Patents by Inventor Akinori Shibuya

Akinori Shibuya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200363718
    Abstract: Provided is a kit including a curable composition for imprinting which contains a polymerizable compound having an aromatic ring and a composition for forming an underlayer film for imprinting which contains a polymer and a solvent, in which the polymer contains at least one kind of specific constitutional unit and has a polymerizable group, a film formed of the composition for forming an underlayer film for imprinting is a solid film at 23° C., and a portion that has a continuous partial structure containing an aromatic ring which is included in the polymerizable compound and accounts for 60% by mass or more of the polymerizable compound is common to a continuous partial structure containing an aromatic ring which is included in a substituent R in a side chain in the polymer.
    Type: Application
    Filed: August 7, 2020
    Publication date: November 19, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya Shimoju, Akinori Shibuya, Yuichiro Goto, Akihiro Hakamata
  • Publication number: 20200363730
    Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.
    Type: Application
    Filed: June 26, 2020
    Publication date: November 19, 2020
    Applicant: NIKON CORPORATION
    Inventors: Akinori SHIRATO, Takashi SHIBUYA
  • Publication number: 20200326638
    Abstract: In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.
    Type: Application
    Filed: June 25, 2020
    Publication date: October 15, 2020
    Applicant: NIKON CORPORATION
    Inventors: Akinori SHIRATO, Takashi SHIBUYA
  • Patent number: 10780679
    Abstract: Provided is a laminate that excels in adhesion among a plurality of resin layers formed as insulating layers containing polyimide and so forth, a method for manufacturing the laminate, a semiconductor device, and, a method for manufacturing the semiconductor device. The laminate comprises a substrate, and at least two resin layers, each of the resin layers is independently brought into contact, in at least a part of the surface thereof, with other resin layer, and the layers independently has a Young's modulus exceeding 2.8 GPa and not exceeding 5.0 GPa, and, an elongation after fracture exceeding 50% and not exceeding 200%, and further has a three-dimensional radical crosslinked structure, and at least one of the resin layers contains at least either polyimide or polybenzoxazole.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: September 22, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Yu Iwai, Takeshi Kawabata, Akinori Shibuya
  • Publication number: 20200264516
    Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.
    Type: Application
    Filed: April 29, 2020
    Publication date: August 20, 2020
    Applicant: NIKON CORPORATION
    Inventors: Akinori SHIRATO, Takashi SHIBUYA
  • Patent number: 10732510
    Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: August 4, 2020
    Assignee: NIKON CORPORATION
    Inventors: Akinori Shirato, Takashi Shibuya
  • Patent number: 10732517
    Abstract: In an exposure apparatus, on a substrate holder, a plurality of grating areas is arranged mutually apart in the X-axis direction, and a plurality of heads that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: August 4, 2020
    Assignee: NIKON CORPORATION
    Inventors: Akinori Shirato, Takashi Shibuya
  • Patent number: 10722514
    Abstract: Disclosed herein, inter alia, compounds and methods of use thereof for the modulation of USP7 activity.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: July 28, 2020
    Assignee: RAPT THERAPEUTICS, INC.
    Inventors: Berenger Biannic, Xinping Han, Dennis X. Hu, John Michael Ketcham, Paul Robert Leger, Jack Maung, Akinori Okano, Jacob Bradley Schwarz, Grant Shibuya, David Juergen Wustrow, Kyle Young
  • Publication number: 20200157267
    Abstract: The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R1 and R2 each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R3 represents a monovalent organic group, and R4 and R5 each independently represent a hydrogen atom or a monovalent organic group.
    Type: Application
    Filed: January 23, 2020
    Publication date: May 21, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori Shibuya, Yuichiro Goto
  • Patent number: 10656529
    Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: May 19, 2020
    Assignee: NIKON CORPORATION
    Inventors: Akinori Shirato, Takashi Shibuya
  • Patent number: 10649329
    Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a basic compound (A) corresponding to at least one of the following basic compound (A1) or (A2): (A1) a nonionic compound having an alicyclic structure (a1) and a basic site (b2) at a site different from the alicyclic structure within one molecule, or (A2) a nonionic compound having a heterocyclic structure (a2) having no basicity and a basic site (b2) at a site different from the heterocyclic structure within one molecule.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Akinori Shibuya, Keiyu Ou
  • Publication number: 20200089113
    Abstract: A photosensitive resin composition is also provided that includes a polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor; a photo-radical polymerization initiator; and a solvent, in which an acid value of an acid group contained in the polymer precursor and having a neutralization point in a pH range of 7.0 to 12.0 is in a range of 2.5 to 34.0 mgKOH/g, and either the polymer precursor contains a radically polymerizable group or the photosensitive resin composition includes a radically polymerizable compound other than the polymer precursor.
