Patents by Inventor Akihiro Wada

Akihiro Wada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8106006
    Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. Compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. Methods are provided for modulating an antimicrobial activity and for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: January 31, 2012
    Assignee: The United States of America as represented by the Secretary of the Department of Health and Human Services
    Inventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
  • Publication number: 20090155293
    Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method if provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.
    Type: Application
    Filed: February 18, 2009
    Publication date: June 18, 2009
    Inventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
  • Patent number: 7511015
    Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method is provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.
    Type: Grant
    Filed: February 18, 2003
    Date of Patent: March 31, 2009
    Assignee: The United States of America as represented by the Department of Health and Human Services
    Inventors: Joel Moss, Rodney L. Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
  • Publication number: 20060036083
    Abstract: This disclosure provides modified antimicrobial agents, for example modified defensin polypeptides. In one embodiment, compositions including a modified arginine residue, such as an ADP-ribosylated and/or ribosylated alpha defensin polypeptide, are provided. Also provided are methods of modulating an immune response using the modified defensin polypeptides. In one embodiment, a method is provided for modulating an antimicrobial activity. In another embodiment, a method if provided for inhibiting a cytotoxic activity. Also disclosed are methods for treating diseases in a subject that are associated with an immune response, such as inflammatory and pulmonary diseases, using the disclosed modified defensin polypeptides.
    Type: Application
    Filed: February 18, 2003
    Publication date: February 16, 2006
    Inventors: Joel Moss, Rodney Levine, Akihiro Wada, Toshiya Hirayama, Gregorino Paone
  • Patent number: 6992229
    Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: January 31, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
  • Patent number: 6930212
    Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: August 16, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
  • Patent number: 6861565
    Abstract: A process for producing a fluoroalkanol which can easily be industrially practiced with high selectivity, is provided. CHR1R2OH, a radical initiator and CF2?CFRf are continuously supplied and reacted at from 105 to 135° C., and H—(RfCFCF2)n—CR1R2—OH formed, is continuously discharged. Here, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, Rf is a fluorine atom or a C1-4 polyfluoroalkyl group, and n is an integer of from 1 to 4.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 1, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Toshihiko Tohma, Akihiro Wada
  • Publication number: 20040091661
    Abstract: A process for producing a fluoroalkanol of high purity containing little evaporation residue, which can be industrially easily carried out with high selectivity, is provided. In the process, a radial initiator and CF2═CFR3 (formula 3) are continuously added to CHR1R2—OH (Formula 2) to react them to form H—(CFR3CF2)n—CR1R2—OH (formula 1). In the formulae, n is an integer of from 1 to 4, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, and R3 is a fluorine atom or a C1-4 perfluoroalkyl group.
    Type: Application
    Filed: December 28, 2001
    Publication date: May 13, 2004
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Akihiro Wada, Hidemi Tanaka, Koichiro Tanabe, Nobuyuki Yamagishi, Tohihiko Toma
  • Publication number: 20030158452
    Abstract: A process for producing a fluoroalkanol which can easily be industrially practiced with high selectivity, is provided.
    Type: Application
    Filed: March 10, 2003
    Publication date: August 21, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Toshihiko Tohma, Akihiro Wada
  • Publication number: 20030069454
    Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.
    Type: Application
    Filed: November 19, 2002
    Publication date: April 10, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
  • Publication number: 20020115893
    Abstract: The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.
    Type: Application
    Filed: February 20, 2002
    Publication date: August 22, 2002
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Hidekazu Okamoto, Akihiro Wada, Toshihiko Toma, Nobuyuki Yamagishi
  • Publication number: 20020086131
    Abstract: A process for producing a fluoroalkanol of high purity containing little evaporation residue, which can be industrially easily carried out with high selectivity, is provided. In the process, a radial initiator and CF2═CFR3 (formula 3) are continuously added to CHR1R2—OH (Formula 2) to react them to form H—(CFR3CF2)n—CR1R2—OH (formula 1). In the formulae, n is an integer of from 1 to 4, each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group, and R3 is a fluorine atom or a C1-4 perfluoroalkyl group.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 4, 2002
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Akihiro Wada, Hidemi Tanaka, Koichiro Tanabe, Nobuyuki Yamagishi, Tohihiko Toma
  • Patent number: 5349098
    Abstract: A process for producing chlorofluorobenzenes, which comprises reacting fluorine-containing nitrobenzenes of the following formula (1) with chlorine gas to obtain chlorofluorobenzenes of the following formula (2): ##STR1## wherein n and m are integers satisfying 1.ltoreq.n.ltoreq.3, 0.ltoreq.m.ltoreq.2 and 1.ltoreq.n+m.ltoreq.3.
    Type: Grant
    Filed: December 15, 1992
    Date of Patent: September 20, 1994
    Assignee: Asahi Glass Company Ltd.
