Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.

Abstract: An image processing method is configured to denoise three-dimensional image data. The image processing method includes an image transform step of performing a frequency transform for the three-dimensional image data in the optical axis direction and of calculating three-dimensional transformed image data, an image modulation step of reducing an absolute value of the three-dimensional transformed image data in a specific frequency region and of calculating three-dimensional modulated image data, and an inverse image transform step of performing an inverse frequency transform corresponding to the frequency transform for the three-dimensional modulated image data in the optical axis direction and of calculating three-dimensional inversely transformed image data. The specific frequency region is a part of a predetermined.

Abstract: A confocal microscope includes an illumination optical system configured to uniformly illuminate at least part of a first confocal stop with a light beam from a light source, a first collection optical system configured to collect a light beam passing through the first confocal stop onto a specimen, a second collection optical system configured to collect a light beam from the specimen onto a second confocal stop, a detection unit configured to detect a light beam passing through the second confocal stop, and a light intensity control member provided to at least one of the first collection optical system and the second collection optical system and having a transmittance of a first region including an optical axis that is lower than a transmittance of a second region around the first region.

Abstract: An image estimating method is configured to utilize image data of an object captured at N different positions zj that are spaced from each other at an interval ?z in an optical axis direction, and to estimate image data at a position z in the optical axis direction. N is an integer of 2 or larger. The image estimating method includes the steps of an image converting step of performing a frequency conversion for N pieces of image data in the optical axis direction, and of calculating N pieces of converted image data, and a coupling step of multiplying the N pieces of converted image data by a complex number determined for the N pieces of converted image data based upon z and ?z, and of summing up multiplied results.

Abstract: Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 ?m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Abstract: An image processing method is configured to denoise three-dimensional image data. The image processing method includes an image transform step of performing a frequency transform for the three-dimensional image data in the optical axis direction and of calculating three-dimensional transformed image data, an image modulation step of reducing an absolute value of the three-dimensional transformed image data in a specific frequency region and of calculating three-dimensional modulated image data, and an inverse image transform step of performing an inverse frequency transform corresponding to the frequency transform for the three-dimensional modulated image data in the optical axis direction and of calculating three-dimensional inversely transformed image data. The specific frequency region is a part of a predetermined.

Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; “A” represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

Abstract: A defocus amount estimation method for an imaging apparatus that captures, using an image sensor, an image of a specimen formed by an imaging optical system includes a captured image evaluation step of fixing the specimen using a transparent member including a mark that applies at least one of a phase variation and an amplitude change to transmitted light, to acquire a captured image containing an image of the specimen and an image of the mark, and an estimation step of estimating a defocus amount based on the captured image.

Abstract: A polysilicon film to be a resistor element is formed on a resistor element formation region of a semiconductor substrate while a polysilicon gate and high concentration impurity regions are formed on a transistor formation region. Thereafter, an insulating film is formed on the entire surface of the semiconductor substrate. Then, a photoresist film is formed to cover the transistor formation region, and a conductive impurity is ion-implanted into the polysilicon film. Next, the photoresist film is removed by ashing.

Abstract: A polysilicon film to be a resistor element is formed on a resistor element formation region of a semiconductor substrate while a polysilicon gate and high concentration impurity regions are formed on a transistor formation region. Thereafter, an insulating film is formed on the entire surface of the semiconductor substrate. Then, a photoresist film is formed to cover the transistor formation region, and a conductive impurity is ion-implanted into the polysilicon film. Next, the photoresist film is removed by asking.

Abstract: Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 ?m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein Ra represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.