Patents by Inventor Akira Fujita

Akira Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240083369
    Abstract: Provided is a vehicle configured to allow for capturing an image of a surrounding area along a side of a vehicle regardless of whether a door is opened or closed. A vehicle comprises a vehicle body having a passenger opening on a side, and a camera rearward of the passenger opening. The camera has an optical axis oriented in a laterally outward and frontward direction. A door with a side mirror is provided at the passenger opening and has a door window in its upper part. The camera may be located above a lower end of the door window and/or above an upper end of the side mirror. An extension window is provided rearward of the passenger opening, with a garnish member at an edge of the extension window. The camera may be provided on the garnish member.
    Type: Application
    Filed: September 5, 2023
    Publication date: March 14, 2024
    Inventors: Shingo NAKAYAMA, Tadahiro MATORI, Akira FUJITA, Yuhei TANAKA
  • Patent number: 11908680
    Abstract: A substrate processing method includes a first process of supplying an etching liquid to a peripheral portion of a substrate while rotating the substrate having a metal polycrystalline film formed on a front surface thereof; a second process of supplying a rinse liquid to a portion of the substrate closer to a center side of the substrate than a supply position of the etching liquid in the first process while rotating the substrate; a third process of supplying the etching liquid to the peripheral portion of the substrate while rotating the substrate; a fourth process of supplying the rinse liquid to a portion of the substrate closer to the center side of the substrate than a supply position of the etching liquid in the third process while rotating the substrate; and a fifth process of drying the substrate after the fourth process.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: February 20, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Fujita, Kyosei Goto, Hiroki Aso, Daisuke Saiki
  • Publication number: 20240033766
    Abstract: A substrate processing apparatus includes a substrate holder, a rotational driver configured to rotate the substrate holder, and an ejection part configured to eject a processing liquid toward a liquid landing point of the substrate. The ejection part includes a plurality of nozzles that is different from each other in at least one of a first angle ? or a second angle ?. A circle is defined. An angle formed by a straight line, which interconnects a foot of a perpendicular line from an ejection point of the processing liquid to the substrate and the liquid landing point, and a tangential line to the circle at the liquid landing point is defined as a first angle ?, and an angle formed by that straight line and a straight line, which interconnects the ejection point and the liquid landing point, is defined as a second angle ?.
    Type: Application
    Filed: July 15, 2021
    Publication date: February 1, 2024
    Inventor: Akira FUJITA
  • Publication number: 20230282659
    Abstract: An optical device package includes a glass substrate, a warpage reducing film, a redistribution layer, and a semiconductor element. The warpage reducing film is disposed directly or indirectly on the glass substrate. The redistribution layer includes a wiring sublayer and an insulating sublayer. The wiring sublayer and the insulating sublayer are at least partially disposed on the warpage reducing film. The semiconductor element is mounted on the redistribution layer.
    Type: Application
    Filed: January 20, 2023
    Publication date: September 7, 2023
    Applicant: Shanghai Tianma Micro-Electronics Co., Ltd.
    Inventors: Akira FUJITA, Futoshi NAKANISHI, Shingo SAIGOU, Nobuya SEKO
  • Patent number: 11633959
    Abstract: The present disclosure provides a thermal print head for achieving fine printing. A thermal print head of the disclosure includes: a substrate, having a substrate main surface and a substrate back surface facing opposite sides in a z direction; a resistor layer, disposed on a side of the substrate main surface and including a plurality of heat generating portions arranged in a main scan direction to generate heat by energization; a wiring layer, disposed on the side of the substrate main surface and including a conduction path for electrically conducting the plurality of heat generating portions; a metal layer, interposed between the substrate and the wiring layer with the resistor layer; and an insulating layer, interposed between the metal layer and the wiring layer with the resistor layer. The conduction path includes the metal layer. The metal layer includes tantalum (Ta).
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: April 25, 2023
    Assignee: ROHM CO., LTD.
    Inventors: Goro Nakatani, Akira Fujita
  • Patent number: 11506779
    Abstract: An outside sensor unit includes an outside sensor, a main bracket, a support bracket, a rotation device, and a position adjustment device. The outside sensor detects the outside of a vehicle. The main bracket is attached to a vehicle body. The support bracket supports the outside sensor and is attached to the main bracket. The rotation device has a rotation axis line which is substantially parallel to a roll axis of the vehicle and connects the support bracket and the main bracket together rotatably around the rotation axis line. The position adjustment device is capable of adjusting the relative rotation position between the support bracket and the main bracket around the rotation axis line.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: November 22, 2022
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Akira Fujita, Takato Watanabe, Yoshitaka Katashima
  • Publication number: 20220328390
    Abstract: A multi-layered board includes an upper insulating layer, a lower conductive layer including first lower conductive parts, an upper conductive layer between the lower conductive layer and the upper insulating layer and including first upper conductive parts and second upper conductive parts, and a lower insulating layer between the lower conductive layer and the upper conductive layer. The first upper conductive part includes a first pad exposed from a hole of the upper insulating layer. The second upper conductive part includes a second pad exposed from a hole of the upper insulating layer. At least a part of the first pad is in direct contact with the first lower conductive part within a hole of the lower insulating layer. The second pad is outside any hole of the lower insulating layer. A top surface of the second pad is higher than a top surface of the first pad.
