Abstract: A new, stable trimeric TNF? structure is disclosed with distorted symmetry which can bind to the TNFR1 receptor to attenuate signalling therefrom, which can be used in the treatment and/or prevention of diseases associated with the soluble TNF?/TNFR1 interaction. Membrane-bound TNF? is not affected in its ability to signal through TNFR2, and thus the new structure of TNF? may be used in therapies which do not significantly raise the risk of infection or malignancy.

Abstract: A formulation for the coating of substrates, the formulation including 5 to 70 wt % of hydroxy-functional fluoropolymers, 5 to 70 wt % of polyesters based on dicarboxylic or polycarboxylic acids or derivatives thereof and on aliphatic or cycloaliphatic diols or polyols, the polyester including at least one aliphatic or cycloaliphatic dicarboxylic acid or polycarboxylic acid or derivatives thereof, 2 to 25 wt % of crosslinkers, 0.01 to 2 wt % of crosslinking catalysts, up to 20 wt % of UV absorbers and up to 10 wt % of UV stabilizers.

Abstract: A pitch bearing assembly for a wind turbine may include an outer race and an inner race rotatable relative to the outer race. The inner race may define an inner circumference and may include a plurality of gear teeth around the inner circumference. The inner race may also include a circumferential flange extending at least partially around the inner circumference. In addition, the pitch bearing assembly may include a stiffener coupled to the circumferential flange.

Abstract: A control circuit adjusts the duty cycle of a PWM control signal. An analog processing component within the control circuit receives an analog feedback input signal and compares it to an analog reference signal to generate a pre-processed signal. A sigma-delta modulator within the analog processing component generates a quantized signal based on the pre-processed signal. A digital processing component stores a value. The controller then adjusts the duty cycle of the PWM signal to correspond to the value. A clock keeps the system synchronized.

Abstract: A pitch bearing assembly for a wind turbine may include an outer race and an inner race rotatable relative to the outer race. The inner race may define an inner circumference and may include a plurality of gear teeth around the inner circumference. The inner race may also include a circumferential flange extending at least partially around the inner circumference. In addition, the pitch bearing assembly may include a stiffener coupled to the circumferential flange.

Abstract: A control circuit adjusts the duty cycle of a PWM control signal. An analog processing component within the control circuit receives an analog feedback input signal and compares it to an analog reference signal to generate a pre-processed signal. A sigma-delta modulator within the analog processing component generates a quantized signal based on the pre-processed signal. A digital processing component stores a value. The controller then adjusts the duty cycle of the PWM signal to correspond to the value. A clock keeps the system synchronized.

Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract: A hub assembly for use with a wind turbine is provided. The hub assembly includes a body formed from a first material, a bearing seat formed integrally with the body, and a support assembly positioned within an opening defined by the bearing seat and at least partially coupled to the body. The support assembly includes an insert formed from a second material different than the first material.

Abstract: A hub assembly for use with a wind turbine is provided. The hub assembly includes a body formed from a first material, a bearing seat formed integrally with the body, and a support assembly positioned within an opening defined by the bearing seat and at least partially coupled to the body. The support assembly includes an insert formed from a second material different than the first material.

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: A circuit, method for regulation, and use thereof is provided, whereby the circuit can include a charge pump that is connected to a supply voltage terminal in order to produce a pump voltage from a supply voltage, and includes a control circuit whose inputs are connected to the output of the charge pump and to the supply voltage terminal in order to sense a difference between the pump voltage and the supply voltage as a controlled variable. The circuit is designed to compare the controlled variable to a reference variable, and output is connected to a control input of the charge pump in order to control the charge pump as a function of the comparison.

Abstract: The present invention relates to the use of branched, amorphous, polyester-based macropolyols for coating metal strips, to methods of coating metal strips and to the coated metal strips thus obtained. The coating comprises branched polyesters having trifunctional branching agent contents of between 10 and 25 mol %, based on the alcohol component, and the molecular weight of the polyester is between 2500 and 4500 g/mol.

Abstract: A circuit, method for regulation, and use thereof is provided, whereby the circuit can include a charge pump that is connected to a supply voltage terminal in order to produce a pump voltage from a supply voltage, and includes a control circuit whose inputs are connected to the output of the charge pump and to the supply voltage terminal in order to sense a difference between the pump voltage and the supply voltage as a controlled variable. The circuit is designed to compare the controlled variable to a reference variable, and output is connected to a control input of the charge pump in order to control the charge pump as a function of the comparison.

Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract: A bearing segment of a heavy-duty hydrodynamic axial plain bearing for an electric machine and including a stationary subassembly and a rotary subassembly is described. The bearing segment includes a sliding surface facing a front surface of the rotary subassembly and in close proximity to the front surface so as to form a lubricant gap containing a lubricant between the sliding surface and the front surface. The front surface slides relative to the sliding surface when the rotary subassembly is rotating so as to create a high pressure region and a low pressure region of the lubricant gap. The bearing segment also includes an equalizing duct interconnecting the high-pressure region and the low-pressure region.

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.

Abstract: At least two components are brought to rest on each other at least in an assembly portion, with a carrier element contacting a first one of the two components at least in the assembly portion, and at least one projection passing through the components in the assembly portion in the direction towards the carrier element. The carrier element is planarly supported at least in the assembly portion against the passing-through movement of the projection, and the passing of the projection through the components. The opposed planar support of the carrier element effects a plastic deformation of the passed-through material of the components in the direction transversely to the passing-through movement of the projection by deforming the carrier element.

Abstract: In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.