Patents by Inventor Akira Nishioka

Akira Nishioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11918327
    Abstract: A sphygmomanometer according to the present disclosure includes a main body that is mounted with a pump and is to be disposed on a dorsal surface of a wrist and a cuff that is to be attached around the wrist. The cuff extends along a circumferential direction of the wrist from an ulnar side end portion of the main body to a palmar surface and is set to a length covering an ulnar artery or a length covering a radial artery beyond the ulnar artery of a wrist having a preset maximum wrist circumference. A fluid is supplied from the pump to the cuff to press the wrist. A blood pressure is calculated based on a pressure of the fluid contained in the cuff.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: March 5, 2024
    Assignees: OMRON CORPORATION, OMRON HEALTHCARE CO., LTD.
    Inventors: Shohei Iwata, Takanori Nishioka, Akira Tampo, Yoshihiko Sano, Takeshi Kubo, Yu Higashimura
  • Publication number: 20230369011
    Abstract: A stage device includes: a sample installation unit in which a positioning target is installed; a scale plate used to measure displacement of the sample installation unit in a vertical direction; and a lower axis table configured to support the scale plate. A free support unit is provided between the scale plate and the lower axis table.
    Type: Application
    Filed: April 5, 2023
    Publication date: November 16, 2023
    Applicant: Hitachi High-Tech Corporation
    Inventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Takanori KATO, Akira NISHIOKA
  • Publication number: 20230143197
    Abstract: A stage apparatus includes a lower stage that moves in a Y-axis direction, an upper stage that floats from the lower stage and moves at least in an X-axis direction orthogonal to the Y-axis direction, a heat exchanger that cools a Y table of the lower stage with a refrigerant, and a control device that controls an inclination of the lower stage with reference to the Y table cooled by the heat exchanger.
    Type: Application
    Filed: October 11, 2022
    Publication date: May 11, 2023
    Applicant: Hitachi High-Tech Corporation
    Inventors: Akira NISHIOKA, Motohiro TAKAHASHI, Masaki MIZUOCHI, Yasuhiro ANDO, Raifu YAMAMOTO
  • Publication number: 20220076918
    Abstract: A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.
    Type: Application
    Filed: July 13, 2021
    Publication date: March 10, 2022
    Inventors: Akira NISHIOKA, Shuichi NAKAGAWA, Masaki MIZUOCHI, Takaaki KIKUCHI, Masashi FUJITA, Kenta NOMURA, Naoya ISHIGAKI
  • Patent number: 11049687
    Abstract: A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: June 29, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Naruo Watanabe, Hironori Ogawa, Takanori Kato, Akira Nishioka
  • Patent number: 10879033
    Abstract: Provided is a stage apparatus that reduces thermal deformation and temperature rise in an upper table on which a sample is mounted and a charged particle beam apparatus including the stage apparatus. The stage apparatus includes: an upper stage that moves an upper table on which a sample is mounted in a first direction; a middle stage that moves a middle table on which the upper stage is mounted in a second direction orthogonal to the first direction; and a lower stage that moves a lower table on which the middle stage is mounted in a third direction orthogonal to the first direction and the second direction. The upper table and the middle table use a material having a smaller thermal expansion coefficient than in a material of the lower table, and the lower table uses a material having higher thermal conductivity than in the material of the upper table and the middle table.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: December 29, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akira Nishioka, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Hironori Ogawa, Naruo Watanabe, Motohiro Takahashi, Takanori Kato
  • Patent number: 10804067
    Abstract: Provided is a charged particle beam apparatus including: an XY stage on which a sample is placed; a charged particle beam source which irradiates the sample with a charged particle beam; a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam; an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: October 13, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takanori Kato, Motohiro Takahashi, Naruo Watanabe, Akira Nishioka, Masaki Mizuochi, Shuichi Nakagawa, Hironori Ogawa
  • Publication number: 20200176217
    Abstract: A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.
