Abstract: There may be provided a radiation sensor, that may include multiple semiconductor regions that form a sensing PN junction and a draining PN junction that is located below the sensing PN junction; a bias circuit that is configured to (i) bias the sensing PN junction to maintain a sensing PN junction depletion region of a fixed size during a first sensing period and during a second sensing period, and (i) bias the draining PN junction to form a draining PN junction depletion region of a first size during the first sensing period and of a second size during the second sensing period; and an output circuit that is configured to generate a first output signal that represent sensed radiation out of radiation that impinged on the radiation sensor during the first sensing period, and to generate a second output signal that represent sensed radiation out of radiation impinged on the radiation sensor during the second sensing period.

Abstract: There may be provided a radiation sensor, that may include multiple semiconductor regions that form a sensing PN junction and a draining PN junction that is located below the sensing PN junction; a bias circuit that is configured to (i) bias the sensing PN junction to maintain a sensing PN junction depletion region of a fixed size during a first sensing period and during a second sensing period, and (i) bias the draining PN junction to form a draining PN junction depletion region of a first size during the first sensing period and of a second size during the second sensing period; and an output circuit that is configured to generate a first output signal that represent sensed radiation out of radiation that impinged on the radiation sensor during the first sensing period, and to generate a second output signal that represent sensed radiation out of radiation impinged on the radiation sensor during the second sensing period.

Abstract: A sensor circuit having a Single Photon Avalanche Diode (SPAD) and an active quenching circuit including a quenching transistor controlled by a one-shot (or similar) circuit is disclosed. The quenching transistor applies a reverse-bias voltage level on the cathode of the SPAD. During photon detection events, pulses generated by the SPAD's avalanche breakdown trigger the one-shot circuit to de-actuate the quenching transistor, allowing the cathode potential to drop below the SPAD's breakdown voltage. After a delay period, which is defined by the one-shot's configuration, allows reliable completion of the avalanche breakdown process, the one-shot circuit re-actuates the quenching transistor such that the SPAD's cathode is refreshed to the reverse-bias voltage level. The one-shot circuit is optionally coupled by way of capacitors to the SPAD and the quenching transistor to facilitate implementation using standard CMOS elements. The sensor is suitable for use in a LIDAR system.

Abstract: A system that may include (a) a radiation source that is constructed and arranged to illuminate an object with radiation during consecutive time frames of microsecond-scale duration, wherein radiation emitted during one time frame differs by energy from radiation transmitted during an adjacent time frame; and (b) a CMOS sensor that may include a readout circuit and CMOS pixels. Each CMOS pixel may include a radiation sensing element and in-pixel memory elements. Different in-pixel memory elements are constructed and arranged to sample a state of the radiation sensing element during different time frames of the consecutive time frames.

Abstract: A system that may include (a) a radiation source that is constructed and arranged to illuminate an object with radiation during consecutive time frames of microsecond-scale duration, wherein radiation emitted during one time frame differs by energy from radiation transmitted during an adjacent time frame; and (b) a CMOS sensor that may include a readout circuit and CMOS pixels. Each CMOS pixel may include a radiation sensing element and in-pixel memory elements. Different in-pixel memory elements are constructed and arranged to sample a state of the radiation sensing element during different time frames of the consecutive time frames.

Abstract: A sensor circuit having a Single Photon Avalanche Diode (SPAD) and an active quenching circuit including a quenching transistor controlled by a one-shot (or similar) circuit is disclosed. The quenching transistor applies a reverse-bias voltage level on the cathode of the SPAD. During photon detection events, pulses generated by the SPAD's avalanche breakdown trigger the one-shot circuit to de-actuate the quenching transistor, allowing the cathode potential to drop below the SPAD's breakdown voltage. After a delay period, which is defined by the one-shot's configuration, allows reliable completion of the avalanche breakdown process, the one-shot circuit re-actuates the quenching transistor such that the SPAD's cathode is refreshed to the reverse-bias voltage level. The one-shot circuit is optionally coupled by way of capacitors to the SPAD and the quenching transistor to facilitate implementation using standard CMOS elements. The sensor is suitable for use in a LIDAR system.

Abstract: An image sensor module that comprises a die, wherein the die comprises light sensors and optics; and wherein the optics comprises luminescent elements that represent die manufacturing information that is indicative of a manufacturing process of the die.

