Abstract: The present invention herein provides a method for preparing a dispersion of fluorinated nanodiamond particles, which can be used in, for instance, an abrasive, a lubricant, and a heat-exchanging fluid medium, which is stable over a long period of time on the order of not less than 120 hours and which has a viscosity, as determined at 20° C., of not less than 3 cP. This dispersion can be prepared by blending fluorinated nanodiamond particles with a first liquid having a viscosity, as determined at 20° C., of not higher than 2.5 cP to thus form a suspension, classifying the suspension to give a classified suspension, and then blending the classified suspension with a second liquid having a viscosity value, as determined at 20° C., of not less than 4 cP.

Abstract: A fluorine gas generating device 100 which is characterized by having a cylindrical member 31a for circulating therein the main-product gas, a gas feed port 51a for introducing the main-product gas into the cylindrical member 31a, a gas discharge port 52a for discharging the main-product gas from the cylindrical member 31a, an adsorbent holding member 201 arranged in the cylindrical member 31a to form a space to provide a channel for the main-product gas circulated in the cylindrical member 31a, a stirring blade 202 for stirring the main-product gas that is introduced through the gas feed port 51a, and a gas flow guiding cylinder 203 for circulating or diffusing the main-product gas in the space within the cylindrical member 31a.

Abstract: Disclosed is an electrode for electrolytic synthesis of a fluorine compound, including: an electrode substrate having at least a surface thereof formed of a conductive carbon material; a conducting diamond layer formed on a part of the surface of the electrode substrate; and a metal fluoride-containing coating layer formed on an exposed part of the electrode substrate that is uncovered by the conducting diamond layer. It is possible for the electrolytic synthesis electrode to limit the growth of a graphite fluoride layer on the electrode surface, prevent decrease in effective electrolysis area and allow stable electrolysis in an electrolytic bath of a hydrogen fluoride-containing molten salt.

Abstract: Disclosed is a halogen-containing gas supply apparatus for supplying a halogen-containing gas from a container filled with the halogen-containing gas at a high pressure to an external apparatus, the halogen-containing gas supply apparatus including: a supply tube connecting the container and the external apparatus; a supply valve attached to the supply tube to supply the halogen-containing gas from the container; and a shock wave prevention mechanism installed downstream of the supply valve to prevent generation of a shock wave.

Abstract: A fluorine gas generating apparatus includes: a first main passage connected to a first gas chamber and supplying a fluorine gas to an external device; a first conveying device leading out and conveying the fluorine gas from the first gas chamber; a first pressure detector detecting the pressure on the upstream side of the first conveying device; a first pressure regulating valve returning the fluorine gas from the first conveying device to the suction side of the first conveying device; a controller controlling the opening degree of the first pressure regulating valve so that the pressure detected by the first pressure detector becomes a first set value; a start valve provided on the upstream side of the pressure detector; and a differential pressure detector for detecting the pressure difference before and after the start valve in the closed valve state.

Abstract: A direct-touch diaphragm valve according to the present invention includes a valve body having inlet and outlet passages, a valve chamber being in communication with the inlet and outlet passages, a valve seat located around an open inner end of the inlet passage and a diaphragm arranged on the valve seat so as to hermetically seal the valve chamber and open or close the inlet and outlet passages, wherein the valve seat and the diaphragm have respective contact surfaces formed therebetween such that: such that: the contact surface of the valve seat has a surface roughness Ra of 0.1 to 10.0 ?m and a curvature radius Ra of 100 to 1000 mm; and the area ratio Sb/Sa of a contact area Sb of the valve seat with the diaphragm to a gas contact surface area Sa of the diaphragm ranges from 0.2 to 10%.

Abstract: A fluorine gas generating apparatus includes an electrolytic cell where the molten salt is retained and which is separated and divided above the liquid level of the molten salt into a first gas chamber where a product gas mainly containing a fluorine gas generated at an anode immersed in the molten salt is led and a second gas chamber where a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt is led, and a refining device refining the fluorine gas by coagulating with a cooling medium and trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode. The cooling medium for coagulation of the hydrogen fluoride gas in the refining device and discharged is re-used as a utility gas used at spots in the fluorine gas generating apparatus.

Abstract: [Object] To provide a fluorine gas generating system which can stably supply high purity fluorine gas while preventing blockade of a purification apparatus for adsorbing and removing hydrogen fluoride. [Solving means] A fluorine gas generating system characterized by including a purification apparatus 20 for adsorbing and removing hydrogen fluoride vaporized from a molten salt of an electrolysis tank 1 and mixed in fluorine gas generated at an anode 7, in which the purification apparatus 20 includes a cylindrical member through which main-product gas containing fluorine gas generated in the electrolysis tank 1 flows, a temperature regulator for regulating temperature of the cylindrical member, and an adsorbent holder disposed inside the cylindrical member, the adsorbent holder being disposed to form an aperture for securing a flow passage of the main-product gas inside the cylindrical member.

