Patents by Inventor Akihiro Wada
Akihiro Wada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8106006Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. Compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. Methods are provided for modulating an antimicrobial activity and for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.Type: GrantFiled: February 18, 2009Date of Patent: January 31, 2012Assignee: The United States of America as represented by the Secretary of the Department of Health and Human ServicesInventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
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Publication number: 20090155293Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method if provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.Type: ApplicationFiled: February 18, 2009Publication date: June 18, 2009Inventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
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Patent number: 7511015Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method is provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.Type: GrantFiled: February 18, 2003Date of Patent: March 31, 2009Assignee: The United States of America as represented by the Department of Health and Human ServicesInventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
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Publication number: 20060036083Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method if provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.Type: ApplicationFiled: February 18, 2003Publication date: February 16, 2006Inventors: Joel Moss, Rodney Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
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Patent number: 6992229Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.Type: GrantFiled: November 19, 2002Date of Patent: January 31, 2006Assignee: Asahi Glass Company, LimitedInventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
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Patent number: 6930212Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.Type: GrantFiled: February 20, 2002Date of Patent: August 16, 2005Assignee: Asahi Glass Company, LimitedInventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
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Patent number: 6861565Abstract: A process for producing a fluoroalkanol which can easily be industrially practiced with high selectivity, is provided. CHR1R2OH, a radical initiator and CF2?CFRf are continuously supplied and reacted at from 105 to 135° C., and H—(RfCFCF2)n—CR1R2—OH formed, is continuously discharged. Here, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, Rf is a fluorine atom or a C1-4 polyfluoroalkyl group, and n is an integer of from 1 to 4.Type: GrantFiled: March 10, 2003Date of Patent: March 1, 2005Assignee: Asahi Glass Company, LimitedInventors: Toshihiko Tohma, Akihiro Wada
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Publication number: 20040091661Abstract: A process for producing a fluoroalkanol of high purity containing little evaporation residue, which can be industrially easily carried out with high selectivity, is provided. In the process, a radial initiator and CF2═CFR3 (formula 3) are continuously added to CHR1R2—OH (Formula 2) to react them to form H—(CFR3CF2)n—CR1R2—OH (formula 1). In the formulae, n is an integer of from 1 to 4, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, and R3 is a fluorine atom or a C1-4 perfluoroalkyl group.Type: ApplicationFiled: December 28, 2001Publication date: May 13, 2004Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Akihiro Wada, Hidemi Tanaka, Koichiro Tanabe, Nobuyuki Yamagishi, Tohihiko Toma
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Publication number: 20030158452Abstract: A process for producing a fluoroalkanol which can easily be industrially practiced with high selectivity, is provided.Type: ApplicationFiled: March 10, 2003Publication date: August 21, 2003Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Toshihiko Tohma, Akihiro Wada
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Publication number: 20030069454Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.Type: ApplicationFiled: November 19, 2002Publication date: April 10, 2003Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
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Publication number: 20020115893Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.Type: ApplicationFiled: February 20, 2002Publication date: August 22, 2002Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
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Publication number: 20020086131Abstract: A process for producing a fluoroalkanol of high purity containing little evaporation residue, which can be industrially easily carried out with high selectivity, is provided. In the process, a radial initiator and CF2═CFR3 (formula 3) are continuously added to CHR1R2—OH (Formula 2) to react them to form H—(CFR3CF2)n—CR1R2—OH (formula 1). In the formulae, n is an integer of from 1 to 4, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, and R3 is a fluorine atom or a C1-4 perfluoroalkyl group.Type: ApplicationFiled: December 28, 2001Publication date: July 4, 2002Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Akihiro Wada, Hidemi Tanaka, Koichiro Tanabe, Nobuyuki Yamagishi, Tohihiko Toma
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Patent number: 5349098Abstract: A process for producing chlorofluorobenzenes, which comprises reacting fluorine-containing nitrobenzenes of the following formula (1) with chlorine gas to obtain chlorofluorobenzenes of the following formula (2): ##STR1## wherein n and m are integers satisfying 1.ltoreq.n.ltoreq.3, 0.ltoreq.m.ltoreq.2 and 1.ltoreq.n+m.ltoreq.3.Type: GrantFiled: December 15, 1992Date of Patent: September 20, 1994Assignee: Asahi Glass Company Ltd.Inventors: Seisaku Kumai, Akihiro Wada, Shinsuke Morikawa
