Abstract: A control circuit adjusts the duty cycle of a PWM control signal. An analog processing component within the control circuit receives an analog feedback input signal and compares it to an analog reference signal to generate a pre-processed signal. A sigma-delta modulator within the analog processing component generates a quantized signal based on the pre-processed signal. A digital processing component stores a value. The controller then adjusts the duty cycle of the PWM signal to correspond to the value. A clock keeps the system synchronized.

Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract: A hub assembly for use with a wind turbine is provided. The hub assembly includes a body formed from a first material, a bearing seat formed integrally with the body, and a support assembly positioned within an opening defined by the bearing seat and at least partially coupled to the body. The support assembly includes an insert formed from a second material different than the first material.

Abstract: A hub assembly for use with a wind turbine is provided. The hub assembly includes a body formed from a first material, a bearing seat formed integrally with the body, and a support assembly positioned within an opening defined by the bearing seat and at least partially coupled to the body. The support assembly includes an insert formed from a second material different than the first material.

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: A circuit, method for regulation, and use thereof is provided, whereby the circuit can include a charge pump that is connected to a supply voltage terminal in order to produce a pump voltage from a supply voltage, and includes a control circuit whose inputs are connected to the output of the charge pump and to the supply voltage terminal in order to sense a difference between the pump voltage and the supply voltage as a controlled variable. The circuit is designed to compare the controlled variable to a reference variable, and output is connected to a control input of the charge pump in order to control the charge pump as a function of the comparison.

Abstract: The present invention relates to the use of branched, amorphous, polyester-based macropolyols for coating metal strips, to methods of coating metal strips and to the coated metal strips thus obtained. The coating comprises branched polyesters having trifunctional branching agent contents of between 10 and 25 mol %, based on the alcohol component, and the molecular weight of the polyester is between 2500 and 4500 g/mol.

Abstract: A circuit, method for regulation, and use thereof is provided, whereby the circuit can include a charge pump that is connected to a supply voltage terminal in order to produce a pump voltage from a supply voltage, and includes a control circuit whose inputs are connected to the output of the charge pump and to the supply voltage terminal in order to sense a difference between the pump voltage and the supply voltage as a controlled variable. The circuit is designed to compare the controlled variable to a reference variable, and output is connected to a control input of the charge pump in order to control the charge pump as a function of the comparison.

Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract: A bearing segment of a heavy-duty hydrodynamic axial plain bearing for an electric machine and including a stationary subassembly and a rotary subassembly is described. The bearing segment includes a sliding surface facing a front surface of the rotary subassembly and in close proximity to the front surface so as to form a lubricant gap containing a lubricant between the sliding surface and the front surface. The front surface slides relative to the sliding surface when the rotary subassembly is rotating so as to create a high pressure region and a low pressure region of the lubricant gap. The bearing segment also includes an equalizing duct interconnecting the high-pressure region and the low-pressure region.

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.

Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.

Abstract: At least two components are brought to rest on each other at least in an assembly portion, with a carrier element contacting a first one of the two components at least in the assembly portion, and at least one projection passing through the components in the assembly portion in the direction towards the carrier element. The carrier element is planarly supported at least in the assembly portion against the passing-through movement of the projection, and the passing of the projection through the components. The opposed planar support of the carrier element effects a plastic deformation of the passed-through material of the components in the direction transversely to the passing-through movement of the projection by deforming the carrier element.

Abstract: In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.

Abstract: Arrangement and process for assembling at least two tobacco rods in a cigarette rod maker. The arrangement includes at least two flow surfaces and feed devices structured and arranged to convey tobacco on the at least two flow surfaces. Each of the at least two flow surfaces are structured and arranged to guide the tobacco from the feed devices to at least one suction rod conveyor, respectively, and the feed devices include at least two ducts arranged one behind the other crosswise to a conveying direction of the suction rod conveyor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

Abstract: A system and method for control and monitoring of rotating equipment through the use of machine status classification where, in one embodiment, adaptive control measures responsive to the machine status are implemented. The invention provides a computer-implemented method for monitoring a mechanical component using either a neural network or weighted distance classifier. The method references a predetermined set of candidate data features for a sensor measuring an operational attribute of the component and derives a subset of those features which are then used in real-time to determine class affiliation parameter values. The classification database is updated when an anomalous measurement is encountered, even as monitoring of the mechanical component continues in real-time. The invention also provides a dimensionless peak amplitude data feature and a dimensionless peak separation data feature for use in classifying.

Abstract: In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion.

Abstract: Assemblies of collated film sections and related prints, each belonging to a customer, are fed seriatim into a tray at the right-hand side of a horizontal table in front of a seated attendant so that the attendant can remove an assembly with the right hand while the left-hand opens the corresponding customer pocket which is held in a position of readiness at the left-hand side of the table. The attendant can observe the collating operation by inspecting successive film frames while the frames move above an illuminated window below and in front of the web of photographic paper with exposed and developed prints thereon. The pockets are removed seriatim from a magazine and are transported to the left-hand side of the table where the rear panel of an oncoming pocket is held by suction to facilitate the task of opening the pocket by pulling the front panel away from the rear panel.

Abstract: A camera can use film cassettes which, depending upon the sensitivity of the film they contain, are or are not provided with an external marker. If a cassette with a marker is inserted into the camera the marker deflects a sensing arm so that a projection of the arm moves out of the path of movement of a rack which carries a filter. This permits the spring-biased rack to move to a position in which the filter is located in the path of light impinging upon a light-sensing device of the camera. If a cassette without a marker is inserted the arm is not deflected and its projection extends into the path of movement of the rack and prevents the rack from moving to the aforementioned position, so that the filter cannot move into the light path.