    Inventors: Seisaku Kumai, Akihiro Wada, Shinsuke Morikawa
  • Patent number: 5208394
    Abstract: A process for producing chlorofluorobenzenes, which comprises reacting fluorine-containing nitrobenzenes of the following formula (1) with chlorine gas to obtain chlorofluorobenzenes of the following formula (2): ##STR1## wherein n and m are integers satisfying 1.ltoreq.n.ltoreq.3, 0.ltoreq.m.ltoreq.2 and 1.ltoreq.n+m.ltoreq.3.
    Type: Grant
    Filed: August 6, 1992
    Date of Patent: May 4, 1993
    Assignee: Asahi Glass Company Ltd.
    Inventors: Seisaku Kumai, Akihiro Wada, Shinsuke Morikawa
  • Patent number: 5198305
    Abstract: A novel optical element substrate which comprises a random copolymer comprising, in specific weight proportions, a methyl methacrylate unit, an aromatic vinyl compound unit, an unsaturated aliphatic acid unit and a hexagonal acid anhydride unit of the formula ##STR1## The substrate has excellent heat resistance, thermal stability, transparency, resistance to scratching and metal layer corrosion preventive properties and exhibits advantageously low double refraction and warpage. The novel substrate can be advantageously employed as a substrate for an optical element such as an optical disc, e.g. a digital audio disc, a video disc and a disc capable of being directly read after recording, a mirror, a lens and the like.
    Type: Grant
    Filed: December 23, 1991
    Date of Patent: March 30, 1993
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Akihiro Wada, Rin-ichi Kakuta
  • Patent number: 5072062
    Abstract: A method for brominating a perfluoroalkyl iodide or a perfluoroalkylene diiodide, which comprises reacting a perfluoroalkyl iodide or a perfluoroalkylene diiodide with a brominating agent in a gas phase to obtain a perfluoroalkyl bromide or a perfluoroalkylene dibromide.
    Type: Grant
    Filed: April 3, 1991
    Date of Patent: December 10, 1991
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Seisaku Kumai, Akihiro Wada
  • Patent number: 4888387
    Abstract: A resin composition comprising (A) a copolymer comprising hexagonal units selected from hexagonal acid anhydride units, hexagonal imide units and mixtures thereof, methyl methacrylate units, (meth)acrylic acid units and optionally aromatic vinyl compound units, (B) a graft copolymer rubber, and (C) at least one polymer selected from a polyamide and a polycarbonate, wherein the weight proportions of components (A), (B) and (C) relative to the total weight of components (A), (B) and (C) are in the ranges of from 5 to 50%, from 5 to 50% and from 45 to 80%, respectively. The resin composition has surprisingly improved impact strength not possessed by any of the individual component polymers of the resin composition, while maintaining advantageous properties, such as moldability, other mechanical strengths, rigidity, heat resistance, moisture resistance, chemical resistance and dimensional stability, attributed to the individual component polymers.
    Type: Grant
    Filed: March 8, 1989
    Date of Patent: December 19, 1989
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Akihiro Wada, Rin-ichi Kakuta, Kenji Ohuchi, Jun Sugiyama, Shinji Hasegawa
  • Patent number: 4820778
    Abstract: A novel random copolymer containing, in specific ratios, methyl methacrylate units, aromatic vinyl compound units, methacrylic acid units, hexagonal anhydride units and hexagonal imide units of the formula ##STR1## has been found to have excellent optical properties, mechanical strength, heat distortion resistance, heat decomposition resistance and oil resistance, and have low water absorption. The copolymer can advantageously be employed as a material for parts of light electric apparatus, engineering plastics, lenses, optical fiber cables, and is especially useful as a material for a substrate of optical discs.
    Type: Grant
    Filed: March 3, 1987
    Date of Patent: April 11, 1989
  • Patent number: 4439492
    Abstract: In injection molding thermoplastic resin compositions containing reinforcing materials and/or fillers, high quality molded articles superior in surface gloss and exhibiting substantially no surface defect can be obtained, by employing a technical measure, in which only superficial layer of the inner wall surface of the mold is selectively heated, by high-frequency induction heating, to a temperature above the heat distortion temperature of the thermoplastic resin composition employed prior to injection molding and cooling and solidifying the resin.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: March 27, 1984
    Assignee: Asahi-Dow Limited
    Inventors: Akihiro Wada, Kichiya Tazaki, Tamotsu Tahara, Hiroshi Suzuki, Yukihisa Mizutani
  • Patent number: 4340551
    Abstract: In injection molding thermoplastic resin compositions containing reinforcing materials and/or fillers, high quality molded articles superior in surface gloss and exhibiting substantially no surface defect can be obtained, by employing a technical measure, in which only superficial layer of the inner wall surface of the mold is selectively heated, by high-frequency induction heating, to a temperature above the heat distortion temperature of the thermoplastic resin composition employed prior to injection molding and cooling and solidifying the resin.
    Type: Grant
    Filed: August 11, 1980
    Date of Patent: July 20, 1982
    Assignee: Asahi-Dow Limited
    Inventors: Akihiro Wada, Kichiya Tazaki, Tamotsu Tahara, Hiroshi Suzuki, Yukihisa Mizutani