Abstract: A Schmitt trigger's hysteresis is established by standard and non-standard MOSFETs having different (lower/higher) threshold voltages. For example, a standard n-channel transistor having a relatively low threshold voltage (e.g., 1V) sets the lower trigger switching voltage, and a non-standard n-channel transistor (e.g., an n-channel source/drain and a polysilicon gate doped with a p-type dopant) exhibits a relatively high threshold voltage (e.g., 2V) that sets the higher trigger switching voltage. An output control circuit generates the Schmitt trigger's digital output signal based on the on/off states of the two (non-standard and standard) MOSFETs, whereby the changes digital output signal between two values when the analog input signal falls below the lower threshold voltage (i.e., when both MOSFETs are turned on/off) and rises above the higher threshold voltage (i.e., when both MOSFETs are turned off/on). Self-resetting and other circuits utilize the Schmitt trigger to facilitate, e.g.

Abstract: A Schmitt trigger's hysteresis is established by standard and non-standard MOSFETs having different (lower/higher) threshold voltages. For example, a standard n-channel transistor having a relatively low threshold voltage (e.g., 1V) sets the lower trigger switching voltage, and a non-standard n-channel transistor (e.g., an n-channel source/drain and a polysilicon gate doped with a p-type dopant) exhibits a relatively high threshold voltage (e.g., 2V) that sets the higher trigger switching voltage. An output control circuit generates the Schmitt trigger's digital output signal based on the on/off states of the two (non-standard and standard) MOSFETs, whereby the changes digital output signal between two values when the analog input signal falls below the lower threshold voltage (i.e., when both MOSFETs are turned on/off) and rises above the higher threshold voltage (i.e., when both MOSFETs are turned off/on). Self-resetting and other circuits utilize the Schmitt trigger to facilitate, e.g.

Abstract: A global shutter image sensor formed on an n-type bulk substrate and including pixels having pinned n-type photodiodes and memory nodes formed in designated n-doped epitaxial layer regions that are separated from the bulk substrate by a p-type vertical (potential) barrier implant. Each memory node includes both a buried channel portion and a contiguous pinned diode portion having different doping levels such that an intrinsic lateral electrical field drives electrons from the buried channel portion into the pinned diode portion during global charge transfer from an adjacent photodiode. The p-type vertical (potential) barrier implant is coupled to ground, and the bulk substrate is switched between a low integration voltage level during integration periods, and a high reset voltage level, whereby the photodiodes are globally reset without requiring reset transistors. P-type sinker implant sections and p-type vertical barrier implants form box-like diffusions around each pixel's photodiode and memory node.

Abstract: A backside illuminated semiconductor image sensor that includes a Fabry-Perot resonator tuned to absorb near infrared (NIR) radiation; wherein the Fabry-Perot resonator comprises a front reflector, a back reflector and an active Silicon layer between the front reflector and the back reflector.

Abstract: A global shutter image sensor formed on an n-type bulk substrate and including pixels having pinned n-type photodiodes and memory nodes formed in designated n-doped epitaxial layer regions that are separated from the bulk substrate by a p-type vertical (potential) barrier implant. Each memory node includes both a buried channel portion and a contiguous pinned diode portion having different doping levels such that an intrinsic lateral electrical field drives electrons from the buried channel portion into the pinned diode portion during global charge transfer from an adjacent photodiode. The p-type vertical (potential) barrier implant is coupled to ground, and the bulk substrate is switched between a low integration voltage level during integration periods, and a high reset voltage level, whereby the photodiodes are globally reset without requiring reset transistors. P-type sinker implant sections and p-type vertical barrier implants form box-like diffusions around each pixel's photodiode and memory node.

Abstract: A method for manufacturing a metal insulator metal (MIM) trench capacitor, the method may include forming a cavity in an Intermetal Dielectric stack, wherein a bottom of the cavity exposes a lower metal layer; wherein the Intermetal Dielectric stack comprises a top dielectric layer; depositing a first metal layer on a bottom of a cavity and on sidewalls of the cavity; depositing a sacrificial layer over the first metal layer; filling the cavity with a filling material; removing, by a planarization process, a portion of the sacrificial layer positioned above the top dielectric layer and a portion of the first metal layer positioned above the top dielectric layer to expose an upper portion of the sacrificial layer and an upper portion of the first metal layer; forming a recess by removing the upper portion of the sacrificial layer and the upper portion the first metal layer while using the filling material as a mask; removing the filling material by a first removal process that is selective to the sacrificial l