    Type: Application
    Filed: November 14, 2019
    Publication date: June 4, 2020
    Inventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Shuichi NAKAGAWA, Tomotaka SHIBAZAKI, Naruo WATANABE, Hironori OGAWA, Takanori KATO, Akira NISHIOKA
  • Patent number: 10671057
    Abstract: The present invention has an object of providing a management system capable of predicting a malfunction occurrence rate that takes account of installation conditions and operating conditions of individual machining apparatuses. A management system that manages machining apparatuses which uses coolant, includes: an acquisition unit that acquires duration information including an installed duration and operating duration of the machining apparatus and condition information based on the installed duration and operating duration of the machining apparatus for each of the machining apparatuses; an analysis unit that analyzes a malfunction occurrence rate for each of the machining apparatuses, based on the duration information and the condition information, as well as the malfunction occurrence information of the machining apparatus caused by coolant; and a notification information generation unit that outputs notification information based on the analyzed malfunction occurrence rate.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: June 2, 2020
    Assignee: FANUC CORPORATION
    Inventor: Akira Nishioka
  • Patent number: 10658151
    Abstract: To provide a lightweight and highly rigid stage device that can move in X and Y directions and a Z direction, and a charged particle beam device including the stage device. A stage device includes a chuck that is loaded with a sample, an XY stage that moves in X and Y directions, and a Z stage that moves in a Z direction. The Z stage includes: an inclined part that is fixed to the XY stage and includes an inclined surface inclined with respect to an XY plane; a movement part that moves on the inclined surface; and a table that is fixed to the movement part and is provided with the a plane parallel to the XY plane.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: May 19, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Naruo Watanabe, Akira Nishioka, Takanori Kato, Hironori Ogawa
  • Patent number: 10627256
    Abstract: A rotation angle detecting device includes: a rotating part rotating integrally with the rotating shaft and including a detected portion; an A-phase detector detecting change of a physical quantity caused by rotation of the rotating part, inside a first detection field over the detected portion and outputting an A-phase signal; and a B-phase detector detecting change of the physical quantity caused by rotation of the rotating part, inside a second detection field located over the detected portion and outputting a B-phase signal that is out of phase with the A-phase signal. The second detection field is shorter than the first detection field with respect to the direction perpendicular to the rotating direction of the rotating part.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: April 21, 2020
    Assignee: FANUC CORPORATION
    Inventor: Akira Nishioka
  • Patent number: 10527467
    Abstract: A rotation angle detector comprises a rotating body including a plurality of track parts, and an abnormality detecting unit for detecting an abnormality based on signals generated in detection units. The detection units generate a first signal based on a first track part and a second signal based on a second track part. The abnormality detecting unit includes a judgement unit for judging an occurrence of an abnormality when the difference between the fluctuation range of the first signal and the fluctuation range of the second signal is larger than a predetermined fluctuation range judgement value.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: January 7, 2020
    Assignee: FANUC CORPORATION
    Inventors: Akira Nishioka, Shunichi Odaka, Keisuke Imai
  • Publication number: 20190378678
    Abstract: Provided is a stage apparatus that reduces thermal deformation and temperature rise in an upper table on which a sample is mounted and a charged particle beam apparatus including the stage apparatus. The stage apparatus includes: an upper stage that moves an upper table on which a sample is mounted in a first direction; a middle stage that moves a middle table on which the upper stage is mounted in a second direction orthogonal to the first direction; and a lower stage that moves a lower table on which the middle stage is mounted in a third direction orthogonal to the first direction and the second direction. The upper table and the middle table use a material having a smaller thermal expansion coefficient than in a material of the lower table, and the lower table uses a material having higher thermal conductivity than in the material of the upper table and the middle table.
    Type: Application
    Filed: June 6, 2019
    Publication date: December 12, 2019
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira NISHIOKA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Tomotaka SHIBAZAKI, Hironori OGAWA, Naruo WATANABE, Motohiro TAKAHASHI, Takanori KATO
  • Publication number: 20190259567
    Abstract: To provide a lightweight and highly rigid stage device that can move in X and Y directions and a Z direction, and a charged particle beam device including the stage device. A stage device includes a chuck that is loaded with a sample, an XY stage that moves in X and Y directions, and a Z stage that moves in a Z direction. The Z stage includes: an inclined part that is fixed to the XY stage and includes an inclined surface inclined with respect to an XY plane; a movement part that moves on the inclined surface; and a table that is fixed to the movement part and is provided with the a plane parallel to the XY plane.
