Abstract: A description is given of compounds of the formula I ##STR1## where R.sup.1 is H, C.sub.1 -C.sub.12 alkyl, C.sub.2 -C.sub.12 alkenyl, C.sub.2 -C.sub.12 alkynyl, O--C.sub.1 -C.sub.12 alkyl, CO--C.sub.1 -C.sub.12 alkyl, in which radicals alkyl chains may also be interrupted by O, S, S.dbd.O, SO.sub.2 or N--C.sub.1 -C.sub.12 alkyl, or is C.sub.5 -C.sub.12 cycloalkyl which is unsubstituted or substituted by1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, O--C.sub.5 -C.sub.12 cycloalkyl, which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, CO--C.sub.6 -C.sub.14 aryl, which is unsubstituted or substituted by 1 to 9 C.sub.1 -C.sub.4 alkyl and/orC.sub.1 -C.sub.4 alkoxy radicals, O-benzyl, which on the aromatic ring is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, CO-benzyl, which on the aromatic ring is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.

Abstract: A description is given of compounds obtainable by reacting compounds of the general formula ##STR1## where A is O or N--R.sup.2 andB is a direct bond or O--CH.sub.2 --CH.sub.2, the carbon of the ethylene group being attached to the nitrogen of the piperidine ring, and R.sup.1 is H, C.sub.1 -C.sub.20 alkyl, C.sub.2 -C.sub.20 alkenyl, C.sub.2 -C.sub.20 alkynyl, C.sub.6 -C.sub.20 aryl, C.sub.7 -C.sub.20 aralkyl, O--C.sub.1 -C.sub.20 alkyl, O--C.sub.5 -C.sub.8 cycloalkyl, CO--C.sub.1 -C.sub.20 alkyl, CO--C.sub.6 -C.sub.20 aryl, CO--C.sub.7 -C.sub.20 aralkyl, O--CO--C.sub.1 -C.sub.20 alkyl or C.sub.1 -C.sub.6 alkyl-Z--C.sub.1 -C.sub.6 alkyl, where Z is O, S or C.dbd.O, andR.sup.2 is C.sub.1 -C.sub.12 alkyl or ##STR2## and Y is O or N--R.sup.4, or Y--R.sup.3, following removal of the hydrogen in position 4 of the piperidine ring, is the divatent radical ##STR3## [.fwdarw.spiro compound], and R.sup.3 is C.sub.1 -C.sub.20 alkyl, CO--C.sub.1 -C.sub.20 alkyl, CO--C.sub.6 -C.sub.20 aryl or CO--C.sub.7 -C.sub.

Abstract: A description is given of compounds of the formula I ##STR1## where r is 0 or 1 and y is a number from the range 1-3; X is a direct bond or --NR.sub.8 --, --CO--, --CONH-- or --COO-- or a divalent aliphatic or mixed aromatic-aliphatic C.sub.1 -C.sub.18 hydrocarbon radical;Z is an aromatic, aliphatic or mixed aromatic-aliphatic C.sub.3 -C.sub.18 hydrocarbon radical which is interrupted in the aliphatic moiety by one or more divalent functional groups, in each case in a carbon-carbon single bond, and/or in the aromatic or aliphatic moiety by one or more divalent functional groups, in each case in a carbon-hydrogen bond, possible functional groups being --O--, --NR.sub.8 --, --S--, --SO--, --SO.sub.

Abstract: The invention relates to compounds obtainable by polymerization of esters or phenol ethers of the formula V ##STR1## and/or of the formula VI ##STR2## in which m and n are each 0 or 1, and A, E, R.sup.1 to R.sup.6 and X are as defined in claim 1, and up to 50 mol % of other, ethylenically unsaturated compounds. The homopolymers and copolymers according to the invention can advantageously be employed for the stabilization of organic polymers against the harmful effect of light, oxygen and/or heat.

Abstract: The invention relates to polyethers of the formula I ##STR1## in which m is 0 or 1; n is an integer in the range from 3 to 100; R.sup.1, in the case where m is 0 or 1, is C.sub.1 -C.sub.36 alkyl or C.sub.7 -C.sub.36 aralkyl, each of which is unsubstituted or substituted by C.sub.5 -C.sub.8 cycloalkyl, is interrupted in the aliphatic part by C.sub.5 -C.sub.8 cycloalkylene or by oxygen or sulfur or --NR.sup.11 -- or is substituted in the aromatic part by 1 to 3 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.3 -C.sub.36 alkenyl; C.sub.5 -C.sub.12 cycloalkyl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.6 -C.sub.10 aryl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; and R.sup.1, in the case where m is 0, can alternatively be hydrogen; C.sub.1 -C.sub.36 alkoxy or C.sub.7 -C.sub.36 aralkoxy, each of which is unsubstituted or substituted by C.sub.5 -C.sub.