    Type: Application
    Filed: November 20, 2019
    Publication date: March 19, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Takeshi KAWABATA, Kenta YOSHIDA, Yu IWAI, Akinori SHIBUYA
  • Publication number: 20200040222
    Abstract: There are provided a composition having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate.
    Type: Application
    Filed: October 10, 2019
    Publication date: February 6, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori Shibuya, Yuichiro Goto
  • Patent number: 10538627
    Abstract: A photosensitive resin composition using a polyimide precursor composition, a cured film, a method for producing a cured film, a semiconductor device, and a method for producing a polyimide precursor composition are provided. In the polyimide precursor composition, the molar ratio of repeating units represented by General Formula (1-2) among structural isomers of the polyimide precursor is 60% to 90% by mole. In General Formula (1-2), A1 and A2 each independently represents an oxygen atom or NH, R111 and R112 each independently represents a single bond or a divalent organic group, and R113 and R114 each independently represents a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: January 21, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Takuma Amemiya, Hidekazu Oohashi, Yu Iwai, Akinori Shibuya
  • Patent number: 10526448
    Abstract: Provided are photosensitive resin compositions having a wide exposure latitude, a precursor composition for providing such a photosensitive resin composition, a method for producing a precursor composition, a cured film, a method for producing a cured film; and a semiconductor device. The precursor composition is a precursor composition containing at least one kind of heterocycle-containing polymer precursor, in which the heterocycle-containing polymer precursor is selected from a polyimide precursor and a polybenzoxazole precursor; and the dispersity which is a weight-average molecular weight/a number-average molecular weight of the heterocycle-containing polymer precursor is 2.5 or more.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: January 7, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Akinori Shibuya, Yu Iwai, Takeshi Kawabata, Ichiro Koyama
  • Publication number: 20190382623
    Abstract: There are provided a composition for forming an adhesive film for imprinting having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate. A composition for forming an adhesive film for imprinting contains a resin having a polymerizable group; and a solvent, in which the resin has at least one kind of a repeating unit derived from a polymerizable compound having a C log P value less than or equal to 0, and solubility of the resin in water at 25° C. is greater than or equal to 1 mass %, provided that the C log P value is a coefficient showing affinity of an organic compound with respect to water and 1-octanol.
    Type: Application
    Filed: August 21, 2019
    Publication date: December 19, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori SHIBUYA, Yuichiro GOTO
  • Publication number: 20190375753
    Abstract: Disclosed herein are pyrozolo-pyrimidin-amino-cycloalkyl compounds, analogs thereof, pharmaceutical compositions comprising thereof and therapeutic uses therefor.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 12, 2019
    Inventors: Minna H. T. Bui, Adrian O. Dukes, Xinping Han, Dennis X. Hu, Jeffrey J. Jackson, Yoo Min Ko, Paul R. Leger, Anqi Ma, Jack Maung, Andrew A. Ng, Akinori Okano, Omar Robles, Grant Shibuya, Hunter P. Shunatona, Jacob B. Schwarz, Anton A. Shakhmin, David J. Wustrow, Mikhail Zibinsky
  • Patent number: 10501580
    Abstract: A photosensitive resin composition using a polyimide precursor composition, a cured film, a method for producing a cured film, a semiconductor device, and a method for producing a polyimide precursor composition are provided. In the polyimide precursor composition, the molar ratio of repeating units represented by General Formula (1-2) among structural isomers of the polyimide precursor is 60% to 90% by mole. In General Formula (1-2), A1 and A2 each independently represents an oxygen atom or NH, R111 and R112 each independently represents a single bond or a divalent organic group, and R113 and R114 each independently represents a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: December 10, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Takuma Amemiya, Hidekazu Oohashi, Yu Iwai, Akinori Shibuya
  • Publication number: 20190369496
    Abstract: Provided are a photosensitive resin composition in which the progress of cyclization reaction is fast and storage stability over time is excellent, a heterocyclic ring-containing polymer precursor, a cured film, a laminate, a method for producing a cured film, and a semiconductor device, using the photosensitive resin composition. The photosensitive resin composition includes a heterocyclic ring-containing polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor, and a solvent, in which a solid content of the photosensitive resin composition has an amine value of 0.0002 to 0.0200 mmol/g.
    Type: Application
    Filed: August 15, 2019
    Publication date: December 5, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Takeshi KAWABATA, Yu IWAI, Akinori SHIBUYA
  • Patent number: 10450417
    Abstract: Provided is a resin capable of yielding a cured film with less warp and good uniformity, and of yielding a cured film (pattern) with less scum; a composition using the resin; a cured film; and a method for manufacturing a cured film and a semiconductor device. The resin is selected from polyimide precursor, polyimide, polybenzoxazole precursor, and, polybenzoxazole, and has a polymerizable group, and has a total content of a component with a molecular weight of 1,000 or smaller of 0.005 to 1.0% by mass.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: October 22, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Yu Iwai, Akinori Shibuya