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Patent number: 5208394Abstract: A process for producing chlorofluorobenzenes, which comprises reacting fluorine-containing nitrobenzenes of the following formula (1) with chlorine gas to obtain chlorofluorobenzenes of the following formula (2): ##STR1## wherein n and m are integers satisfying 1.ltoreq.n.ltoreq.3, 0.ltoreq.m.ltoreq.2 and 1.ltoreq.n+m.ltoreq.3.Type: GrantFiled: August 6, 1992Date of Patent: May 4, 1993Assignee: Asahi Glass Company Ltd.Inventors: Seisaku Kumai, Akihiro Wada, Shinsuke Morikawa
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Patent number: 5198305Abstract: A novel optical element substrate which comprises a random copolymer comprising, in specific weight proportions, a methyl methacrylate unit, an aromatic vinyl compound unit, an unsaturated aliphatic acid unit and a hexagonal acid anhydride unit of the formula ##STR1## The substrate has excellent heat resistance, thermal stability, transparency, resistance to scratching and metal layer corrosion preventive properties and exhibits advantageously low double refraction and warpage. The novel substrate can be advantageously employed as a substrate for an optical element such as an optical disc, e.g. a digital audio disc, a video disc and a disc capable of being directly read after recording, a mirror, a lens and the like.Type: GrantFiled: December 23, 1991Date of Patent: March 30, 1993Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Akihiro Wada, Rin-ichi Kakuta
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Patent number: 5072062Abstract: A method for brominating a perfluoroalkyl iodide or a perfluoroalkylene diiodide, which comprises reacting a perfluoroalkyl iodide or a perfluoroalkylene diiodide with a brominating agent in a gas phase to obtain a perfluoroalkyl bromide or a perfluoroalkylene dibromide.Type: GrantFiled: April 3, 1991Date of Patent: December 10, 1991Assignee: Asahi Glass Company, Ltd.Inventors: Seisaku Kumai, Akihiro Wada
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Patent number: 4888387Abstract: A resin composition comprising (A) a copolymer comprising hexagonal units selected from hexagonal acid anhydride units, hexagonal imide units and mixtures thereof, methyl methacrylate units, (meth)acrylic acid units and optionally aromatic vinyl compound units, (B) a graft copolymer rubber, and (C) at least one polymer selected from a polyamide and a polycarbonate, wherein the weight proportions of components (A), (B) and (C) relative to the total weight of components (A), (B) and (C) are in the ranges of from 5 to 50%, from 5 to 50% and from 45 to 80%, respectively. The resin composition has surprisingly improved impact strength not possessed by any of the individual component polymers of the resin composition, while maintaining advantageous properties, such as moldability, other mechanical strengths, rigidity, heat resistance, moisture resistance, chemical resistance and dimensional stability, attributed to the individual component polymers.Type: GrantFiled: March 8, 1989Date of Patent: December 19, 1989Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Akihiro Wada, Rin-ichi Kakuta, Kenji Ohuchi, Jun Sugiyama, Shinji Hasegawa
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Patent number: 4820778Abstract: A novel random copolymer containing, in specific ratios, methyl methacrylate units, aromatic vinyl compound units, methacrylic acid units, hexagonal anhydride units and hexagonal imide units of the formula ##STR1## has been found to have excellent optical properties, mechanical strength, heat distortion resistance, heat decomposition resistance and oil resistance, and have low water absorption. The copolymer can advantageously be employed as a material for parts of light electric apparatus, engineering plastics, lenses, optical fiber cables, and is especially useful as a material for a substrate of optical discs.Type: GrantFiled: March 3, 1987Date of Patent: April 11, 1989
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Patent number: 4439492Abstract: In injection molding thermoplastic resin compositions containing reinforcing materials and/or fillers, high quality molded articles superior in surface gloss and exhibiting substantially no surface defect can be obtained, by employing a technical measure, in which only superficial layer of the inner wall surface of the mold is selectively heated, by high-frequency induction heating, to a temperature above the heat distortion temperature of the thermoplastic resin composition employed prior to injection molding and cooling and solidifying the resin.Type: GrantFiled: March 29, 1982Date of Patent: March 27, 1984Assignee: Asahi-Dow LimitedInventors: Akihiro Wada, Kichiya Tazaki, Tamotsu Tahara, Hiroshi Suzuki, Yukihisa Mizutani
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Patent number: 4340551Abstract: In injection molding thermoplastic resin compositions containing reinforcing materials and/or fillers, high quality molded articles superior in surface gloss and exhibiting substantially no surface defect can be obtained, by employing a technical measure, in which only superficial layer of the inner wall surface of the mold is selectively heated, by high-frequency induction heating, to a temperature above the heat distortion temperature of the thermoplastic resin composition employed prior to injection molding and cooling and solidifying the resin.Type: GrantFiled: August 11, 1980Date of Patent: July 20, 1982Assignee: Asahi-Dow LimitedInventors: Akihiro Wada, Kichiya Tazaki, Tamotsu Tahara, Hiroshi Suzuki, Yukihisa Mizutani