Patents by Inventor Akihiro Nishida

Akihiro Nishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220024953
    Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including an alkoxide compound represented by the following general formula (1): where R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, and z1 represents an integer of from 1 to 3.
    Type: Application
    Filed: December 3, 2019
    Publication date: January 27, 2022
    Applicant: ADEKA CORPORATION
    Inventors: Atsushi SAKURAI, Masako HATASE, Tomoharu YOSHINO, Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20220017554
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.
    Type: Application
    Filed: September 30, 2021
    Publication date: January 20, 2022
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Nana OKADA, Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20220002867
    Abstract: A method of the present invention for producing a metallic ruthenium thin film on a substrate by atomic layer deposition includes: (A) a step of introducing a feedstock gas containing a specific ruthenium compound into a treatment atmosphere, and allowing the ruthenium compound to deposit on the substrate; and a step of introducing a reactive gas containing a specific compound into the treatment atmosphere, and allowing the reactive gas to react with the specific ruthenium compound deposited on the substrate.
    Type: Application
    Filed: October 28, 2019
    Publication date: January 6, 2022
    Applicant: ADEKA CORPORATION
    Inventors: Akihiro NISHIDA, Masaki ENZU
  • Patent number: 11178870
    Abstract: Pyridine compounds of Formula (1) are provided: wherein R1, R2, X, Y and Het are defined. The pyridine compounds can be used to treat or prevent plant diseases.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: November 23, 2021
    Assignee: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki Umetani, Shun Okaya, Hideaki Ikishima, Takeshi Fukumoto, Akihiro Nishida, Masanori Yanagi, Ryohei Naito, Koji Masutomi, Tomomi Shirakawa, Akane Sakurada, Satoshi Yutani
  • Patent number: 11161867
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.).
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: November 2, 2021
    Assignee: ADEKA CORPORATION
    Inventors: Tomoharu Yoshino, Nana Okada, Akihiro Nishida, Atsushi Yamashita
  • Patent number: 11147272
    Abstract: Pyridone compounds of formula (1) and salts thereof: wherein R1, R2, R3, X, Y1, Y2, Y3 and n are defined. The pyridone compounds can control plant diseases.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: October 19, 2021
    Assignee: MITSUI CHEMICALS ARGRO, INC.
    Inventors: Hideki Umetani, Hideaki Ikishima, Akihiro Nishida, Shun Okaya, Ryohei Naito, Takeshi Fukumoto, Satoshi Yutani, Toshiaki Ohara
  • Patent number: 11051513
    Abstract: An object of the invention is to provide compounds of formula (1) or salts thereof which are effective as agricultural and horticultural fungicides. In the formula, R1 represents, for example, a hydroxy group or a cyano group, R2, R3 and R4 are independent of one another and each represent, for example, a hydrogen atom or a halogen atom, R5 represents, for example, a hydrogen atom or a halogen atom, X represents an oxygen atom or a sulfur atom, Y represents, for example, a phenyl group or a pyridyl group, and the bond including the broken line represents a double bond or a single bond.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: July 6, 2021
    Assignee: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki Umetani, Takeshi Fukumoto, Ryohei Naito, Hideaki Ikishima, Toshiyuki Kouno, Akihiro Nishida, Masanori Yanagi, Kazuki Kitajima, Satoshi Yutani, Tomomi Shirakawa, Toshiaki Ohara
  • Publication number: 20210155638
    Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a magnesium compound represented by the following general formula (1): where R1 represents an isopropyl group, a sec-butyl group, or a tert-butyl group. A thin-film containing a magnesium atom is produced on a surface of a substrate with high productivity through use of the raw material.
    Type: Application
    Filed: April 8, 2019
    Publication date: May 27, 2021
    Applicant: ADEKA CORPORATION
    Inventors: Masaki ENZU, Keisuke TAKEDA, Akihiro NISHIDA
  • Patent number: 11000038
    Abstract: A pyridone compound represented by Formula (1): wherein R1, R2, X, Y and Z are defined. The pyridone compound can control plant diseases.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: May 11, 2021
    Assignee: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki Umetani, Kazuki Kitajima, Takeshi Fukumoto, Masanori Yanagi, Akihiro Nishida, Ryohei Naito, Koya Saito, Tomomi Shirakawa, Hikaru Koishihara, Akane Sakurada, Satoshi Yutani, Toshiaki Ohara
  • Patent number: 10920313
    Abstract: A diazadienyl compound represented by General Formula (I) below: wherein R1 represents a C1-6 linear or branched alkyl group, and M represents nickel atom or manganese atom. In particular, since a compound in which R1 in General Formula (I) is a methyl group has a high vapor pressure and a high thermal decomposition starting temperature, the compound is useful as a raw material for forming a thin film by a CVD method or ALD method.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: February 16, 2021
    Assignee: ADEKA CORPORATION
    Inventors: Tomoharu Yoshino, Masaki Enzu, Akihiro Nishida, Atsushi Yamashita
  • Patent number: 10882874
    Abstract: A vanadium compound represented by following General Formula (1). In General Formula (1), R1 represents a linear or branched alkyl group having 1 to 7 carbon atoms and n represents a number from 2 to 4. R1 preferably represents a secondary alkyl or a tertiary alkyl. It is preferred that in General Formula (1), n is 2 and R1 is tert-butyl group or tert-pentyl group, since the compound has a broad ALD window and high thermal decomposition temperature to be able to form a good quality vanadium-containing thin film that has a small carbon residue when used as an ALD material.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: January 5, 2021
    Assignee: ADEKA CORPORATION
    Inventors: Makoto Okabe, Akihiro Nishida, Tomoharu Yoshino
  • Publication number: 20200196600
    Abstract: A pyridone compound represented by Formula (1): wherein R1, R2, X, Y and Z are defined. The pyridone compound can control plant diseases.
