Abstract: A profiler or scanning probe microscope may be scanned across a sample surface with a distance between them controlled to allow the sensing tip to contact the surface intermittently in order to find and measure features of interest. The distance is controlled so that when the sensing tip is raised or lowered to touch the sample surface, there is no lateral relative motion between the tip and the sample. This prevents tip damage. Prior knowledge of the height distribution of the sample surface may be provided or measured and used for positioning the sensing tip initially or in controlling the separation to avoid lateral contact between the tip and the sample. The process may also be performed in two parts: a fast find mode to find the features and a subsequent measurement mode to measure the features. A quick step mode may also be performed by choosing steps of lateral relative motion to be smaller than 100 nanometers to reduce probability of tip damage.

Abstract: A method to detect metal contamination on a semiconductor topography is provided. The semiconductor topography may include a semiconductor substrate or a dielectric material disposed upon a semiconductor substrate. The metal contamination may be driven into the semiconductor substrate by an annealing process. Alternatively, the annealing process may drive the metal contamination into the dielectric material. Subsequent to the annealing process, a charge may be deposited upon an upper surface of the semiconductor topography. An electrical property of the semiconductor topography may be measured. A characteristic of at least one type of metal contamination may be determined as a function of the electrical property of the semiconductor topography. The method may be used to determine a characteristic of one or more types of metal contamination on a portion of the semiconductor topography or the entire semiconductor topography.

Abstract: A dual stage scanning instrument includes a sensor for sensing a parameter of a sample and coarse and fine stages for causing relative motion between the sensor and the sample. The coarse stage has a resolution of about 1 micrometer and the fine stage has a resolution of 1 nanometer or better. The sensor is used to sense the parameter when both stages cause relative motion between the sensor assembly and the sample. The sensor may be used to sense height variations of the sample surface as well as thermal variations, electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing along scan at a coarser resolution and short scans a high resolution using the same probe tip or two probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.

Abstract: A dual stage scanning instrument includes a sensor for sensing a parameter of a sample and coarse and fine stages for causing relative motion between the sensor and the sample. The coarse stage has a resolution of about 1 micrometer and the fine stage has a resolution of 1 nanometer or better. The sensor is used to sense the parameter when both stages cause relative motion between the sensor assembly and the sample. The sensor may be used to sense height variations of the sample surface as well as thermal variations, electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing along scan at a coarser resolution and short scans a high resolution using the same probe tip or two probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.

Abstract: An optical profilometer and a stylus probe measuring device used in the same instrument have the advantage that these two sensors can be quickly switched between each other. This can be an advantage when used to measure samples, since the optical profilometer can be used until a sample is found to be outside of the desired tolerances. Afterwards, the stylus probe measuring device can be used to accurately determine the profile data. This is an advantage because an optical profilometer is relatively quick, and the stylus probe measuring device is relatively accurate. Additionally, since the optical profilometer and stylus probe device are in the same instrument, the X and Y positions of these devices can be interrelated accurately. This allows images to be produced where the positions on the images can be easily correlated. For example, measurement cursors in sensor data displays can correlated by the positional offset information.

Abstract: A dual stage scanning instrument includes a sensor for sensing a parameter of a sample and coarse and fine stages for causing relative motion between the sensor and the sample. The coarse stage has a resolution of about 1 micrometer and the fine stage has a resolution of 1 nanometer or better. The sensor is used to sense the parameter when both stages cause relative motion between the sensor assembly and the sample, The sensor may be used to sense height variations of the sample surface as well as thermal variations electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing along scan at a coarser resolution and short scans a high resolution using the same probe tip or two probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.

Abstract: A probe tip of a scanning probe microscope or a profilometer is scanned across a surface in a contact, non-contact, or intermittent contact mode to sense the presence of a feature to be located. The probe tip may be scanned along substantially parallel paths, spiral paths or in a sequence of random positions to locate the feature. After the feature has been located, a different searching sequence is employed in order to locate a center of the feature if such is desired. Then, the probe tip is scanned across the surface over the center of the feature in order to perform a measurement of the feature. For some particular features such as tungsten plugs, metal clusters or metal filled via holes of a surface, an electrical or magnetic parameter of the feature may be used for locating the feature after which the same or a different characteristic of the feature, such as geometric profile, can be measured.

Abstract: An acoustic sensor used with a first sensor (such as a profilometer, scanning probe microscope or the like) allows for the positioning of the first sensor with respect to the sample. The acoustic sensor has a greater range than a profilometer or a scanning probe microscope, and a relatively quick response time, which allows it to be an effective proximity detector. Additionally, the acoustic sensor is not affected by the material of the sample's surface layer.