Abstract: The invention relates to compounds of the formula I ##STR1## in which n is a number in the range from 1 to 100; X is --R.sup.7 --, --CO--, --CO--CO--, --CO--R.sup.2 --CO--, --CO--NH--R.sup.5 --NH--CO--, --CO--O--R.sup.6 --O--CO-- or ##STR2## where p is a number in the range from 0 to 6, X' is O or a direct bond, E is C.sub.1 -C.sub.12 alkyl, phenyl, C.sub.7 -C.sub.12 phenylalkyl or C.sub.5 -C.sub.12 cycloalkyl, and E' is hydrogen or is as defined for E;Z, when X is R.sup.7, is O or NR.sup.1 ; Z, when X is ##STR3## is O; and Z, in all other cases, is O, NH or NR.sup.1 ;R.sup.1 is C.sub.1 -C.sub.4 alkyl, C.sub.7 -C.sub.9 phenylalkyl, C.sub.5 -C.sub.7 cycloalkyl, C.sub.2 -C.sub.8 alkanoyl, benzoyl or C.sub.1 -C.sub.4 alkyl-substituted benzoyl;R.sup.2 and R.sup.7 are C.sub.1 -C.sub.18 alkylene; C.sub.2 -C.sub.18 alkylene which is interrupted by O or S; phenylene; a mixed aromatic/aliphatic radical containing 7 to 12 carbon atoms; naphthylene; or an --R.sup.4 --D--R.sup.4 -- radical;R.sup.

Abstract: Esters or phenol ethers of the formula I or II ##STR1## in which m and n are each an integer from the range from 1 to 6; A.sup.1 is an m-valent hydrocarbon radical having 1 to 30 carbon atoms; or an m-valent hydrocarbon radical having 2 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and the free valencies of which are located on carbon atoms and in which A.sup.1, in the case where m=2, additionally is a direct bond;A.sup.2 is an n-valent aromatic or araliphatic hydrocarbon radical having 6 to 30 carbon atoms; or an n-valent aromatic or araliphatic hydrocarbon radical having 5 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and n free valencies of which are located on those carbon atoms which are a constituent of aromatic rings;R.sup.1 is hydrogen; a hydrocarbon or hydrocarbonoxy radical having 1 to 36 carbon atoms, which is unsubstituted or substituted by --CO--N(R.sup.3).sub.2 or interrupted by --CO--N(R.sup.3)-- or --N(R.sup.

Abstract: Esters or phenol ethers of the formula I or II ##STR1## in which m and n are each an integer from the range from 1 to 6; A.sup.1 is an m-valent hydrocarbon radical having 1 to 30 carbon atoms; or an m-valent hydrocarbon radical having 2 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and the free valencies of which are located on carbon atoms; and in which A.sup.1, in the case where m=2, additionally is a direct bond;A.sup.2 is an n-valent aromatic or araliphatic hydrocarbon radical having 6 to 30 carbon atoms; or an n-valent aromatic or araliphatic hydrocarbon radical having 5 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and n free valencies of which are located on those carbon atoms which are a constituent of aromatic rings;R.sup.1 is hydrogen; a hydrocarbon or hydrocarbonoxy radical having 1 to 36 carbon atoms, which is unsubstituted or substituted by --CO--N(R.sup.3).sub.2 or interrupted by --CON(R.sup.3)-- or --N(R.sup.

Abstract: The invention relates to polyethers of the formula I ##STR1## in which m is 0 or 1; n is an integer in the range from 3 to 100; R.sup.1, in the case where m is 0 or 1, is C.sub.1 -C.sub.36 alkyl or C.sub.7 -C.sub.36 aralkyl, each of which is unsubstituted or substituted by C.sub.5 -C.sub.8 cycloalkyl, is interrupted in the aliphatic part by C.sub.5 -C.sub.8 cycloalkylene or by oxygen or sulfur or --NR.sup.11 -- or is substituted in the aromatic part by 1 to 3 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.3 -C.sub.36 alkenyl; C.sub.5 -C.sub.12 cycloalkyl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.6 -C.sub.10 aryl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; and R.sup.1, in the case where m is 0, can alternatively be hydrogen; C.sub.1 -C.sub.36 alkoxy or C.sub.7 -C.sub.36 aralkoxy, each of which is unsubstituted or substituted by C.sub.5 -C.sub.

