Patents by Inventor Akio Shima

Akio Shima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090140233
    Abstract: A nonvolatile semiconductor memory device having a large storage capacity and stabilized rewriting conditions in which a memory cell includes a nonvolatile recording material layer, a selector element and a semiconductor layer provided between the nonvolatile recording material layer and the selector element and having a thickness ranging from 5 to 200 nm.
    Type: Application
    Filed: November 10, 2008
    Publication date: June 4, 2009
    Inventors: Masaharu KINOSHITA, Motoyasu Terao, Hideyuki Matsuoka, Yoshitaka Sasago, Yoshinobu Kimura, Akio Shima, Mitsuharu Tai, Norikatsu Takaura
  • Publication number: 20090085042
    Abstract: A display device having a thin film semiconductor device including a semiconductor thin film having first and second semiconductor regions formed each into a predetermined shape above an insulative substrate, a conductor fabricated into a predetermined shape to the semiconductor thin film and a dielectric film put between the semiconductor thin film and the conductor, in which the semiconductor thin film is a polycrystal thin film with the crystallization ratio thereof exceeding 90% and the difference of unevenness on the surface of the semiconductor thin film does not exceed 10 nm.
    Type: Application
    Filed: July 29, 2008
    Publication date: April 2, 2009
    Inventors: Toshiyuki Mine, Mitsuharu Tai, Akio Shima
  • Publication number: 20080145987
    Abstract: A reflectance-controlling layer whose reflectance to irradiation of laser light becomes lower as a thickness thereof becomes thinner is formed on a semiconductor substrate having a first region and a second region. Thereafter, the reflectance-controlling layer on the first region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal an n?-type semiconductor region and an n+-type semiconductor region of the first region. In the same manner, after the reflectance-controlling layer is formed on the semiconductor substrate, the reflectance-controlling layer on the second region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal a p?-type semiconductor region and a p+-type semiconductor region of the second region.
    Type: Application
    Filed: November 21, 2007
    Publication date: June 19, 2008
    Inventor: Akio Shima
  • Patent number: 7191610
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Grant
    Filed: April 8, 2004
    Date of Patent: March 20, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Koichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii
  • Patent number: 7174735
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: February 13, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Kouichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii
  • Patent number: 7098111
    Abstract: A manufacturing technology of a MOSFET having a shallow junction and a source and drain of a low resistance is provided. After having ion-implanted an As on the surface of a p type well forming a gate electrode, a surface protection layer and an energy absorber layer are deposited on a substrate. When the surface of the substrate is irradiated by a YAG laser beam of the wavelength of 1064 nm for one nano second to 999 nano seconds, a heat absorbed by the energy absorber layer is transmitted to the substrate in an ultra short time, and heats its surface to a melting temperature, and therefore, the impurity is activated, and an extension region of a low resistance is formed in an extremely shallow region of about 20 nm in depth from the surface of the p type well.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: August 29, 2006
    Assignee: Hitachi, Ltd.
    Inventor: Akio Shima
  • Publication number: 20050064664
    Abstract: A manufacturing technology of a MOSFET having a shallow junction and a source and drain of a low resistance is provided. After having ion-implanted an As on the surface of a p type well forming a gate electrode, a surface protection layer and an energy absorber layer are deposited on a substrate. When the surface of the substrate is irradiated by a YAG laser beam of the wavelength of 1064 nm for one nano second to 999 nano seconds, a heat absorbed by the energy absorber layer is transmitted to the substrate in an ultra short time, and heats its surface to a melting temperature, and therefore, the impurity is activated, and an extension region of a low resistance is formed in an extremely shallow region of about 20 nm in depth from the surface of the p type well.
    Type: Application
    Filed: September 24, 2004
    Publication date: March 24, 2005
    Inventor: Akio Shima
  • Publication number: 20040245583
    Abstract: Source and drain diffusion layers by an extremely shallower box shaped highly doped impurity distribution that was not obtainable so far by the existent solid phase growing is attained by liquid phase growing with no effects on the gate electrode thereby attaining low consumption power and operation at large current and higher speed in a micro-refined semiconductor device. Contact with inter-connection layer over the entire region of the source and drain diffusion layers is enabled overstriding the gate electrode and without short circuit with the gate electrode by utilizing that the etching selectivity of an insulation film comprising Al as a main constituent atom is extremely higher with respect to an Si oxide film.
    Type: Application
    Filed: March 3, 2004
    Publication date: December 9, 2004
    Inventors: Masatada Horiuchi, Akio Shima, Takashi Takahama
  • Publication number: 20040187497
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Application
    Filed: April 8, 2004
    Publication date: September 30, 2004
    Applicant: Hitachi, Ltd.
    Inventors: Kouichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii
  • Publication number: 20040154325
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Application
    Filed: January 22, 2004
    Publication date: August 12, 2004
    Applicant: Hitachi, Ltd.
    Inventors: Kouichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii
  • Patent number: 6698223
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: March 2, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Kouichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii
  • Publication number: 20030227062
    Abstract: Source-drain diffusion regions of a shallow junction and a stacked metal silicide film structure of a low resistance in a miniaturized MIS transistor are to be attained while ensuring high reliability. The concentration of an impurity (As, P, In, Sb) in surface areas of source-drain diffusion regions (6, 7) is set to a value of not smaller than 5×1021/cm3. Alternatively, an alloy film of germanium and silicon containing not less than 20% of germanium, or germanium film, is formed on surface areas of the source-drain diffusion regions (6, 7).
    Type: Application
    Filed: June 6, 2003
    Publication date: December 11, 2003
    Inventors: Masatada Horiuchi, Kazuhiro Ohnishi, Akio Shima, Takashi Takahama, Masakazu Kawano
  • Publication number: 20030131621
    Abstract: In the air-conditioning system, a primary side to generate heat includes a heat storage and a heat source and produces cool or warm water using an inexpensive commercial power source such as a nighttime power source. A system collaboration unit is disposed between a motor to drive a water pump and a power source. The unit is connected to the motor via a cable. An output from the inverter is connected to the motor via a cable.
    Type: Application
    Filed: August 30, 2002
    Publication date: July 17, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Kouichi Satoh, Seiji Yanagisawa, Shu Watabe, Yukihiro Fujita, Akio Shima, Yuji Tanaka, Shinichi Takahashi, Hiroshi Kunii