    Type: Application
    Filed: January 7, 2019
    Publication date: August 22, 2019
    Inventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Shuichi NAKAGAWA, Tomotaka SHIBAZAKI, Naruo WATANABE, Akira NISHIOKA, Takanori KATO, Hironori OGAWA
  • Publication number: 20190252151
    Abstract: Provided is a charged particle beam apparatus including: an XY stage on which a sample is placed; a charged particle beam source which irradiates the sample with a charged particle beam; a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam; an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.
    Type: Application
    Filed: January 7, 2019
    Publication date: August 15, 2019
    Inventors: Takanori KATO, Motohiro TAKAHASHI, Naruo WATANABE, Akira NISHIOKA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Hironori OGAWA
  • Patent number: 10366912
    Abstract: An object of the invention is to provide a stage apparatus that realizes compatibility between long stroke driving and reduction of a burden on a drive mechanism. In order to achieve the above object, there is suggested a stage apparatus including a first table that moves a sample in a first direction, a second table that moves the first table in a second direction different from the first direction, moving mechanisms that move the tables, respectively, a movable body that supports a moving mechanism, and a third moving mechanism that moves the movable body so as to follow the second table.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: July 30, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Naruo Watanabe, Hironori Ogawa, Takanori Kato, Akira Nishioka
  • Publication number: 20190094045
    Abstract: A rotation angle detecting device includes: a rotating part rotating integrally with the rotating shaft and including a detected portion; an A-phase detector detecting change of a physical quantity caused by rotation of the rotating part, inside a first detection field over the detected portion and outputting an A-phase signal; and a B-phase detector detecting change of the physical quantity caused by rotation of the rotating part, inside a second detection field located over the detected portion and outputting a B-phase signal that is out of phase with the A-phase signal. The second detection field is shorter than the first detection field with respect to the direction perpendicular to the rotating direction of the rotating part.
    Type: Application
    Filed: September 20, 2018
    Publication date: March 28, 2019
    Inventor: Akira NISHIOKA
  • Patent number: 10120368
    Abstract: A manufacturing adjustment system includes a decision part and a tolerance setting part. The decision part decides whether part dimensions calculated by a part dimension calculation part fall within a predetermined range of dimensions and a total machining time calculated by a total machining-time calculation part falls within a predetermined time. The tolerance setting part sets a workpiece tolerance for each machine based on the decision result of the decision part when the workpieces are produced by the machines.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: November 6, 2018
    Assignee: FANUC CORPORATION
    Inventor: Akira Nishioka
  • Publication number: 20180284734
    Abstract: The present invention has an object of providing a management system capable of predicting a malfunction occurrence rate that takes account of installation conditions and operating conditions of individual machining apparatuses. A management system that manages machining apparatuses which uses coolant, includes: an acquisition unit that acquires duration information including an installed duration and operating duration of the machining apparatus and condition information based on the installed duration and operating duration of the machining apparatus for each of the machining apparatuses; an analysis unit that analyzes a malfunction occurrence rate for each of the machining apparatuses, based on the duration information and the condition information, as well as the malfunction occurrence information of the machining apparatus caused by coolant; and a notification information generation unit that outputs notification information based on the analyzed malfunction occurrence rate.
    Type: Application
    Filed: March 20, 2018
    Publication date: October 4, 2018
    Applicant: FANUC CORPORATION
    Inventor: Akira NISHIOKA
  • Patent number: 10066971
    Abstract: A rotation angle detection apparatus includes a rotator having a track unit to detect the rotation angle of a rotation axis; a detection unit disposed in correspondence with the track unit; a rotation angle calculation unit for calculating the rotation angle of the rotation axis based on signals generated by the detection unit; a rotation speed calculation unit for calculating the rotation speed of the rotation axis; and an abnormality detection unit for detecting an abnormality. The abnormality detection unit includes a frequency analyzing unit for calculating the frequency characteristic of the signals; a storage unit for storing the number of the signals per revolution of the rotator; a signal frequency calculation unit for calculating a signal frequency; and a determination unit for detecting the abnormality in the detection apparatus, when the frequency characteristic includes a component of a higher order than the signal frequency.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: September 4, 2018
    Assignee: FANUC CORPORATION
    Inventors: Akira Nishioka, Shunichi Odaka, Keisuke Imai