Patents by Inventor Akira Kumazawa

Akira Kumazawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for dielectric of plasma display, laminate for dielectric, and method for forming the dielectric
    Publication number: 20070042177
    Abstract: A composition for a dielectric of a plasma display panel laminating a plurality of layers, includes: a lower layer composition containing inorganic powder and a binder resin, an upper layer composition containing inorganic powder, a binder resin, a photopolymerizable monomer and a photopolymerization initiator, the upper layer composition being provided above the lower layer, and an intermediate layer composition containing a thermally decomposable resin, the intermediate layer composition being provided between the lower layer and the upper layer.
    Type: Application
    Filed: May 17, 2004
    Publication date: February 22, 2007
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hitoshi Setsuda, Akira Kumazawa, Kiminori Oshio, Hiroyuki Obiya
  • Photoresist stripping solution and method of treating substrate with the same
    Publication number: 20060063688
    Abstract: Disclosed is a photoresist stripping solution comprising: (a) a salt of hydrofluoric acid with a base free from metallic ions; and (b) a water-soluble organic solvent, wherein the content of the component (a) is 0.001 to 0.1 mass % based on the total mass of the photoresist stripping solution. Also disclosed is a method of treating a substrate, which comprises: forming a photoresist film on a substrate; subjecting it to light exposure and then to development; etching thereof with a photoresist pattern as a mask pattern; ashing the mask; and bringing the photoresist stripping solution into contact with the substrate.
    Type: Application
    Filed: September 19, 2005
    Publication date: March 23, 2006
    Inventors: Shigeru Yokoi, Takayuki Haraguchi, Kazumasa Wakiya, Akira Kumazawa
  • Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device
    Publication number: 20050271982
    Abstract: The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include an unbaked dielectric layer (12A) and a photosensitive unbaked spacer material layer (16A). The burnable intermediate layer (14) positions between the dielectric layer (12) and the spacer material layer (16), and may burn up upon baking treatment, enabling removal of residues of the spacer material layer in the region subjected to its removal.
    Type: Application
    Filed: May 26, 2004
    Publication date: December 8, 2005
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hitoshi Setsuda, Akira Kumazawa, Kiminori Oshio, Hiroyuki Obiya
  • Photosensitive composition for sandblasting and photosensitive film using the same
    Patent number: 6897011
    Abstract: A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
    Type: Grant
    Filed: March 16, 2004
    Date of Patent: May 24, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akira Kumazawa, Ryuma Mizusawa, Syunji Nakazato, Hiroyuki Obiya
  • Photosensitive composition for sandblasting and photosensitive film using the same
    Publication number: 20040175659
    Abstract: A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
    Type: Application
    Filed: March 16, 2004
    Publication date: September 9, 2004
    Applicant: Tokyo Ohka Kogyo Co., Ltd., a Japan corporation
    Inventors: Akira Kumazawa, Ryuma Mizusawa, Syunji Nakazato, Hiroyuki Obiya
  • Photopolymerizable composition
    Patent number: 6506540
    Abstract: A photopolymerizable composition comprising (A) a polymer binder, (B) a photopolymerizable monomer and (C) a photopolymerization initiator, wherein the component (B) is at least one compound represented by the following formula (1):
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: January 14, 2003
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akira Kumazawa, Shinichiro Ishino, Hiroyuki Obiya, Kenji Tazawa
  • Photosensitive composition for sandblasting and photosensitive film using the same
    Publication number: 20020076652
    Abstract: A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
    Type: Application
    Filed: November 6, 2001
    Publication date: June 20, 2002
    Inventors: Akira Kumazawa, Ryuma Mizusawa, Syunji Nakazato, Hiroyuki Obiya
  • Photopolymerizable composition
    Publication number: 20020031723
    Abstract: A photopolymerizable composition comprising (A) a polymer binder, (B) a photopolymerizable monomer and (C) a photopolymerization initiator, wherein the component (B) is at least one compound represented by the following formula (1): 1
    Type: Application
    Filed: May 15, 2001
    Publication date: March 14, 2002
    Inventors: Akira Kumazawa, Shinichiro Ishino, Hiroyuki Obiya, Kenji Tazawa