Abstract: The invention relates to compounds obtainable by polymerization of esters or phenol ethers of the formula V ##STR1## and/or of the formula VI ##STR2## in which m and n are each 0 or 1, and A, E, R.sup.1 to R.sup.6 and X are as defined in claim 1, and up to 50 mol % of other, ethylenically unsaturated compounds. The homopolymers and copolymers according to the invention can advantageously be employed for the stabilization of organic polymers against the harmful effect of light, oxygen and/or heat.

Abstract: The invention relates to polyethers containing recurring units of the formula I ##STR1## in which A is --CH.sub.2 -- or --CO--, and, when A is methylene, E is ##STR2## and when A is carbonyl, E is ##STR3## R.sup.1 is hydrogen, and R.sup.2 is likewise hydrogen or an aromatic, aliphatic or araliphatic carbonyloxy radical or a corresponding radical of an ether or tertiary amine, or R.sup.1 and R.sup.2 together are a.dbd.O substituent or together with the carbon atom to which they are bonded are a five- or six-membered, substituted, oxygen- and/or nitrogen-containing heterocyclic ring, andR.sup.17 is a hydrocarbon radical having a maximum of 18 carbon atoms.The polyethers according to the invention can advantageously be employed for the stabilization of organic material against the harmful effect of light, oxygen and/or heat.

Abstract: The invention relates to polyethers of the formula I ##STR1## in which m is 0 or 1; n is an integer in the range from 3 to 100; R.sup.1, in the case where m is 0 or 1, is C.sub.1 -C.sub.36 alkyl or C.sub.7 -C.sub.36 aralkyl, each of which is unsubstituted or substituted by C.sub.5 -C.sub.8 cycloalkyl, is interrupted in the aliphatic part by C.sub.5 -C.sub.8 cycloalkylene or by oxygen or sulfur or --NR.sup.11 -- or is substituted in the aromatic part by 1 to 3 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.3 -C.sub.36 alkenyl; C.sub.5 -C.sub.12 cycloalkyl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals; C.sub.6 -C.sub.10 aryl which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub. alkoxy radicals; and R.sup.1, in the case where m is 0, can alternatively be hydrogen; C.sub.1 -C.sub.36 alkoxy or C.sub.7 -C.sub. 36 aralkoxy, each of which is unsubstituted or substituted by C.sub.5 -C.sub.

Abstract: The invention relates to compounds of formula I ##STR1## wherein A is a radical of formula ##STR2## R.sub.1 and R.sub.2 are each independently of the other hydrogen, C.sub.1 --C.sub.4 alkyl, C.sub.1 C.sub.4 alkoxy, halogen or a radical of formula ##STR3## wherein X is --O--, --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or --SO.sub.2 --, and R.sub.3 and R.sub.4 are each independently of the other hydrogen, C.sub.1 --C.sub.4 alkyl or phenyl, as well as compositions comprising these compounds.The compositions are particularly suitable for making integrated circuits.

Abstract: Esters or phenol ethers of the formula I or II ##STR1## in which m and n are each an integer from the range from 1 to 6; A.sup.1 is an m-valent hydrocarbon radical having 1 to 30 carbon atoms; or an m-valent hydrocarbon radical having 2 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and the free valencies of which are located on carbon atoms; and in which A.sup.1, in the case where m=2, additionally is a direct bond;A.sup.2 is an n-valent aromatic or araliphatic hydrocarbon radical having 6 to 30 carbon atoms; or an n-valent aromatic or araliphatic hydrocarbon radical having 5 to 30 carbon atoms, which contains the heteroatoms oxygen, nitrogen and/or sulfur and n free valencies of which are located on those carbon atoms which are a constituent of aromatic rings;R.sup.1 is hydrogen; a hydrocarbon or hydrocarbonoxy radical having 1 to 36 carbon atoms, which is unsubstituted or substituted by --CO--N(R.sup.3).sub.2 or interrupted by --CO--N(R.sup.3)-- or --N(R.sup.

