Patents by Inventor Akira Yonezawa

Akira Yonezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6243946
    Abstract: An interlayer connection structure in a circuit board characterized in that a local part of a conductive circuit layer disposed at one surface side of an insulative sheet is bent inwardly of the insulative sheet so that an apex of a projectingly bent portion is formed, and the apex of the projectingly bent portion is abutted with another conductive circuit layer disposed at the other surface side of the insulative sheet so that an interlayer connection is established therebetween.
    Type: Grant
    Filed: April 11, 1997
    Date of Patent: June 12, 2001
    Assignee: Yamaichi Electronics Co., Ltd.
    Inventors: Etsuji Suzuki, Akira Yonezawa, Hidehisa Yamazaki
  • Patent number: 6037589
    Abstract: An high resolution electron beam observation instrument has an electron beam source, an electron beam optical system for converging the electron beam and scanning the electron beam across the surface of a sample, and a compound magnetic and electrostatic objective lens comprising a single pole magnetic lens having a single magnetic pole portion disposed between the electron beam source and the sample and an electrostatic immersion lens, the electrostatic immersion lens comprising an upper electrode and a lower electrode, one end of the upper electrode extending between the single magnetic pole portion and the sample, and the lower electrode being disposed between the upper electrode and the sample; wherein a deceleration electric field is generated between the upper electrode and the lower electrode to allow high resolution observation of the sample. The upper electrode may comprise the single magnetic pole portion of the single pole magnetic lens, or one or more seperate electrodes.
    Type: Grant
    Filed: January 16, 1998
    Date of Patent: March 14, 2000
    Assignee: Seiko Instruments Inc.
    Inventors: Akira Yonezawa, Mitsuyoshi Sato, Osamu Takaoka
  • Patent number: 5973395
    Abstract: An IC package is provided that has a flexible wiring sheet, including an upper portion, a lower portion and a side portion which is wound around a base member over an upper surface, side surfaces and a lower surface of the base member. An IC is loaded on an upper surface of the upper flexible wiring sheet covering the upper surface of the base member. The IC is connected to an electrode provided on an upper lead pattern portion laid along the upper surface of the flexible wiring sheet. The lead pattern is extended from the upper flexible wiring sheet to the lower flexible wiring sheet via the side surfaces of the flexible wiring sheet covering side surfaces of the base member. An electrode to be connected with an object is arranged on the lower lead pattern portion which is formed on the lower flexible wiring sheet, and overall the IC or an IC connection portion is sealed on the upper surface of the upper flexible wiring sheet.
    Type: Grant
    Filed: April 29, 1997
    Date of Patent: October 26, 1999
    Assignee: Yamaichi Electronics Co., Ltd.
    Inventors: Etsuji Suzuki, Akira Yonezawa, Hidehisa Yamazaki, Hiroshi Odaira
  • Patent number: 5950306
    Abstract: A circuit board includes a wiring board which includes an insulative board having a wiring pattern on one surface thereof, a connection hole being formed in the insulative board such that the connection hole reaches the wiring pattern, a conductive bump, which is formed by growing a plating on the wiring pattern, being embedded in the connection hole, and the conductive bump serves as a connection to a wiring pattern which is intimately attached to the other surface of the insulative board.
    Type: Grant
    Filed: December 11, 1996
    Date of Patent: September 14, 1999
    Assignee: Yamaichi Electronics Co., Ltd.
    Inventors: Etsuji Suzuki, Akira Yonezawa, Hidehisa Yamazaki
  • Patent number: 5241176
    Abstract: An electron beam device having a single pole electromagnetic objective lens whose pole top face is positioned in front of a sample as viewed from the side of an electron beam source. A secondary electron detector is provided in the vicinity of the pole top face of an inner cylinder of the objective lens. The objective lens has a circular cylindrical or conical shape at the top of the objective lens and the vertical angle of the circular cylindrical or conical shape is 45.degree.-90.degree.. The working distance between the top of the objective lens and sample is less than 6 mm. It is possible to survey the sample with a resolving power corresponding to a dimension about one-half that of the prior art under low accelerating voltage conditions.
    Type: Grant
    Filed: December 2, 1991
    Date of Patent: August 31, 1993
    Assignee: Seiko Instruments Inc.
    Inventor: Akira Yonezawa
  • Patent number: 5023457
    Abstract: An unipolar magnetic field type objective lens used as an objective lens of an electron beam device. By properly adjusting the shape and strength of the objective lens, not only the aberration coefficients of the objective lens are reduced but also the secondary electrons emitted from a sample are efficiently detected to thereby allow semiconductor wafers of large diameter to be observed at a low acceleration voltage, a large angle of inclination, and with a high resolution.