    Type: Application
    Filed: April 10, 2018
    Publication date: June 25, 2020
    Applicant: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki UMETANI, Kazuki KITAJIMA, Takeshi FUKUMOTO, Masanori YANAGI, Akihiro NISHIDA, Ryohei NAITO, Koya SAITO, Tomomi SHIRAKAWA, Hikaru KOISHIHARA, Akane SAKURADA, Satoshi YUTANI, Toshiaki OHARA
  • Publication number: 20200148706
    Abstract: The present invention provides a metal alkoxide compound represented by the following general formula (1): (in the formula, R1 and R2 each independently represent an alkyl group having 1 to 4 carbon atoms, R3 represents an alkyl group having 2 or 3 carbon atoms, M represents a scandium atom, an yttrium atom, a lanthanum atom, a cerium atom, a praseodymium atom, a neodymium atom, a promethium atom, a samarium atom, a europium atom, a gadolinium atom, a terbium atom, a dysprosium atom, a holmium atom, an erbium atom, a thulium atom, an ytterbium atom, or a lutetium atom, and n represents the valence represented by M.
    Type: Application
    Filed: May 28, 2018
    Publication date: May 14, 2020
    Applicant: ADEKA CORPORATION
    Inventors: Atsushi SAKURAI, Masako HATASE, Nana OKADA, Akihiro NISHIDA
  • Publication number: 20200140463
    Abstract: The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:
    Type: Application
    Filed: August 9, 2018
    Publication date: May 7, 2020
    Applicant: ADEKA CORPORATION
    Inventors: Nana OKADA, Masako HATASE, Akihiro NISHIDA, Atsushi SAKURAI
  • Publication number: 20200131042
    Abstract: The present invention provides a raw material for thin film formation containing a compound represented by the following General Formula (1), a method for manufacturing a thin film using the raw material, and a novel compound represented by General Formula (2) in this specification: wherein, X represents a halogen atom, and R represents a primary alkyl group or secondary butyl group having 1 to 5 carbon atoms.
    Type: Application
    Filed: May 17, 2018
    Publication date: April 30, 2020
    Applicant: ADEKA CORPORATION
    Inventors: Akihiro NISHIDA, Nana OKADA, Yoshiki OE
  • Publication number: 20200083520
    Abstract: A method for producing an yttrium oxide-containing thin film by atomic layer deposition, the method comprising: a step for introducing a raw material gas containing tris(sec-butylcyclopentadienyl) yttrium into a treatment atmosphere in order to deposit tris(sec-butylcyclopentadienyl) yttrium on a substrate; and a step for introducing a reactive gas containing water vapor into the treatment atmosphere and causing the reactive gas to react with the tris(sec-butylcyclopentadienyl) yttrium that has been deposited on the substrate, thereby oxidizing yttrium is provided.
    Type: Application
    Filed: February 13, 2018
    Publication date: March 12, 2020
    Applicant: ADEKA CORPORATION
    Inventors: Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20200055887
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.
    Type: Application
    Filed: October 5, 2017
    Publication date: February 20, 2020
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Nana OKADA, Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20200045963
    Abstract: Pyridone compounds of formula (1) and salts thereof: wherein R1, R2, R3, X, Y1, Y2, Y3 and n are defined. The pyridone compounds can control plant diseases.
    Type: Application
    Filed: April 10, 2018
    Publication date: February 13, 2020
    Applicant: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki UMETANI, Hideaki IKISHIMA, Akihiro NISHIDA, Shun OKAYA, Ryohei NAITO, Takeshi FUKUMOTO, Satoshi YUTANI, Toshiaki OHARA
  • Publication number: 20200045968
    Abstract: Pyridine compounds of Formula (1) are provided: wherein R1, R2, X, Y and Het are defined. The pyridine compounds can be used to treat or prevent plant diseases.
    Type: Application
    Filed: April 10, 2018
    Publication date: February 13, 2020
    Applicant: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki UMETANI, Shun OKAYA, Hideaki IKISHIMA, Takeshi FUKUMOTO, Akihiro NISHIDA, Masanori YANAGI, Ryohei NAITO, Koji MASUTOMI, Tomomi SHIRAKAWA, Akane SAKURADA, Satoshi YUTANI
  • Publication number: 20190380340
    Abstract: An object of the invention is to provide compounds of formula (1) or salts thereof which are effective as agricultural and horticultural fungicides. In the formula, R1 represents, for example, a hydroxy group or a cyano group, R2, R3 and R4 are independent of one another and each represent, for example, a hydrogen atom or a halogen atom, R5 represents, for example, a hydrogen atom or a halogen atom, X represents an oxygen atom or a sulfur atom, Y represents, for example, a phenyl group or a pyridyl group, and the bond including the broken line represents a double bond or a single bond.
    Type: Application
    Filed: January 26, 2018
    Publication date: December 19, 2019
    Applicant: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki UMETANI, Takeshi FUKUMOTO, Ryohei NAITO, Hideaki IKISHIMA, Toshiyuki KOUNO, Akihiro NISHIDA, Masanori YANAGI, Kazuki KITAJIMA, Satoshi YUTANI, Tomomi SHIRAKAWA, Toshiaki OHARA