Abstract: The invention relates to compounds of formula I ##STR1## wherein A is a radical of formula ##STR2## R.sub.1 and R.sub.2 are each independently of the other hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen or a radical of formula ##STR3## wherein X is --O--, --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or --SO.sub.2 --, and R.sub.3 and R.sub.4 are each independently of the other hydrogen, C.sub.1 -C.sub.4 alkyl or phenyl, as well as compositions comprising these compounds.The compositions are particularly suitable for making integrated circuits.

Abstract: Radiation-sensitive compositions comprising(a) a polyester containing structural repeating units of formula (I) ##STR1## wherein Z is a radical of formulae (IIa)-(IIh) ##STR2## wherein Y is a direct bond, C.sub.1 -C.sub.20 alkylene, phenylene, --CH.sub.2 --C.sub.6 H.sub.4 --CH.sub.2 --, cyclopentylene or cyclohexylene, and R.sub.1 and R.sub.2 are each independently of the other hydrogen, methyl or ethyl, with the proviso that R.sub.1 and R.sub.2 are not simultaneously hydrogen, and(b) a substance that generates acid upon exposure to actinic radiation,form a highly sensitive high resolution positive photoresist formulation which is suitable for DUV lithography and, in particular, for making integrated circuits.

Abstract: Compounds of formula (I) ##STR1## wherein R.sub.1 is hydrogen, methyl or halogen, n is 2 or 3, and R is C.sub.1 -C.sub.6 alkyl, benzyl, 2-tetrahydrofuranyl, 2-tetrahydropyranyl, C.sub.1 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or benzyloxycarbonyl, or, if two substituents OR are ortho-positioned to each other, two substituents R together form an ethylene group which may be substituted by up to four C.sub.1 -C.sub.6 alkyl groups, or form a C.sub.2 -C.sub.6 alkylidene group, can be polymerized in the absence or presence of other unsaturated comonomers to polymers having a molecular weight M.sub.w of 10.sup.3 to 10.sup.6 and which are suitable for producing positive photoresists with high resolution and very good contrast.

Abstract: Polymers suitable for use as positive photoresists can be prepared, in the absence or presence of other olefinically unsaturated monomers, from benzoates comprising an olefinic unsaturated substituent and consisting of formula I ##STR1## wherein R.sub.1 and R.sub.2 are each independently of the other a hydrogen atom, C.sub.1 -C.sub.4 alkyl or phenyl, R.sub.3 is a hydrogen atom, methyl or a halogen atom, R.sub.4 is a hydrogen atom or methyl, R.sub.5 is C.sub.1 -C.sub.4 alkyl or C.sub.6 -C.sub.12 aryl, and R.sub.6 and R.sub.7 are each independently of the other a hydrogen atom, C.sub.1 -alkyl or C.sub.6 -C.sub.12 aryl, and R.sub.5 and R.sub.7, when taken together, may also be an unsubstituted or a C.sub.1 -C.sub.4 alkyl-, C.sub.1 -C.sub.4 alkoxy-, C.sub.6 -C.sub.12 aryl- or C.sub.6 -C.sub.12 aryloxy-substituted ethylene, propylene or butylene radical.

Abstract: Polymers suitable for use as positive photoresists can be prepared, in the absence or presence of other olefinically unsaturated monomers, from benzoates comprising an olefinic unsaturated substituent and consisting of formula I ##STR1## wherein R.sub.1 and R.sub.2 are each independently of the other a hydrogen atom, C.sub.1 -C.sub.4 alkyl or phenyl, R.sub.3 is a hydrogen atom, methyl or a halogen atom, R.sub.4 is a hydrogen atom or methyl, R.sub.5 is C.sub.1 -C.sub.4 alkyl or C.sub.6 -C.sub.12 aryl, and R.sub.6 and R.sub.7 are each independently of the other a hydrogen atom, C.sub.1 -C.sub.4 alkyl or C.sub.6 -C.sub.12 aryl, and R.sub.5 and R.sub.7, when taken together, may also be an unsubstituted or a C.sub.1 -C.sub.4 alkyl-, C.sub.1 -C.sub.4 alkoxy-, C.sub.6 -C.sub.12 aryl- or C.sub.6 -C.sub.12 aryloxy-substituted ethylene, propylene or butylene radical.

Abstract: Organometal-containing polymers having side chains of the formula I ##STR1## in which, for example, M is Si, X is O, R.sup.1 and R.sup.2 are hydrogen and R.sup.4 to R.sup.6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.