Abstract: Embodiments described herein generally related to a substrate processing apparatus. In one embodiment, a process kit for a substrate processing chamber disclosed herein. The process kit includes a ring having a first ring component and a second ring component, a sliding ring, and an actuating mechanism. The first ring component is interfaced with the second ring component such that the second ring component is movable relative to the first ring component forming a gap therebetween. The sliding ring is positioned beneath the ring and contacts a bottom surface of the second ring component. A top surface of the sliding ring contacts the second ring component. The actuating mechanism is interfaced with the bottom surface of the sliding ring. The actuating mechanism is configured to actuate the sliding ring such that the gap between the first ring component and the second ring component varies.

Abstract: A calibration object is transferred from a processing chamber to an aligner station by one or more robot arms. The calibration object has a first processing chamber orientation in the processing chamber and a second orientation at the aligner station. A first characteristic error value associated with a transfer path between the processing chamber and the aligner is determined based on the first processing chamber orientation and the second orientation of the calibration object at the aligner station. In response to detecting an object at the aligner station to be transferred to the processing chamber along the transfer path, the object is aligned by the aligner station to be placed in the processing chamber according to a target processing chamber orientation based on a target aligner orientation as adjusted by the first characteristic error value determined for the transfer path between the processing chamber and the aligner station.

Abstract: Aspects generally relate to methods and systems for modulating capacitance values of different components within a processing chamber. The processing chamber includes an electrode driven by a power source coupled to a substrate, where a first capacitance is produced between the electrode and the substrate, an edge ring disposed adjacent the substrate, the edge ring having a second capacitance, and at least one capacitor disposed within the processing chamber to match the second capacitance of the edge ring to the first capacitance between the electrode and the substrate. In one example, the at least one capacitor is a fixed capacitor. In another example, the at least one capacitor is a variable capacitor. Components of the processing chamber may be powered by either a radiofrequency source or a pulse generator.

Abstract: A mounting box is for being mounted on a trailer front. The mounting box extends along a width, a height and a length and is limited by a front surface including a flat or curved alignment area. The alignment area extends in the length of the mounting box and measures at least 1 m, at least 1.5 m or at least 2 m in a length direction defined by the length of the mounting box. The mounting box includes a connection section, wherein the connection section includes a plurality of box connectors fixedly mounted on the mounting box for providing an electrical, pneumatic or hydraulic connection with corresponding truck connectors. The connection section is arranged above or below the alignment area in a height direction defined by the height of the mounting box, so that the alignment area provides a continuous surface which is uninterrupted by the box connectors.

Abstract: A carrier includes a rigid body forming a plurality of openings and a plurality of fasteners configured to removably attach to the rigid body via the plurality of openings. A first set of fingers is configured to be removably attached to the rigid body via the plurality of fasteners and the plurality of openings. The first set of fingers is configured to support first content during first transportation of the carrier within a substrate processing system. A second set of fingers is configured to be removably attached to the rigid body via the plurality of fasteners and the plurality of openings. The second set of fingers is configured to support second content during second transportation of the carrier within the substrate processing system.

Abstract: An electrical connector for a substrate support assembly is disclosed herein. The electrical connector includes a first interface body, and a second interface body coupled to the first interface body and to a third interface body. The second interface body is circumscribed by the third interface body. The first interface body and the second interface body each comprise a plurality of electrical terminals disposed in sockets formed in the respective first and second interface bodies, each electrical terminal disposed in sockets of the first interface body coupled to a respective one of the electrical terminals disposed in sockets of the second interface body to form a plurality of isolated conductive electrical unions, wherein the second interface body includes a plurality of protruding sidewalls that extend into the first interface body between each of the electrical terminals of the first interface body.

Abstract: Disclosed herein is a method and apparatus for controlling surface characteristics by measuring capacitance of a process kit ring. The method includes interfacing a ring with a jig assembly for measuring capacitance in at least a first location of the ring. The ring has that includes a top surface, a bottom surface, and an inner surface opposite an outer surface. At least the bottom surface has an external coating placed thereon. The method further includes contacting a measuring device to the first location on the outer surface proximate the bottom surface. The measuring device contacts an opening in the external coating to the body. The measuring device contacts a first conductive member that is electrically coupled to the ring. A capacitance is measured on the measuring device. The capacitance across the top surface is measured.

Abstract: According to embodiments described herein, an oil-cooled exhaust turbine apparatus is provided. The exhaust turbine apparatus comprises a rotatable shaft with a turbine wheel, a bearing member comprising a bearing, a bearing housing comprising a sealing bush portion for providing a first sealing device axially between the turbine wheel and the bearing member; an oil cooling chamber for cooling an inner face of the bearing housing, an oil channel for providing oil into the oil cooling chamber, an oil drainage chamber arranged axially between the bearing member and the sealing bush portion and an oil barrier wall surrounding, in at least a vertically top circumferential segment, a radially outer side of the oil drainage chamber for covering the oil drainage chamber from the oil cooling chamber.

Abstract: A substrate support assembly is described herein that includes a facility plate, a ground plate coupled to the facility plate, a fluid conduit disposed within the substrate support assembly disposed through the facility plate and the ground plate, and a connector coupled to the ground plate that houses a portion of the fluid conduit. The connector includes a biasing assembly and a fastener disposed in a pocket formed in the ground plate.

