Patents by Inventor Andrew J. Blakeney
Andrew J. Blakeney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7217497Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.Type: GrantFiled: June 8, 2004Date of Patent: May 15, 2007Assignee: Arch Specialty Chemicals, Inc.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
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Patent number: 6924339Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.Type: GrantFiled: May 14, 2003Date of Patent: August 2, 2005Assignee: Arch Specialty Chemicals, Inc.Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
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Patent number: 6855476Abstract: A photoacid compound having the following general structure: R—O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.Type: GrantFiled: April 5, 2002Date of Patent: February 15, 2005Assignee: Arch Specialty Chemicals, Inc.Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
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Publication number: 20040219454Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.Type: ApplicationFiled: June 8, 2004Publication date: November 4, 2004Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
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Patent number: 6783916Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.Type: GrantFiled: July 9, 2001Date of Patent: August 31, 2004Assignee: Arch Specialty Chemicals, Inc.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
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Patent number: 6783917Abstract: A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.Type: GrantFiled: April 4, 2002Date of Patent: August 31, 2004Assignee: Arch Specialty Chemicals, Inc.Inventors: Andrew J. Blakeney, Sanjay Malik, Stephanie Dilocker, John Ferri, Jeffery Eisele
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Publication number: 20030204035Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: 1Type: ApplicationFiled: May 14, 2003Publication date: October 30, 2003Applicant: Arch Specialty Chemicals Inc.Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
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Patent number: 6610808Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.Type: GrantFiled: March 7, 2002Date of Patent: August 26, 2003Assignee: Arch Specialty Chemicals, Inc.Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
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Publication number: 20030065101Abstract: A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.Type: ApplicationFiled: April 4, 2002Publication date: April 3, 2003Applicant: ARCH SPECIALITY CHEMICALS, INC.Inventors: Andrew J. Blakeney, Sanjay Malik, Stephanie Dilocker, John Ferri, Jeffery Eisele
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Patent number: 6514664Abstract: The present invention is a radiation sensitive composition that includes a polymer resin, a photoacid generator, a solvent, and a heterocyclic additive selected from: 1-phenyl-2-pyrrolidinone and compound of the formulas (I), (II), (III), and (IV): where R1 is —H, —NH2—, —OH, —N(CH3)2, —NH—CO—CH3, or where R2 is —CH3 or benzoyl; where R3 is —H, or C1-C4 alkyl; W, X, Y, and Z are each independently selected from —CH2—, —CH(CH3)—, —C(CH3)2—, —NH—, or —N(CH3)—, with the proviso that at least one of W, X, Y, or Z is and at least one of W, X, Y, or Z is —NH— or —N(CH3)—; where A is —CH═ or R4 is —H, —CH3, or —CH2—CH(CH3)2; R5 is —H, —CH3, or —CH2—CH(OH)—CH2(OH); R6 is &Type: GrantFiled: July 20, 2000Date of Patent: February 4, 2003Assignee: Arch Specialty Chemicals, Inc.Inventors: Medhat A. Touky, Gail McCormick, Jacqueline M. Marshall, Andrew J. Blakeney
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Publication number: 20030022097Abstract: A photosensitive resist composition comprising:Type: ApplicationFiled: April 19, 2001Publication date: January 30, 2003Applicant: ARCH SPECIALTY CHEMICALS, INCInventors: Sanjay Malik, Jeff Eisele, John Ferri, Andrew J. Blakeney
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Publication number: 20020197558Abstract: A photoacid compound having the following general structure:Type: ApplicationFiled: April 5, 2002Publication date: December 26, 2002Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
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Patent number: 6492092Abstract: The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.Type: GrantFiled: March 12, 1999Date of Patent: December 10, 2002Assignee: Arch Specialty Chemicals, Inc.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
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Publication number: 20020173594Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: 1Type: ApplicationFiled: March 7, 2002Publication date: November 21, 2002Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
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Patent number: 6380317Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: October 26, 1999Date of Patent: April 30, 2002Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Publication number: 20020007018Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.Type: ApplicationFiled: July 9, 2001Publication date: January 17, 2002Applicant: Arch Specialty Chemicals, Inc.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
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Patent number: 6323287Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.Type: GrantFiled: March 12, 1999Date of Patent: November 27, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
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Patent number: 6309793Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: November 1, 2000Date of Patent: October 30, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6159653Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: April 14, 1998Date of Patent: December 12, 2000Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6146793Abstract: A terpolymer with chemically amplified (acid labile) moieties and organosilicon moieties suitable for use as the binder resin for a photoimageable resist photoresist composition suitable for use in 193 nm photolithographic processes.The terpolymers have the following structural units: ##STR1## where R is a methyl or hydroxyethyl group, R.sup.1 is a hydrogen atom, a methyl group or a --CH.sub.2 COOCH.sub.3 group and R.sup.2 and R.sup.3 are each independently a hydrogen atom or a methyl group.Type: GrantFiled: February 22, 1999Date of Patent: November 14, 2000Assignee: Arch Specialty Chemicals, Inc.Inventors: Ulrich Schaedeli, Andrew J. Blakeney, Thomas Steinhausler, Daniela White, Allen H. Gabor