    Type: Application
    Filed: April 4, 2022
    Publication date: October 13, 2022
    Inventor: Akira FUJITA
  • Patent number: 11376826
    Abstract: A multilayer film including alternately-laminated fluororesin layers and polyimide resin layers, wherein a total number of the fluororesin layers and the polyimide resin layers is five or more, a ratio of the total thickness of the fluororesin layers to the thickness of the whole multilayer film is 50% or more, and at least one of the outermost layers of the multilayer film is a fluororesin layer.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: July 5, 2022
    Assignee: Arisawa Mfg. Co., Ltd.
    Inventors: Hiroyuki Matsuyama, Makoto Tai, Akira Fujita, Takayuki Mayama
  • Publication number: 20220199400
    Abstract: A substrate processing method includes a first process of supplying an etching liquid to a peripheral portion of a substrate while rotating the substrate having a metal polycrystalline film formed on a front surface thereof; a second process of supplying a rinse liquid to a portion of the substrate closer to a center side of the substrate than a supply position of the etching liquid in the first process while rotating the substrate; a third process of supplying the etching liquid to the peripheral portion of the substrate while rotating the substrate; a fourth process of supplying the rinse liquid to a portion of the substrate closer to the center side of the substrate than a supply position of the etching liquid in the third process while rotating the substrate; and a fifth process of drying the substrate after the fourth process.
    Type: Application
    Filed: December 17, 2021
    Publication date: June 23, 2022
    Inventors: Akira Fujita, Kyosei Goto, Hiroki Aso, Daisuke Saiki
  • Publication number: 20220097409
    Abstract: The present disclosure provides a thermal print head for achieving fine printing. A thermal print head of the disclosure includes: a substrate, having a substrate main surface and a substrate back surface facing opposite sides in a z direction; a resistor layer, disposed on a side of the substrate main surface and including a plurality of heat generating portions arranged in a main scan direction to generate heat by energization; a wiring layer, disposed on the side of the substrate main surface and including a conduction path for electrically conducting the plurality of heat generating portions; a metal layer, interposed between the substrate and the wiring layer with the resistor layer; and an insulating layer, interposed between the metal layer and the wiring layer with the resistor layer. The conduction path includes the metal layer. The metal layer includes tantalum (Ta).
    Type: Application
    Filed: September 9, 2021
    Publication date: March 31, 2022
    Inventors: GORO NAKATANI, AKIRA FUJITA
  • Patent number: 11164760
    Abstract: An etching apparatus includes a substrate holder configured to hold a substrate; a rotation driver configured to rotate the substrate holder around a rotation axis; a liquid discharge unit configured to discharge an etching solution to a peripheral portion of the substrate; and a controller configured to control an operation of the etching apparatus by controlling at least the rotation driver and the liquid discharge unit. The controller controls at least one of a rotational velocity of the substrate, a discharge velocity of the etching solution from the liquid discharge unit or a discharge direction of the etching solution from the liquid discharge unit to etch the substrate under immediate deviation conditions in which the etching solution is deviated from the substrate immediately after the etching solution from the liquid discharge unit lands at a liquid landing point in the peripheral portion of the substrate.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: November 2, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Akira Fujita
  • Patent number: 11139809
    Abstract: A driving apparatus includes a current output unit, a reference voltage output unit, a comparator, and a drive control unit. The current output unit is switchable to either a first ON resistance or a second ON resistance that is N times (N>1) the first ON resistance. The reference voltage output unit outputs a fist reference voltage during a large current time period, and outputs a second reference voltage that is M times (M>1) the first reference voltage during a small current time period. The drive control unit performs control to perform switching to the first ON resistance during the large current time period, and to perform switching to the second ON resistance during the small current time period.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: October 5, 2021
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventor: Akira Fujita
  • Patent number: 11097554
    Abstract: A thermal printhead includes a substrate, a protrusion formed on an obverse surface of the substrate and extending in a main scanning direction, a heat storage layer formed on a top surface of the protrusion, and a plurality of heat-generating parts arranged along the main scanning direction on the heat storage layer. The substrate and the protrusion are integrally formed from a single-crystal semiconductor.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: August 24, 2021
    Assignee: ROHM CO., LTD.
