Patents by Inventor Ana R. Londergan

Ana R. Londergan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition
    Patent number: 6720259
    Abstract: A method to deposit a passivating layer of a first material on an interior reactor surface of a cold or warm wall reactor, in which the first material is non-reactive with one or more precursor used to form a second materials. Subsequently when a film layer is deposited on a substrate by subjecting the substrate to the one or more precursors, in which at least one precursor has a low vapor pressure, uniformity and repeatability is improved by the passivation layer.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: April 13, 2004
    Assignee: Genus, Inc.
    Inventors: Ana R. Londergan, Sasangan Ramanathan, Jereld Winkler, Thomas E. Seidel
  • PASSIVATION METHOD FOR IMPROVED UNIFORMITY AND REPEATABILITY FOR ATOMIC LAYER DEPOSITION AND CHEMICAL VAPOR DEPOSITION
    Publication number: 20040023516
    Abstract: A method to deposit a passivating layer of a first material on an interior reactor surface of a cold or warm wall reactor, in which the first material is non-reactive with one or more precursors used to form a second material. Subsequently when a film layer is deposited on a substrate by subjecting the substrate to the one or more precursors, in which at least one precursor has a low vapor pressure, uniformity and repeatability is improved by the passivation layer.
    Type: Application
    Filed: October 2, 2002
    Publication date: February 5, 2004
    Inventors: Ana R. Londergan, Sasangan Ramanathan, Jereld Winkler, Thomas E. Seidel