Patents by Inventor Akihiro Hosokawa

Akihiro Hosokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10493529
    Abstract: Provided is a hard sintered body which exhibits excellent high temperature oxidation resistance and has a high hardness at a high temperature. In the hard sintered body, a binder phase is contained at from 8.8 to 34.4 mol % and the balance is composed of a hard phase and inevitable impurities. The binder phase contains iron aluminide containing FeAl as a main component and alumina that is dispersed in iron aluminide and has a particle size of 1 ?m or less. The hard phase is composed of at least one kind selected from carbides, nitrides, carbonitrides and borides of Group 4 metals, Group 5 metals and Group 6 metals in the periodic table, and solid solutions of these.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: December 3, 2019
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Koji Shimojima, Ryouichi Furushima, Hiroyuki Hosokawa, Kiyotaka Katou, Akihiro Matsumoto
  • Patent number: 10411802
    Abstract: A receiving-side splitter 4 that constitutes part of an optical communication device 1 splits a receiving-side signal light into a plurality of lights at a splitting ratio according to the intensity distribution of mutually different propagation modes included in the receiving-side signal light passed through a transmission medium 3. A transmission-side splitter 10 splits a transmission-side signal light into a plurality of-lights. A signal processing device 5 detects the light intensity and/or the phase of the receiving-side signal light, and sets a control target value for the light intensity and/or the phase of the transmission-side signal light to a value according to the result of the detection. A modulator 9 adjusts the light intensity or the phase of a the transmission-side signal light so that the light intensity or phase equals the set value. A multiplexer 8 multiplexes the plurality of transmission-side signal lights.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: September 10, 2019
    Assignee: NEC CORPORATION
    Inventors: Akihiro Tanaka, Toshiharu Ito, Kohei Hosokawa, Seigo Takahashi, Manabu Arikawa
  • Patent number: 10313011
    Abstract: It is difficult in a free space optical receiver to satisfy both of the stable receiving and the highly sensitive receiving; therefore, a free space optical receiver according to an exemplary aspect of the present invention includes a light collecting means for collecting laser light having propagated through a free space transmission path; a multimode light generating means for receiving input of the laser light collected by the light collecting means, exciting multimode light, and outputting multimode propagation light including a plurality of propagation mode light beams with a number smaller than a number of multimode light beams possible to be excited; and a mode separating means for separating the multimode propagation light into the plurality of propagation mode light beams and outputting the plurality of propagation mode light beams.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: June 4, 2019
    Assignee: NEC CORPORATION
    Inventors: Seigo Takahashi, Toshiharu Ito, Akihiro Tanaka, Kohei Hosokawa, Manabu Arikawa
  • Patent number: 10294559
    Abstract: A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded includes an integral plate with parallel cooling holes drilled parallel to the principal faces. The ends of the holes may be sealed and vertically extending slots arranged in two staggered groups on each side and machined down to respective pairs of cooling holes on opposite sides of the backing plate in pairs. Four manifolds tubes are sealed to the four groups of slots and provide counter-flowing coolant paths.
    Type: Grant
    Filed: March 15, 2012
    Date of Patent: May 21, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Yoshiaki Tanase, Makoto Inagawa, Akihiro Hosokawa
  • Patent number: 9222165
    Abstract: The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the shadow frame to reduce the amount of material that may deposit on the shadow frame during processing. The top shield may be cooled to reduce the amount of fluxuation in temperature of the top shield and shadow frame during processing and/or during down time.
    Type: Grant
    Filed: January 18, 2012
    Date of Patent: December 29, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Akihiro Hosokawa, Bradley O. Stimson, Hienminh Huu Le, Makoto Inagawa
  • Patent number: 8961756
    Abstract: A magnetron assembly including one or more magnetrons each forming a closed plasma loop on the sputtering face of the target. The target may include multiple strip targets on which respective strip magnetrons roll and are partially supported on a common support plate through a spring mechanism. The strip magnetron may be a two-level folded magnetron in which each magnetron forms a folded plasma loop extending between lateral sides of the strip target and its ends meet in the middle of the target. The magnets forming the magnetron may be arranged in a pattern having generally uniform straight portions joined by curved portion in which extra magnet positions are available near the corners to steer the plasma track. Multiple magnetrons, possibly flexible, may be resiliently supported on a scanned support plate and individually partially supported by rollers on the back of one or more targets.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: February 24, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Makoto Inagawa, Hien Minh Huu Le, Akihiro Hosokawa, Bradley O. Stimson, John M. White
  • Patent number: 8875547
    Abstract: Provided is an ozone generator (47) including two sheets of ozone generating electrodes (156, 157). These two ozone generating electrodes (156, 157) are arranged in a treating passage (152) in series along an air flowing direction. Thus, the air to come in from an air inlet port flows at first along the ozone generating electrode (156) of the first sheet, and receives, while flowing, the creeping discharge of the first ozone generating electrode (156) thereby to generate the ozone. The air thus having generated the ozone further flows in the treating passage (152) to the ozone generating electrode (157) of the second sheet, and receives, while flowing, the creeping discharge of the second ozone generating electrode (157) thereby to generate the additional ozone. The highly dense ozone can be used to clean the washing water.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: November 4, 2014
    Assignees: Haier Group Corporation, Qingdao Haier Washing Machine Co., Ltd.