Abstract: A global shutter (GS) image sensor pixel includes a pinned photodiode connected to a memory node by a first transfer gate transistor, and a floating diffusion connected to the memory node by a second transfer gate transistor. The memory node includes a buried channel portion disposed under the first transfer gate transistor and a contiguous pinned diode portion disposed between the first and second transfer gate transistors, where the two memory node portions have different doping levels such that an intrinsic lateral electrical field drives electrons from the buried channel portion into the pinned diode portion. The floating diffusion node similarly includes a buried channel portion disposed under the second transfer gate transistor and a contiguous pinned diode portion that generate a second intrinsic lateral electrical field that drives electrons into the pinned diode portion of the floating diffusion. A 6T CMOS pixel is disclosed that facilitates low-noise CDS readout.

Abstract: A single-exposure high dynamic range (HDR) image sensor utilizes a charge amplifier having a selectively coupled conversion capacitor to read a single photodiode charge during a multi-phase readout operation. An overflow readout is performed during the photodiode charge integration phase, and utilizes the conversion capacitor to read overflow signals indicating rapidly rising photodiode charges caused by extreme exposure conditions, which also prevents saturation of the photodiode. At the end of the integration phase, the remaining photodiode charge is then measured using two readouts: a high sensitivity readout during which the storage capacitor de-coupled to accurately measure low-light conditions, and a low sensitivity readout during which the remaining photodiode charge is stored on the storage capacitor to provide normal light image data. Final single exposure HDR image data is then calculated by summing the overflow image data with the high-sensitivity and/or the low-sensitivity image data.

Abstract: A backside illuminated semiconductor image sensor that includes a Fabry-Perot resonator tuned to absorb near infrared (NIR) radiation; wherein the Fabry-Perot resonator comprises a front reflector, a back reflector and an active Silicon layer between the front reflector and the back reflector.

Abstract: A method for manufacturing a metal insulator metal (MIM) trench capacitor, the method may include forming a cavity in an Intermetal Dielectric stack, wherein a bottom of the cavity exposes a lower metal layer; wherein the Intermetal Dielectric stack comprises a top dielectric layer; depositing a first metal layer on a bottom of a cavity and on sidewalls of the cavity; depositing a sacrificial layer over the first metal layer; filling the cavity with a filling material; removing, by a planarization process, a portion of the sacrificial layer positioned above the top dielectric layer and a portion of the first metal layer positioned above the top dielectric layer to expose an upper portion of the sacrificial layer and an upper portion of the first metal layer; forming a recess by removing the upper portion of the sacrificial layer and the upper portion the first metal layer while using the filling material as a mask; removing the filling material by a first removal process that is selective to the sacrificial l

Abstract: An image sensor module that comprises a die, wherein the die comprises light sensors and optics; and wherein the optics comprises luminescent elements that represent die manufacturing information that is indicative of a manufacturing process of the die.

Abstract: A global shutter (GS) image sensor pixel includes a pinned photodiode connected to a memory node by a first transfer gate transistor, and a floating diffusion connected to the memory node by a second transfer gate transistor. The memory node includes a buried channel portion disposed under the first transfer gate transistor and a contiguous pinned diode portion disposed between the first and second transfer gate transistors, where the two memory node portions have different doping levels such that an intrinsic lateral electrical field drives electrons from the buried channel portion into the pinned diode portion. The floating diffusion node similarly includes a buried channel portion disposed under the second transfer gate transistor and a contiguous pinned diode portion that generate a second intrinsic lateral electrical field that drives electrons into the pinned diode portion of the floating diffusion. A 6T CMOS pixel is disclosed that facilitates low-noise CDS readout.

Abstract: A method for fabricating image sensors and other semiconductor ICs that controls the amount of hydrogen generated during back-end processing. The back-end processing includes forming multiple metallization layers after front-end processing is completed (i.e., after forming the pre-metal dielectric), where each metallization layer includes a patterned aluminum structure, an interlevel dielectric (ILD) layer including TEOS-based oxide formed over the patterned aluminum structure. A cap layer including a low-moisture content oxide such as silane oxide (i.e., SiO2 generated by way of a silane CVD process) is formed over at least one ILD layer. The cap layer serves as an etch-stop for the subsequently-formed metal layer of a next metallization layer by isolating the underlying ILD material from the plasma environment during aluminum over-etch, which significantly reduces the production and migration of hydrogen into front-end structures.