Publication number: 20240272561
Abstract: Provided is a method of managing a semiconductor processing apparatus, including irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (EUV) light, reflecting or transmitting, by the diffuser, the EUV light, transmitting, by an optical system, the EUV light from the diffuser, receiving, by an image sensor, the EUV light from the optical system, obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions, generating, based on an optical prediction model, a plurality of predictive images estimating a diffraction pattern in the image sensor, adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, and generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors.
Type:
Application
Filed:
September 26, 2023
Publication date:
August 15, 2024
Applicant:
SAMSUNG ELECTRONICS CO., LTD.
Inventors:
Junho SHIN, Seungbeom PARK, Jangwoon SUNG, Hojun LEE, Wookrae KIM, Myungjun LEE