Abstract: A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.

Abstract: A utility transfer apparatus includes: a magnetic member being secured to a first member; a first coil provided on the first member and wound on the magnetic member; and a second coil provided on a second member and wound on the magnetic member so that the second member is movable relative to the first member. The magnetic member forms a magnetic circuit that does not have an air gap.

Abstract: An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a table on which the substrate is mounted and that can move two-dimensionally while holding the substrate. The exposure apparatus also includes a hydrostatic bearing unit arranged on an image plane side of the projection optical system. The hydrostatic bearing unit includes at least one hydrostatic bearing that supplies liquid in a space between a bearing surface facing the substrate mounted on the table and the substrate so as to maintain the distance between the bearing surface and the surface of the substrate by static pressure of the liquid.

Abstract: Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

Abstract: An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. The projection system is maintained in contact with the immersion liquid after the substrate has been moved away from under the projection system.

Abstract: A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.

Abstract: A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value.

Abstract: A scanning exposure method moves a mask stage in a scanning direction by a driver having a first portion coupled to the mask stage, which includes a reflective portion positioned along the scanning direction. A counter weight having at least one beam extending along the scanning direction, moves in a direction opposite to the mask stage in response to a reaction force generated by movement of the mask stage by the driver. The at least one beam of the counter weight is coupled to a second portion of the driver. The counter weight is movably supported via a first bearing by a base member. The movement of the counter weight is guided in the scanning direction via a second bearing by a guide mounted on the base member and extending along the scanning direction. A length of the guide is longer than a length of the reflective portion.

Abstract: An exposure apparatus that irradiates an energy beam to a substrate includes a projection optical system that projects the energy beam to the substrate, and a support device having a flexible structure to support the projection optical system. According to one embodiment, the flexible structure includes three flexible rods that support the projection optical system from an upper side of the projection optical system. According to an embodiment, extended lines of the respective rods cross at a reference point of the projection optical system.

Abstract: In a scanning exposure method, a mask stage that holds a mask is moved in a scanning direction by a first electromagnetic driver having a first portion coupled to the mask stage, and a second portion. A position of the mask stage is detected by a position detector that cooperates with a reflective portion of the mask stage that is positioned along the scanning direction. A counter weight having a bearing and at least one beam extending along the scanning direction moves in a direction opposite to a movement direction of the mask stage in response to a reaction force generated by movement of the mask stage by the first electromagnetic driver. The counter weight preferably is heavier than the mask stage, and a length of the at least one beam along the scanning direction preferably is longer than a length of the reflective portion along the scanning direction.

Abstract: A scanning exposure method moves a mask stage in a scanning direction by a driver having a first portion coupled to the mask stage, which includes a reflective portion positioned along the scanning direction. A counter weight having at least one beam extending along the scanning direction, moves in a direction opposite to the mask stage in response to a reaction force generated by movement of the mask stage by the driver. The at least one beam of the counter weight is coupled to a second portion of the driver. The counter weight is movably supported via a first bearing by a base member. The movement of the counter weight is guided in the scanning direction via a second bearing by a guide mounted on the base member and extending along the scanning direction. A length of the guide is longer than a length of the reflective portion.

Abstract: In a scanning exposure method, a mask stage that holds a mask is moved in a scanning direction by a first electromagnetic driver having a first portion coupled to the mask stage, and a second portion. A position of the mask stage is detected by a position detector that cooperates with a reflective portion of the mask stage that is positioned along the scanning direction. A counter weight having a bearing and at least one beam extending along the scanning direction moves in a direction opposite to a movement direction of the mask stage in response to a reaction force generated by movement of the mask stage by the first electromagnetic driver. The counter weight preferably is heavier than the mask stage, and a length of the at least one beam along the scanning direction preferably is longer than a length of the reflective portion along the scanning direction.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A stage apparatus includes a table disposed above a base table so as to oppose to the base table, an X-axis-direction table support mechanism portion disposed between the base and the table for supporting the table in a state that the table is capable of moving in an X-axis-direction within a two-dimensional plane, a Y-axis-direction table support mechanism portion disposed between the base and the table for supporting the table in a state that the table is capable of moving in a Y-axis-direction within a two-dimensional plane, an X-axis-direction linear guide portion formed on an upper surface of the base and extending in the X-axis-direction, a Y-axis-direction linear guide portion formed on the upper surface of the base and extending in the Y-axis-direction, an X-axis direction movable member provided so as to move along the X-axis-direction linear guide portion and connected to the Y-axis-direction table support mechanism portion, a Y-axis-direction movable member provided so as to move along the Y-axis-d

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are supported by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuator devices which are preferably voice coil motors extending between the coarse stage and the high accuracy stage. Additionally, dead weight supports are provided between the coarse stage and the high accuracy stage for vertically supporting the dead weight of the high accuracy stage. The dead weight supports are preferably air bellows.

Abstract: A three-dimensional shape measuring apparatus has a point light source for radiating illumination light diverging in the shape of an elliptical cone, a slit illumination system for imaging the illumination light into the shape of a slit, an objective system for imaging the illumination light toward a measurement object and for imaging reflected light traveling back from the measurement object, a beam splitter for separating the optical paths of the illumination light entering the objective system and of the reflected light exiting from the objective system, and a sensor for detecting the amount of the reflected light exiting from the objective system.