Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable stage to hold a substrate and having an upper surface around the held substrate. An apparatus frame supports the optical assembly and the containment member, and an optical mount isolator, which has an actuator, isolates the optical assembly from vibrations of the apparatus frame. A first inlet of the containment member faces at least one of the substrate and the stage and collects fluid from a gap between the containment member and the at least one of the substrate and the stage. A gas supply outlet of the containment member supplies gas to the gap.

Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable stage to hold a substrate and having an upper surface around the held substrate. An apparatus frame supports the optical assembly and the containment member, and an optical mount isolator, which has an actuator, isolates the optical assembly from vibrations of the apparatus frame. A first inlet of the containment member faces at least one of the substrate and the stage and collects fluid from a gap between the containment member and the at least one of the substrate and the stage. A gas supply outlet of the containment member supplies gas to the gap.

Abstract: A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure.

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

Abstract: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet is controlled based on the motion of the surface such that a pressure exerted by the gas is made stronger or weaker depending on the motion of the surface.

Abstract: A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and a liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The table assembly top surface has a first opening portion, and a top surface of a sensor is arranged inside of the first opening portion. The sensor top surface is positionable opposite the projection system by the table assembly such that a gap, in which the liquid can be maintained, is formed between the projection system and the sensor top surface. The table assembly and sensor top surfaces are apposed on a substantially same plane, or are substantially co-planar.

Abstract: A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The top surface and the substrate are positionable opposite to the projection system such that the liquid is maintained between the projection system and a portion of one or both of the top surface and a surface of the substrate. A sensor has a top surface arranged at the top surface of the table assembly and is positionable opposite to the projection system such that a gap, in which the liquid can be maintained, is formed between the projection system and the top surface of the sensor. The top surfaces of the table assembly and of the sensor are apposed on a substantially same plane, or are substantially co-planar.

Abstract: Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.

Abstract: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.

Abstract: A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

Abstract: A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure.

Abstract: A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.

Abstract: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

Abstract: A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.