Abstract: The present invention provides a method for manufacturing a small-sized physically-strengthened glass sheet having excellent design properties, a structure using the small-sized physically-strengthened glass sheet, and a method for manufacturing the structure. In the cutting step in the method for manufacturing a physically-strengthened glass sheet of the present invention, the intermediate layer 17 is locally heated at a temperature not higher than the annealing point thereof with a laser beam 20 to thereby locally generate a tensile stress smaller than the internal residual tensile stress CT or a compressive stress in the intermediate layer 17 to control the propagation speed of the crack 30 due to the internal residual tensile stress.

Abstract: The present invention relates to a chemically strengthened glass for a display device, having a visible light transmittance Tva of 50% or more and less than 91% at a thickness of 1 mm using A light source, and an excitation purity Pe of less than 0.5% at a thickness of 1 mm.

Abstract: A method capable of forming a sufficiently thick low alkali concentration region without heating glass to a high temperature and even in an atmosphere which is not an atmosphere of plasma formation gas such as helium and argon, is provided. A glass substrate having a pair of main surfaces and being made of glass containing an alkali oxide in its composition, is disposed between a first electrode and a second electrode so that one main surface is separated from the first electrode and the other main surface is brought into contact with the second electrode, and a corona discharge is generated by applying a direct-current voltage to the first electrode as a positive electrode and the second electrode as a negative electrode, in a positive-electrode-side surface layer portion of the glass substrate, at least one positive ion including an alkali ion migrate toward the negative-electrode-side.

Abstract: The present invention relates to a TiO2-containing quartz glass substrate for an imprint mold having a main surface and a side surface, in which the side surface has an arithmetic average roughness (Ra) of 1 nm or less, and the side surface has a root mean square (MSFR_rms) of concaves and convexes in the wavelength region of from 10 ?m to 1 mm being 10 nm or less.

Abstract: The present invention relates to an alkali-free glass having a strain point of from 680 to 735° C., an average thermal expansion coefficient at from 50 to 350° C. of from 30×10?7 to 43×10?7/° C., and a specific gravity of 2.60 or less, and containing, indicated by mol % on the basis of oxides, SiO2 65 to 69%, Al2O3 11.5 to 14%, B2O3 3 to 6.5%, MgO 1 to 5%, CaO 7.5 to 12%, SrO 0 to 1%, BaO 0.5 to 6%, and ZrO2 0 to 2%.

Abstract: The present invention relates to an alkali-free glass having a strain point of 680 to 735° C., an average thermal expansion coefficient at from 50 to 350° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa.s of 1,710° C. or lower, and a temperature T4 at which the glass viscosity reaches 104 dPa.s of 1,310° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 63 to 74, Al2O3 11.5 to 16, B2O3 exceeding 1.5 to 5, MgO 5.5 to 13, CaO 1.5 to 12, SrO 1.5 to 9, BaO 0 to 1, and ZrO2 0 to 2, in which MgO+CaO+SrO+BaO is from 15.5 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.35 or more, CaO/(MgO+CaO+SrO+BaO) is 0.50 or less, and SrO/(MgO+CaO+SrO+BaO) is 0.50 or less.

Abstract: The present invention relates to an alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at from 50 to 350° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1,710° C. or lower, and a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1,320° C. or lower, containing, indicated by % by mass on the basis of oxides: SiO2 58.5 to 67.5, Al2O3 18 to 24, B2O3 0 to 1.7, MgO 6.0 to 8.5, CaO 3.0 to 8.5, SrO 0.5 to 7.5, BaO 0 to 2.5, and ZrO2 0 to 4.0, containing 0 to 0.35% by mass of Cl, 0.01 to 0.15% by mass of F, and 0.01 to 0.3% by mass of SnO2, and having a ?-OH value of the glass of from 0.15 to 0.60 mm?1.

Abstract: The present invention relates to an alkali-free glass substrate with a thickness of 0.4 mm or less, which has been reduced in thickness by 5 ?m or more by a hydrofluoric acid (HF) etching treatment, in which the alkali-free glass substrate contains an alkali-free glass described below, and the alkali-free glass substrate after reduced in thickness has a specific modulus of 32 MNm/kg or more and a photoelastic constant of 31 nm/MPa/cm or less, the alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at 50 to 350° C. of from 30×10?7to 43×10?7/° C., a temperature T2 at which a glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower.

Abstract: The present invention relates to a non-alkali glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1,710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1,320° C. or lower, containing, indicated by percentage by mass on the basis of oxides, SiO2 58.5 to 67.5, Al2O3 18 to 24, B2O3 0 to 1.7, MgO 6.0 to 8.5, CaO 3.0 to 8.5, SrO 0.5 to 7.5, BaO 0 to 2.5 and ZrO2 0 to 4.0, containing Cl in an amount of from 0.15 to 0.35% by mass, F in an amount of from 0.01 to 0.15% by mass and SO3 in an amount of from 1 to 25 ppm and having a ?-OH value of the glass of from 0.15 to 0.45 mm?1, in which (MgO/40.3)+(CaO/56.1)+(SrO/103.6)+(BaO/153.3) is from 0.27 to 0.35, (MgO/40.3)/((MgO/40.3)+(CaO/56.1)+(SrO/103.6)+(BaO/153.3)) is 0.40 or more, (MgO/40.3)/((MgO/40.3)+(CaO/56.1)) is 0.40 or more, and (MgO/40.3)/((MgO/40.3)+(SrO/103.6)) is 0.