Abstract: A provided emergency stop facility includes an alternative gas supply facility capable of supplying a cooling medium in a refining device as an alternative gas instead of an entrained gas shut-off by closure of an entrained gas shut-off valve with loss of a driving source caused by the emergency stop; an alternative entrained gas shut-off valve switching between supply and shut-off of an alternative gas to a hydrogen fluoride supply passage; and an instrumentation gas supply facility for emergency stop having an instrumentation gas shut-off valve enabling supply of an instrumentation gas by opening with loss of the driving source caused by the emergency stop, wherein at the emergency stop of the fluorine gas generating apparatus, the alternative entrained gas shut-off valve is opened upon receipt of the supply of the instrumentation gas, and the alternative gas is supplied to the hydrogen fluoride supply passage.

Abstract: A fluorine gas generating apparatus generating a fluorine gas by electrolyzing hydrogen fluoride in molten salt, includes: an electrolytic cell including, above a liquid level of molten salt, a first gas chamber into which a product gas mainly containing the fluorine gas generated at an anode immersed in the molten salt and a second gas chamber separated from the first gas chamber into which a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt; a hydrogen fluoride supply source retaining hydrogen fluoride to be replenished in the electrolytic cell; a refining device trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode to refine the fluorine gas; and a recovery facility conveying and recovering the hydrogen fluoride trapped in the refining device in the electrolytic cell or the hydrogen fluoride supply source.

Abstract: A semiconductor production equipment includes a fluorine gas generator, and a detoxification device for combusting a waste gas containing a fluorine-based gas. The fluorine gas generator is configured to electrolyze hydrogen fluoride in an electrolytic bath of a molten salt containing hydrogen fluoride to generate a main product gas whose major component is fluorine gas at an anode side and generate a by-product gas whose major component is hydrogen at a cathode side. The semiconductor production equipment further includes a lead-out line for introducing the by-product gas generated from the fluorine gas generator to the detoxification device. The detoxification device includes a mechanism for using the by-product gas sent to the detoxification device as a combustion agent.

Abstract: A fluorine gas generating device 100 is provided which facilitates the maintenance operation of recovery and replacement of an adsorbing material that adsorbs hydrogen fluoride and supplies fluorine gas in a stable manner. The device comprises a refining line 20 that includes refining devices that, with the aid of adsorbing material, remove hydrogen fluoride gas that has been evaporated from a molten salt of an electrolytic tank 1 and mixed to fluorine gas generated at a positive pole 103a of the electrolytic tank. The refining line 20 comprises a first refining section 21 that includes at least two refining devices arranged in parallel and a second refining section 22 that includes at least two refining devices arranged in parallel and is positioned downstream of the first refining section 21. Fluorine gas that has passed through either one of the refining devices of the first refining section 21 is selectively led to either one of the refining devices of the second refining section.

Abstract: [Task] It is a task to provide a fluorine gas supply system which can stably supply fluorine gas generated by a fluorine gas generation device to a semiconductor processing device in a large quantity and in a precise concentration. [Means for solving task] In the fluorine gas supply system, a mixed gas stored in a buffer tank is introduced into a gas introducing piping before the mixed gas is adjusted in the buffer tank to circulate the mixed gas and a monitoring device is disposed which measures a fluorine gas concentration within the mixed gas so that, in response to the obtained fluorine gas concentration, a flow quantity of inert gas supply source can be adjusted.

Abstract: There is provided a process for producing a fluorinated nanodiamond dispersion liquid, including a purification step of mixing a fluorinated nanodiamond with an alcohol having a carbon number of 4 or fewer, then conducting an ultrasonic treatment to produce a suspension, and subjecting the obtained suspension to a classification treatment by centrifugation to produce a dispersion liquid of fluorinated nanodiamond; a drying step to prepare a dry fluorinated nanodiamond by removing the alcohol from the dispersion liquid of fluorinated nanodiamond that is obtained by the purification step; and a redispersion step to prepare the fluorinated nanodiamond dispersion liquid by mixing the dry fluorinated nanodiamond that is obtained by the drying step, with an aprotic polar solvent and then conducting an ultrasonic treatment.

Abstract: There is disclosed a fluorinated nanodiamond having an oxygen-to-fluorine element ratio (O/F) of 0.06 to 0.20, a fluorinated nanodiamond dispersion in which the fluorinated nanodiamond is dispersed in an alcohol-containing dispersion medium, and a production method of the fluorinated nanodiamond dispersion.

Abstract: The present invention herein provides a method for preparing a dispersion of fluorinated nanodiamond particles, which can be used in, for instance, an abrasive, a lubricant, and a heat-exchanging fluid medium, which is stable over a long period of time on the order of not less than 120 hours and which has a viscosity, as determined at 20° C., of not less than 3 cP. This dispersion can be prepared by blending fluorinated nanodiamond particles with a first liquid having a viscosity, as determined at 20° C., of not higher than 2.5 cP to thus form a suspension, classifying the suspension to give a classified suspension, and then blending the classified suspension with a second liquid having a viscosity value, as determined at 20° C., of not less than 4 cP.

Abstract: A polishing slurry for a chemical mechanical polishing. The polishing slurry includes an aqueous medium. A fluorinated nanodiamond is provided to be contained in the aqueous medium. Additionally, a fluorine-based surfactant is provided also to be contained in the aqueous medium.