Patents by Inventor Akinori Nakano

Akinori Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7524908
    Abstract: A copolymerized high polymer film includes plural organic polymers, as skeleton, and is manufactured by blowing more than two kinds of organic monomers of respectively specific structures, in a vapor phase condition, onto the surface of a heated substrate, through plasma being generated in a reaction chamber. As a result, manufacture of an organic high polymer film capable of further reducing the effective relative permittivity of organic polymer films as a whole can be achieved, and, at the same time, further improvement in mechanical strength of film as well as film forming speed can be achieved.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: April 28, 2009
    Assignee: NEC Corporation
    Inventors: Jun Kawahara, Keizo Kinoshita, Nobutaka Kunimi, Akinori Nakano
  • Patent number: 7439315
    Abstract: A copolymer film having a decreased dielectric constant which is produced by supplying at least two organic monomers as raw materials, forming a film of a copolymer comprising a backbone based on said at least two monomers on a surface of a substrate, and heating the copolymer film at a temperature higher than a temperature at which the copolymer film is formed.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: October 21, 2008
    Assignee: NEC Corporation
    Inventors: Nobutaka Kunimi, Jun Kawahara, Akinori Nakano, Keizo Kinoshita
  • Patent number: 7220810
    Abstract: A polymer film having a low dielectric constant is produced polymerizing a raw material gas containing a compound of the formula (1): wherein PCA represents a polycycloaliphatic hydrocarbon group, ALK represents a divalent aliphatic hydrocarbon group, m is 1 or 2, n is 0 or 1, and R1 and R2 represent independently each other an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group or an aryloxy group by a plasma polymerization method.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: May 22, 2007
    Assignees: Sumitomo Chemical Company, Limited, NEC Corporation, ASM Japan K.K.
    Inventors: Nobutaka Kunimi, Jun Kawahara, Akinori Nakano, Keizo Kinoshita
  • Publication number: 20060052560
    Abstract: A copolymer film having a decreased dielectric constant which is produced by supplying at least two organic monomers as raw materials, forming a film of a copolymer comprising a backbone based on said at least two monomers on a surface of a substrate, and heating the copolymer film at a temperature higher than a temperature at which the copolymer film is formed.
    Type: Application
    Filed: July 22, 2005
    Publication date: March 9, 2006
    Applicants: Sumitomo Chemical Company, Limited, NEC CORPORATION, ASM Japan K.K.
    Inventors: Nobutaka Kunimi, Jun Kawahara, Akinori Nakano, Keizo Kinoshita
  • Publication number: 20060009600
    Abstract: A polymer film having a low dielectric constant is produced polymerizing a raw material gas containing a compound of the formula (1): wherein PCA represents a polycycloaliphatic hydrocarbon group, ALK represents a divalent aliphatic hydrocarbon group, m is 1 or 2, n is 0 or 1, and R1 and R2 represent independently each other an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group or an aryloxy group by a plasma polymerization method.
    Type: Application
    Filed: June 16, 2005
    Publication date: January 12, 2006
    Applicants: Sumitomo Chemical Company, Limited, NEC CORPORATION, ASM Japan K.K.
    Inventors: Nobutaka Kunimi, Jun Kawahara, Akinori Nakano, Keizo Kinoshita
  • Publication number: 20050282987
    Abstract: A copolymerized high polymer film includes plural organic polymers, as skeleton, and is manufactured by blowing more than two kinds of organic monomers of respectively specific structures, in a vapor phase condition, onto the surface of a heated substrate, through plasma being generated in a reaction chamber. As a result, manufacture of an organic high polymer film capable of further reducing the effective relative permittivity of organic polymer films as a whole can be achieved, and, at the same time, further improvement in mechanical strength of film as well as film forming speed can be achieved.
    Type: Application
    Filed: May 27, 2005
    Publication date: December 22, 2005
    Applicants: NEC Corporation, Sumitomo Chemical Company Limited, ASM Japan K.K.
    Inventors: Jun Kawahara, Keizo Kinoshita, Nobutaka Kunimi, Akinori Nakano
  • Patent number: 6261974
    Abstract: A DVS-BCB polymer film is grown by heating a divinyl siloxane bisbenzocyclobutene (DVS-BCB) monomer in a vaporization controller with continuously supplying; supplying a carrier gas and maintaining a partial pressure of the DVS-BCB monomer at a state lower than a saturated vapor pressure, thereby to vaporize the monomer; transporting the carrier gas containing the DVS-BCB monomer from the vaporization controller to an evacuated reaction chamber; and spraying the gas on the heated surface of a substrate in the reaction chamber.
    Type: Grant
    Filed: June 14, 1999
    Date of Patent: July 17, 2001
    Assignee: NEC Corporation
    Inventors: Jun Kawahara, Yoshihiro Hayashi, Akinori Nakano, Mikio Shimizu, Tomohisa Nishikawa