Patents by Inventor Akinori Tanaka

Akinori Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10310419
    Abstract: An image forming apparatus includes an image bearing member to form a toner image on a recording material with a liquid developer containing a toner and a carrier liquid, wherein the carrier liquid contains a first substance, charged to an opposite polarity to a charge polarity of the toner, for imparting an electrical polarity to the toner, and a second substance, higher in volume resistivity than the first substance, a cleaning portion to collect the liquid developer remaining on the image bearing member after the toner image is transferred onto the recording material, a toner separating device to separate the collected liquid developer into the toner and the carrier liquid, and a carrier separating device to separate the carrier liquid into the carrier liquid containing the first substance and the carrier liquid containing the second substance by applying an electric field to the carrier liquid.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: June 4, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Teppei Nagata, Akinori Tanaka
  • Publication number: 20190003047
    Abstract: Described herein is a technique capable of preventing an occurrence of the metal contamination in a vaporizer for vaporizing a liquid source. According to the technique described herein, there is provided a vaporizer including: a vaporization vessel constituted by a quartz body; and an atomizer made of a fluorine resin and configured to atomize a liquid source using a carrier gas (atomization gas) and to supply the atomized liquid source into the vaporization vessel.
    Type: Application
    Filed: September 7, 2018
    Publication date: January 3, 2019
    Inventors: Hideto TATENO, Akinori TANAKA, Daisuke HARA, Masahisa OKUNO, Takuya JODA, Takashi TSUKAMOTO, Sadayoshi HORII, Toru KAKUDA
  • Publication number: 20180308730
    Abstract: A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.
    Type: Application
    Filed: April 24, 2018
    Publication date: October 25, 2018
    Inventors: Kenji NAKAMIZO, Satoshi MORITA, Akinori TANAKA, Hiroshi KOMIYA, Mikio NAKASHIMA, Kousuke FUKUDA, Youichi MASAKI, Ryoji ANDO, Ikuo SUNAKA
  • Publication number: 20180204742
    Abstract: A substrate processing apparatus, includes: a process chamber accommodating a substrate; a vaporizer vaporizing a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas, the vaporizer including: a vaporization vessel; and a heater heating the liquid precursor introduced into the vessel; a carrier gas flow rate controller controlling flow rate of the carrier gas supplied to the vaporizer; a liquid precursor flow rate controller controlling flow rate of the liquid precursor; a processing gas supply pipe introducing the processing gas delivered from the vaporizer into the process chamber; and a gas concentration sensor detecting a gas concentration of the reaction gas contained in the processing gas delivered from the vaporizer into the processing gas supply pipe.
    Type: Application
    Filed: March 13, 2018
    Publication date: July 19, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto TATENO, Daisuke HARA, Masahisa OKUNO, Takuya JODA, Takashi TSUKAMOTO, Akinori TANAKA, Toru KAKUDA, Sadayoshi HORII
  • Publication number: 20180204720
    Abstract: Described herein is a technique capable of acquiring, monitoring and recording the progress of the reaction between a substrate and a reactive gas contained in a process gas in a process chamber during the processing of the substrate. According to the technique, there is provided a substrate processing apparatus including: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber via a process gas supply pipe; an exhaust pipe configured to exhaust an inner atmosphere of the process chamber; a first gas concentration sensor configured to detect a first concentration of a reactive gas contained in the process gas in the process gas supply pipe; and a second gas concentration sensor configured to detect a second concentration of the reactive gas contained in an exhaust gas in the exhaust pipe.
    Type: Application
    Filed: March 12, 2018
    Publication date: July 19, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Akinori TANAKA, Hideto TATENO, Sadayoshi HORII
  • Publication number: 20180087709
    Abstract: A configuration including a process chamber for processing a substrate, a gas supply system including supply pipe for supplying a source gas into the process chamber, and an exhaust system including exhaust pipe for discharging an exhaust gas containing the source gas from the process chamber, in which at least one of the supply pipe and the exhaust pipe includes an inner pipe constituting a first flow path of the source gas or the exhaust gas, a member provided outside the inner pipe and constituting a second flow path between the member and an outer wall of the inner pipe, and an outer pipe provided surrounding the inner pipe in order to provide a space between the outer pipe and an outside of the member.