    Inventors: Goro Nakatani, Akira Fujita, Kazuya Nakakubo, Yasuhiro Fuwa
  • Patent number: 11069754
    Abstract: A display device includes: a display panel including a display region where a user image is displayed and a measurement region; a transparent front panel disposed on a front side of the display panel; a bonding layer provided between the display panel and the front panel to avoid a first space and cover the display region, and bonding the display panel and the front panel together; and a component placed in the first space, the component including a detector configured to detect a physical property of the measurement region in the first space and flexible print circuits with the detector mounted thereon, and the flexible print circuits extending from the first space to an outside of an interspace between the display panel and the front panel.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: July 20, 2021
    Assignee: TIANMA MICROELECTRONICS CO., LTD.
    Inventors: Hitoshi Yoshida, Akira Fujita
  • Publication number: 20210170732
    Abstract: A multilayer film including alternately-laminated fluororesin layers and polyimide resin layers, wherein a total number of the fluororesin layers and the polyimide resin layers is five or more, a ratio of the total thickness of the fluororesin layers to the thickness of the whole multilayer film is 50% or more, and at least one of the outermost layers of the multilayer film is a fluororesin layer.
    Type: Application
    Filed: March 19, 2019
    Publication date: June 10, 2021
    Inventors: Hiroyuki Matsuyama, Makoto Tai, Akira Fujita, Takayuki Mayama
  • Patent number: 11024519
    Abstract: A substrate processing apparatus includes a rotation holding device that holds and rotates a substrate, a liquid supply device including one or more rinse liquid nozzles that are positioned on back surface side of the substrate and supply rinse liquid to peripheral edge portion of back surface of the substrate, a cup that receives the liquid supplied to the substrate, and a control device including circuitry that controls the holding and supply devices. The nozzle is attached to the cup to receive the liquid, and the circuitry controls the holding and supply devices and executes first process in which the holding device varies rotation speed between first and second speeds, and the nozzle supplies the liquid to the peripheral edge portion of the back surface of the substrate such that the liquid cleans peripheral region of the nozzle in the cup and region on outer side of the peripheral region.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: June 1, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Akira Fujita
  • Publication number: 20210098249
    Abstract: A substrate processing apparatus includes a substrate holder configured to hold a substrate, a rotary driver configured to rotate the substrate holder around a rotation axis, a processing liquid nozzle configured to eject a processing liquid toward a peripheral portion of the substrate, and a gas nozzle configured to eject a gas toward the processing liquid from a time at which the processing liquid is ejected from an ejection port of the processing liquid nozzle until a time at which the processing liquid arrives at a liquid arrival point on the substrate.
    Type: Application
    Filed: September 17, 2020
    Publication date: April 1, 2021
    Inventor: Akira FUJITA
  • Publication number: 20210005465
    Abstract: An etching apparatus includes a substrate holder configured to hold a substrate; a rotation driver configured to rotate the substrate holder around a rotation axis; a liquid discharge unit configured to discharge an etching solution to a peripheral portion of the substrate; and a controller configured to control an operation of the etching apparatus by controlling at least the rotation driver and the liquid discharge unit. The controller controls at least one of a rotational velocity of the substrate, a discharge velocity of the etching solution from the liquid discharge unit or a discharge direction of the etching solution from the liquid discharge unit to etch the substrate under immediate deviation conditions in which the etching solution is deviated from the substrate immediately after the etching solution from the liquid discharge unit lands at a liquid landing point in the peripheral portion of the substrate.
    Type: Application
    Filed: July 2, 2020
    Publication date: January 7, 2021
    Inventor: Akira Fujita
  • Publication number: 20210001641
    Abstract: A thermal printhead includes a substrate, a protrusion formed on an obverse surface of the substrate and extending in a main scanning direction, a heat storage layer formed on a top surface of the protrusion, and a plurality of heat-generating parts arranged along the main scanning direction on the heat storage layer. The substrate and the protrusion are integrally formed from a single-crystal semiconductor.
    Type: Application
    Filed: June 24, 2020
    Publication date: January 7, 2021
    Inventors: Goro NAKATANI, Akira FUJITA, Kazuya NAKAKUBO, Yasuhiro FUWA
  • Patent number: 10861647
    Abstract: A method for manufacturing a monolithic ceramic electronic component includes preparing a mother block including ceramic green sheets stacked on each other, and an internal electrode pattern arranged along interfaces between the ceramic green sheets, cutting the mother block along first and second cutting lines that are perpendicular or substantially perpendicular to each other to obtain green chips each having a laminated structure including ceramic layers and internal electrodes in a raw state, the internal electrodes being exposed on a cut side surface produced by cutting along the first cutting line, forming a raw ceramic protective layer on the cut side surface to obtain a raw component body, and firing the raw component body, wherein the cut side surface is treated with a degreasing agent.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: December 8, 2020
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Yuya Takagi, Akira Fujita, Hideaki Tanaka, Togo Matsui