    Inventors: Masami Suzuki, Akihiro Hosokawa
  • Patent number: 8783390
    Abstract: A vehicle drive apparatus independently controls drive forces for a front-right drive wheel, a front-left drive wheel, a rear-right drive wheel, and a rear-left drive wheel using a front-right electric motor, a front-left electric motor, a rear-right electric motor, and a rear-left electric motor, respectively. The drive forces for the drive wheels of a vehicle incorporating the vehicle drive apparatus are determined based on the target moments in the yaw and roll directions of the vehicle, the total drive for the drive wheels, and the drive reaction forces at the drive wheels. Thus, the performance desired by the driver can be achieved, and the drivability therefore improves accordingly.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: July 22, 2014
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Yoshinori Maeda, Akihiro Hosokawa, Yousuke Suzuki, Michitaka Tsuchida, Kazuya Okumura, Tadahiro Oshiumi, Kensuke Yoshizue, Koji Sugiyama
  • Patent number: 8714663
    Abstract: A target braking-driving force Fvn and a target yaw moment Mvn of the entire vehicle are calculated, and when the target braking-driving force Fvn and the target yaw moment Mvn cannot be achieved by the braking-driving forces of the front wheels, a target braking-driving force Fvft and a target yaw moment Mvft of the front wheels are adjusted such that the magnitudes of the braking-driving force and yaw moment of the vehicle produced by the braking-driving forces of the front wheels become the maximum at a ratio between Fvn and Mvn. A target braking-driving force Fvrt and a target yaw moment Mvrt of the rear wheels are calculated on the basis of Fvn, Mvn, Fvft, and Mvft, and similar adjustment is performed for them when necessarily.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: May 6, 2014
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Yoshinori Maeda, Yasuhiro Oshiumi, Michitaka Tsuchida, Kazuya Okumura, Kensuke Yoshizue, Akihiro Hosokawa, Koji Sugiyama
  • Patent number: 8574411
    Abstract: A sputtering apparatus for processing large area substrates is provided. By introducing gas across the entire target surface, a uniform composition film may be formed on the substrate. When the gas is introduced merely at the perimeter, the gas distribution is not uniform. By providing a gas introduction tube across the processing area, the reactive gas will uniformly distribute to the whole target. Also, providing the gas tube with multiple inner tubes provides a quick, effective gas dispersion capability.
    Type: Grant
    Filed: October 10, 2011
    Date of Patent: November 5, 2013
    Assignee: Applied Materials, Inc.
    Inventors: John M. White, Yan Ye, Akihiro Hosokawa
  • Patent number: 8500975
    Abstract: A rectangular magnetron placed at the back of a rectangular sputtering target for coating a rectangular panel and having magnets of opposed polarities arranged to form a gap therebetween corresponding to a plasma track adjacent the target which extends in a closed serpentine or spiral loop. The spiral may have a large number of wraps and the closed loop may be folded before wrapping. The magnetron has a size only somewhat less than that of the target and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100 mm for a 2 m target corresponding to at least the separation of the gap between parallel portions of the loop. A central ferromagnetic shim beneath some magnets in the loop may compensate for vertical droop. The magnetron may be scanned in two alternating double-Z patterns rotated 90° between them.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: August 6, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Hien Minh Huu Le, Akihiro Hosokawa, Avi Tepman
  • Publication number: 20130056037
    Abstract: A processing unit includes third discharge nozzles. Each of the third discharge nozzles discharges a processing liquid toward a lower tapered surface of a groove of a V-shaped cross-sectional configuration formed in a side wall of an inner bath. This forms relatively low-speed liquid flows within the inner bath. The processing unit further includes plate-like members. The plate-like members block upward ones of the liquid flows discharged from the third discharge nozzles and impinging upon the lower tapered surfaces of the inner bath. This achieves the efficient replacement of the processing liquid without disturbing upward flows of the processing liquid within the inner bath. Thus, the processing liquid stored in the processing bath is efficiently replaced with another processing liquid without disturbing the upward flows of the processing liquid within the processing bath.