    Type: Application
    Filed: September 15, 2017
    Publication date: March 29, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Mikio OHNO, Akinori TANAKA
  • Publication number: 20180059582
    Abstract: An image forming apparatus includes an image forming portion configured to form a toner image on a recording material with a liquid developer containing a toner and a carrier liquid, wherein the carrier liquid contains a first substance for imparting an electrical polarity to the toner and a second substance, higher in volume resistivity than the first substance, as a dispersion medium for dispersing the toner; and a carrier separating device configured to separate the carrier liquid into the first substance charged to an opposite polarity to a charge polarity of the toner and the second substance by applying an electric field to the liquid developer collected from the image forming portion so as to collect each of the first substance and the second substance.
    Type: Application
    Filed: May 27, 2016
    Publication date: March 1, 2018
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Teppei Nagata, Akinori Tanaka
  • Patent number: 9530677
    Abstract: A substrate processing apparatus comprises a processing chamber for storing a substrate and performing a specified processing on the substrate, a substrate holding jig for holding the substrate in the processing chamber, a placement stand capable of moving the substrate holding jig inside and outside the processing chamber while mounting the substrate holding jig, a substrate holding jig movement mechanism for moving the substrate holding jig to a location different from the placement stand while holding the substrate holding jig, and a substrate holding jig movement suppression mechanism for suppressing vertical and horizontal movement of the substrate holding jig in order to keep the substrate holding jig mounted on the placement unit of the substrate holding jig movement mechanism.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: December 27, 2016
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Takatomo Yamaguchi, Akinori Tanaka, Daisuke Hara
  • Patent number: 9084298
    Abstract: There are provided a substrate processing apparatus capable of suppressing leakage of magnetic field during processing of a substrate.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: July 14, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Yukitomo Hirochi, Akinori Tanaka, Akihiro Sato, Takeshi Itoh, Daisuke Hara, Kenji Shirako, Kazuhiro Morimitsu, Masanao Fukuda
  • Patent number: 8851886
    Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a non-metallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold includes a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: October 7, 2014
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Shinya Morita, Akihiro Sato, Akinori Tanaka, Shigeo Nakada, Takayuki Nakada, Shuhei Saido, Tomoyuki Matsuda
  • Patent number: 8538313
    Abstract: The present invention includes an image forming unit, a reversing unit configured to reverse the sheet on which the image has been formed by the image forming unit, a reconveyance path which conveys the sheet reversed by the reversing unit to a feeding path for forming an image on the sheet by the image forming unit again, a position detection unit which is provided on the reconveyance path and configured to detect a position of the sheet in a width direction, a skew-feeding correction unit which is provided on the reconveyance path and configured to correct skew-feeding of the sheet, wherein the position detection unit is disposed on the downstream of the skew-feeding correction unit in reconveyance path, wherein the image forming unit corrects the position of the image to be formed on the sheet, which is conveyed through the reconveyance path, based on a signal from the positioning detection unit.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: September 17, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventor: Akinori Tanaka
  • Patent number: 8311458
    Abstract: In an image forming apparatus having a developing rotary, when a positive direction refers to a circumferential direction of the developing rotary in which the portion of the developing rotary facing a photosensitive drum moves in the same direction as the movement of the circumference of the photosensitive drum, a clear developing unit is farther from the developing unit positioned in the negative direction relative to the clear developing unit than from the developing unit positioned in the positive direction relative to the clear developing unit.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: November 13, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventor: Akinori Tanaka
  • Publication number: 20120216743
    Abstract: A downsized substrate may be housed in a substrate accommodation vessel (FOUP) constituting a transfer system corresponding to a large diameter substrate. An attachment includes an upper plate and a lower plate supported by a first support groove that can support an 8-inch wafer, and holding columns installed at the upper plate and the lower plate and including a second support groove that can support a 2-inch wafer (if necessary, via a wafer holder and a holder member). Accordingly, the 2-inch wafer can be housed in a pod corresponding to the 8-inch wafer, and the pod, which is a transfer system, can be standardized to reduce cost of a semiconductor manufacturing apparatus. In addition, a distance from each gas supply nozzle to the wafer can be increased to sufficiently mix reactive gases before arrival at the wafer and improve film-forming precision to the wafer.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 30, 2012
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Takeshi Itoh, Akinori Tanaka
  • Patent number: 8246734
    Abstract: The writing ink composition of the present invention includes: an oil-based component containing a polar solvent and a spinnability imparting agent; and a water-based component containing water, polyhydric alcohol, a thixotropy imparting agent and a pigment, the water-based component being dispersed in the above oil-based component.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: August 21, 2012
    Assignee: Zebra Co., Ltd.