    Type: Grant
    Filed: May 30, 1990
    Date of Patent: June 11, 1991
    Assignee: Seiko Instruments, Inc.
    Inventor: Akira Yonezawa
  • Patent number: 4961003
    Abstract: An apparatus for directing a scanned electron beam to a sample along an axis. An objective magnetic lens of a single-pole type focusses the scanned electron beam onto the sample. The objective magnetic lens includes a central pole portion extending along the axis and having a central end face effective to generate a magnetic field for focusing the scanned electron beam onto the sample and a peripheral sleeve portion extending along the axis and having a peripheral edge face effective to form a magnetic circuit between the central end face and the peripheral edge face, the peripheral sleeve portion having an inner radius R. A magnetic shield member is disposed to surround the sample to magnetically shield the same.
    Type: Grant
    Filed: November 1, 1989
    Date of Patent: October 2, 1990
    Assignee: Seiko Instruments, Inc.
    Inventor: Akira Yonezawa
  • Patent number: 4434367
    Abstract: An electron microscope comprises an objective lens, at least an intermediate lens and a projector lens arrayed in this order on an optical axis. A movable aperture element is disposed between the objective lens and the intermediate lens whose disposition and magnetic excitation are so selected that electron beam diverging from a crossover produced at a back focal plane of the objective lens is focused on a plane of the movable aperture element. In the case of an electron microscope comprising an objective lens, an objective aperture element, a selected area aperture element, at least an intermediate lens and a projector lens arrayed in this order along an optical axis, an additional lens is disposed between the objective aperture element and the selected area aperture element. Disposition and magnetic excitation of the additional lens are so selected that electron beam diverging from a crossover produced at a back focal plane of the objective lens is focused at a plane of the selected area aperture element.
    Type: Grant
    Filed: July 28, 1981
    Date of Patent: February 28, 1984
    Assignee: International Precision Incorporated
    Inventor: Akira Yonezawa
  • Patent number: 4429222
    Abstract: A transmission electron microscope comprises an objective lens and a condenser lens which are so arranged that excitation of the condenser lens can be varied in association with variation in excitation of the objective lens. A cross-over point which is produced by the condenser lens of the last stage in the non-excited state of the objective lens is caused to coincide with a preselected position on the optical axis of the microscope, which position is determined in accordance with magnitude of excitation of the objective lens. The position of a convergence point of the electron beam produced downstream of a specimen to be observed is maintained substantially constant independently from variations in excitation of the objective lens. The direction in which the electron beam impinges on specimen at a point to be observed is maintained substantially constant independently from variation in excitation of the objective lens.
    Type: Grant
    Filed: January 8, 1981
    Date of Patent: January 31, 1984
    Assignee: International Precision Incorporated
    Inventor: Akira Yonezawa
  • Patent number: 4383176
    Abstract: A symmetrical magnetic field type objective lens for an electron microscope comprises an upper magnetic pole piece and a lower magnetic pole piece disposed below the upper pole piece with a predetermined inter-pole distance S. Bores of a same diameter b are formed in the upper and the lower pole pieces, respectively. The distance S and the diameter are selected so that 1.ltoreq.S/b.ltoreq.5. Additionally, excitation J of the objective lens is so selected with respect to a predetermined magnetomotive force Jc.o. of a Riecke-Ruska's condenser objective lens that the condition that 1.4 Jc.o..ltoreq.J.ltoreq.1.7 Jc.o. is fulfilled. The objective lens assures a wide field of view without being accompanied with blurs or distortion of image.
    Type: Grant
    Filed: January 29, 1981
    Date of Patent: May 10, 1983
    Assignee: International Precision Incorporated
    Inventors: Akira Yonezawa, Kohei Shirota
  • Patent number: 4219732
    Abstract: In a scanning electron microscope, an objective lens field is generated between a pair of deflecting coils and a specimen by an objective lens having upper and lower magnetic pole pieces. A supplemental magnetic pole piece is installed between said upper and lower magnetic pole pieces so that the half width of the objective lens axial magnetic field distribution is increased and the principal plane of the objective lens is positioned near the lower pole piece. By so doing, the spherical aberration coefficient of the objective lens is reduced and a high resolution scanning image is obtained.
    Type: Grant
    Filed: March 28, 1979
    Date of Patent: August 26, 1980
    Assignee: Nihon Denshi Kabushiki Kaisha
    Inventors: Seiichi Nakagawa, Akira Yonezawa, Masatsugu Kikuchi