Abstract: Provided is a resin that exhibits high resist performance because a poorly soluble component with respect to a resist solvent is reduced, and a production method for the resin. Disclosed is a photoresist resin containing an acrylic resin, in which when the photoresist resin is dissolved in propylene glycol monomethyl ether acetate in such a way that a resin solid content concentration is 5 wt %, a polystyrene equivalent turbidity measured using a method described in “Drinking Water Testing Methods” of Japan Water Works Association of 2003, Ministry of Health, Labor and Welfare Ordinance No. 261 of Japan is 30 or less.

Abstract: A new diversity concept is provided for achieving accurate phase retrieval with a singleshot acquisition. Multiple irradiance data are obtained by a diffractive grating or CGH designed to generate multiple diffraction orders with different diversity values. The effective filters associated with the individual diffraction orders from the diffractive grating or CGH are calculated. The effective filters are extracted by numerical propagation, and they preferably include both real and imaginary values, which signify both absorption and phase shift versus position in the filter plane. The reconstruction process utilizes accurate knowledge of the effective filters for each diffraction order for high quality reconstruction of the extrinsic phase.

Abstract: An aberration estimating method includes acquiring a light intensity distribution of an optical image of an object formed via a target optical system, acquiring an approximated aberration of the target optical system based on the light intensity distribution, determining an initial value of the aberration of the target optical system based on the approximated aberration, and estimating an aberration of the target optical system using the initial value.

Abstract: Provided is a monomer that improves solubility in organic solvents, hydrolyzability, and solubility in water after hydrolysis of a resin as well as imparts higher heat resistance to a resin.

Abstract: An aberration estimating method includes acquiring a light intensity distribution of an optical image of an object formed via a target optical system, acquiring an approximated aberration of the target optical system based on the light intensity distribution, determining an initial value of the aberration of the target optical system based on the approximated aberration, and estimating an aberration of the target optical system using the initial value.

Abstract: Provided are a photoresist resin having high solubility in solvents and a method for producing the photoresist resin. Also provided are a photoresist resin composition containing the photoresist resin and a pattern formation method using the photoresist resin composition. A photoresist resin containing no cyano group at a resin end and having a molecular weight distribution (Mw/Mn) of not greater than 1.4.

Abstract: An aberration estimating method includes acquiring a light intensity distribution of an optical image of an object formed via a target optical system, acquiring an approximated aberration of the target optical system based on the light intensity distribution, determining an initial value of the aberration of the target optical system based on the approximated aberration, and estimating an aberration of the target optical system using the initial value.

Abstract: An image processing method includes acquiring a plurality of coded data based on imaging of an object using a plurality of types of coding masks, calculating composite data based on the plurality of coded data by weighted averaging using complex coefficients, and calculating an object image by reconstruction processing based on the composite data and the plurality of types of coding masks. The reconstruction processing includes performing a deconvolution calculation for the composite data based on a transmittance distribution of the plurality of types of coding masks.

Abstract: Object: To provide a monomer that is useful in forming a photoresist resin that has excellent swelling resistance. Resolution Means: A photoresist resin containing a polymerization unit represented by Formula (Y), where RX denotes a halogen atom or an alkyl group having from 1 to 6 carbon atoms substituted with a halogen atom; A1 denotes a single bond or a linking group, and when A1 denotes a linking group, A1 and RX1 may be bonded to each other to form a ring; RX1 denotes a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms, or an alkenyl group having from 2 to 6 carbon atoms; n denotes an integer from 0 to 5, and when n is 2 or greater, the multiple RX1 may be the same or different and may be bonded to each other to form a ring; and m denotes an integer from 1 to 4.

Abstract: The image estimating method is configured to estimate, using image data generated by capturing an object via an image-pickup optical system at a plurality of positions that are spaced at first intervals in an optical-axis direction of the image-pickup optical system, image data at a position different from the plurality of positions. The image estimating method includes an image acquiring step of acquiring image data, a frequency analyzing step of calculating a transverse cutoff frequency in a direction perpendicular to the optical-axis direction based on the image data acquired in the image acquiring step, and an interval calculating step of calculating the first interval based on the transverse cutoff frequency calculated by the frequency analyzing step.