    Inventors: Tomooki Okabe, Akinori Tanaka
  • Patent number: 8178725
    Abstract: A method for efficiently separating and collecting an optically active amino acid amide and an optically active amino acid from an aqueous solution containing the optically active amino acid amide and the optically active amino acid includes separating and collecting an optically active amino acid amide from an aqueous solution containing the optically active amino acid amide and an optically active amino acid, utilizing a difference in solubility in an organic solvent between the optically active amino acid amide and the optically active amino acid, without desalting the aqueous solution or after desalting the same, under such a condition that a ratio (C/A) of the total equivalent (C) of cations to the total equivalent (A) of anions contained in the aqueous solution falls within the range from 0.95 to 1.05 when the aqueous solution is not desalted, and the range from 0.5 to 1.5 when the aqueous solution is desalted.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: May 15, 2012
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masaki Sugita, Satoshi Nanba, Akinori Tanaka
  • Patent number: 8137019
    Abstract: The ink composition for a writing instrument has an aqueous component containing water, a thixotropic agent, a polyhydric alcohol and a pigment, dispersed in an oil component having dyes and non-dye components, wherein the IOB value for all of the dyes in the oil component is no greater than 0.9.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: March 20, 2012
    Assignee: Zebra Co., Ltd.
    Inventors: Mayumi Yamaguchi, Yu Tsukamoto, Akinori Tanaka
  • Patent number: 8081906
    Abstract: An image forming apparatus includes color developing units for development with color developing agents, a transparence developing unit for development with a transparent developing agent, a rotary member which holds and rotationally moves the color and transparence developing units toward a development position, a driving device which rotationally drives the rotary member, a toner accumulation portion arranged below the rotary member in a gravity direction, falling toner accumulating therein, and a controller capable of starting image formation after the rotary member is moved to a reference position for rotation start. When the rotary member is located at the reference position, stop control thereof is performed such that at least one color developing unit is located in a region arranged downstream of the transparence developing unit and upstream of a lowermost portion of the rotary member in the gravity direction, with reference to the rotation direction of the rotary member.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: December 20, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Akinori Tanaka
  • Publication number: 20110306212
    Abstract: Embodiments described herein relate to a substrate processing apparatus includes a reaction tube, a processing chamber provided inside the reaction tube to process a substrate therein, an induction target provided inside the reaction tube to surround the processing chamber and configured to heat the substrate, a heat insulator provided inside the reaction tube to surround the induction target, an induction target provided outside the reaction tube to inductively heat at least the induction target, a first gas supply unit for supplying a first gas into the processing chamber, and a second gas supply unit for supplying a second gas to a first gap provided between the induction target and the heat insulator.
    Type: Application
    Filed: June 10, 2011
    Publication date: December 15, 2011
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Akihiro SATO, Akinori TANAKA, Takeshi ITOH, Masanao FUKUDA, Kazuhiro MORIMITSU
  • Patent number: 8043421
    Abstract: The present invention is directed to a kit for rendering a glass surface water repellent. This invention is particularly directed to a kit for coating a windshield of a vehicle to render the windshield water repellent.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: October 25, 2011
    Assignees: E.I. du Pont de Nemours & Company, Soft 99 Corporation
    Inventors: Masahiro Kato, Akinori Tanaka, Masahiro Sasagawa, Hiromitsu Adachi
  • Patent number: D813065
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: March 20, 2018
    Assignees: HITACHI KOKUSAI ELECTRIC INC., HORIBA ADVANCED TECHNO CO., LTD.
    Inventors: Hideto Tateno, Akinori Tanaka, Kimihiko Arimoto