    Type: Application
    Filed: July 24, 2012
    Publication date: March 7, 2013
    Inventors: Kozo TERASHIMA, Akihiro HOSOKAWA, Keiji MAGARA
  • Publication number: 20120175250
    Abstract: A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded includes an integral plate with parallel cooling holes drilled parallel to the principal faces. The ends of the holes may be sealed and vertically extending slots arranged in two staggered groups on each side and machined down to respective pairs of cooling holes on opposite sides of the backing plate in pairs. Four manifolds tubes are sealed to the four groups of slots and provide counter-flowing coolant paths.
    Type: Application
    Filed: March 15, 2012
    Publication date: July 12, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Yoshiaki Tanase, Makoto Inagawa, Akihiro Hosokawa
  • Patent number: 8206548
    Abstract: Mutually different plural kinds of processing liquid are sequentially supplied to a gap space in which a substrate is arranged to perform a wet processing to the substrate with respect to each processing liquid. Further, the processing liquid used in the wet processing is sequentially released from the communicating portion upon execution of each wet processing. The liquid retrieval tanks are selectively positioned at a retrieval position corresponding to the kind of processing liquid released from the communicating portion by relatively moving the processing unit and the liquid retrieval unit. The liquid retrieval unit is separated from the processing unit and is arranged below the processing unit. The processing liquid is released from the communicating portion of the processing unit to below the gap space downwards vertically.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: June 26, 2012
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Itsuki Kajino, Akihiro Hosokawa, Kozo Terashima
  • Patent number: 8182661
    Abstract: A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded includes an integral plate with parallel cooling holes drilled parallel to the principal faces. The ends of the holes may be sealed and vertically extending slots arranged in two staggered groups on each side and machined down to respective pairs of cooling holes on opposite sides of the backing plate in pairs. Four manifolds tubes are sealed to the four groups of slots and provide counter-flowing coolant paths.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: May 22, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Yoshiaki Tanase, Makoto Inagawa, Akihiro Hosokawa
  • Publication number: 20120111273
    Abstract: The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the shadow frame to reduce the amount of material that may deposit on the shadow frame during processing. The top shield may be cooled to reduce the amount of fluxuation in temperature of the top shield and shadow frame during processing and/or during down time.
    Type: Application
    Filed: January 18, 2012
    Publication date: May 10, 2012
    Inventors: AKIHIRO HOSOKAWA, Bradley O. Stimson, Hienminh Huu Le, Makoto Inagawa
  • Publication number: 20120024693
    Abstract: A sputtering apparatus for processing large area substrates is provided. By introducing gas across the entire target surface, a uniform composition film may be formed on the substrate. When the gas is introduced merely at the perimeter, the gas distribution is not uniform. By providing a gas introduction tube across the processing area, the reactive gas will uniformly distribute to the whole target. Also, providing the gas tube with multiple inner tubes provides a quick, effective gas dispersion capability.
    Type: Application
    Filed: October 10, 2011
    Publication date: February 2, 2012
    Inventors: John M. White, Yan Ye, Akihiro Hosokawa
  • Publication number: 20120000773
    Abstract: The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.
    Type: Application
    Filed: September 13, 2011
    Publication date: January 5, 2012
    Inventors: Yan Ye, Ankur Kadam, Yanping Li, Allen Ka-Ling Lau, Makoto Inagawa, Bradley O. Stimson, Akihiro Hosokawa
  • Patent number: 7976635
    Abstract: One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: July 12, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Shinichi Kurita, Wendell T. Blonigan, Akihiro Hosokawa
  • Patent number: 7879210
    Abstract: A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. The yokes separated by a gap sufficiently small that the two yokes are magnetically coupled. Each yoke has its own set of spring supports from above and rolling/sliding supports from below to allow the magnetron shape to conform to that of the target. Alternatively, narrow slots are formed in a unitary yoke.
    Type: Grant
    Filed: February 3, 2006
    Date of Patent: February 1, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Makoto Inagawa, Akihiro Hosokawa, John M. White