Abstract: An image capturing apparatus (500) capable of performing three-dimensional tomography of an object by digital holography, includes a splitting element (502) which splits a light beam emitted from a light source into an object light beam and a reference light beam, an illumination system (503) which controls a plurality of object light beams that are generated from the object light beam and that move in directions different from each other to be incident on the object simultaneously, a composite element (507) which causes the plurality of object light beams to interfere with the reference light beam, an image sensor (508) which acquires hologram generated by interference of each of the plurality of light beams with the reference light beam, and a controller (509) which controls the illumination system so that the plurality of object light beams interfere with each other on the image sensor.

Abstract: The imaging apparatus includes an optical system dividing light into object and reference beams and causing the object beam and the reference beam to interfere with each other to form interference fringes on an image sensor. A processor performs multiple imaging processes for the interference fringes with different incident angles of the object beam to an object, a first process to acquire a transmitted wavefront for each incident angle and a second process to calculate a three-dimensional refractive index distribution from the transmitted wavefronts. The apparatus includes a modulator changing a phase distribution of light in any one of an optical path from a light source to a dividing element, a reference beam path and an optical path from a combining element to the image sensor and causes the modulator to change the phase distribution in at least one of the multiple imaging processes.

Abstract: A semiconductor device includes: a first transistor and a second transistor disposed in or on a silicon substrate; an element isolation structure that isolates the first transistor and the second transistor, the element isolation structure comprising at least one of a first element isolation film disposed in a region of a first well disposed in a formation area of the first transistor, or a second element isolation film disposed in a region of a second well disposed in a formation area of the second transistor, and a third well disposed under the first well in the silicon substrate and is electrically connected to the second well. The first element isolation film or the second element isolation film has a portion that does not extend over a boundary between the first well and the second well.

Abstract: A semiconductor device includes: a first transistor and a second transistor disposed in or on a silicon substrate; an element isolation structure that isolates the first transistor and the second transistor, the element isolation structure comprising at least one of a first element isolation film disposed in a region of a first well disposed in a formation area of the first transistor, or a second element isolation film disposed in a region of a second well disposed in a formation area of the second transistor, and a third well disposed under the first well in the silicon substrate and is electrically connected to the second well. The first element isolation film or the second element isolation film has a portion that does not extend over a boundary between the first well and the second well.

Abstract: A confocal microscope includes an illumination optical system configured to uniformly illuminate at least part of a first confocal stop with a light beam from a light source, a first collection optical system configured to collect a light beam passing through the first confocal stop onto a specimen, a second collection optical system configured to collect a light beam from the specimen onto a second confocal stop, a detection unit configured to detect a light beam passing through the second confocal stop, and a light intensity control member provided to at least one of the first collection optical system and the second collection optical system and having a transmittance of a first region including an optical axis that is lower than a transmittance of a second region around the first region.

Abstract: Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(?O)—, —C(?O)—O—, —O—C(?O)—O—, —C(?O)—O—C(?O)—, —C(?O)—NH—, —S(?O)—O—, —S(?O)2—O—, —ORa, —C(?O)—ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.

Abstract: The image estimating method is configured to estimate, using image data generated by capturing an object via an image-pickup optical system at a plurality of positions that are spaced at first intervals in an optical-axis direction of the image-pickup optical system, image data at a position different from the plurality of positions. The image estimating method includes an image acquiring step of acquiring image data, a frequency analyzing step of calculating a transverse cutoff frequency in a direction perpendicular to the optical-axis direction based on the image data acquired in the image acquiring step, and an interval calculating step of calculating the first interval based on the transverse cutoff frequency calculated by the frequency analyzing step.

Abstract: The imaging apparatus includes an optical system dividing light into object and reference beams and causing the object beam and the reference beam to interfere with each other to form interference fringes on an image sensor. A processor performs multiple imaging processes for the interference fringes with different incident angles of the object beam to an object, a first process to acquire a transmitted wavefront for each incident angle and a second process to calculate a three-dimensional refractive index distribution from the transmitted wavefronts. The apparatus includes a modulator changing a phase distribution of light in any one of an optical path from a light source to a dividing element, a reference beam path and an optical path from a combining element to the image sensor and causes the modulator to change the phase distribution in at least one of the multiple imaging processes.

Abstract: Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(?O)—, —C(?O)—O—, —O—, —C(?O)—O—, —C(?O)—O—, —C(?O)—, —C(?O)—NH—, —S(?O)—O—, —S(?O)2—O—, —ORa, —C(?O) —ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.

Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.