cladding layer, such that the glass laminate has a % transmission of at least 96%, and the at least one cladding layer comprises a grain size in a range of 10 nm to 1 ?m, or a graded glass index of greater than 5 nm.

Abstract: A glass article is provided that includes: a glass substrate comprising a thickness and a primary surface; and a textured region defined by the primary surface. The textured region comprises a plurality of sub-surface hillocks, each hillock having a top surface and a base, the base located below the primary surface of the substrate. The plurality of hillocks comprises an average lateral feature size from 0.1 ?m to 3 ?m and an average height from 5 nm to 200 nm. Further, the primary surface of the substrate is substantially planar.

Abstract: An etchant comprises: greater than or equal to 20 wt % and less than or equal to 45 wt % ammonium bifluoride; greater than or equal to 0.25 wt % and less than or equal to 10 wt % of a silicon compound; greater than or equal to 5 wt % and less than or equal to 30 wt % hydrochloric acid; greater than or equal to 25 wt % and less than or equal to 60 wt % water; and greater than or equal to 0.5 wt % and less than or equal to 20 wt % of polyhydric alcohol. The silicon compound comprises silica, silica gel, ammonium hexafluorosilicate, potassium hexafluorosilicate, sodium hexafluorosilicate, magnesium hexafluorosilicate, or a combination thereof.

Abstract: A silicate-based glass composition includes 15-65 wt. % SiO2, 15-50 wt. % CaO, 1-30 wt. % P2O5, and 1-20 wt. % ZrO2, such that the composition has a hydrolytic resistance of glass grains (HGB) of at most 3, when measured by International Organization for Standardization section 719 (ISO 719), and forms a bioactive crystalline phase in simulated body fluid.

Abstract: Apparatus and method for treating a substrate, for example texturing a substrate. In some embodiments, a masking material is applied to a surface of the substrate in a predetermined pattern, the surface thereafter contacted with an etchant that removes the masking material. Contacting the surface with the etchant produces multiple co-located textures. In other embodiments, the masking step can be eliminated, and the etchant is applied in a predetermined pattern to produce multiple co-located textures. In still other embodiments, the substrate has a chemical composition, and the substrate is exposed to a leachant that leaches at least one constituent of the chemical composition to produce a substrate with a varying chemical composition at the substrate surface.

Abstract: A glass-based article with a textured surface exhibiting low haze is provided. The glass-based articles are produced by utilizing a combination of abrasion and etching, where hydrofluoric acid is not utilized. The process for producing the glass-based articles also includes an ion exchange process.

Abstract: A textured glass article includes: a body comprising an aluminosilicate glass comprising greater than or equal to 16 wt % Al2O3, the body having at least a first surface; a plurality of dendritic surface features extending from the first surface, each of the plurality of dendritic surface features comprising a base on the first surface and a surface feature size at the base greater than or equal to 10 ?m and less than or equal to 350 ?m; and a transmittance haze greater than or equal to 50%.

Abstract: An article that includes: a glass-based substrate comprising a thickness, a primary surface and a compressive stress region that extends from the primary surface to a selected depth; and a textured region defined by the primary surface. The textured region comprises a surface roughness (Ra) of at least 10 nm. The article can also comprise a Knoop Scratch Threshold of at least 9 Newtons (N).

Abstract: The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

Abstract: A borosilicate-based composition, including: 50-85 mol. % SiO2, 10-40 mol. % B2O3, >0-5 mol. % SnO2, and >0-20 mol. % of at least one alkali oxide selected from Li2O, Na2O, K2O, Rb2O, and Cs2O, such that the composition has a Young's Modulus less than 64 GPa.

Abstract: A method is described herein of making a textured glass article where the method includes: providing a glass substrate having an initial primary surface and an opposing primary surface; disposing a protective coating on at least one of the initial primary surface or the opposing primary surface; and etching the glass substrate with a hydrofluoric acid-free etchant having a pH of about 7 or less to form a leached layer in the glass substrate.

Abstract: The methods generally include contacting an alkali-containing glass article having a first alkali metal cation with a molten salt bath including from 0.1 wt. % to 3 wt. % nanoparticles and at least one alkali metal salt having a second alkali metal cation that has an atomic radius larger than an atomic radius of the first alkali metal cation. The nanoparticles may include at least one of metalloid oxide nanoparticles and metal oxide nanoparticles. The methods also include maintaining contact of the glass article with the molten salt bath to allow the first alkali metal cations to be exchanged with the second alkali metal cations of the molten salt bath. Further, the methods may include removing the glass article from contact with the molten salt bath to produce a strengthened glass article. A Surface Hydrolytic Resistance titration volume of the strengthened glass article may be less than 1.5 mL.

Abstract: A silicate-based glass composition includes 15-65 wt. % SiO2, 2.5-25 wt. % MgO, 1-30 wt. % P2O5, and 15-50 wt. % CaO. The glass composition may also include 0-5 wt. % F?, and 0-10 wt. % ZrO2. The glass composition may also include one of 0-10 wt. % Al2O3, 0-10 wt. % SrO, and 0-10 wt. % ZnO.

Abstract: The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

Abstract: A glass article is provided that includes: a glass substrate comprising a thickness and a primary surface; and a textured region defined by the primary surface. The textured region comprises a plurality of sub-surface hillocks, each hillock having a top surface and a base, the base located below the primary surface of the substrate. The plurality of hillocks comprises an average lateral feature size from 0.1 ?m to 3 ?m and an average height from 5 nm to 200 nm. Further, the primary surface of the substrate is substantially planar.