Abstract: A composition of microorganisms, comprising photoautotrophic microorganisms (16) which produce oxygen by photosynthetic water oxidation chemoheterotrophic microorganisms (17) which respire oxygen, wherein the photoautotrophic microorganisms (16) and the chemoheterotrophic microorganisms (17) are comprised in a biofilm (13), the biofilm further comprising components (15) which were secreted by the photoautotrophic microorganisms (16) and/or the chemoheterotrophic microorganisms (17), and a reactor (1), a method for forming a biofilm, and a method for biocatalytic conversion employing such composition.

Abstract: A process kit enclosure system includes walls and a retention device structure. The retention device structure includes a retention device post and a retention device fin. The retention device fin in a first position is disposed above and secures a process kit ring supported in the interior volume of the process kit enclosure system. The retention device fin is rotated from the first position to be in a second position to be outside a boundary of the process kit ring. The retention device post is aligned with and inserts into a recess formed by a top cover of the process kit enclosure system responsive to the retention device post being in the first position. The retention device post is misaligned with and blocked from inserting into the recess formed by the top cover responsive to the retention device post of the retention device structure being in the second position.

Abstract: Disclosed herein is a seal assembly for a substrate processing chamber and a component assembly containing the seal assembly. The seal assembly includes a ring-shaped seal member; a holder disposed radially inward of the ring-shaped seal member; and a retaining mechanism coupling the ring-shaped seal member with the holder. The component assembly includes a first component coupled with a second component via a bonding layer; a groove formed by the first component, the second component, and the bonding layer; and the seal assembly disposed in the groove.

Abstract: A device automatically establishes at least one connection between a towing vehicle and a trailer vehicle. The device includes an outrigger, an alignment device, a gripper arm and a gripper arm drive. A system includes the device. A towing vehicle includes a device or a system. A trailer vehicle is configured to be connected to a towing vehicle including the device or the system. A truck-trailer combination includes a towing vehicle and a trailer vehicle. Further, a method automatically establishes connections between a towing vehicle and a trailer vehicle.

Abstract: Embodiments described herein generally related to a substrate processing apparatus. In one embodiment, a process kit for a substrate processing chamber disclosed herein. The process kit includes a ring having a first ring component and a second ring component, a sliding ring, and an actuating mechanism. The first ring component is interfaced with the second ring component such that the second ring component is movable relative to the first ring component forming a gap therebetween. The sliding ring is positioned beneath the ring and contacts a bottom surface of the second ring component. A top surface of the sliding ring contacts the second ring component. The actuating mechanism is interfaced with the bottom surface of the sliding ring. The actuating mechanism is configured to actuate the sliding ring such that the gap between the first ring component and the second ring component varies.

Abstract: Embodiments described herein generally related to a substrate processing chamber and a method of processing substrate in a processing chamber. In one embodiment, a method of using a process kit for a substrate processing chamber disclosed herein. The method begins by positioning the substrate on a substrate support disposed in the substrate processing chamber. A plasma is formed above the substrate and a tilt and height of an edge ring is adjusted with a controller. The controller is coupled to a movement assembly having one of three linear actuators for tilting a sliding ring interfaced with the edge ring to change a direction of ions at one edge of the substrate.

Abstract: Substrate supports and related components including additive manufacturing processes are disclosed. One substrate support assembly includes an electrostatic chuck; and a cooling base having a first surface that is bonded to a first surface of the electrostatic chuck with a metallic bonding material, the cooling base comprising: a ceramic body having a coefficient of thermal expansion substantially the same as the electrostatic chuck; one or more cooling channels formed within the ceramic body; and one or more conductive zones extending through the ceramic body from the first surface to a second surface on an opposite side of the cooling base.

Abstract: A process kit enclosure system includes surfaces to enclose an interior volume, a first support structure including first fins, a second support structure including second fins, and a front interface to interface the process kit enclosure system with a load port of a wafer processing system. The first and second fins are sized and spaced to hold process kit ring carriers and process kit rings in the interior volume. Each of the process kit rings is secured to one of the process kit ring carriers. The process kit enclosure system enables first automated transfer of a first process kit ring carrier securing a first process kit ring from the process kit enclosure system into the wafer processing system and second automated transfer of a second process kit ring carrier securing a second process kit ring from the wafer processing system into the process kit enclosure system.

Abstract: According to embodiments described herein, an oil-cooled exhaust turbine apparatus is provided. The exhaust turbine apparatus comprises a rotatable shaft with a turbine wheel, a bearing member comprising a bearing, a bearing housing comprising a sealing bush portion for providing a first sealing device axially between the turbine wheel and the bearing member; an oil cooling chamber for cooling an inner face of the bearing housing, an oil channel for providing oil into the oil cooling chamber, an oil drainage chamber arranged axially between the bearing member and the sealing bush portion and an oil barrier wall surrounding, in at least a vertically top circumferential segment, a radially outer side of the oil drainage chamber for covering the oil drainage chamber from the oil cooling chamber.

Abstract: In order to provide a method for manufacturing a bipolar plate layer for a bipolar plate of an electrochemical unit of an electrochemical device having the method steps of: providing a starting material for the bipolar plate layer; and shaping the starting material such that an edge web which borders a flow field of the bipolar plate layer is formed, which is configured to be carried out simply and reliably even when large numbers of bipolar plate layers are to be manufactured, it is proposed that the method comprises the following: separating out gas passage openings from an edge web portion of the starting material, wherein after the gas passage openings have been separated out the edge web portion is shaped such that the edge web is formed from the edge web portion.