Abstract: The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×107 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102dPa.s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPd.s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

Abstract: The present invention relates to a production method for a non-alkali glass, containing putting glass raw materials in a melting furnace, heating to a temperature of 1,350 to 1,750° C. to prepare a molten glass, and forming the molten glass into a sheet shape by float method, in which the heating in the melting furnace concurrently utilizes heating by combustion flame of burners and electrical heating of the molten glass by heating electrodes arranged so as to be dipped in the molten glass in the melting furnace, and in which when electrical resistivity at 1,350° C. of the molten glass is represented by Rg (?cm) and electrical resistivity at 1,350° C. of a refractory constituting the melting furnace is represented by Rb (?cm), the glass raw materials and the refractory are selected so as to achieve Rb>Rg.

Abstract: A method for manufacturing an alkali-free glass includes heating the glass raw material at a temperature of 1,400 to 1,800° C. in a melting furnace to thereby prepare a molten glass, and forming the molten glass into a sheet shape, wherein heating by combustion flame of a burner and electrical heating of the molten glass by a heating electrode arranged so as to be dipped in the molten glass in the melting furnace are used in combination in the heating in the melting furnace, and when an electrical resistivity of the molten glass at 1,400° C. is Rg (?cm) and an electrical resistivity of a refractory constituting the melting furnace at 1,400° C. is Rb (?cm), the glass raw material and the refractory are selected so as to satisfy Rb>Rg.

Abstract: To provide a glass plate to be tempered, which has a low thermal expansion coefficient at relatively low temperature, and which can have a sufficiently high surface compression stress by a conventional heat tempering process, even when it is thin. A glass plate to be tempered, which contains B2O3 in a range of from 12.5 to 35 mol % in its composition, the difference [X?Y] between the total content X of compounds selected from MgO, CaO, BaO, Na2O and K2O in the composition and the content Y of B2O3 in the composition being within a range of from ?5 to 10 mol %, and which is to be tempered by heating and quenching.

Abstract: A method of manufacturing a lithium ion conductive solid electrolyte includes (a) a step of preparing an object to be processed including a crystalline material, that includes alkali metal other than lithium and whose ionic conductivity at room temperature is greater than or equal to 1×10?13 S/cm; and (b) a step of performing an ion-exchange process on the object to be processed in molten salt including lithium ions.

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract: A float glass for chemical strengthening, having a bottom surface to contact a molten metal during molding and a top surface facing the bottom surface. An absolute value of a difference between a normalized hydrogen concentration at a depth of 5 to 10 ?m that is a value obtained by dividing a hydrogen concentration at a depth of 5 to 10 ?m by a hydrogen concentration at a depth of 50 to 55 ?m in the top surface and the normalized hydrogen concentration at a depth of 5 to 10 ?m in the bottom surface is 0.35 or less.

Abstract: The present invention relates to a chemically strengthened glass for a display device, having a visible light transmittance Tva of 50% or more and less than 91% at a thickness of 1 mm using A light source, and an excitation purity Pe of less than 0.5% at a thickness of 1 mm.

Abstract: The present invention provides a glass plate to be tempered, which has a low thermal expansion coefficient, a high surface compression stress due to physical reinforcements and a low density and is excellent in the scratch durability. A glass plate to be tempered which comprises, by mass % as represented by the following composition: SiO2: 55 to 85%, B2O3: 2 to 12%, MgO: 0.1 to 12%, CaO: 0.1 to 12%, Na2O: 0 to 13%, MgO+CaO+SrO+ZnO: 3 to 16% and Al2O3: 0 to 3% and, which can be tempered by heating and quenching.

Abstract: The present invention relates to a glass composition including, in terms of mol % on the basis of oxides: from 55 to 70% of SiO2, from 5 to 10% of Al2O3, from 0 to 0.5% of B2O3, from 3 to 15% of MgO, from 3 to 15% of CaO, from 2 to 10% of SrO, from 1 to 10% of BaO, from 0 to 3% of ZrO2, from 0 to 1.8% of Na2O, and from 0 to 1% of K2O, provided that MgO+CaO+SrO+BaO is from 20 to 35%, and Na2O+K2O is from 0 to 2%, in which the glass composition has a glass transition temperature of 680° C. or higher, an average thermal expansion coefficient of from 50×10?7 to 70×10?7/° C., and a temperature at which a viscosity is 102 dPa·s of 1,600° C. or lower.

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1?90(° C.) to T1?220(° C.) for 120 hours or more.