Abstract: Provided is a positive resist composition using a resin having, in the polymer main chain, a specific acid decomposable structure and further having, in the side chain thereof, several specific acid decomposable groups, satisfactory in an exposure latitude, a focus latitude, and pattern collapse prevention at a high level, and having reduced development defects; and a pattern forming method.

Abstract: A positive resist composition comprises: (A) a compound that generates an acid upon irradiation with an actinic ray or radiation; and (B) a resin that has an acid-decomposable repeating unit represented by formula (I?), has a dispersity of 1.5 or less and increases its solubility in an alkali developer by action of an acid, wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two members out of Ry1 to Ry3 may combine to form a ring structure; and Z represents a divalent linking group.

Abstract: A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.

Abstract: A photosensitive composition comprises (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups that are different from each other in the acid decomposition ratio at an image formation sensitivity.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having at least two of repeating units represented by general formula (1) below and exhibiting increased solubility in an alkali developer when acted on by an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation. In the formula, each of R, A, R0, Z, L and n represents the same as defined in the claims and in the specification.

Abstract: A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

Abstract: A positive photosensitive composition includes (A) a resin having a repeating unit with a lactone structure of 5.0 or below an Onishi parameter and having any of repeating units of Formula (I) that when acted on by an acid, generates a carboxylic acid, and (B) a compound that when exposed to actinic rays or radiation, generates an acid, wherein each of R1, R2 and R3 independently represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted cycloalkyl group, provided that R2 and R3 may be bonded with each other to thereby form a ring structure, and Ra represents a hydrogen atom, an alkyl group or a group of the formula —CH2—O—Ra2 in which Ra2 represents a hydrogen atom, an alkyl group or an acyl group, the structure of Formula (I) having a van der Waals volume of 306×10?30 m3 or less.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.

Abstract: A lithographic printing plate precursor comprising a photosensitive layer comprising: (A) a fluorescent brightening agent; (B) an activator compound being capable of inducing a chemical change by an interaction with light absorption of the fluorescent brightening agent to produce at least one of a radical, an acid and a base; (C) a compound being capable of undergoing a reaction by an effect of at least one of a radical, an acid and a base to irreversibly change in its physical or chemical properties; and (D) a polyurethane resin binder, wherein the polyurethane resin binder is synthesized from at least following compounds (i), (ii), (iii) and (iv): (i) a diisocyanate compound; (ii) a diol compound having at least one carboxyl group; (iii) a diol compound having a logP value of less than 0; and (iv) a diol compound having a logP value of 0 or more, with the proviso that each of the diol compound (iii) and the diol compound (iv) does not have a carboxyl group.

Abstract: A photosensitive composition comprising: a sensitizing dye represented by the formula (I) defined herein, in which Z represents a substituted divalent linking group forming a 5-membered or 6-membered ring, provided that a total volume of substituents arranged on the 5-membered or 6-membered ring formed by Z is 200 ?3 or more; R1 represents a hydrogen atom or a monovalent non-metal atomic group; A represents a substituted or unsubstituted aromatic ring or hetero ring; and R1 and A may be taken together to form an aliphatic or aromatic ring; an activator compound being capable of causing a chemical change due to a mutual action with an electron excited state to be generated by light absorption of the sensitizing dye, thereby generating a radical or an acid; and a polymerizable compound being capable of reacting with at least one of a radical and an acid.

Abstract: A photosensitive composition comprising (i) at least one titanocene compound, (ii) a pyridine compound having a structure represented by formula (1) defined in the specification or a cyan compound having a structure represented by formula (3) defined in the specification, and (iii) a compound capable of undergoing a reaction with at least one of a radical and an acid to irreversibly change its physical or chemical property.

Abstract: A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.

Abstract: A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation

Abstract: A photosensitive composition comprising: a sensitizing dye represented by the following formula (1): in which A represents an optionally substituted aromatic ring or an optionally substituted hetero ring; X represents an oxygen atoms a sulfur atom, or —N(R6)—; and R1, R2, R3, R4, R5, and R6 each independently represents a hydrogen atom or a monovalent non-metal atomic group; an activator compound being capable of causing a chemical change due to a mutual action with light absorption of the sensitizing dye represented by the formula (1) so as to generate at least one of a radical, an acid and a base; and a compound being capable of reacting with at least one of a radical and an acid so that physical or chemical characteristics thereof change irreversibly.

Abstract: A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

Abstract: A photosensitive composition containing: a sensitizing dye represented by the formula (1) as defined herein; an initiator compound capable of generating a radical, an acid, or a base; and a compound whose physical or chemical characteristic irreversibly changes by at least one of a radical, an acid, and a base.

Abstract: The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of generating a radical with light or heat. Further, the invention provides a negative-working planographic printing plate precursor which has a recording layer containing the polymerizable composition. Use of the polymerizable composition of the invention provides a planographic printing plate precursor that is capable of forming high-quality images free from stains in non-image portions, and further has high strength in formed image portions and excellent printing endurance.

Abstract: A compound having a novel structure and a photo-sensitive composition comprising (i) the novel compound as a sensitizing dye, (ii) an activator compound generating at least one of a radical and an acid by interacting the activator compound with light absorption of the sensitizing dye to cause chemical change, and (iii) a compound changing its physical or chemical property irreversibly by a reaction with at least one of the radical and the acid.

Abstract: A photosensitive composition comprising: a polymer obtained by polymerization of a monomer having a structure represented by the formula (I) as defined herein; a polymerizable compound having an unsaturated double bond; and a radical polymerization initiator selected from a hexaarylbiimidazole compound and a metallocene compound.

Abstract: A photosensitive composition comprising: a hexaarylbiimidazole compound represented by the following formula (I) as defined herein; a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 850 nm; and an addition-polymerizable compound capable of reacting by at least one of a radical and an acid.