Abstract: A stage apparatus includes a table disposed above a base table so as to oppose to the base table, an X-axis-direction table support mechanism portion disposed between the base and the table for supporting the table in a state that the table is capable of moving in an X-axis-direction within a two-dimensional plane, a Y-axis-direction table support mechanism portion disposed between the base and the table for supporting the table in a state that the table is capable of moving in a Y-axis-direction within a two-dimensional plane, an X-axis-direction linear guide portion formed on an upper surface of the base and extending in the X-axis-direction, a Y-axis-direction linear guide portion formed on the upper surface of the base and extending in the Y-axis-direction, an X-axis direction movable member provided so as to move along the X-axis-direction linear guide portion and connected to the Y-axis-direction table support mechanism portion, a Y-axis-direction movable member provided so as to move along the Y-axis-d

Abstract: A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

Abstract: A three-dimensional shape measuring apparatus is provided with: an illuminator for illuminating a measurement object by two luminous fluxes in different directions, the two luminous fluxes intersecting each other at a specified position; a light receiver including a plurality of photoelectric conversion elements for receiving light to generate an electric signal in accordance with an intensity of received light; and an objective optical system for transmitting light reflected from the measurement object to the light receiver.

Abstract: Since a mask stage 16 and a substrate stage 14 are supported in a floating manner over a base member 12, the both stages are driven in mutually opposite directions in a non-contact manner along the scanning direction by the aid of a linear motor 13. During this process, the movement of the both stages 16, 14 does not exert any force on the base member 12 and other components, and thus the momentum is conserved. The mass ratio between the stage 16 and the stage 14 is set to be identical with a reduction magnification of an unillustrated projection optical system. Therefore, according to the law of conservation of momentum, the velocity ratio between the stage 16 and the stage 14 is a reciprocal number of the reduction magnification of the projection optical system. Thus, the both stages 16, 14 are subjected to accurate synchronous control.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: Since a mask stage 16 and a substrate stage 14 are supported in a floating manner over a base member 12, the both stages are driven in mutually opposite directions in a non-contact manner along the scanning direction by the aid of a linear motor 13. During this process, the movement of the both stages 16, 14 does not exert any force on the base member 12 and other components, and thus the momentum is conserved. The mass ratio between the stage 16 and the stage 14 is set to be identical with a reduction magnification of an unillustrated projection optical system. Therefore, according to the law of conservation of momentum, the velocity ratio between the stage 16 and the stage 14 is a reciprocal number of the reduction magnification of the projection optical system. Thus, the both stages 16, 14 are subjected to accurate synchronous control.

Abstract: A stage apparatus for moving a table, on which a work is carried, of a semiconductor producing equipment or the like on a base by way of a driving shaft and positioning the table at a predetermined position. The stage apparatus comprises a guide mechanism for guiding and supporting the table on the base; a linear motor provided between the base and the table along a direction in which the table is fed; and controlling means for controlling, for a predetermined period before the table is stopped, stopping operations of the driving shaft and the linear motor in a mutually associated relationship in accordance with predetermined controlling conditions.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: Since a mask stage 16 and a substrate stage 14 are supported in a floating manner over a base member 12, the both stages are driven in mutually opposite directions in a non-contact manner along the scanning direction by the aid of a linear motor 13. During this process, the movement of the both stages 16, 14 does not exert any force on the base member 12 and other components, and thus the momentum is conserved. The mass ratio between the stage 16 and the stage 14 is set to be identical with a reduction magnification of an unillustrated projection optical system. Therefore, according to the law of conservation of momentum, the velocity ratio between the stage 16 and the stage 14 is a reciprocal number of the reduction magnification of the projection optical system. Thus, the both stages 16, 14 are subjected to accurate synchronous control.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) difection and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.

Abstract: A tilt and motion apparatus capable of high accuracy positioning. An upper stage is spaced apart and moved, both for vertical movement and tilting, relative to a lower stage. The upper stage is supported on the lower stage by three articulated flexures which each move in the vertical direction but are kinematically rigid in the horizontal plane. Each articulated flexure has three arms connected in a Z shape and both flexure ends are fixed to a base structure mounted on the lower stage. A voice coil motor with one element mounted on the flexure and a second cooperating element on the lower stage pushes against each flexure, which is also connected to the upper stage, away from the lower stage. Thus, the upper stage is very stiff in the horizontal direction. Additionally, at least one air cylinder is connected between the upper stage and lower stage to provide a constant counterforce to the upper stage to support its weight.

Abstract: Position apparatus for controlling the movement of a table, on which a semiconductor work is carried along a unidirectional path in rectangular coordinate system. The table is driven in a single plane by x and y coordinate drive control means. The position apparatus includes guide means for supporting the table on the base; first drive means for driving the table in a first direction, a second drive means for driving the table in a second direction opposite to the first direction and controller means for controlling the first and second drive means to cause the table to stop without causing table vibration and without overshoot.

Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.